TY - JOUR A1 - Sennikov, P. A1 - Gornushkin, Igor B. A1 - Kornev, R. A1 - Nazarov, V. A1 - Polyakov, V. A1 - Shkrunin, V. T1 - Hydrogen Reduction of MoF6 and Molybdenum Carbide Formation in RF Inductively Coupled Low‑Pressure Discharge: Experiment and Equilibrium Thermodynamics Consideration JF - Plasma Chemistry and Plasma Processing N2 - The physical plasma parameters, temperature and electron number density, are studied in the RF-IC (RF inductively coupled) discharge at a reduced pressure of 3 Torr in mixtures of MoF6 with Ar, H2 and CH4. The emission spectra of mixtures are investigated. It is shown that in the presence of argon, the concentration of free electrons in plasma and dissociation rate of MoF6 increase. A main role of molecular hydrogen is the generation of atomic hydrogen that binds atomic fuorine and leads to the formation of gaseous and solid products. Exhaust gas mixtures exiting the reactor are analyzed by mass spectrometry. It is shown that for all cases, the conversion of MoF6 into reaction products is close to 100%. A thermodynamic analysis of the equilibrium composition of MoF6 systems with Ar, H2 and CH4 was carried out and the obtained results are in good agreement with experimentally observed composition of the solid and gas phases. Analysis of solid deposits from mixture MoF6/H2/Ar revealed the presence of molybdenum powder and large amount of amorphous MoFx. The deposit obtained from mixtures with methane, MoF6/H2/Ar/CH4, contained crystalline molybdenum carbide, Mo3C2. KW - Molybdenum carbide KW - RF ICP discharge KW - Reduction of MoF6 KW - Thermodynamic KW - Molybdenum PY - 2020 DO - https://doi.org/10.1007/s11090-020-10138-3 SN - 0272-4324 VL - 41 IS - 2 SP - 673 EP - 690 PB - Springer AN - OPUS4-51569 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Veico, V. P. A1 - Karlagina, Yu. Yu. A1 - Samokhvalov, A. A. A1 - Polyakov, D. S. A1 - Manokhin, S. S. A1 - Radaev, M. M. A1 - Odintsova, G. V. A1 - Gornushkin, Igor B. T1 - Surface Structuring and Reverse Deposition of Nanoporous Titanium Oxides by Laser Ablation of Titanium in Air JF - Plasma Chemistry and Plasma Processing N2 - The deposition of titanium oxides during titanium laser ablation in air has been experimentally and numerically investigated. A titanium sample was irradiated by nanosecond pulses from an Yb-fber laser with a beam scanned across the sample surface for its texturing. As a result, the hierarchical structure was observed consisting of a microrelief formed by the laser ablation and a nanoporous coating formed by the reverse deposition from the laser induced plasma plume. The chemical and phase composition of the nanoporous coating, as well as the morphology and structure of the surface, were studied using scanning electron microscopy, atomic force microscopy, and X-ray microanalysis. It was found that the deposit consists mostly of porous TiO2 with 26% porosity and inclusions of TiO, Ti2O3, and Ti2O3N. Optical emission spectroscopy was used to control the plasma composition and estimate the effective temperature of plasma plume. The chemical-hydrodynamic model of laser induced plasma was developed to get a deeper insight into the deposition process. The model predicts that condensed titanium oxides, formed in peripheral plasma zones, gradually accumulate on the surface during the plasma plume evolution. A satisfactory agreement between the experimental and calculated chemical composition of the plasma plume as well as between the experimental and calculated composition and thickness of the deposited film was demonstrated. This allows a cautious conclusion that the formation of condensed oxides in the plasma and their consequent deposition onto the ablation surface are among the key mechanisms of formation of porous surface films. KW - Laser ablation KW - Laser induced plasma deposition KW - Surface coating KW - Titanium dioxide KW - Hydrodynamic model KW - Plasma chemistry KW - Emission spectroscopy PY - 2022 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-548555 DO - https://doi.org/10.1007/s11090-022-10256-0 VL - 42 IS - 4 SP - 923 EP - 937 PB - Springer AN - OPUS4-54855 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gornushkin, Igor B. A1 - Sennikov, P. A1 - Kornev, R. A1 - Ermakov, A. A1 - Shkrunin, V. A1 - Polyakov, V. T1 - Laser induced dielectric breakdown for synthesis of chlorofluorosilanes JF - Journal of Fluorine Chemistry N2 - Tetrafluorosilane (SF4) and tetrachlorosilane (SiCl4) plasmas have been widely used as a source of either F or Cl for etching silicon or as a source of silicon for deposition of Si-based materials. Using different combinations of F and Cl in molecules of chlorofluorosilane SiFxCly adds additional flexibility in realization of these processes. Direct synthesis of SiFxCl4-x (x=1, 2, 3) from SiF4 and SiCl4 is thermodynamically forbidden under standard conditions. This restriction is removed in low-temperature plasmas studied in this work: a laser induced dielectric breakdown (LIDB) plasma and steady-state inductively-coupled plasma (ICP). The plasmas differ in many respects including energy content, temperature, and electron density that lead to different ionization/excitation states of plasma species, which are observed from plasma optical emission spectra. IR spectroscopy and mass-spectrometry confirm the formation of three chlorofluorosilanes, SiF3Cl, SiF2Cl2, and SiFCl3 that constitute ~60% in products of LIDB plasma and split 50/50 between SiF3Cl, SiFCl3 and SiF2Cl2. Experimental observations are verified by equilibrium static calculations via the minimization of Gibbs free energy and by dynamic calculations via the chemical-hydrodynamic plasma model of a spherically expanding plasma plume. The both types of calculations qualitatively agree with the results of spectroscopic analysis and reproduce dominant presence of SiF2Cl2 as the temperature of the gas approaches the room temperature. KW - Chemical-hydrodynamic modeling KW - Chlorofluorosilanes KW - Laser induced dielectric breakdown KW - Inductively coupled plasma KW - Equilibrium chemical modeling PY - 2020 DO - https://doi.org/10.1016/j.jfluchem.2020.109692 VL - 241 SP - 109692 PB - Elsevier B.V. AN - OPUS4-51646 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gornushkin, Igor B. A1 - Veiko, V. P. A1 - Karlagina, Y. Y. A1 - Samokhvalov, A. A. A1 - Polyakov, D. S. T1 - Equilibrium model of titanium laser induced plasma in air with reverse deposition of titanium oxides JF - Spectrochimica acta / B N2 - A chemical-hydrodynamic model of laser induced plasma is developed to study a process of deposition of titanium oxides from titanium laser induced plasma to the titanium target surface. The model is relevant to texturing and coating of titanium bone implants that is done by scanning the ablation laser across implant surfaces. Such the procedure improves the biocompatibility and durability of the implants. The model considers plasma chemical reactions, formation of condensed species inside the plasma plume, and deposition and accumulation of these species on the ablation surface. A chemical part of the model is based on minimization of Gibbs free energy of the chemical system; it is used to calculate the chemical composition of the plasma. A hydrodynamic part uses the 2D fluid-dynamic equations that model a 3D axisymmetric plasma plume and assumes the mass and energy exchange between the plasma and the surface. The initial parameters for the model are inferred from experiment. The model shows that condensed titanium oxides, mostly TiO2, form in a peripheral plasma zone and gradually adhere to the surface during the plasma plume evolution. The model predicts the major component and thickness of the deposit and can be applied for the optimization of experiments aimed at surface modification. KW - Fluid dynamic model KW - Plasma chemistry KW - Laser ablation KW - Laser induced plasma deposition KW - Surface coating KW - Titanium dioxide PY - 2022 DO - https://doi.org/10.1016/j.sab.2022.106449 SN - 0038-6987 SN - 0584-8547 VL - 193 SP - 1 EP - 7 PB - Elsevier CY - Amsterdam AN - OPUS4-54866 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gornushkin, Igor B. A1 - Sennikov, P. G. A1 - Kornev, R. A. A1 - Polyakov, V. S. T1 - Equilibrium calculations for plasmas of volatile halides of III, IV and VI group elements mixed with H2 and H2 + CX4 (X = H, Cl, F) relevant to PECVD of isotopic materials JF - Journal of radioanalytical and nuclear chemistry N2 - The composition of hydrogen and hydrogen-methane plasmas containing ~10% of BX₃, SiX₄, GeX₄ (X = F, Cl), SF₆, MoF₆ and WF₆ is calculated for the temperature range ~300-4000 K using the equilibrium chemical model. The calculations provide valuable information about thermodynamic parameters (pressure, temperature) needed for condensation of pure elements (in H₂ plasma) and their carbides (in H₂ + CH₄ plasma) and about intermediate reaction products. Using volatile fluorides for plasma chemical deposition alleviates obtaining monoisotopic elements and their isotopic compounds because fluorine is monoisotopic. PECVD is promising method for one-step conversion of fluorides to elemental isotopes and their carbides. For fluorides, further insight is needed into properties of plasmas supported by different types of discharges. KW - Plasma chemistry KW - Modeling chemical reactions KW - Plasma enhanced chemical vapor deposition KW - Reduction of volatile chlorides and fluorides by hydrogen PY - 2020 DO - https://doi.org/10.1007/s10967-020-07295-2 VL - 326 IS - 1 SP - 407 EP - 421 PB - Springer CY - Dordrecht AN - OPUS4-51144 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -