TY - JOUR A1 - Dietrich, Paul M. A1 - Lange, Nele A1 - Lippitz, Andreas A1 - Holzweber, Markus A1 - Kulak, N. A1 - Unger, Wolfgang T1 - Click chemistry on silicon nitride for biosensor fabrication N2 - Biosensors are of essential importance in medical and biological diagnostics. Often, they are produced using silane chemistry on glass or silicon oxide surfaces. However, controlling that silane chemistry is challenging. Here, we present an alternative strategy to form functional organic layers and biosensors on silicon Nitride (Si3N4). H-terminated Si3N4 films are used to generate reactive azide groups by various azidation methods. Biomolecular probes can then be immobilized using click chemistry reactions with the azide groups and due to its high sensitivity in XPS a fluorine-substituted test alkyne was utilized to optimize click chemistry conditions. After that a biotinylated alkyne was clicked to Si3N4 surfaces followed by immobilization of streptavidin as analyte in a model assay. The functionalized surfaces were thoroughly characterized by surface chemical analysis using X-ray photoelectron spectroscopy (XPS) and near edge X-ray absorption fine structure (NEXAFS)spectroscopy. KW - Biosensors KW - H-terminated Si3N4 films KW - Click chemistry KW - X-ray photoelectron spectroscopy KW - Near edge X-ray absorption fine structure KW - Streptavidin binding PY - 2019 U6 - https://doi.org/10.1016/j.apsusc.2019.03.002 SN - 0169-4332 VL - 481 SP - 10 EP - 15 PB - Elsevier B.V. AN - OPUS4-48634 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Dietrich, P. A1 - Thissen, A. A1 - Kulak, N. A1 - Kjaervik, Marit A1 - Unger, Wolfgang T1 - XPS surface chemical analysis of aqueous solutions with EnviroESCA N2 - Water and aqueous reagents are essential in any biological process or system. But apart from a few special low vapor-pressure cases, liquids have not been accessible to any technique requiring UHV conditions. EnviroESCA opens up this exciting field of applications. In this paper first results from water based samples are presented as a proof of concept to demonstrate the special capabilities of EnviroESCA analyzing liquid samples. The following solutions were investigated under near ambient pressure conditions: i.) water, ii.) brine, iii.) an oil in water dispersion, iv.) aqueous iron(II) sulfate heptahydrate, and v.) a suspension of nano silver particles in water. KW - Surface Analysis KW - Near Ambient Pressure XPS KW - Aqueous Solutions PY - 2017 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:b43-394603 UR - http://www.enviro.specs.de/cms/upload/bilder/EnviroESCA/Applications/Liquids/Application-Note_EnviroESCA_Aqueous_Solutions.pdf N1 - BAM Mitarbeiter Beitrag im Acknowledgement definiert. IS - #000394 SP - 1 PB - SPECS CY - Berlin AN - OPUS4-39460 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Lange, Nele A1 - Dietrich, Paul M. A1 - Lippitz, Andreas A1 - Kulak, N. A1 - Unger, Wolfgang T1 - New azidation methods for the functionalization of silicon nitride and application in copper-catalyzed azide-alkyne cycloaddition (CuAAC) N2 - In this study, a new direct functionalization method of silicon nitride (Si3N4) using azidation and click chemistry is presented. First, amino groups (NHx) were created on a Si3N4 substrate by fluoride etching. These NHx-terminated Si3N4 surfaces were analyzed by chemical derivatization X-ray photoelectron spectroscopy (CD-XPS) with 4-trifluoromethylbenzaldehyde (TFBA) and a derivatization yield of 20% was concluded. In the second step freshly prepared NHx surfaces were transformed into azides which were used immediately in a click reaction with halogenated alkynes. The presented combination of amination, azidation and click reaction is a promising alternative for common silane-based Si3N4 functionalization methods. T2 - 16th European Conference on Applications of Surface and Interface Analysis CY - Granada, Spain DA - 28.09.2015 KW - XPS KW - Azidation KW - Click chemistry KW - Silicon nitride KW - Chemical derivatization PY - 2016 UR - http://onlinelibrary.wiley.com/doi/10.1002/sia.5950/full U6 - https://doi.org/10.1002/sia.5950 VL - 48 SP - 621 EP - 625 PB - John Wiley & Sons, Ltd AN - OPUS4-36841 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dietrich, Paul A1 - Glamsch, Stephan A1 - Ehlert, Christopher A1 - Lippitz, Andreas A1 - Kulak, N. A1 - Unger, Wolfgang T1 - Synchrotron-radiation XPS analysis of ultra-thin silane films: Specifying the organic silicon N2 - The analysis of chemical and elemental in-depth variations in ultra-thin organic layers with thicknesses below 5 nm is very challenging. Energy- and angle-resolved XPS (ER/AR-XPS) opens up the possibility for non-destructive chemical ultra-shallow depth profiling of the outermost surface layer of ultra-thin organic films due to its exceptional surface sensitivity. For common organic materials a reliable chemical in-depth analysis with a lower limit of the XPS information depth z95 of about 1 nm can be performed. As a proof-of-principle example with relevance for industrial applications the ER/AR-XPS analysis of different organic monolayers made of amino- or benzamidosilane molecules on silicon oxide surfaces is presented. It is demonstrated how to use the Si 2p core-level region to non-destructively depth-profile the organic (silane monolayer) – inorganic (SiO2/Si) interface and how to quantify Si species, ranging from elemental silicon over native silicon oxide to the silane itself. The main advantage of the applied ER/AR-XPS method is the improved specification of organic from inorganic silicon components in Si 2p core-level spectra with exceptional low uncertainties compared to conventional laboratory XPS. KW - Synchrotron radiation XPS KW - Depth profiling KW - Silanes KW - Monolayer KW - Amines KW - Amides PY - 2016 U6 - https://doi.org/10.1016/j.apsusc.2015.12.052 SN - 0169-4332 SN - 1873-5584 VL - 363 SP - 406 EP - 411 PB - Elsevier B.V. CY - Amsterdam AN - OPUS4-35262 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dietrich, Paul A1 - Streeck, C. A1 - Glamsch, Stephan A1 - Ehlert, Christopher A1 - Lippitz, Andreas A1 - Nutsch, A. A1 - Kulak, N. A1 - Beckhoff, B. A1 - Unger, Wolfgang T1 - Quantification of silane molecules on oxidized silicon: Are there options for a traceable and absolute determination? N2 - Organosilanes are used routinely to functionalize various support materials for further modifications. Nevertheless, reliable quantitative information about surface functional group densities after layer formation is rarely available. Here, we present the analysis of thin organic nanolayers made from nitrogen containing silane molecules on naturally oxidized silicon wafers with reference-free total reflection X-ray fluorescence (TXRF) and X-ray photoelectron spectroscopy (XPS). An areic density of 2−4 silane molecules per nm2 was calculated from the layer’s nitrogen mass deposition per area unit obtained by reference-free TXRF. Complementary energy and angle-resolved XPS (ER/ARXPS) in the Si 2p core-level region was used to analyze the outermost surface region of the organic (silane layer)−inorganic (silicon wafer) interface. Different coexisting silicon species as silicon, native silicon oxide, and silane were identified and quantified. As a result of the presented proof-of-concept, absolute and traceable values for the areic density of silanes containing nitrogen as intrinsic marker are obtained by calibration of the XPS methods with reference-free TXRF. Furthermore, ER/AR-XPS is shown to facilitate the determination of areic densities in (mono)layers made from silanes having no heteroatomic marker other than silicon. After calibration with reference-free TXRF, these areic densities of silane molecules can be determined when using the XPS component intensity of the silane’s silicon atom. PY - 2015 U6 - https://doi.org/10.1021/acs.analchem.5b02846 SN - 0003-2700 SN - 1520-6882 VL - 87 IS - 19 SP - 10117 EP - 10124 PB - American Chemical Society CY - Washington, DC AN - OPUS4-34796 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -