TY - JOUR A1 - Wagner, G. A1 - Tiede, U. A1 - Meisel, M. A1 - Schulze, Rolf-Dieter A1 - Mackrodt, Brigitte T1 - Examination of universal microhardness of hard reaction layers resulting from reactions of organic polymers with container glass surfaces and their use for low-friction protective layers KW - Glas KW - Universalmikrohärte KW - Polymer, organisch KW - Gleitschutzschicht PY - 1995 SN - 0946-7475 VL - 68 IS - 10 SP - 318 EP - 326 PB - Verl. d. Dt. Glastechn. Ges. CY - Offenbach AN - OPUS4-592 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter T1 - NEXAFS - spectroscopy on plasma-polymerized films prepared from organic molecules (ethylene, allyl alcohol, styrene) KW - Plasma KW - Beschichtung KW - Organische Filme KW - Röntgenabsorptionsspektroskopie PY - 2004 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2003.pdf#page=297 SN - 0179-4159 SP - 297 EP - 299 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-3478 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface Analysis of Plasma-Deposited Polymer Films, 4 - In situ Characterization of Plasma-Deposited Ethylene Films by XPS and NEXAFS N2 - XPS and NEXAFS spectroscopy were used for the chemical characterization of pulsed plasma-deposited ethylene films before and after exposure to ambient air. The influence of external plasma parameters on the spectroscopic results was investigated. Information on the chemical character of the plasma-polymerized films, such as the regularity of the primary structure, the amount of long-living radicals, and branching or cross-linking or both was derived from this data. Irregularity and radical concentration for post-plasma reactions of the plasma-deposited films increased with the duty cycle or power. A decreased level of monomer fragmentation and, consequently, an increase in regularity is partially concluded from the experimental data when the monomer pressure is increased. The concentration of surface radicals available for post-plasma reactions also increased with monomer pressure. The correlation found between the degree of the post-plasma oxygen incorporation and the variation of the various external parameters agreed with earlier ToF-SSIMS findings. KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization KW - Polyethylene (PE) KW - Thin films PY - 2005 U6 - https://doi.org/10.1002/ppap.200400070 SN - 1612-8850 SN - 1612-8869 VL - 2 IS - 4 SP - 310 EP - 318 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11940 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface Analysis of Plasma-Deposited Polymer Films, 2: Analysis of Post-Plasma Air Reacted Plasma Polymerized Styrene by X-Ray Photoelectron Spectroscopy and X-Ray Absorption Spectroscopy N2 - Chemical properties of plasma-polymerized styrene films can be effectively controlled by the appropriate choice of external plasma parameters, such as duty cycle, power and monomer pressure. Chemical properties here are the regularity of the primary structure, the amount of long living radicals and branching or cross-linking or both in plasma polymerized styrene films, which can be indirectly monitored by X-ray photoelectron spectroscopy (XPS) and near edge X-ray absorption fine structure (NEXAFS) spectroscopy. Principally, XPS and NEXAFS spectra of plasma-polymerized styrene show all the spectroscopic fingerprints characteristic of atactic polystyrene indicating an inherent similarity of the respective primary chemical structures. There is an increase in irregularity and radical concentration for the plasma deposited films with increasing duty cycle or power. With an increase in monomer pressure, a decreased level of monomer fragmentation and, consequently, an increase in regularity must be concluded from the experimental data. The applied power regulates the fragmentation of the monomers as monitored by spectroscopic signals correlated to the aromatic rings. A trend in the extent of the post-plasma oxygen incorporation according to the variation of the various external plasma parameters was deduced, which agrees with earlier ToF-SIMS findings KW - Chemical characterization KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization KW - Polystyrene PY - 2004 U6 - https://doi.org/10.1002/ppap.200400022 SN - 1612-8850 SN - 1612-8869 VL - 1 SP - 134 EP - 140 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-6935 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Sickfeld, Jürgen A1 - Schulze, Rolf-Dieter A1 - Raabe, Hans-Joachim T1 - Messung von Spannungen in Tankinnenbeschichtungen - Quellverhalten mit organischen Medien KW - Beschichtung, organisch KW - Tank KW - Spannung KW - Epocidharz KW - Quellverhalten PY - 1996 SN - 0014-7699 VL - 102 IS - 2 SP - 49 EP - 55 PB - Vincentz CY - Hannover AN - OPUS4-661 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Schulze, Rolf-Dieter A1 - Mix, Renate A1 - Kühn, Gerhard A1 - Friedrich, Jörg Florian ED - d'Agostino, R. T1 - Pulsed plasma initiated homo and copolymerisation - deposition rates and plasma diagnostics in dependence on the pulse length and frequency T2 - 16th International Symposium on Plasma Chemistry (ISPC-16) CY - Taormina, Italy DA - 2003-06-22 PY - 2003 IS - CD-ROM PB - Dep. of Chemistry, Univ. CY - Bari AN - OPUS4-2708 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian T1 - Pulsed r.f. plasma for polymer film deposition with SEERS diagnostic T2 - 8th International Conference on Plasma Surface Engineering (PSE2002) CY - Garmisch-Partenkirchen, Germany DA - 2002-09-09 KW - C pulsed KW - C radio frequency KW - C plasma KW - D nitrogen KW - D oxygen KW - DX plasma deposition PY - 2002 SN - 0257-8972 SP - 405 PB - Elsevier Science CY - Lausanne AN - OPUS4-1615 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Schulze, Rolf-Dieter A1 - Mix, Renate A1 - Friedrich, Jörg F. T1 - Aerosol-Barriere-Entladung und Elektrospray zur ultradünnen Polymerabscheidung T2 - Thüringer Grenz- und Oberflächentage CY - Gera, Germany DA - 2010-09-07 PY - 2010 AN - OPUS4-21929 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Mix, Renate A1 - Schulze, Rolf-Dieter A1 - Rau, A. A1 - Friedrich, Jörg Florian ED - G. Blasek, T1 - Aerosol-Barriereentladung und Elektrospray zur Polymerschichtabscheidung T2 - 17. Neues Dresdner Vakuumtechnisches Kolloquium - Beschichtung, Modifizierung und Charakterisierung von Polymeroberflächen CY - Dresden, Deutschland DA - 2009-10-21 KW - Corona KW - Barriereentladung KW - Haftvermittler KW - Schälfestigkeit PY - 2009 SN - 978-3-9812550-1-0 SP - 76 EP - 80 AN - OPUS4-20252 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Mix, Renate A1 - Joshi, Ranjit A1 - Schulze, Rolf-Dieter A1 - Meyer-Plath, Asmus A1 - Friedrich, Jörg Florian ED - Tachibana, K. ED - Takai, O. T1 - Aerosol and underwater plasma for polymer surface functionalization T2 - Proceedings of the 18th International Symposium on Plasma Chemistry (ISPC-18) CY - Kyoto, Japan DA - 2007-08-26 PY - 2007 SN - 978-4-9903773-4-2 SP - 27P/80, 1 EP - 4 PB - International Union of Pure and Applied Chemistry CY - Kyoto AN - OPUS4-20667 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -