TY - JOUR A1 - Procop, Mathias T1 - Abschätzung der Dicke absorbierender Schichten eines EDX-Detektorsystems mit Hilfe von Bremsstrahlungsspektren T2 - 29. Kolloquium des Arbeitskreises für Elektronenmikroskopische Direktabbildung und Analyse von Oberflächen (EDO) CY - Münster, Deutschland DA - 1996-10-08 KW - Oberflächenanalyse KW - Schichtdickenmessung KW - EDX-Detektor KW - Bremsstrahlungspektrum KW - X-ray spectrometry KW - X-ray detector KW - Si(Li) detector PY - 1996 SN - 0340-3815 VL - 29 SP - 47 EP - 50 PB - Ehrenwerth CY - Münster, Westf. AN - OPUS4-641 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Höpner, A. A1 - Seitz, H. A1 - Rechenberg, I. A1 - Bugge, C. A1 - Procop, Mathias A1 - Scheerschmidt, E. A1 - Queisser, A. T1 - TEM Characterization of the Interface Quality of MOVPE Grown Strained InGaAs/GaAs Heterostructures KW - TEM KW - Laser PY - 1995 SN - 1862-6300 SN - 0031-8965 VL - 150 IS - 427 SP - 427 EP - 437 PB - Wiley-VCH CY - Berlin AN - OPUS4-598 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Procop, Mathias ED - Hunger, H.-J. T1 - AUGER-Elektronenspektroskopie PY - 1995 SN - 3-342-00430-4 SP - 382 EP - 408 PB - Dt. Verl. für Grundstoffindustrie CY - Leipzig AN - OPUS4-605 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias T1 - A Simple Procedure to Check the Spectral Response of an EDX Detector KW - Röntgenspektrokopie KW - Spekralanalyse KW - Detektor PY - 1996 SN - 0076-8642 VL - 13 SP - 473 EP - 477 PB - Springer CY - Wien AN - OPUS4-617 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Scholze, F. T1 - Synchrotron Radiation for the Characterization of Energy Dispersive X-ray Spectrometers KW - Röntgenspektroskopie KW - Detektoren KW - Elektronenstrahl-Mikroanalyse KW - ESMA KW - EPMA KW - Röntgenfluoreszenzanalyse KW - RFA KW - XRF PY - 2004 DO - https://doi.org/10.1017/S1431927604880152 SN - 1431-9276 SN - 1435-8115 VL - 10 IS - 2 SP - 98 EP - 99 PB - Cambridge University Press CY - New York, NY AN - OPUS4-3720 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias T1 - Instrumental Specification for Semiconductor X-ray Detectors and their check in an Analytical Laboratory PY - 1999 VL - 20 IS - 1 SP - 96 EP - 103 PB - Società Italiana di Microscopia Elettronica CY - Modena AN - OPUS4-835 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias T1 - Estimation of Absorbing Layer Thickness for an Si(Li) Detector PY - 1999 SN - 0049-8246 IS - 28 SP - 33 EP - 40 PB - Wiley CY - Chichester AN - OPUS4-824 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Hasche, K. A1 - Ulm, G. A1 - Herrmann, K. A1 - Krumrey, M. A1 - Ade, G. A1 - Sümpel, J. A1 - Busch, I. A1 - Thomsen-Schmidt, P. A1 - Schädlich, S. A1 - Schindler, A. A1 - Frank, W. A1 - Procop, Mathias A1 - Beck, Uwe T1 - About the calibration of thickness standards on the nanometer scale T2 - 3rd International EUSPEN conference ; 3rd International conference. European Society for Precision Engineering and Nanotechnology ; 4th General meeting. European Society for Precision Engineering and Nanotechnology CY - Eindhoven, The Netherlands DA - 2002-05-26 PY - 2002 SN - 90-386-2883-8 SP - 1 EP - 5 CY - Eindhoven AN - OPUS4-2283 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hasche, K. A1 - Herrmann, K. A1 - Thomsen-Schmidt, P. A1 - Krumrey, M. A1 - Ulm, G. A1 - Ade, G. A1 - Pohlenz, F. A1 - Stümpel, J. A1 - Busch, I. A1 - Schädlich, S. A1 - Frank, W. A1 - Hirsch, D. A1 - Schindler, A. A1 - Procop, Mathias A1 - Beck, Uwe T1 - Ein Beitrag zu kalibrierten Nanometerschichten für unterschiedliche Anwendungsbereiche N2 - Nanotechnologien werden gegenwärtig als leistungsfähige Oberflächentechniken in erheblichem Umfange industriell genutzt. Dabei spielen dünne Schichten und deren Kenndaten eine wesentliche Rolle, z.B. als Röntgenspiegel oder optische und magnetooptische Datenträger. Die Schichtdicke zählt hierbei zu den technologisch wichtigen Parametern. Abgeleitet von Anwenderinteressen, werden für die Röntgenreflektometrie (XRR bzw. GIXR), Elektronenstrahl-Mikroanalyse (EPMA) und Röntgenfluoreszenzanalyse (XRF) einerseits und die Ellipsometrie andererseits zugeschnittene Schichtdickenmaßverkörperungen (SDM) entwickelt, gefertigt und untersucht. Das Ziel ist die Bereitstellung praxistauglicher, kalibrierter SDM, im weiteren Schichtdickennormale (SDN) genannt. SDN sind Maßverkörperungen, für die der Schichtdickenwert mit einer definierten Messunsicherheit bekannt und auf ein metrologisch anerkanntes Längennormal zurückgeführt ist. Berichtet wird über die Herstellung und messtechnische Charakterisierung der beiden spezifischen Varianten von Maßverkörperungen. T2 - 47. Internationales Wissenschaftliches Kolloquium. Technische Universität Ilmenau ; Herbstkonferenz der Gesellschaft für Arbeitswissenschaft ; 6. Workshop Multimedia für Bildung und Wirtschaft CY - Ilmenau, Deutschland DA - 2002-09-23 PY - 2002 UR - http://publica.fraunhofer.de/documents/N-14872.html VL - 47 SP - 568 EP - 569 PB - Techn. Univ. CY - Ilmenau AN - OPUS4-2284 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Koenders, L. A1 - Hasche, K. A1 - Ulm, G. A1 - Krumrey, M. A1 - Ade, G. A1 - Stümpel, J. A1 - Busch, I. A1 - Thomsen-Schmidt, P. A1 - Schädlich, S. A1 - Schindler, A. A1 - Frank, W. A1 - Beck, Uwe A1 - Procop, Mathias T1 - Über die metrologische Charakterisierung von Schichtdicken Standards im Nanometerbereich T2 - 12th Applied Surface Analysis Workshop ; AOFA 12 CY - --- DA - 2002-09-15 PY - 2002 AN - OPUS4-2285 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias A1 - Beck, Uwe A1 - Hasche, K. A1 - Ulm, G. A1 - Herrmann, K. A1 - Krumrey, M. A1 - Ade, G. A1 - Sümpel, J. A1 - Busch, I. A1 - Thomsen-Schmidt, P. A1 - Schädlich, S. A1 - Schindler, A. A1 - Frank, W. T1 - About the calibration of thickness standards on the nanometer scale T2 - EUSPEN 2002 CY - Eindhoven, Netherlands DA - 2002-05-26 PY - 2002 AN - OPUS4-3259 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias T1 - Abschätzung der Dicke absorbierender Schichten eines EDX-Detektorsystems mit Hilfe von Bremsstrahlungsspektren T2 - 29. Kolloquium des Arbeitskreises für Elektronenmikroskopische Direktabbildung und Analyse von Oberflächen (EDO) CY - Münster, Germany DA - 1996-10-08 PY - 1996 AN - OPUS4-3260 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Scholze, F. T1 - Measurement of detection efficiency and response functions for an Si(Li) x-ray spectrometer in the range 0.1-5 keV N2 - Efficiency and response functions were determined for a modern commercial energy-dispersive x-ray spectrometer in the photon energy range 0.1-5 keV using dispersed and undispersed synchrotron radiation. The spectrometer was equipped with an Si(Li) detector crystal, a thin-film window and a digital pulse processor. Monochromatized synchrotron radiation from the PTB VUV radiometry beamline at the electron storage ring BESSY was used for the absolute determination of the detection efficiency with a typical relative uncertainty of 1-2% in the photon energy range 0.1-1.5 keV by direct comparison with calibrated photodiodes. At higher photon energies, the efficiency was found by comparison of the measured and calculated undispersed synchrotron radiation spectrum. The absolute intensity of the synchrotron radiation was known with a relative uncertainty of less than 1%. In the overlapping region, the results from the two independent experiments are in full agreement. The energy dependence of the measured efficiency can be explained only with a detector model assuming that there is no dead layer. A simple model for the effect of incomplete charge collection (ICC) was applied to describe the measured response functions. Consequences of the ICC such as broadening and shift of low-energy peaks and redistribution of counts around 1.84 keV are explained with the model, in accordance with the experimental results. PY - 2001 DO - https://doi.org/10.1002/xrs.472 SN - 0049-8246 VL - 30 IS - 2 SP - 69 EP - 76 PB - Wiley CY - Chichester AN - OPUS4-1120 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Thomsen-Schmidt, P. A1 - Hasche, K. A1 - Ulm, G. A1 - Herrmann, K. A1 - Krumrey, M. A1 - Ade, G. A1 - Stümpel, J. A1 - Procop, Mathias A1 - Beck, Uwe T1 - Realisation and metrological characterisation of thickness standards below 100 nm T2 - DVG Jahrestagung 2002 CY - Magdeburg, Germany DA - 2002-06-17 PY - 2002 SP - 1 EP - 9 PB - Deutsche Vakuum-Gesellschaft CY - Kaiserslautern AN - OPUS4-1936 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias A1 - Beck, Uwe A1 - Hasche, K. A1 - Herrmann, K. A1 - Thomsen-Schmidt, P. A1 - Krumrey, M. A1 - Ulm, G. A1 - Pohlenz, F. A1 - Stümpel, J. A1 - Busch, I. A1 - Schädlich, S. A1 - Frank, W. A1 - Hirsch, D. A1 - Schindler, A. T1 - Ein Beitrag zu kalibrierten Nanometerschichten für unterschiedliche Anwendungsbereiche T2 - Maschinenbau und Nanotechnik: 47. Internationales Wissenschaftliches Kolloquium der TU Ilmenau CY - Ilmenau, Germany DA - 2002-09-23 PY - 2002 AN - OPUS4-3620 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Scholze, F. A1 - Procop, Mathias T1 - High-accuracy calibration of energy-dispersive detectors using undispersed and monochromatized radiation PY - 2004 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2003.pdf#page=14 SN - 0179-4159 SP - 14 EP - 16 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-4188 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias A1 - Beck, Uwe A1 - Hirsch, D. A1 - Frank, W. A1 - Schindler, A. A1 - Schädlich, S. A1 - Busch, I. A1 - Thomsen-Schmidt, P. A1 - Stümpel, J. A1 - Ade, G. A1 - Krumrey, M. A1 - Koenders, L. A1 - Ulm, G. A1 - Hasche, K. T1 - Film thickness standards for X-ray techniques and ellipsometry T2 - Workshop Metrology CY - Plzen, Czech Republic DA - 2002-10-20 PY - 2002 AN - OPUS4-4322 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias A1 - Hodoroaba, Vasile-Dan A1 - Bjeoumikhov, A. A1 - Arkadiev, V. T1 - Calculation of X-Ray spectra emitted from a microfocus X-Ray tube with X-Ray optics T2 - European Conference on X-Ray Spectrometry (EXRS 2006) CY - Paris, France DA - 2006-06-19 PY - 2006 AN - OPUS4-12470 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias T1 - EDXTOOLS - ein Programmpaket in MATLAB zur Berechnung von Röntgenspektren und Spektrometereigenschaften T2 - Forschungsseminar "Ausgewählte analytische Methoden der Physik" am Institut für Atomphysik der Technischen Universität Berlin CY - Berlin, Germany DA - 2006-05-30 PY - 2006 AN - OPUS4-12413 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias T1 - Wie genau ist standardlose Elektronenstrahl-Mikroanalyse? T2 - Kolloquium "Ausgewählte analytische Methoden der Physik" - TU-Berlin, Institut für Atomare Physik und Fachdidaktik CY - Berlin, Germany DA - 2002-10-29 PY - 2002 AN - OPUS4-6248 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias T1 - EDX-Spektrometerüberprüfung an der BAM gemäß ISO 17025 T2 - ThermoNORAN Nutzertreffen CY - Marburg, Germany DA - 2002-11-05 PY - 2002 AN - OPUS4-6249 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias T1 - Energiedispersive Röntgenspektrometrie und Qualitätssicherung T2 - BAM-Kolloquium "Rasterelektronenmikrosakopie unter variablem Kammerinnendruck" CY - Berlin, Germany DA - 2002-05-28 PY - 2002 AN - OPUS4-6213 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias T1 - How accurate your standardless EDS analysis really is? T2 - SCANDEM 2002 CY - Tampere, Finland DA - 2002-06-14 PY - 2002 AN - OPUS4-6214 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias A1 - Hodoroaba, Vasile-Dan T1 - Erste Ergebnisse mit m-XRF-Röhre am REM T2 - Klausurberatung des IFV UVR CY - Berlin, Germany DA - 2003-02-07 PY - 2003 AN - OPUS4-4368 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias T1 - Eine Mikrofokus-Röntgenquelle als Zusatz zum Raserelektronenmikroskop für die Röntgenflüoreszenzanalyse T2 - Fachtagung "PRORA 2003" CY - Berlin, Germany DA - 2003-04-03 PY - 2003 AN - OPUS4-4369 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias T1 - Fehlermöglichkeiten bei der ESMA am REM/EDX T2 - Kundenschulung der Fa. Röntec CY - Strausberg, Germany DA - 2003-06-04 PY - 2003 AN - OPUS4-4370 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Scholze, F. A1 - Procop, Mathias T1 - Detection efficiency of energy-dispersive detectors with low-energy windows N2 - Energy dispersive X-ray spectrometry offers the opportunity for fast composition determination of specimens by X-ray fluorescence or electron probe microanalysis. For fundamental parameter based quantification, the knowledge of the detection efficiency of the spectrometer is essential. At low energies the efficiency is strongly influenced by X-ray absorption in the radiation entrance window. State-of-the-art windows consist of polymer foil containing C, N, and O, coated with Al and in some cases with a special B compound. The foil is supported by a Si grid to withstand the atmosphere pressure. The absorption of all these components must be known to describe the detection efficiency. The transmittance of three types of widely used commercial windows has been measured. Transmittance curves have been fitted by analytical expressions using tabulated mass absorption coefficients. Because tabulated mass absorption coefficients do not consider near edge effects, there are strong deviations between measured and calculated transmittance below 0.6 keV. It is proposed to model the spectrometer efficiency by the measured window transmittance and calculated absorptions from front contact and possible contaminations. This reduces the number of unknown parameters drastically. PY - 2005 DO - https://doi.org/10.1002/xrs.859 SN - 0049-8246 VL - 34 IS - 6 SP - 473 EP - 476 PB - Wiley CY - Chichester AN - OPUS4-11936 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias A1 - Scholze, F. T1 - Synchrotron Radiation for the Characterization of Energy Dispersive X-ray Spectrometers T2 - Microscopy and Microanalysis CY - Savannah, GA, USA DA - 2004-08-02 PY - 2004 AN - OPUS4-4612 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias A1 - Scholze, F. T1 - Detection efficiency of energy dispersive detectors: high accuracy measurement and modelling T2 - European Conference on X-Ray Spectrometry CY - Alghero, Italy DA - 2004-06-06 PY - 2004 AN - OPUS4-4603 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias A1 - Bjeomikov, A. A1 - Langhoff, N. A1 - Arkadiev, V. A1 - Wedell, R. A1 - Eggert, F. A1 - Hodoroaba, Vasile-Dan T1 - A new microfocus X-ray source iMOXS for high sensitive XRF analysis in scanning electron microscopes T2 - European Conference on X-Ray Spectrometry CY - Alghero, Italy DA - 2004-06-06 PY - 2004 AN - OPUS4-4604 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias T1 - Stand und Perspektiven der Materialanalyse mittels Röntgenspektroskopie am Rasterelektronenmikroskop T2 - Kolloquium des Zentrums für Mikro- und Nanotechnologie (ZMN) CY - Ilmenau, Germany DA - 2004-03-31 PY - 2004 AN - OPUS4-4610 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Procop, Mathias T1 - Röntgenspektroskopie am Rasterelektronenmikroskop PY - 2001 SP - 1 EP - 26 AN - OPUS4-6834 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias T1 - EDXTOOLS - Computer Programmes for the Determination of Critical EDX Spectrometer Parameters N2 - Quality assurance according to ISO or EN norms entails a periodical check of critical instrumental parameters. Not yet all commercial software purchased with instruments supports the related measurements and their fast evaluation. EDXTOOLS consist of a programme library which complements the existing software for electron excited energy dispersive X-ray spectrometry (EDS) in this respect. EDXTOOLS can be used to check the detection efficiency by the evaluation of the L/K intensity ratio in a copper or nickel spectrum or by the calculation of the thickness of absorbing detector layers from experiments, which can be performed on any scanning electron microscope. Moreover, measured spectra can be modified by the transmission curve of absorbing media to estimate their influence on the result of quantitative analysis. EDXTOOLS allow the determination of the signal to background ratio from an Fe-55 spectrum and the fitting of measured FWHM's of K-lines to find the resolution curve DE = Ö{DE 2el + DE 2det}. They are completed by the possibility of calculating EDX spectra for the K-lines of light elements and to compare the resulting spectra for different formulae, physical data tables, and detector parameters chosen for the calculation. EDXTOOLS are written in MATLAB®, a wide spread interpreter language. This has the advantage that the programmes are readable text files. A user can check each computational step and modify it. The installation of MATLAB® and its optimization toolbox is necessary to work with EDXTOOLS. KW - X-ray spectrometry KW - EDS KW - Quantitative analysis KW - Computer programmes PY - 2000 DO - https://doi.org/10.1007/s006040050104 SN - 0026-3672 SN - 1436-5073 VL - 132 IS - 2-4 SP - 527 EP - 530 PB - Springer CY - Wien AN - OPUS4-6837 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias T1 - Measurement of X-Ray Emission Efficiencies for K-Lines KW - X-ray spectrometry KW - X-ray emission KW - X-ray yield KW - Electron probe microanalysis KW - EMPA KW - Standardless analysis PY - 2004 DO - https://doi.org/10.1017/S1431927604040139 SN - 1431-9276 SN - 1435-8115 VL - 10 IS - 4 SP - 481 EP - 490 PB - Cambridge University Press CY - New York, NY AN - OPUS4-6838 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias A1 - Unger, Wolfgang T1 - Standard-free quantification in EPMA T2 - CCQM Surface Analysis Working Group Meeting 2006 CY - Sèvres, France DA - 2006-04-05 PY - 2006 AN - OPUS4-12306 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Bjeoumikhov, A. A1 - Arkadiev, V. A1 - Eggert, F. A1 - Hodoroaba, Vasile-Dan A1 - Langhoff, N. A1 - Procop, Mathias A1 - Rabe, J. A1 - Wedell, R. T1 - A new microfocus x-ray source, iMOXS, for highly sensitive XRF analysis in scanning electron microscopes N2 - Scanning electron microscopes are usually equipped with energy-dispersive X-ray detectors for electron probe microanalysis. This widespread analytical method allows investigators to determine the elemental composition of specimens with a spatial resolution of about 1 µm. However, owing to the electron-specimen interaction, the emitted spectra reveal, in addition to characteristic lines, also a high level of continuous bremsstrahlung background. As a result, elements with low concentrations cannot be identified. The minimum detection limit can be diminished by two orders of magnitude if the characteristic lines are excited as fluorescence by an additional x-ray source. In this case, the emergence of bremsstrahlung is considerably reduced. Combining a high-brilliance microfocus x-ray tube with efficient polycapillary optics enables one to realize an experimental arrangement for performing local fluorescence analysis at the same point where the electron beam hits the sample. The polycapillary optics under consideration focuses the emitted x-radiation onto focal spots between 30 and 100 µm in diameter. Count rates of several thousands cps have been achieved. Elemental maps have been obtained by means of the motorized specimen stage of the microscope. Copyright © 2005 John Wiley & Sons, Ltd. KW - Micro-XRF KW - Microfocus x-ray source KW - EPMA KW - SEM PY - 2005 DO - https://doi.org/10.1002/xrs.872 SN - 0049-8246 VL - 34 IS - 6 SP - 493 EP - 497 PB - Wiley CY - Chichester AN - OPUS4-11228 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Wandel, K. A1 - Procop, Mathias A1 - Richter, U. A1 - Wolf, R. T1 - The influence of the storage time and the deposition of SiO2 on the properties of H2SO4 etched (In,Ga) As surface layers investigated by XPS and ellipsometry PY - 1993 SN - 0268-1242 SN - 1361-6641 VL - 8 SP - 1438 EP - 1444 PB - IOP Publ. CY - Bristol AN - OPUS4-7087 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Gruska, B. A1 - Wandel, K. A1 - Procop, Mathias ED - Lengeler, B. T1 - The InGaAs/SiO2 interface investigated by angle resolved XPS and ellipsometry T2 - 4th International Conference on the Formation of Semiconductor Interfaces (ICFSI) CY - Jülich, Germany DA - 1993-06-14 PY - 1993 SN - 981-021559-2 VL - 4 SP - 373 EP - 376 PB - World Scientific CY - Singapore AN - OPUS4-7088 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Röder, A. T1 - An interlaboratory comparison of energy dispersive X-ray microanalysis (EDX) of titanium and zirkonium nitrides N2 - The results of an interlaboratory comparison of energy dispersive X-ray microanalysis of TiN0.84 and ZrN were presented. The microprobe group of the German Physical Society (DPG) and the Federal Institute for Materials Research and Testing (BAM) had initiated the interlaboratory comparison. The primary aim was to test modern EDX systems equipped with ultrathin windows concerning the accuracy and reliability of the analysis of compounds containing light elements. The participants from 23 laboratories performed the analysis at different primary energies, in the standard-less mode as well as on the base of own standards, and considering Ti-K or Ti-L in case of TiN0.84. The results show a slight overestimation of the nitrogen content and a large standard deviation from the mean value. Reasons for the scattering of the results are discussed. T2 - 8th Symposium on Solid State Analysis DA - 1995-07-03 KW - Titanium nitride KW - Zirconium nitride KW - EDX KW - X-rays KW - Microanalysis PY - 1997 DO - https://doi.org/10.1007/BF01246159 SN - 0026-3672 SN - 1436-5073 VL - 125 IS - 1-4 SP - 33 EP - 39 PB - Springer CY - Wien AN - OPUS4-7089 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Radtke, Martin A1 - Krumrey, M. A1 - Hasche, K. A1 - Schädlich, S. A1 - Frank, W. T1 - Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range N2 - The thickness of thin films of platinum and nickel on fused silica and silicon substrates has been determined by EPMA using the commercial software STRATAGEM for calculation of film thickness. Film thickness ranged in the order 10 nm. An attempt was made to estimate the confidence range of the method by comparison with results from other methods of analysis. The data show that in addition to the uncertainty of the spectral intensity measurement and the complicated fitting routine, systematic deviation caused by the underlying model should be added. The scattering in the results from other methods does not enable specification of a range of uncertainty, but deviations from the real thickness are estimated to be less than 20%. KW - Electron probe microanalysis KW - EPMA KW - Thin films KW - Thickness measurement KW - X-rays PY - 2002 DO - https://doi.org/10.1007/s00216-002-1514-5 SN - 1618-2642 SN - 1618-2650 VL - 374 SP - 631 EP - 634 PB - Springer CY - Berlin AN - OPUS4-7090 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Hübner, Wolfgang A1 - Wäsche, Rolf A1 - Nieland, S. A1 - Ehrmann, O. T1 - Fast Elemental Mapping in Materials Science KW - Electron probe microanalysis KW - EPMA KW - Energy dispersive X-ray spectroscopy KW - EDS KW - Elemental mapping PY - 2002 UR - http://www.microscopy-analysis.com/sites/default/files/magazine_pdfs/mag%20179_2002_Jan_Procop_1.pdf SN - 0958-1952 IS - January SP - 5 EP - 6 PB - Rolston Gordon Comm. CY - Bookham, Surrey AN - OPUS4-7091 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias T1 - XPS data for sputter-cleaned In0.53Ga0.47As, GaAs, and InAs surfaces PY - 1992 UR - http://www.sciencedirect.com/science?_ob=PublicationURL&_tockey=%23TOC%235251%231992%23999409998%23276008%23FLP%23&_cdi=5251&_pubType=J&_auth=y&_acct=C000049503&_version=1&_urlVersion=0&_userid=963821&md5=dc56897f6b3c86cf4d7ea713dee69341 SN - 0368-2048 SN - 1873-2526 VL - 59 SP - R1 EP - R10 PB - Elsevier CY - Amsterdam AN - OPUS4-7092 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias T1 - Über Probleme bei der EDX-Analyse im Energiebereich unterhalb 1 keV T2 - 27. Kolloquium des Arbeitskreises für Elektronenmikroskopische Direktabbildung und Analyse von Oberflächen (EDO) CY - Saarbrücken, Deutschland DA - 1994-10-04 KW - X-ray spectrometry KW - EDX KW - X-ray analysis KW - Quantitative analysis PY - 1994 SN - 0340-3815 VL - 27 SP - 1 EP - 5 PB - Ehrenwerth CY - Münster, Westf. AN - OPUS4-7093 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias T1 - Energy dispersive X-ray microanalysis at low energies KW - Microanalysis KW - X-ray spectrometry KW - Energy dispersive spectrometry KW - EDS KW - X-ray detectors PY - 1998 SN - 0958-1952 IS - March SP - 9 EP - 10 PB - Rolston Gordon Comm. CY - Bookham, Surrey AN - OPUS4-7094 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Wandel, K. A1 - Verucchi, R. T1 - Ex-situ XPS-investigation of the interface between PE-CVD SiO2 and wet chemically etched MO-CVD epitaxial layers of In0.53Ga0.47As PY - 1995 SN - 0937-0633 VL - 353 SP - 647 EP - 654 PB - Springer CY - Berlin AN - OPUS4-7095 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Wandel, K. T1 - Photoelectron spectroscopic and ellipsometric investigation of In0.53Ga0.47As surfaces after wet chemical etching PY - 1993 SN - 0937-0633 VL - 364 SP - 23 EP - 28 PB - Springer CY - Berlin AN - OPUS4-7096 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Klein, A. A1 - Rechenberg, I. A1 - Krüger, D. T1 - AES Depth profiling of semiconducting multilayer structures using an ion beam bevelling technique PY - 1997 SN - 0937-0633 VL - 358 SP - 358 EP - 360 PB - Springer CY - Berlin AN - OPUS4-7097 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Klein, A. A1 - Rechenberg, I. A1 - Krüger, D. T1 - AES Depth Profiling of Semiconducting Epitaxial Layers with Thicknesses in the Nanometre Range Using an Ion Beam Bevelling Technique KW - AES KW - Depth profiling KW - Ion beam bevelling PY - 1997 SN - 0142-2421 SN - 1096-9918 VL - 25 SP - 458 EP - 463 PB - Wiley CY - Chichester AN - OPUS4-7098 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias T1 - EDXTOOLS with new features T2 - EMAS (European Microbeam Analysis Society) 2003 / 8th European Workshop on Modern Developments and Applications in Microbeam Analysis CY - Chiclana de la Frontera, Spain DA - 2003-05-18 PY - 2003 AN - OPUS4-5027 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, Mathias T1 - Measurement of X-ray emission rates for K-lines T2 - EMAS (European Microbeam Analysis Society) 2003 / 8th European Workshop on Modern Developments and Applications in Microbeam Analysis CY - Chiclana de la Frontera, Spain DA - 2003-05-18 PY - 2003 AN - OPUS4-5028 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -