TY - GEN A1 - Berger, Achim A1 - Ecker, Klaus A1 - Görner, Wolf A1 - Merchel, Silke A1 - Procop, Mathias A1 - Radtke, Martin A1 - Riesemeier, Heinrich T1 - X-ray fluorescence analysis at the BAMline PY - 2002 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2001.pdf#page=253 SN - 0179-4159 SP - 253 EP - 254 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-1322 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Berger, Achim A1 - Görner, Wolf A1 - Merchel, Silke A1 - Radtke, Martin A1 - Riesemeier, Heinrich A1 - Reiche, I. A1 - Riederer, J. T1 - A closer look at Albrecht Dürer's drawings (1471-1528) PY - 2002 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/infos/bessy/highlights2001.pdf#page=32 SN - 0179-4159 SP - 32 EP - 33 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-1323 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Berger, Achim A1 - Görner, Wolf A1 - Merchel, Silke A1 - Radtke, Martin A1 - Riesemeier, Heinrich A1 - Reiche, I. A1 - Riederer, J. T1 - Non-destructive investigations of Dürer's silver point drawings by Sy-XRF PY - 2002 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2001.pdf#page=292 SN - 0179-4159 SP - 292 EP - 293 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-1324 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Radtke, Martin A1 - Berger, Achim A1 - Görner, Wolf A1 - Merchel, Silke A1 - Riesemeier, Heinrich A1 - Riederer, J. A1 - Reiche, I. T1 - Spatial resolved trace analysis of Dürer's silver point drawings by means of SR-XRF T2 - EDXRS 2002 - European Conference on Energy Dispersive X-Ray Spectrometry CY - Berlin, Germany DA - 2002-06-16 PY - 2002 AN - OPUS4-2993 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Radtke, Martin T1 - Instrumentation for the BESSY micriprobe T2 - Workshop on "An Application of Microfocus X-Ray Sourses in Material- Enviromental-, Life-Science and Archeometry" CY - Berlin, Germany DA - 2002-09-03 PY - 2002 AN - OPUS4-2991 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Radtke, Martin A1 - Berger, Achim A1 - Ecker, Klaus A1 - Merchel, Silke A1 - Procop, Mathias A1 - Riesemeier, Heinrich A1 - Görner, Wolf A1 - Reiche, I. T1 - Synchrotron induced X-ray fluorescence for trace element analysis T2 - Hamburg Workshop CY - Hamburg, Germany DA - 2002-09-16 PY - 2002 SN - 3-924330-53-0 SP - 1(?) PB - Gesellschaft Deutscher Chemiker AN - OPUS4-1525 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Radtke, Martin A1 - Berger, Achim A1 - Görner, Wolf A1 - Merchel, Silke A1 - Reiche, I. A1 - Riederer, J. A1 - Riesemeier, H. T1 - Spatial Resolved Trace Analysis of Dürer's Silver Point Drawings by Means of SR-XRF T2 - European Conference on Energy Dispersive X-Ray Spectrometry (EDXRS) CY - Berlin, Germany DA - 2002-06-16 PY - 2002 SP - 158 AN - OPUS4-1397 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Merchel, Silke A1 - Berger, Achim A1 - Görner, Wolf A1 - Radtke, Martin A1 - Riesemeier, Heinrich A1 - Reiche, I. A1 - Riederer, J. A1 - Duval, A. A1 - Guicharnaud, H. T1 - Non-Destructive Investigations of Dürer's Silver Point Drawings by Pixe and SY-XRF T2 - 7th International Conference on Non-destructive testing and Microanalysis for the Diagnostics and Conservation of the Cultural and Environmental Heritage ; art 2002 CY - Antwerp, Belgium DA - 2002-06-02 PY - 2002 UR - http://srs.dl.ac.uk/arch/publications/reiche/reiche_fullcorr.pdf SP - 82 AN - OPUS4-1400 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Ecker, Klaus A1 - Wätjen, U. A1 - Berger, Achim A1 - Persson, L. A1 - Pritzkow, Wolfgang A1 - Radtke, Martin A1 - Riesemeier, Heinrich T1 - RBS, SY-XRF, INAA and ICP-IDMS of antimony implanted in silicon - A multi-method approach to characterize and certify a reference material N2 - A layer of Sb atoms, implanted with an energy of 400 keV and a nominal dose of 5×1016 atoms/cm2 into a high purity silicon wafer, was certified for its areal density (atoms/cm2) using Rutherford backscattering spectrometry (RBS), instrumental neutron activation analysis (INAA) and inductively coupled plasma isotope dilution mass spectrometry (ICP-IDMS) and for its isotope ratio using INAA and ICP-IDMS. Excellent agreement between the results of the different independent methods was found. In the present work, the measurements of the homogeneity of the areal density of Sb, previously determined with RBS in spots having 1 mm diameter, are improved with synchrotron X-ray fluorescence analysis: Higher precision in even smaller sample spots allows to estimate a reduced inhomogeneity of the whole batch of samples of the order of only 0.4%. Thus the uncertainty of the certified value can further be reduced. Down to fractions of a chip with 0.3×0.4 mm2 area, the areal density is now certified as (4.81±0.06)×1016 Sb atoms/cm2, where the expanded uncertainty 0.06 (coverage factor k=2) corresponds to only 1.2%. The relative merits of the different analytical methods are discussed. KW - Certified reference material KW - RBS KW - INAA KW - ICP-IDMS KW - XRF KW - SY-XRF PY - 2002 U6 - https://doi.org/10.1016/S0168-583X(01)01038-2 SN - 0168-583X SN - 1872-9584 VL - 188 IS - 1-4 SP - 120 EP - 125 PB - Elsevier CY - Amsterdam AN - OPUS4-13870 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Radtke, Martin A1 - Krumrey, M. A1 - Hasche, K. A1 - Schädlich, S. A1 - Frank, W. T1 - Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range N2 - The thickness of thin films of platinum and nickel on fused silica and silicon substrates has been determined by EPMA using the commercial software STRATAGEM for calculation of film thickness. Film thickness ranged in the order 10 nm. An attempt was made to estimate the confidence range of the method by comparison with results from other methods of analysis. The data show that in addition to the uncertainty of the spectral intensity measurement and the complicated fitting routine, systematic deviation caused by the underlying model should be added. The scattering in the results from other methods does not enable specification of a range of uncertainty, but deviations from the real thickness are estimated to be less than 20%. KW - Electron probe microanalysis KW - EPMA KW - Thin films KW - Thickness measurement KW - X-rays PY - 2002 U6 - https://doi.org/10.1007/s00216-002-1514-5 SN - 1618-2642 SN - 1618-2650 VL - 374 SP - 631 EP - 634 PB - Springer CY - Berlin AN - OPUS4-7090 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -