TY - JOUR A1 - Kautek, Wolfgang A1 - Pentzien, Simone A1 - Conradi, Andrea A1 - Krüger, Jörg A1 - Brzezinka, Klaus-Werner T1 - Pulsed-laser deposition and boron-blending of diamond-like carbon (DLC) thin films KW - Pulslaser KW - Bor KW - Dünnfilmtechnologie KW - Dünnfilm, diamantartig PY - 1996 SN - 0169-4332 SN - 1873-5584 VL - 106 SP - 158 EP - 165 PB - North-Holland CY - Amsterdam AN - OPUS4-630 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Kautek, Wolfgang A1 - Pentzien, Simone A1 - Krüger, Jörg A1 - König, E. ED - Kautek, W. ED - König, E. T1 - Laser cleaning of ancient parchments T2 - LACONA I CY - Heraklion, Crete, Greece DA - 1995-10-04 PY - 1997 SN - 3-901025-68-5 VL - 18 SP - 69 EP - 78 PB - Mayer CY - Klosterneuburg AN - OPUS4-11784 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Kautek, Wolfgang A1 - Pentzien, Simone A1 - Röllig, Mathias A1 - Rudolph, Pascale A1 - Krüger, Jörg A1 - Maywald-Pitellos, C. A1 - Bansa, H. A1 - Grösswang, H. A1 - König, E. T1 - Near-UV laser interaction with contaminants and pigments on parchment: laser cleaning diagnostics by SE-microscopy, VIS-, and IR-spectroscopy PY - 2000 SN - 1296-2074 SN - 1778-3674 VL - 1 IS - sup.1 PB - Elsevier CY - Paris AN - OPUS4-5981 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Daminelli-Widany, Grazia A1 - Pentzien, Simone A1 - Hertwig, Andreas A1 - Krüger, Jörg T1 - Influence of film thickness on laser ablation of hydrogenated amorphous carbon films N2 - Single-pulse damage thresholds of hydrogenated amorphous carbon (a-C:H) films were measured for 8-ns laser pulses at 532-nm wavelength. Layer thicknesses from below the optical penetration depth to above the thermal diffusion length (60 nm–13 µm) were examined. After correction of the damage-threshold values for the fraction of energy effectively absorbed by the material, the damage threshold was found to increase linearly with the layer thickness, also for film thicknesses below the optical penetration depth of a-C:H. The threshold fluence reached the bulk value for a layer thickness equal to the thermal diffusion length. The thermal diffusion coefficient was obtained from fitting the experimental data. Several phenomena like graphitization, blistering, exfoliation, and ablation were observed for different fluence regimes and film thicknesses. PY - 2006 U6 - https://doi.org/10.1007/s00339-005-3460-5 SN - 0340-3793 VL - 83 IS - 1 SP - 89 EP - 94 PB - Springer CY - Berlin AN - OPUS4-12022 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Pentzien, Simone A1 - Rabin, Ira A1 - Hahn, Oliver A1 - Krüger, Jörg A1 - Kleber, F. A1 - Hollaus, F. A1 - Diem, M. A1 - Sablatnig, R. ED - Park, J.-I. ED - Kim, J. T1 - Can Modern Technologies Defeat Nazi Censorship? N2 - Censorship of parts of written text was and is a common practice in totalitarian regimes. It is used to destroy information not approved by the political power. Recovering the censored text is of interest for historical studies of the text. This paper raises the question, whether a censored postcard from 1942 can be made legible by applying multispectral imaging in combination with laser cleaning. In the fields of art conservation (e.g. color measurements), investigation (e.g. Analysis of underdrawings in paintings), and historical document analysis, multispectral imaging techniques have been applied successfully to give visibility to information hidden to the human eye. The basic principle of laser cleaning is to transfer laser pulse energy to a contamination layer by an absorption process that leads to heating and evaporation of the layer. Partial laser cleaning of postcards is possible; dirt on the surface can be removed and the obscured pictures and writings made visible again. We applied both techniques to the postcard. The text could not be restored since the original ink seems to have suffered severe chemical damage. T2 - ACCV 2012 Workshops, 11th Asian conference on computer vision CY - Daejeon, Korea DA - 05.11.2012 KW - Laser cleaning KW - Multispectral imaging KW - Image restoration KW - Image enhancement PY - 2013 SN - 978-3-642-37483-8 SN - 0302-9743 VL - II IS - LNCS 7729 SP - 13 EP - 24 PB - Springer CY - Berlin Heidelberg AN - OPUS4-28160 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Mann, Guido A1 - Pentzien, Simone A1 - Krüger, Jörg T1 - Beam diameter dependence of surface damage threshold of fused silica fibers and preforms for nanosecond laser treatment at 1064 nm wavelength N2 - Optical fibers made of fused silica are a common method of transmitting high laser pulse energies. Failure of those fibers is a significant risk. The determination of laser-induced damage thresholds (LIDT) on fiber end facets according to ISO 21254 standard is needed. In the past, single pulse nanosecond laser experiments showed an improvement of LIDT with increasing fiber core diameter for 1064 nm wavelength and a constant beam diameter of 50 µm. This paper pays particular attention to the influence of the laser beam diameter on damage resistance. All-silica fiber types (LEONI) with different core diameters (100–600 µm) were investigated using beam diameters in a range from 30 µm to 100 µm. For comparison experiments on fused silica preform material (Heraeus F300) were performed. On one hand, surface LIDT of fused silica preform material decreases significantly with increasing beam size. A model considering a random distribution of point defects explains the experimental data qualitatively. On the other hand, LIDT of fiber end facets stays constant. White light microscopy results suggest that the point defect density on fiber end facets is lower compared to the preform surface due to an excellent surface polish quality. KW - Laser-induced damage threshold KW - Nanosecond laser KW - Optical fiber KW - Fused silica KW - Spot size KW - Defect model PY - 2013 U6 - https://doi.org/10.1016/j.apsusc.2013.03.088 SN - 0169-4332 SN - 1873-5584 VL - 276 SP - 312 EP - 316 PB - Elsevier B.V. CY - Amsterdam AN - OPUS4-28310 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Pentzien, Simone A1 - Rabin, Ira A1 - Hahn, Oliver A1 - Krüger, Jörg A1 - Kleber, F. A1 - Hollaus, F. A1 - Diem, M. A1 - Sablatnig, R. T1 - Can modern technologies defeat nazi censorship? KW - Laser cleaning KW - Multispectral imaging KW - Image enhancement KW - Ancient manuscripts KW - Image restoration PY - 2010 SN - 1556-4673 VL - 2 IS - 3, Article 1 SP - 1 EP - 16 PB - Association for Computing Machinery CY - New York, NY, USA AN - OPUS4-25651 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CHAP A1 - Schmidt, Birgit A1 - Koch, W. A1 - Pentzien, Simone A1 - Krüger, Jörg ED - Gabsch, T. T1 - Der Einsatz von Lasertechnik an Modellsystemen zentralasiatischer Wandmalereifragmente KW - Laserreinigung KW - Wandmalerei KW - Verrußung KW - Kunststoffschicht KW - Probekörper PY - 2012 SN - 978-3-7338-0385-8 IS - Kap. 10 SP - 152 EP - 157 PB - Koehler & Amelang GmbH AN - OPUS4-26178 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Kotsifaki, D.G. A1 - Zekou, L. A1 - Pentzien, Simone A1 - Krüger, Jörg A1 - Serafetinides, A.A. ED - Saunders, D. ED - Strlic, M. ED - Korenberg, C. ED - Luxford, N. ED - Birkhölzer, K. T1 - Cleaning of artificially soiled papers by infrared and mid-infrared lasers N2 - One of the most important materials presenting and witnessing human culture is paper. The cleaning of paper is often necessary because contamination must be removed so that the fragile organic substrate can be preserved. The conventional cleaning methods are mechanical or involve the application of chemicals. These methods can damage drawings or print layers to some extent or make the original paper substrate brittle. More specifically, the use of a scalpel blade can cause damage to fibers. Chemical cleaning is difficult to perform locally, can dissolve foreign matter that then migrates into the paper substrate, or involves volatile organic compounds that can be harmful to the conservator. There is, therefore, a need for new conservation technologies aimed at the safe cleaning of paper. Lasers have proved to be an appropriate tool for cleaning as the energy dose and penetration depth at the specific point of contamination can be controlled. Additionally, if used properly, laser cleaning is not destructive to the paper. T2 - LACONA IX - Lasers in the conservation of artworks CY - London, UK DA - 07.09.2011 KW - Laser cleaning KW - Paper KW - Artificial soiling KW - Nanosecond laser KW - Microsecond laser PY - 2013 SN - 978-1-904982-87-6 SP - 219 EP - 221 PB - Archetype publications Ltd. AN - OPUS4-27956 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Eberstein, M. A1 - Geier, M. A1 - Grießmann, H. A1 - Partsch, U. A1 - Voelkel, L. A1 - Böhme, R. A1 - Pentzien, Simone A1 - Koter, Robert A1 - Mann, Guido A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - Towards an industrial laser doping process for the selective emitter using phosphoric acid as dopant N2 - Different laser supported approaches have already been realized, proving the great potential of laserdoped selective emitters (LDSE). However, it is challenging to establish a low-cost process by using pulsed laser tools. So far a single-step process only leads to satisfying results utilizing cw-lasers. In this paper we have examined a two-step process to produce laser-doped selective emitters on multicrystalline textured standard silicon photovoltaic wafers (90-Ω/sq-Emitter, SiN-antireflection coating (ARC)). The precise ARC removal by near-infrared fs-laser pulses (30 fs, 800 nm), and the doping of uncoated silicon wafers by ns-laser pulses (8 ns, 532 nm) were systematically investigated. In the fs-experiment, optimum conditions for ARC removal were identified. In the nsexperiments under suitable conditions (melting regime), the phosphorous concentration underneath the wafer surface was significantly increased and the sheet resistance was reduced by nearly a factor of two. Moreover, electrical measurements on fired metallization fingers deposited on the laser processed wafers showed low contact resistances. Hence, wafer conditioning with combined fs-laser- and ns-laser-processes are expected to be a promising technology for producing selective emitters. T2 - 26th European photovoltaic solar energy conference and exhibition CY - Hamburg, Germany DA - 05.09.2011 KW - Laser processing KW - Doping KW - Selective emitter KW - Multicrystalline silicon PY - 2011 SN - 3-936338-27-2 U6 - https://doi.org/10.4229/26thEUPVSEC2011-2BV.1.2 SP - 1220 EP - 1223 AN - OPUS4-24996 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -