TY - JOUR A1 - Girard-Lauriault, Pierre-Luc A1 - Illgen, René A1 - Ruiz, J.-C. A1 - Wertheimer, M. R. A1 - Unger, Wolfgang T1 - Surface functionalization of graphite and carbon nanotubes by vacuum-ultraviolet photochemical reactions N2 - Graphite and multiwall carbon nanotube surfaces were functionalized by vacuum-ultraviolet induced photochemistry in NH3 or O2, in order to introduce amino- (NH2) or hydroxyl (OH) functionalities, respectively. Modified surfaces were characterized by X-ray photoelectron spectroscopy (XPS), which showed significant incorporation of nitrogen (N) and oxygen (O) at the materials’ surface. While high-resolution XP spectra did not yield much specific information about the incorporated functional groups, chemical derivatization with 4-trifluoromethyl benzaldehyde and trifluoroacetic anhydride accompanied by XPS enabled quantification of NH2 and OH groups, respectively. Using near edge X-ray absorption fine structure spectroscopy, we assessed the conservation of the aromatic structure following functionalization treatments. KW - Carbon nanotubes KW - Graphite KW - Vacuum ultraviolet photochemistry KW - Surface functionalization KW - Amino groups KW - Hydroxyl KW - Derivatization PY - 2012 DO - https://doi.org/10.1016/j.apsusc.2012.03.012 SN - 0169-4332 SN - 1873-5584 VL - 258 IS - 22 SP - 8448 EP - 8454 PB - North-Holland CY - Amsterdam AN - OPUS4-26233 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Girard-Lauriault, Pierre-Luc A1 - Ruiz, J.-C. A1 - Gross, Thomas A1 - Wertheimer, M. R. A1 - Unger, Wolfgang T1 - Ultra-shallow chemical characterization of organic thin films deposited by plasma and vacuum-ultraviolet, using angle- and excitation energy-resolved XPS N2 - Nitrogen (N)-rich organic thin films were deposited using both low-pressure plasma- and vacuum-ultraviolet-based techniques, from mixtures of ammonia (NH3) and ethylene (C2H4). These films were investigated using angle-resolved and excitation energy resolved X-ray photoelectron spectroscopy (ARXPS and ERXPS, respectively) in order to determine their sub-surface chemical profiles. These two techniques enable one to tune the “XPS 95%” information depth, z 95%, by varying either the angle or the excitation energy. Using a combination of both techniques, z 95% can be varied continuously from 0.7 to 11 nm. The surface-near chemistry is investigated using both high-resolution C 1s spectra and elemental concentrations derived from elemental peak intensities. Results show that while laboratory XPS, and even ARXPS, suggest homogenous surface chemistries, the novel combination of ARXPS and ERXPS points to the existence of a compositional profile in the extreme outer surface layer. Our conclusions are supported by simulations using SESSA software. KW - Plasma polymers KW - Vacuum ultraviolet photopolymers KW - Synchrotron XPS KW - Depth profile PY - 2011 DO - https://doi.org/10.1007/s11090-011-9306-3 SN - 0272-4324 VL - 31 IS - 4 SP - 535 EP - 550 PB - Plenum Publ. Corp. CY - New York, NY, USA AN - OPUS4-23993 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -