TY - JOUR A1 - Unger, Wolfgang A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas T1 - Radio frequency (r.f.) plasma-deposited polymer films: influence of external plasma parameters as viewed by comprehensive in-situ surface chemical analysis by XAS, XPS and ToF-SIMS N2 - The formation of plasma-deposited materials made from organic molecules is a technologically attractive way to obtain films with unique properties, e.g. adhesion, wettability, conductivity or selected chemical functionalization. A detailed chemical characterization of these films is a great challenge for the analyst because of the co-existence of a large number of chemical species in plasma-deposited films. We investigated these types of organic films using photoelectron spectroscopy for chemical analysis (ESCA, XPS), near edge X-ray absorption fine structure (NEXAFS) spectroscopy at synchrotron radiation source BESSY II and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). A dedicated plasma preparation chamber was designed and added to the main analysis chamber of the respective spectrometers. This approach offers the possibility of studying plasma-deposited films without exposure to air before analysis (often called in-situ analysis) and the influence of post-plasma reactions, i.e. the ageing process. The present investigations are aimed at finding correlations between basic chemical properties of the deposited films and the plasma deposition parameters, e.g. duty cycle in pulsed plasmas and the power of discharge. KW - Plasma deposition KW - NEXAFS KW - XPS KW - ToF-SIMS KW - Plasma parameter PY - 2006 DO - https://doi.org/10.1002/sia.2158 SN - 0142-2421 SN - 1096-9918 VL - 38 IS - 4 SP - 522 EP - 525 PB - Wiley CY - Chichester AN - OPUS4-12271 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Surface analysis of Plasma Deposited Polymer Films, 7: "In situ" Characterization of Plasma Deposited Allylamine Films by ToF-SSIMS, XPS and NEXAFS Spectroscopy N2 - Plasma deposited allylamine films were studied by in situ ToF-SSIMS, XPS and NEXAFS Spectroscopy before exposure to ambient air. The influence of external plasma parameters such as duty cycle, plasma power, and monomer flow rate on (i) unsaturation, (ii) branching and cross-linking, (iii) nitrogen surface concentration and (iv) retention of amino groups was investigated. Harder plasma conditions, which can be obtained when high duty cycles, high plasma power, and low monomer flow rates are employed, increase the unsaturated, branched and cross-linked character of the plasma deposited films, while the surface concentration of N as well as the retention of the monomer's amino group decrease. As proven by NEXAFS findings and cross-checked by ToF-SSIMS results, the allylamine monomer's primary amino groups are partially transformed into other nitrogen functionalities during its plasma polymerization. Amongst them imines and nitriles are the conversion products with the highest probabilities of formation. Another conversion channel is the formation of nitrogen species not participating in the film growth. This is the reason for an increased N loss in plasma deposited allylamine films as observed independently by XPS and ToF-SSIMS when the plasma parameters are changed from mild to hard. KW - Allylamine KW - NEXAFS KW - Plasma polymerization KW - ToF-SSIMS KW - XPS PY - 2006 DO - https://doi.org/10.1002/ppap.200500168 SN - 1612-8850 SN - 1612-8869 VL - 3 IS - 3 SP - 288 EP - 298 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-12272 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Oran, Umut T1 - Measurement of the hydrophilic character of microscopic areas at microfluide components T2 - 2. Statuskolloquium des DFG SPP 1159 "Neue Strategien der Mess- und Prüftechnik für die Produktion von Mikrosystemen und Nanostrukturen" CY - Jena, Germany DA - 2006-05-29 PY - 2006 AN - OPUS4-12431 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - NEXAFS - spectroscopy on freshly prepared and aged plasma-polymerised films PY - 2006 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2005.pdf#page=322 SN - 0179-4159 SP - 320 EP - 322 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-12804 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Static ToF-SIMS analysis of plasma chemically deposited ethylene/allyl alcohol co-polymer films N2 - A plasma co-polymerization of ethylene as a “chain extending” monomer and allyl alcohol as a carrier monomer for hydroxyl groups was studied. The composition of the feed gas was systematically varied and the plasma co-polymers were analyzed in terms of their relative concentrations of OH functional groups by static Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS) immediately after their preparation without any air contact, i.e., under so called “in situ” conditions. The relative OH group concentration involved in the –CH2–OH groups was derived from the normalized yields of the CH3O+ secondary fragment ion. The density of functional groups in the plasma co-polymers was found to vary non-linearly with respect to the mole percentage of the monomers in the feed gas. Co-polymerization phenomena, i.e. chemical interactions and recombination reactions taking place between monomer molecules in the plasma and/or during the deposition process, become evident in ToF-SIMS spectra. KW - Plasma deposition KW - ToF-SIMS KW - Plasma co-polymerization KW - Ethylene KW - Allyl alcohol PY - 2006 DO - https://doi.org/10.1016/j.apsusc.2006.02.089 SN - 0169-4332 SN - 1873-5584 VL - 252 IS - 19 SP - 6588 EP - 6590 PB - North-Holland CY - Amsterdam AN - OPUS4-13724 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang A1 - Oran, Umut A1 - Senoner, Mathias A1 - Schmidt, M. T1 - Chemische Charakterisierung von mikro- und nanotechnologischen Bauteilen: Verfahrensentwicklung und Referenzmaterialien T2 - VDI/VDE-Tagung "Messtechnik für Mikro- und Nano-Engineering" CY - Erlangen, Germany DA - 2006-11-29 KW - Referenzmaterial KW - Mikrofluidik KW - Nanoanalytik PY - 2006 N1 - Serientitel: VDI-Berichte – Series title: VDI-Berichte IS - 1950 SP - 197 EP - 206 PB - VDI-Verl. CY - Düsseldorf AN - OPUS4-14110 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -