TY - JOUR A1 - Fritzsche, Sven A1 - Topolniak, Ievgeniia A1 - Weise, Matthias A1 - Sturm, Heinz T1 - Shape deviations of DLW microstructures in dependency of fabrication parameters N2 - Deep understanding of the effects associated with fabrication parameters and their influence on the resulting structures shape is essential for the further development of direct laser writing (DLW). In particular, it is critical for development of reference materials, where structure parameters are precisely fabricated and should be reproduced with use of DLW technology. In this study we investigated the effect of various fabrication and preparation parameters on the structural precision of interest for reference materials. A well-studied photo-curable system, SZ2080 negative photo-resist with 1 wt.% Michler's ketone (Bis) photo-initiator, was investigated in this work. The correlation between applied laser power, laser velocity, fabrication direction on the deviations in the structure shape were observed by means of white light interferometry microscopy. Moreover, influence of slicing and hatching distances as well as prebake time were studied as function of sample shape. Deviations in the structure form between the theoretically expected and the one detected after DLW fabrication were observed in the range up to 15%. The observed shape discrepancies show the essential importance of fine-tuning the fabrication parameter for reference structure production. KW - Direct laser writing KW - Fabrication parameters KW - Structural precision KW - SZ2080 negative photo-resist KW - White light interferometry microscopy PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-535906 DO - https://doi.org/10.1088/1361-6439/ac2a14 VL - 31 IS - 12 SP - 1 EP - 8 PB - IOP Science AN - OPUS4-53590 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Müller, Kai A1 - Mirabella, Francesca A1 - Knigge, Xenia A1 - Mezera, Marek A1 - Weise, Matthias A1 - Sahre, Mario A1 - Wasmuth, Karsten A1 - Voss, Heike A1 - Hertwig, Andreas A1 - Krüger, Jörg A1 - Radnik, Jörg A1 - Hodoroaba, Vasile-Dan A1 - Bonse, Jörn T1 - Chemical and topographical changes upon sub-100-nm laser-induced periodic surface structure formation on titanium alloy: the influence of laser pulse repetition rate and number of over-scans N2 - Titanium and its alloys are known to allow the straightforward laser-based manufacturing of ordered surface nanostructures, so-called high spatial frequency laser-induced periodic surface structures (HSFL). These structures exhibit sub-100 nm spatial periods – far below the optical diffraction limit. The resulting surface functionalities are usually enabled by both, topographic and chemical alterations of the nanostructured surfaces. For exploring these effects, multi-method characterizations were performed here for HSFL processed on Ti–6Al–4V alloy upon irradiation with near-infrared ps-laser pulses (1030 nm, ≈1 ps pulse duration, 1–400 kHz) under different laser scan processing conditions, i.e., by systematically varying the pulse repetition frequency and the number of laser irradiation passes. The sample characterization involved morphological and topographical investigations by scanning electron microscopy (SEM), atomic force microscopy (AFM), tactile stylus profilometry, as well as near-surface chemical analyses hard X-ray photoelectron spectroscopy (HAXPES) and depth-profiling time-of-flight secondary ion mass spectrometry (ToF-SIMS). This provides a quantification of the laser ablation depth, the geometrical HSFL characteristics and enables new insights into the depth extent and the nature of the non-ablative laser-induced near-surface oxidation accompanying these nanostructures. This allows to answer the questions how the processing of HSFL can be industrially scaled up, and whether the latter is limited by heat-accumulation effects. T2 - 2023 E-MRS Spring Meeting, Symposium L "Making light matter: lasers in material sciences and photonics" CY - Strasbourg, France DA - 29.05.2023 KW - Laser-induced periodic surface structures (LIPSS) KW - Ultrashort laser pulses KW - Laser processing KW - Hard X-ray photoelectron spectroscopy (HAXPES) KW - Time-of-flight secondary ion mass spectrometry (ToF-SIMS) PY - 2023 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-589902 UR - https://onlinelibrary.wiley.com/doi/full/10.1002/pssa.202300719 DO - https://doi.org/10.1002/pssa.202300719 SN - 1862-6319 VL - 220 SP - 1 EP - 12 PB - Wiley-VCH GmbH CY - Weinheim AN - OPUS4-58990 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Voss, Heike A1 - Knigge, Xenia A1 - Knapic, D. A1 - Weise, Matthias A1 - Sahre, Mario A1 - Hertwig, Andreas A1 - Sacco, A. A1 - Rossi, A. M. A1 - Radnik, Jörg A1 - Müller, Kai A1 - Wasmuth, Karsten A1 - Krüger, Jörg A1 - Hassel, A. W. A1 - Hodoroaba, Vasile-Dan A1 - Bonse, Jörn T1 - Picosecond laser processing of hierarchical micro–nanostructures on titanium alloy upon pre- and postanodization: morphological, structural, and chemical effects N2 - Recent publications indicate that the order of electrochemical anodization (before or after the laser processing step) plays an important role for the response of bone-forming osteoblasts—an effect that can be utilized for improving permanent dental or removable bone implants. For exploring these different surface functionalities, multimethod morphological, structural, and chemical characterizations are performed in combination with electrochemical pre- and postanodization for two different characteristic microspikes covered by nanometric laser-induced periodic surface structures on Ti–6Al–4V upon irradiation with near-infrared ps-laser pulses (1030 nm wavelength, ≈1 ps pulse duration, 67 and 80 kHz pulse repetition frequency) at two distinct sets of laser fluence and beam scanning parameters. This work involves morphological and topographical investigations by scanning electron microscopy and white light interference microscopy, structural material examinations via X-ray diffraction, and micro-Raman spectroscopy, as well as near-surface chemical analyses by X-ray photoelectron spectroscopy and hard X-ray photoelectron spectroscopy. The results allow to qualify the mean laser ablation depth, assess the spike geometry and surface roughness parameters, and provide new detailed insights into the near-surface oxidation that may affect the different cell growth behavior for pre- or postanodized medical implants. T2 - 2023 E-MRS Spring Meeting, Symposium L "Making light matter: lasers in material sciences and photonics" CY - Strasbourg, France DA - 29.05.2023 KW - Hierarchical micro-nanostructures KW - Laser-induced periodic surface structures (LIPSS) KW - Ultrashort laser pulses KW - Ti-6Al-4V alloy KW - X-ray photoelectron spectroscopy PY - 2024 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-601962 DO - https://doi.org/10.1002/pssa.202300920 SN - 1862-6319 SP - 1 EP - 11 PB - Wiley-VCH GmbH CY - Weinheim AN - OPUS4-60196 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Schiek, Manuela A1 - Minenkov, Alexey A1 - Hollweger, Sophia A1 - Duchoslav, Jiri A1 - Erdene-Ochir, Otgonbayar A1 - Weise, Matthias A1 - Ermilova, Elena A1 - Hertwig, Andreas T1 - Optical constants of In2O3-SnO2 (Indium tin oxide, ITO) N2 - Optical constants of In2O3-SnO2 (Indium tin oxide, ITO) Minenkov et al. 2024: on glass; n,k 0.191–1.69 µm Optical constants of In2O3-SnO2 (Indium tin oxide, ITO) Minenkov et al. 2024: on Si wafer, top; n,k 0.191–1.69 µm Optical constants of In2O3-SnO2 (Indium tin oxide, ITO) Minenkov et al. 2024: on Si wafer, bottom; n,k 0.191–1.69 µm KW - Indium Tin Oxide KW - Optical constants KW - Magnetron Sputtering KW - Electrochemical Degradation KW - Spectroscopic Ellipsometry PY - 2024 UR - https://refractiveindex.info/?shelf=other&book=In2O3-SnO2&page=Minenkov-glass UR - https://refractiveindex.info/?shelf=other&book=In2O3-SnO2&page=Minenkov-wafer-top UR - https://refractiveindex.info/?shelf=other&book=In2O3-SnO2&page=Minenkov-wafer-bottom PB - Refractiveindex.info AN - OPUS4-59766 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Reiners, Georg A1 - Weise, Matthias A1 - Hartung, J. A1 - Reinhold, E. A1 - Strümpfel, J. T1 - Ion Assisted vs. Plasma Assisted PVD: Preparation of Optical Multilayers in a Versatile Cluster System Implementing Electron Beam and Sputter Technology N2 - Functionality of optical systems requires optical coatings of high quality which have to be adapted to the application in terms of the performance of optical parameters such as reflectivity (AR, low, defined, high), the substrate material of interest (polymers, ceramics, and glass), the environmental conditions (such as temperature or humidity), and the service conditions (such spectral range and power density). Moreover, in many cases, additional non-optical requirements have to be met, including mechanical features such as scratch resistance, hardness and modulus. Consequently, thickness and overall uniformity requirements are steadily increasing. In general, these demands can usually not be achieved by a single film or coating. Instead, films with specific design features (such as gradients), layer stacks and multilayers are a prerequisite for high quality layers and their reliability. For the development of such layer systems, a versatile cluster deposition system consisting of three clusters and a cluster-to-cluster handler has been designed. Besides a PECVD cluster for DLC coatings, two PVD clusters implement ion assisted electron beam evaporation and plasmabased sputter technology. In addition to metallic films, preparation of oxide and nitride optical coatings (SiO2, TiO2, Ta2O5, ITO, Al2O3, TiN, AlN) in various process modifications (nonreactive, partially reactive, full-reactive; rf-, dc-, mf- mode; PEM control) has been carried out. Within this paper, the effect of several process parameters on layer quality (optical constants, density, and uniformity) is discussed for selected applications examples (AR- and HR coatings, applications at elevated temperatures and applications of enhanced mechanical performance). It has been shown that specific features of ion and plasma assisted PVD processes, including ion-beam and plasma preand post-treatment of substrates and layer systems, may widen the application range and improve functionality features of given coating/substrate systems. T2 - 47th Annual Technical Conference Proceedings CY - Dallas, TX, United States of America DA - 2004-04-24 KW - Ion assisted PVD KW - Optical multilayers KW - Plasma assisted PVD KW - Cluster deposition system PY - 2004 UR - http://www.knovel.com/knovel2/Toc.jsp?BookID=1082 SN - 0737-5921 SN - 1539-2236 SP - 86 EP - 90 CY - Albuquerque, NM AN - OPUS4-4148 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Reiners, Georg A1 - Weise, Matthias A1 - Hartung, J. A1 - Reinhold, E. A1 - Strümpfel, J. T1 - Ion-assisted vs. Plasma-assisted PVD: Preparation of Optical Multi-layers in a Versatile Cluster System Implementing Electron Beam and Sputter Technology KW - Thin Film Technology KW - Ion-assisted PVD KW - Plasma-assisted PVD KW - Optical Multi-layers KW - Cluster Deposition System PY - 2004 SN - 0737-5921 SP - 86 EP - 90 PB - Society of Vacuum Coaters AN - OPUS4-3536 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hertwig, Andreas A1 - Krüger, Jörg A1 - Weise, Matthias A1 - Beck, Uwe T1 - Hydrogen-Containing Amorphous Carbon Layers as Optical Materials in the Near-IR Spectral Range N2 - Hydrogenated amorphous carbon layers were deposited on various substrates by means of a plasma CVD process with a RF substrate bias as well as an ECR plasma source. The optical properties of the a-C:H layers were obtained via spectroscopic ellipsometry and correlated with their mechanical and chemical properties. The layers from pure RF plasma exhibit a higher absorption constant in the visible spectral range and a higher refractive index. All layers are nearly transparent in the NIR spectral range making them candidates for optical thin layer systems. The laser damage behaviour of the a-C:H layers was investigated with ultrashort pulses. The damage thresholds were consistent with the absorption constants of the layers. Interesting damage morphologies were observed indicating a sensitivity of this experiment to sub-structures in the layer. KW - Kohlenstoffschichten KW - Optische Konstanten KW - Ellipsometrie KW - Laser-Material-Bearbeitung KW - Amorphous KW - Diamond-like carbon KW - Hydrocarbons KW - Laser ablation KW - Optical proper PY - 2007 SN - 1612-8850 SN - 1612-8869 VL - 4 IS - S1 SP - S76 EP - S82 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-14862 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Koter, Robert A1 - Weise, Matthias A1 - Hertwig, Andreas A1 - Beck, Uwe A1 - Krüger, Jörg T1 - Influence of film thickness and optical constants on femtosecond laser-induced ablation of hydrogenated amorphous carbon films N2 - Hydrogenated amorphous carbon layers were deposited on BK7 glass in a plasma-assisted chemical vapor deposition process. Low and high refracting films with thicknesses d ranging from 11 nm to 5.8 µm were produced having refractive indices n between 1.68 and 2.41 and linear absorption coefficients of α~100 cm-1 and α~20000 cm-1 at 800 nm wavelength as a result of different plasma modes. Laser ablation thresholds Fth in dependence on d were determined using 30-fs laser pulses. Low absorbing layers show a constant Fth while Fth increases with rising d up to the optical penetration depth of light α-1 for high absorbing films. KW - Physical radiation damage (61.80.-x) KW - Laser-beam impact phenomena (79.20.Ds) KW - Radiation treatment (81.40.Wx) KW - Carbon (81.05.Uw) KW - Optical constants (78.20.Ci) PY - 2010 SN - 1454-4164 VL - 12 IS - 3 SP - 663 EP - 667 PB - INOE & INFM CY - Bucharest AN - OPUS4-21084 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Rybachuk, Maksym A1 - Hertwig, Andreas A1 - Weise, Matthias A1 - Sahre, Mario A1 - Männ, Marion A1 - Beck, Uwe A1 - Bell, J. M. T1 - Near infrared optical materials from polymeric amorphous carbon synthesized by collisional plasma process N2 - The synthesis of polymerlike amorphous carbon (a-C:H) thin-films by microwave excited collisional hydrocarbon plasma process is reported. Stable and highly aromatic a-C:H were obtained containing significant inclusions of poly(p-phenylene vinylene) (PPV). PPV confers universal optoelectronic properties to the synthesized material. That is a-C:H with tailor-made refractive index are capable of becoming absorption-free in visible (red)-near infrared wavelength range. Production of large aromatic hydrocarbon including phenyl clusters and/or particles is attributed to enhanced coagulation of elemental plasma species under collisional plasma conditions. Detailed structural and morphological changes that occur in a-C:H during the plasma synthesis are also described. KW - Kohlenstoffschichten KW - Plasmachemie KW - PA-CVD KW - Amorphous state KW - Carbon KW - Coagulation KW - Hydrogen KW - Optical materials KW - Plasma collision processes KW - Plasma deposition KW - Refractive index KW - Thin films PY - 2010 DO - https://doi.org/10.1063/1.3431292 SN - 0003-6951 SN - 1077-3118 VL - 96 IS - 21 SP - 211909-1 - 211909-3 PB - American Institute of Physics CY - Melville, NY AN - OPUS4-21365 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hönig, D. A1 - Schneider, S. A1 - Domnick, R. A1 - Belzner, M. A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Stephanowitz, Ralph A1 - Weise, Matthias ED - Uhlmann, E. T1 - Ellipsometrische Codierung & Fabry-Perot Schichtsysteme mit offenen, versteckten und forensischen Merkmalen zur Produkt-Authentifizierung T2 - 3. Internationaler Kongress - Sichere Identität CY - Berlin, Deutschland DA - 2011-04-05 KW - Ellipsometric encoding KW - Fabry-Perot layer stacks KW - Product authentification PY - 2011 SP - 1 EP - 4(?) CY - Berlin AN - OPUS4-23306 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Beck, Uwe A1 - Hönig, D. A1 - Schneider, S. A1 - Domnick, R. A1 - Belzner, M. A1 - Hertwig, Andreas A1 - Stephanowitz, Ralph A1 - Sahre, Mario A1 - Weise, Matthias T1 - Fabry-Perot-based layer stacks for ellipsometric encoding - Embedded public, hidden, and forensic information for product authentication N2 - Public, hidden, and forensic features either encoded or directly legible are used for authentication. Fabry-Perot layer stacks as information carriers in combination with imaging ellipsometry as optical read-out system provide all-in-one anti-counterfeiting capability that may establish the new security level 'encoded forensic'. Different layer designs are described with regard to all three security levels: public features (e.g. color and tilt effect) perceptible by the human eye, hidden features (e.g. spectroscopic response in the UV or IR), and forensic features (ellipsometric quantities Ψ and Δ as a function of wavelength λ and angle of incidence AOI). Physically uncloneable functions (PUF) could be realized as a result of a multi-material and a multi-parameter deposition approach as well as by means of specific design features of the Fabry-Perot layer stack. Hence, they are not subject to any reverse engineering strategies. Examples of stratified, micro-structured, and laser-modified Fabry-Perot layer systems are considered that may be used at all perception levels (e.g. human eye, bar code reader, and imaging ellipsometry) for authentication against product counterfeiting and related areas. -------------------------------------------------------------------------------------------------------------------- Zur Authentifizierung werden offene, versteckte und forensische Merkmale entweder codiert oder direkt auslesbar verwendet. Mit Fabry-Perot Schichtsystemen als Informationsträger in Kombination mit der abbildenden Ellipsometrie als optischem Auslesesystem steht ein 'all-in-one' Fälschungsschutz-System zur Verfügung, das ein neues Sicherheitsniveau 'kodiert-forensisch' darstellt. Es werden unterschiedliche Schichtdesigns beschrieben, mit denen alle drei Sicherheitsniveaus realisiert werden können: offene Merkmale (z.B. Farbe und Kippeffekt), die mit dem menschlichen Auge wahrnehmbar sind, versteckte Merkmale (z.B. die spektrale Antwort im Sichtbaren oder im IR) sowie forensische Merkmale (ellipsometrische Größen Ψ und Δ als Funktion der Wellenlänge λ und des Einfallswinkels AOI). Physikalisch nicht klonbare Funktionen (PUF) können im Ergebnis einer Multi-Material- und Multi-Parameter Beschichtungsstrategie sowie durch spezifische Design-Merkmale des Fabry-Perot Schichtsystems realisiert werden. Folglich sind solche Schichtsysteme dem 'reverse engineering' nicht zugänglich. Es werden Beispiele für lateral ausgedehnte, mikrostrukturierte und Laser modifizierte Schichtsysteme auf verschiedenen Ausleseniveaus (menschliches Auge, Barcode-Lesegerät, abbildendes Ellipsometer) vorgestellt, die zur Authentifizierung von Produkten und verwandte Gebiete geeignet sind. KW - Fabry-Perot Schichten KW - Ellipsometrie KW - Produkt- und Markenschutz PY - 2012 DO - https://doi.org/10.1002/vipr.201200494 SN - 0947-076X SN - 1522-2454 VL - 24 IS - 4 SP - 6 EP - 11 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-26180 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Lucassen, F. A1 - Franz, G. A1 - Wirth, R. A1 - Weise, Matthias A1 - Hertwig, Andreas T1 - The morphology of the reaction front of the dissolution-precipitation reaction rutile + wollastonite = titanite in time series experiments at 600 °C/400 MPa N2 - Fluid-assisted mass transport reactions by dissolution-precipitation, where a precursor mineral reacts with a fluid, play an important role in metamorphism and metasomatism. We investigated titanite growth on rutile in time series experiments between one and 107 days at constant P-T conditions of 600 °C and 400 MPa in the system TiO2-CaO-SiO2-Na2O-HCl-H2O. A two-capsule assemblage allows for transport of Ca and Si from dissolving wollastonite to dissolving rutile, the Ti-source, in a NaCl-bearing aqueous fluid, according to the general reaction CaSiO3 + TiO2 = CaTiSiO5. Complete overgrowth of rutile by titanite occurred after just one day of experiment. Fine-grained lozenge-shaped titanite crystals of short-time runs (up to 14 days) reorganize to larger predominantly prismatic crystals after >14 days. After investigation by scanning electron microscopy, the titanite overgrowth was removed from the rutile by hydrofluoric acid, to provide a three-dimensional view of the dissolution-reaction front on the rutile surface. The morphology of the rutile surface is dominated by humps or ridges beneath the central region of a titanite crystal and valleys at the grain boundaries between adjacent titanite crystals. The dissolution pattern on the rutile surface mimics the titanite overgrowth and changes with changing grain size and shape of the titanite with longer run times. The preferred dissolution of rutile in the valleys is clearly linked to the position of the titanite grain boundaries, which served as pathways for fluid-assisted element transport. Rutile-titanite and titanite-titanite boundaries show a significant porosity in transmission electron microscopy images of foils prepared by focused ion beam milling. The large-scale dissolution pattern on the rutile surface is independent of the crystallographic orientation of the rutile and entirely dominated by the arrangement of titanite crystals in the overgrowth. Dissolution features on a scale smaller than ~1 µm are dominated by stepwise dissolution and etch-pits following the crystallographic orientation of the rutile. Similar observations were made in experiments with an additional Al-source, although these experiments result in a different overgrowth pattern; i.e., an exposed rutile surface is always present and solitary titanite crystals are accompanied by partial overgrowths. Quantitative characterization of the surface morphology by white-light interference microscopy demonstrates that, with increasing grain size of titanite, dissolution of rutile is strongly enhanced at the titanite grain boundaries. Natural examples of titanite overgrowths on rutile show the same relations between element pathways, arrangement of titanite crystals and 3D dissolution pattern on rutile as in the experimental systems. We conclude that the transport of Ti away from the rutile and of Ca + Si into the reaction rim occurred in a grain boundary fluid, the composition of which must have been strongly different from the composition of the bulk fluid in the experiment, as well as in the natural system. The reaction progress depends on the availability of a fluid, and relicts of rutile in titanite indicate restricted availability of fluid in the natural system (e.g., a fluid pulse that was consumed by the reactions). The reaction examined here can serve as a proxy for other reactions of the conversion of oxide minerals (e.g., spinel or corundum) into silicates. KW - Experimental mineralogy KW - Rutile KW - Titanite KW - Dissolution-precipitation KW - Reaction morphology KW - Geochemistry & Geophysics PY - 2012 DO - https://doi.org/10.2138/am.2012.3742 SN - 0003-004X SN - 1945-3027 VL - 97 IS - 5-6 SP - 828 EP - 839 PB - Mineralogical Society of America CY - Washington, DC AN - OPUS4-27680 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Schartel, Bernhard A1 - Beck, Uwe A1 - Bahr, Horst A1 - Hertwig, Andreas A1 - Knoll, Uta A1 - Weise, Matthias T1 - Sub-micrometre coatings as an infrared mirror: a new route to flame retardancy N2 - Most of the polymeric materials used are easy to ignite and show extensive flame spread along their surfaces. Apart from extensive heat release rates, their short time to ignition (tig), in particular, is a key fire hazard. Preventing ignition eliminates fire hazards completely. Protection layers that shift tig by more than an order of magnitude are powerful flame retardancy approaches presenting an alternative to the usual flame retardancy concepts. Coatings are proposed that consist of a three-layer system to ensure adhesion to the substrate, acting as an infrared (IR) mirror and protecting against oxidation. The IR-mirror layer stack is realised by physical vapour deposition in the sub-micrometre (<1 µm) range, reducing heat absorption by up to an order of magnitude. Not only is the ease of ignition diminished (tig is increased by several minutes), the flame spread and fire growth indices are also remarkably reduced to as little as 1/10 of the values of the uncoated polymers open for further optimization. Sub-micrometre thin IR-mirror coatings yielding surface absorptivity <0.1 are proposed as a novel and innovative flame retardancy approach. KW - Coating KW - Fire protection KW - Physical vapour deposition (PVD) KW - IR mirror KW - Ignition PY - 2012 DO - https://doi.org/10.1002/fam.1122 SN - 0308-0501 SN - 1099-1018 VL - 36 IS - 8 SP - 671 EP - 677 PB - Heyden CY - London AN - OPUS4-27210 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Sahre, Mario A1 - Stockmann, Jörg M. A1 - Weise, Matthias T1 - Visualisierung von Oberflächenverunreinigungen und Schichtartefakten N2 - Die Oberflächentechnik ist eine Schlüsseltechnologie in nahezu zu allen industriellen Branchen. Mit Ausnahme der mechanischen Stabilität, die das Substrat bereitstellt, werden verschiedenartigste Funktionen materialsparend, zum Teil hochintegriert mit maßgeschneiderten Schichtdesigns unter Ausnutzung von Nano- und Quanteneffekten auf Oberflächen appliziert. Ein Großteil der Fertigungskosten in der Mikro- und Nanotechnik wird durch Reinräume und die Umsetzung ausgeklügelter Reinigungsstrategien zur Vermeidung von Restverschmutzungen und partikulären Belegungen verursacht, da diese unweigerlich zum Bauteilversagen führen. Die Validierung des Reinigungszustandes ist somit von zentraler Bedeutung für die Schichtqualität und Produktfunktionalität. Dies gilt in Abhängigkeit von der Applikation und den vertikalen Schicht- bzw. lateralen Strukturdimensionen sowohl für Fertigungsprozesse im Reinraum als auch für solche in robuster Umgebung. In der Praxis kommt es häufig vor, dass man mikroskopisch scheinbar saubere Substrate erst durch die Beschichtung „enttarnt" und dann Defekte oft mit bloßem Auge sichtbar werden. Noch problematischer ist der Einbau von Verunreinigungen während der Schichtabscheidung, die zunächst nicht sichtbar sind, dann aber zum Bauteilversagen führen. T2 - 11. ThGOT - Thementage Grenz- und Oberflächentechnik CY - Zeulenroda-Triebes, Germany DA - 15.09.2015 KW - Imaging Ellipsometrie KW - Mikroskopie KW - Schleimpflug-Optik PY - 2015 SN - 978-3-00-046056-2 SP - 15.9.2015, Block B, 1 EP - 5 AN - OPUS4-34280 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Baier, Jennifa A1 - Fischer, Daniel A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Hielscher-Hofinger, Stefan A1 - Stockmann, Jörg Manfred A1 - Weise, Matthias T1 - Mapping und Imaging modifizierter Oberflächen: Generische Kenngrößen, Fehlstellen, Reinigungszustand und Haftfestigkeit N2 - Der Vortrag widmet sich dem Mapping und Imaging modifizierter Oberflächen: generische Kenngrößen, Fehlstellen, Reinigungszustand und Haftfestigkeit. Es werden Untersuchungsmethoden zu ihrer Prüfung dargestellt. T2 - 37. ak-adp 2021 CY - Jena, Germany DA - 16.06.2021 KW - Qualitätssicherung KW - Mapping modifizierter Oberflächen KW - Imaging modifizierter Oberflächen KW - Generische Kenngrößen KW - Haftfestigkeit KW - Klebfestigkeit PY - 2021 SP - 1 EP - 10 AN - OPUS4-52893 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Bonse, Jörn A1 - Hertwig, Andreas A1 - Koter, Robert A1 - Weise, Matthias A1 - Beck, Uwe A1 - Reinstädt, Philipp A1 - Griepentrog, Michael A1 - Krüger, Jörg A1 - Picquart, M. A1 - Haro-Poniatowski, E. T1 - Femtosecond laser pulse irradiation effects on thin hydrogenated amorphous carbon layers N2 - The irradiation of ~0.9-µm-thick hydrogenated amorphous carbon (a-C:H) layers deposited on silicon substrates with single femtosecond (fs) laser pulses (35 fs pulse duration, 790 nm centre wavelength) in air is studied experimentally. Irradiation spots have been generated with different peak fluences and subsequently investigated by optical topometry, micro Raman spectroscopy and microscale mechanical indentation in order to evaluate their microscopic, topographical, structural and mechanical properties (e.g. elastic modulus). By this multi-method approach, a clear separation of different effects (delamination and graphitisation) becomes possible. The joint application of mechanical and spectroscopic techniques provides unique insights into the effects of the fs-laser radiation on the carbon layer. PY - 2013 DO - https://doi.org/10.1007/s00339-012-7170-5 SN - 0947-8396 VL - 112 IS - 1 SP - 9 EP - 14 PB - Springer CY - Berlin AN - OPUS4-28629 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Weise, Matthias A1 - Hertwig, Andreas A1 - Beck, Uwe T1 - Scanning White Light Interference Microscopy - Measurement of Topometry and Layer Thickness N2 - 3D coherence scanning interferometry (CSI) is anoptical, non-contact and rapide measurement technique using a defined bandwidth of white light at normal incidence. White light interference microscopy (WLIM) providest here-dimensional surface topometry data up to a resolution of 0.4 µm lateral and 0.1 nm vertical. Three operating modi, surface, films and advanced films, enable measurements of step heights, roughness, wear volume, cone angle, surface pattern and layer thickness. Traceability to SI system is ensured by certified standards (PTB/NIST) within a DAkkS DIN EN ISO/IEC 17025:2018 accredited lab. T2 - EFDS, V2019, Vakuum und Plasma, WS 4, Beschichtungen für Werkzeuge & Bauteile CY - Dresden, Germany DA - 08.10.2019 KW - DIN EN ISO/IEC 17025:2018 KW - Certified standards KW - White light interference microscopy(WLIM) KW - 3D coherence scanning interferometry (CSI) KW - Topometry PY - 2019 AN - OPUS4-49323 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -