TY - JOUR A1 - Senoner, Mathias A1 - Maaßdorf, A. A1 - Rooch, Heidemarie A1 - Österle, Werner A1 - Malcher, M. A1 - Schmidt, M. A1 - Kollmer, F. A1 - Paul, D. A1 - Hodoroaba, Vasile-Dan A1 - Rades, Steffi A1 - Unger, Wolfgang T1 - Lateral resolution of nanoscaled images delivered by surface-analytical instruments: application of the BAM-L200 certified reference material and related ISO standards N2 - The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1–xAs and InxGa1–xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface-analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. KW - AES KW - BAM-L200 KW - CRM KW - EDX KW - Imaging KW - Lateral resolution KW - Sharpness KW - Standardisation KW - STXM KW - ToF-SIMS KW - XPEEM KW - XPS KW - Certified reference material KW - Imaging surface analysis PY - 2015 U6 - https://doi.org/10.1007/s00216-014-8135-7 SN - 1618-2642 SN - 1618-2650 VL - 407 IS - 11 SP - 3211 EP - 3217 PB - Springer CY - Berlin AN - OPUS4-33033 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Stockmann, Jörg M. A1 - Senoner, Mathias A1 - Weimann, T. A1 - Bütefisch, S. A1 - Passiu, C. A1 - Spencer, N. D. A1 - Rossi, A. T1 - Introduction to lateral resolution and analysis area measurements in XPS N2 - Imaging and small-spot (small area) XPS have become increasingly important components of surface chemical analysis during the last three decades, and its use is growing. Some ambiguity in the use of terminology, understanding of concepts, and lack of appropriate reference materials leads to confusing and not always reproducible data. In this paper, it is shown that by using existing knowledge, appropriate test specimens, and standardized approaches, problems of comparability and such reproducibility issues recently observed for XPS data reported in the scientific literature can be overcome. The standardized methods of ISO 18516:2019, (i) the straight-edge, (ii) the narrow-line, and (iii) the grating method, can be used to characterize and compare the lateral resolution achieved by imaging XPS instruments and are described by reporting examples. The respective measurements are made using new test specimens. When running an XPS instrument in the small-spot (small area) mode for a quantitative analysis of a feature of interest, the question arises as to what contribution to the intensity originates from outside the analysis area. A valid measurement approach to control the intensity from outside the nominal analysis area is also described. As always, the relevant resolution depends on the specific question that needs to be addressed. The strengths and limitations of methods defining resolution are indicated. KW - Imaging XPS KW - Lateral resolution KW - Analysis area measurements KW - Small-spot XPS PY - 2020 U6 - https://doi.org/10.1116/6.0000398 VL - 38 IS - 5 SP - 053206 AN - OPUS4-51394 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Bütefisch, S. A1 - Busch, I. T1 - Lateral resolution delivered by imaging surface-analytical instruments as SIMS, AES and XPS: Application of the BAM-L200 Certified Reference Material and related ISO Standards N2 - The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1 xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. KW - Standardization KW - AES KW - XPS KW - SIMS KW - Lateral resolution KW - Certified reference material PY - 2017 SN - 1341-1756 VL - 24 IS - 2 SP - 123 EP - 128 AN - OPUS4-43138 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -