TY - JOUR A1 - Hodoroaba, Vasile-Dan A1 - Unger, Wolfgang A1 - Jenett, H. A1 - Hoffmann, V. A1 - Hagenhoff, B. A1 - Kayser, S. A1 - Wetzig, K. T1 - Depth profiling of electrically non-conductive layered samples by RF-GDOES and HFM plasma SNMS N2 - The work is intended to compare the capabilities of two similar depth profiling techniques to analyse electrically non-conductive samples. In order to get a better evaluation of the depth resolution, various multilayer sandwiches, such as SiO2/TiO2 and Si3N4/SiO2 deposited on glass substrates have been investigated. Optimised depth profiles are presented for both methods, glow discharge optical emission spectrometry (GDOES) and radiofrequency mode (known as “HFM” in the SNMS literature) of plasma secondary neutral mass spectrometry (SNMS). The optimisation procedure, necessary to get the best set of plasma parameters, which result in the optimal depth resolution, is also described for one selected sample. Additionally, sputtering crater profilometry was carried out in order to check out the flatness of the sputtered crater. The influence of the thickness of the sample substrate on the sputtering rate is discussed. Finally, advantages and disadvantages of the use of these two depth profiling methods, especially for the non-conductive samples, are concluded from this comparative study. Time-of-flight secondary ion mass spectrometry (ToF-SIMS) analysis of a cross-sectioned sample was carried out in order to get supplementary information. KW - rf-Glow discharge KW - HFM plasma SNMS KW - Non-conductive layered samples KW - Depth resolution KW - Crater shape KW - ToF-SIMS PY - 2001 DO - https://doi.org/10.1016/S0169-4332(01)00259-8 SN - 0169-4332 SN - 1873-5584 VL - 179 IS - 1-4 SP - 30 EP - 37 PB - North-Holland CY - Amsterdam AN - OPUS4-6882 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Seeger, Stefan A1 - Osan, J. A1 - Czömpöly, O. A1 - Gross, A. A1 - Stosnach, H. A1 - Stabile, L. A1 - Ochsenkuehn-Petropoulou, M. A1 - Tsakanika, L. A1 - Lymperopoulou, T. A1 - Goddard, S. A1 - Fiebig, M. A1 - Gaie-Levrel, F. A1 - Kayser, Y. A1 - Beckhoff, B. T1 - Quantification of Element Mass Concentrations in Ambient Aerosols by Combination of Cascade Impactor Sampling and Mobile Total Reflection X-ray Fluorescence Spectroscopy N2 - Quantitative chemical analysis of airborne particulate matter (PM) is vital for the understanding of health effects in indoor and outdoor environments, as well as for enforcing EU air quality regulations. Typically, airborne particles are sampled over long time periods on filters, followed by lab-based analysis, e.g., with inductively coupled plasma mass spectrometry (ICP-MS). During the EURAMET EMPIR AEROMET project, cascade impactor aerosol sampling is combined for the first time with on-site total reflection X-ray fluorescence (TXRF) spectroscopy to develop a tool for quantifying particle element compositions within short time intervals and even on-site. This makes variations of aerosol chemistry observable with time resolution only a few hours and with good size resolution in the PM10 range. The study investigates the proof of principles of this methodological approach. Acrylic discs and silicon wafers are shown to be suitable impactor carriers with sufficiently smooth and clean surfaces, and a non-destructive elemental mass concentration measurement with a lower limit of detection around 10 pg/m3 could be achieved. We demonstrate the traceability of field TXRF measurements to a radiometrically calibrated TXRF reference, and the results from both analytical methods correspond satisfactorily. KW - TXRF KW - Reference method KW - Cascade impactor KW - Ambient aerosols KW - Particles KW - Air quality monitoring KW - Element mass concentration KW - Size resolved chemical composition KW - Time resolved chemical composition KW - ICP-MS PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-521860 UR - http://www.aerometproject.com/ DO - https://doi.org/10.3390/atmos12030309 SN - 2073-4433 VL - 12 IS - 3 SP - 309 EP - 337 PB - MDPI CY - Basel, Schweiz AN - OPUS4-52186 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -