TY - JOUR A1 - Alvisi, M. A1 - Blome, M. A1 - Griepentrog, Michael A1 - Hodoroaba, Vasile-Dan A1 - Karduck, P. A1 - Mostert, M. A1 - Nacucchi, M. A1 - Procop, Mathias A1 - Rohde, M. A1 - Scholze, F. A1 - Statham, P. A1 - Terborg, R. A1 - Thiot, J.-F. T1 - The Determination of the Efficiency of Energy Dispersive X-Ray Spectrometers by a New Reference Material N2 - A calibration procedure for the detection efficiency of energy dispersive X-ray spectrometers (EDS) used in combination with scanning electron microscopy (SEM) for standardless electron probe microanalysis (EPMA) is presented. The procedure is based on the comparison of X-ray spectra from a reference material (RM) measured with the EDS to be calibrated and a reference EDS. The RM is certified by the line intensities in the X-ray spectrum recorded with a reference EDS and by its composition. The calibration of the reference EDS is performed using synchrotron radiation at the radiometry laboratory of the Physikalisch-Technische Bundesanstalt. Measurement of RM spectra and comparison of the specified line intensities enables a rapid efficiency calibration on most SEMs. The article reports on studies to prepare such a RM and on EDS calibration and proposes a methodology that could be implemented in current spectrometer software to enable the calibration with a minimum of operator assistance. KW - Energy dispersive X-ray spectrometry KW - Standardless analysis KW - X-ray detectors KW - Detection efficiency KW - Spectrometer calibration PY - 2006 U6 - https://doi.org/10.1017/S1431927606060557 SN - 1431-9276 SN - 1435-8115 VL - 12 IS - 5 SP - 406 EP - 415 PB - Cambridge University Press CY - New York, NY AN - OPUS4-13135 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Göbel, E. O. A1 - Hasche, K. A1 - Ulm, G. A1 - Krumrey, M. A1 - Ade, G. A1 - Stümpel, J. A1 - Herrmann, K. A1 - Koenders, L. A1 - Thomsen-Schmidt, P. A1 - Pohlenz, F. A1 - Xu, M. A1 - Dai, G. A1 - Hoffmann, K.-P. A1 - Busch, I. A1 - Frank, W. A1 - Procop, M. A1 - Beck, Uwe T1 - Kalibrierte Schichtdicken-Maßverkörperungen für Nanometerschichten, Teilvorhaben - Kalibrierung von Schichtdicken-Maßverkörperungen im Nanometerbereich - Abschlussbericht des BMBF Verbundvorhabens 13N7704 - 13N77041 KW - Schichtdicke KW - Nanometerbereich PY - 2003 UR - http://edok01.tib.uni-hannover.de/edoks/e01fb02/373214030.pdf SP - 1 EP - 131 PB - Physikalisch-Technische Bundesanstalt CY - Dresden AN - OPUS4-25428 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Hasche, K. A1 - Ulm, G. A1 - Herrmann, K. A1 - Krumrey, M. A1 - Ade, G. A1 - Sümpel, J. A1 - Busch, I. A1 - Thomsen-Schmidt, P. A1 - Schädlich, S. A1 - Schindler, A. A1 - Frank, W. A1 - Procop, Mathias A1 - Beck, Uwe T1 - About the calibration of thickness standards on the nanometer scale T2 - 3rd International EUSPEN conference ; 3rd International conference. European Society for Precision Engineering and Nanotechnology ; 4th General meeting. European Society for Precision Engineering and Nanotechnology CY - Eindhoven, The Netherlands DA - 2002-05-26 PY - 2002 SN - 90-386-2883-8 SP - 1 EP - 5 CY - Eindhoven AN - OPUS4-2283 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hasche, K. A1 - Herrmann, K. A1 - Thomsen-Schmidt, P. A1 - Krumrey, M. A1 - Ulm, G. A1 - Ade, G. A1 - Pohlenz, F. A1 - Stümpel, J. A1 - Busch, I. A1 - Schädlich, S. A1 - Frank, W. A1 - Hirsch, D. A1 - Schindler, A. A1 - Procop, Mathias A1 - Beck, Uwe T1 - Ein Beitrag zu kalibrierten Nanometerschichten für unterschiedliche Anwendungsbereiche N2 - Nanotechnologien werden gegenwärtig als leistungsfähige Oberflächentechniken in erheblichem Umfange industriell genutzt. Dabei spielen dünne Schichten und deren Kenndaten eine wesentliche Rolle, z.B. als Röntgenspiegel oder optische und magnetooptische Datenträger. Die Schichtdicke zählt hierbei zu den technologisch wichtigen Parametern. Abgeleitet von Anwenderinteressen, werden für die Röntgenreflektometrie (XRR bzw. GIXR), Elektronenstrahl-Mikroanalyse (EPMA) und Röntgenfluoreszenzanalyse (XRF) einerseits und die Ellipsometrie andererseits zugeschnittene Schichtdickenmaßverkörperungen (SDM) entwickelt, gefertigt und untersucht. Das Ziel ist die Bereitstellung praxistauglicher, kalibrierter SDM, im weiteren Schichtdickennormale (SDN) genannt. SDN sind Maßverkörperungen, für die der Schichtdickenwert mit einer definierten Messunsicherheit bekannt und auf ein metrologisch anerkanntes Längennormal zurückgeführt ist. Berichtet wird über die Herstellung und messtechnische Charakterisierung der beiden spezifischen Varianten von Maßverkörperungen. T2 - 47. Internationales Wissenschaftliches Kolloquium. Technische Universität Ilmenau ; Herbstkonferenz der Gesellschaft für Arbeitswissenschaft ; 6. Workshop Multimedia für Bildung und Wirtschaft CY - Ilmenau, Deutschland DA - 2002-09-23 PY - 2002 UR - http://publica.fraunhofer.de/documents/N-14872.html VL - 47 SP - 568 EP - 569 PB - Techn. Univ. CY - Ilmenau AN - OPUS4-2284 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Koenders, L. A1 - Hasche, K. A1 - Ulm, G. A1 - Krumrey, M. A1 - Ade, G. A1 - Stümpel, J. A1 - Busch, I. A1 - Thomsen-Schmidt, P. A1 - Schädlich, S. A1 - Schindler, A. A1 - Frank, W. A1 - Beck, Uwe A1 - Procop, Mathias T1 - Über die metrologische Charakterisierung von Schichtdicken Standards im Nanometerbereich T2 - 12th Applied Surface Analysis Workshop ; AOFA 12 CY - --- DA - 2002-09-15 PY - 2002 AN - OPUS4-2285 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Thomsen-Schmidt, P. A1 - Hasche, K. A1 - Ulm, G. A1 - Herrmann, K. A1 - Krumrey, M. A1 - Ade, G. A1 - Stümpel, J. A1 - Procop, Mathias A1 - Beck, Uwe T1 - Realisation and metrological characterisation of thickness standards below 100 nm T2 - DVG Jahrestagung 2002 CY - Magdeburg, Germany DA - 2002-06-17 PY - 2002 SP - 1 EP - 9 PB - Deutsche Vakuum-Gesellschaft CY - Kaiserslautern AN - OPUS4-1936 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias A1 - Radtke, Martin A1 - Krumrey, M. A1 - Hasche, K. A1 - Schädlich, S. A1 - Frank, W. T1 - Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range N2 - The thickness of thin films of platinum and nickel on fused silica and silicon substrates has been determined by EPMA using the commercial software STRATAGEM for calculation of film thickness. Film thickness ranged in the order 10 nm. An attempt was made to estimate the confidence range of the method by comparison with results from other methods of analysis. The data show that in addition to the uncertainty of the spectral intensity measurement and the complicated fitting routine, systematic deviation caused by the underlying model should be added. The scattering in the results from other methods does not enable specification of a range of uncertainty, but deviations from the real thickness are estimated to be less than 20%. KW - Electron probe microanalysis KW - EPMA KW - Thin films KW - Thickness measurement KW - X-rays PY - 2002 U6 - https://doi.org/10.1007/s00216-002-1514-5 SN - 1618-2642 SN - 1618-2650 VL - 374 SP - 631 EP - 634 PB - Springer CY - Berlin AN - OPUS4-7090 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Thomsen-Schmidt, P. A1 - Hasche, K. A1 - Ulm, G. A1 - Herrmann, K. A1 - Krumrey, M. A1 - Ade, G. A1 - Stümpel, J. A1 - Busch, I. A1 - Schädlich, S. A1 - Schindler, A. A1 - Frank, W. A1 - Hirsch, D. A1 - Procop, Mathias A1 - Beck, Uwe T1 - Realisation and metrological characterisation of thickness standards below 100 nm N2 - High-accuracy film thickness measurements in the range below 100 nm can be made by various complex methods like spectral ellipsometry (SE), scanning force microscopy (SFM), grazing incidence X-ray reflectometry (GIXR), or X-ray fluorescence analysis (XRF). The measurement results achieved with these methods are based on different interactions between the film and the probe. A key question in nanotechnology is how to achieve consistent results on a level of uncertainty below one nanometre with different techniques. Two different types of thickness standards are realised. Metal film standards for X-ray techniques in the thickness range 10 to 50 nm are calibrated by GIXR with monochromatised synchrotron radiation of 8048 eV. The results obtained at four different facilities show excellent agreement. SiO2 on Si standards for SE and SFM in the thickness range 6 to 1000 nm are calibrated by GIXR with monochromatised synchrotron radiation of 1841 eV and with a metrological SFM. Consistent results within the combined uncertainties are obtained with the two methods. Surfaces and interfaces of both types of standards are additionally investigated by transmission electron microscopy (TEM). PY - 2004 U6 - https://doi.org/10.1007/s00339-003-2273-7 SN - 0947-8396 VL - 78 IS - 5 SP - 645 EP - 649 PB - Springer CY - Berlin AN - OPUS4-17195 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, M. A1 - Kemf, N. A1 - Hahn, M. A1 - Hodoroaba, Vasile-Dan T1 - Investigation of the enrichment of Co and Cr in periprostethic tissue by scanning electron microscopy and spatial resolved x-ray fluorescence spectroscopy after total hip resurfacing arthroplasty T2 - EMAS 2011, 12th European Workshop on Modern Developments and Applications in Microbeam Analysis CY - Angers, France DA - 2011-05-15 PY - 2011 AN - OPUS4-23551 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, M. A1 - Kemf, N. A1 - Hahn, M. A1 - Hodoroaba, Vasile-Dan T1 - Investigation of the enrichment of Co and Cr in periprostethic tissue by scanning electron microscopy and spatial resolved x-ray fluorescence spectroscopy after total hip resurfacing arthroplasty T2 - EMAS 2011, 12th European Workshop on Modern Developments and Applications in Microbeam Analysis CY - Angers, France DA - 2011-05-15 PY - 2011 AN - OPUS4-23552 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Rackwitz, Vanessa A1 - Procop, M. A1 - Bjeoumikhova, S. A1 - Panne, Ulrich A1 - Hodoroaba, Vasile-Dan T1 - A routine procedure for the characterisation of polycapillary X-ray semi-lenses in prallelising mode with SEM/EDS N2 - The accurate knowledge of the properties of polycapillary X-ray semi-lenses has a significant influence on the quantitative results in a widespread field of applications involving microfocus X-ray beams. A routine procedure for the characterisation of a polycapillary X-ray semi-lens with a scanning electron microscope (SEM) having attached an energy dispersive spectrometer (EDS) is presented in this paper. A key issue of the procedure consists of fitting the semi-lens in front of the EDS for spectra acquisition. Relevant semi-lens parameters such as focal distance, full width at half maximum (FWHM) of the acceptance area, and transmission are determined in parallelising mode of the semi-lens. Special attention has been paid to the calculation of the transmission. KW - Polycapillary X-ray optics KW - Semi-lens KW - Parallelising mode KW - SEM KW - EDS KW - Acceptance area KW - FWHM KW - Transmission KW - Focal distance KW - XRF PY - 2011 U6 - https://doi.org/10.1039/c0ja00135j SN - 0267-9477 SN - 1364-5544 VL - 26 IS - 3 SP - 499 EP - 504 PB - Royal Society of Chemistry CY - London AN - OPUS4-23555 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, M. A1 - Hodoroaba, Vasile-Dan A1 - Kemf, N. A1 - Hahn, M. T1 - Investigation of the enrichment of Co and Cr in periprosthetic tissue by scanning electron microscopy and spatial resolved X-ray fluorescence spectroscopy after total hip resurfacing arthroplasty T2 - SCANDEM 2011 - Annual Meeting of Scandinavian Microscopy Society CY - Oulu, Finland DA - 2011-06-08 PY - 2011 AN - OPUS4-23775 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Rackwitz, Vanessa A1 - Procop, M. A1 - Hodoroaba, Vasile-Dan T1 - Characterization of polycapillary X-ray semilenses with SEM/EDX KW - Polycapillary X-ray optics KW - Semi-lens KW - Parallelising mode KW - SEM KW - EDS KW - Acceptance area KW - FWHM KW - Transmission KW - Focal distance KW - XRF PY - 2010 U6 - https://doi.org/10.1017/S1431927610054280 SN - 1431-9276 SN - 1435-8115 VL - 16 IS - Suppl 2 SP - 932 EP - 933 PB - Cambridge University Press CY - New York, NY AN - OPUS4-27219 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hodoroaba, Vasile-Dan A1 - Procop, M. A1 - Rackwitz, Vanessa T1 - Check and specification of the performance of EDS systems attached to the SEM by means of a new test material EDS-TM002 and an updated evaluation software package EDS spectrometer test - Version 3.4. N2 - Four years ago BAM has made available via its webshop a test material, EDS-TM001, as well as an accompanying software package, "EDX spectrometer check", to be employed by both EDS (energy dispersive spectrometer) users and manufacturers to check and pecify, respectively, the performance of an EDS. KW - EDS detector KW - EDX KW - Test material KW - EDS-TM002 KW - EDS performance test KW - Software PY - 2013 U6 - https://doi.org/10.1017/S1431927613008271 SN - 1431-9276 SN - 1435-8115 VL - 19 IS - Suppl. 2 SP - 1256 EP - 1257 PB - Cambridge University Press CY - New York, NY AN - OPUS4-29421 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hodoroaba, Vasile-Dan A1 - Procop, M. T1 - A method to test the performance of an energy-dispersive X-ray spectrometer (EDS) N2 - A test material for routine performance evaluation of energy-dispersive X-ray spectrometers (EDS) is presented. It consists of a synthetic, thick coating of C, Al, Mn, Cu, and Zr, in an elemental composition that provides interference-free characteristic X-ray lines of similar intensities at 10 kV scanning electron microscope voltage. The EDS energy resolution at the C-K, Mn-Lα, Cu-Lα, Al-K, Zr-Lα, and Mn-Kα lines, the calibration state of the energy scale, and the Mn-Lα/Mn-Kα intensity ratio as a measure for the low-energy detection efficiency are calculated by a dedicated software package from the 10 kV spectrum. Measurements at various input count rates and processor shaping times enable an estimation of the operation conditions for which the X-ray spectrum is not yet corrupted by pile-up events. Representative examples of EDS systems characterized with the test material and the related software are presented and discussed. KW - Energy-dispersive X-ray spectrometer (EDS) KW - Energy-dispersive X-ray spectroscopy (EDX, XEDS) KW - Scanning electron microscope (SEM) KW - Energy resolution KW - Test material KW - Performance check KW - ISO 15632 PY - 2014 U6 - https://doi.org/10.1017/S1431927614001652 SN - 1431-9276 SN - 1435-8115 VL - 20 IS - 05 SP - 1556 EP - 1564 PB - Cambridge University Press CY - New York, NY AN - OPUS4-31565 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Procop, M. A1 - Hodoroaba, Vasile-Dan A1 - Terborg, R. T1 - Determination of the Effective EDS Detector Area Using Experimental and Theoretical X-ray Emission Yields T2 - Microscopy & Microanalysis 2015 CY - Portland, Oregon, USA DA - 2015-08-02 PY - 2015 AN - OPUS4-33879 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hodoroaba, Vasile-Dan A1 - Terborg, R. A1 - Procop, M. T1 - Determination of the effective EDS detector area using experimental and theoretical X-ray emission yields N2 - An energy dispersive X-ray spectrometer operating with a semiconductor detector should be specified in compliance with the ISO standard 15632 [1]. Requirements for specification are: a) a general description of the spectrometer to evaluate its performance, b) the energy resolution with corresponding dead time, c) the P/B ratio in the Fe55 spectrum and, finally, d) the L/K intensity Ratio in a Ni or Cu spectrum to estimate spectrometer efficiency at low energies. Items b) to d) can be easily checked by the user. Related procedures are recommended in the annexes of the standard. KW - EDS KW - X-rays KW - Effective solid angle PY - 2015 U6 - https://doi.org/10.1017/S1431927615008181 SN - 1431-9276 SN - 1435-8115 VL - 21 IS - Suppl. 3 SP - Paper 0739, 1481 EP - 1482 PB - Cambridge University Press CY - New York, NY AN - OPUS4-34342 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -