TY - JOUR A1 - Kühn, Julius A1 - Hodoroaba, Vasile-Dan A1 - Linke, S. A1 - Moritz, W. A1 - Unger, Wolfgang T1 - Characterization of Pd-Ni-Co alloy thin films by ED-EPMA with application of the STRATAGEM software N2 - Ternary thin film alloys based on Pd, Ni and Co on silicon wafers have been characterized in order to determine elemental composition and thickness. A broad variety of alloy compositions was obtained on one and the same substrate by magnetron dc-co-sputter deposition. Energy-dispersive electron probe X-ray microanalysis of these 'multi' alloy composition samples is performed in a non-destructive, precise and, if optimized, also in a time-saving way. The local thickness of the layers under study was in between 50 nm and 250 nm. Pure element bulk materials have been employed as reference specimens. The results attained in this study are compared to those obtained by other analytical methods as Auger electron spectroscopy and X-ray photo electron spectroscopy. KW - Ternary alloys KW - Film thickness KW - Elemental composition KW - Quantification KW - K-values KW - ED-EPMA KW - STRATAGEM PY - 2012 DO - https://doi.org/10.1002/sia.4974 SN - 0142-2421 SN - 1096-9918 VL - 44 IS - 11-12 SP - 1456 EP - 1458 PB - Wiley CY - Chichester AN - OPUS4-27273 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Linke, S. A1 - Kühn, Julius A1 - Nörthemann, K. A1 - Unger, Wolfgang A1 - Moritz, W. T1 - Sensor high throughput screening using photocurrent measurements in silicon N2 - A new high throughput screening method to characterise alloys used as gate metal of Metal/solid Electrolyte/Insulator/Semiconductor (MEIS) gas-sensors was developed. Samples with continuous gradients in alloy concentration for the system Pd1-x-yNiyCoy were analysed regarding H2 sensitivity. First results showed reduced poisoning effects of H2S for Ni concentrations between 4-11 at-% in Pd. T2 - Eurosensors XXVI CY - Kraków, Poland DA - 09.09.2012 KW - LAPS KW - Ternary alloy KW - MEIS sensor KW - H2 sensor KW - High throughput screening PY - 2012 DO - https://doi.org/10.1016/j.proeng.2012.09.366 SN - 1877-7058 VL - 47 SP - 1195 EP - 1198 PB - Elsevier CY - Amsterdam [u.a.] AN - OPUS4-27926 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -