TY - JOUR A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Gross, Thomas A1 - Friedrich, Jörg Florian A1 - Wöll, Ch. A1 - Nick, L. T1 - The Use of Octadecyltrichlorosilane Self-Assembled Layers as a Model for the Assessment of Plasma Treatment and Metallization Effects on Polyolefins N2 - Self-assembled octadecyltrichlorosilane (CH3(CH2)17SiCl3, OTS) films were deposited on an oxidized silicon wafer. They were carefully exposed to a low-pressure oxygen direct current (dc) plasma and/or Cr vapor. Subsequently, they were characterized by X-ray photoelectron spectroscopy, near-edge X-ray absorption fine structure spectroscopy, and atomic force microscopy. Detailed information on the oxygen functionalization and the molecular conformation of the OTS films was obtained. The main result was that functionalization conditions can be found where the order of the film remains almost unaffected. Similarly, Cr evaporation of pure OTS films revealed only slight effects on the order in the film. Cr evaporation of an ordered but functionalized OTS film immediately changes its state toward a fully isotropic one. In the course of interaction, oxygen sites at the surface of the functionalized OTS film are reduced whereas Cr becomes oxidized. A redox reaction scheme is proposed for this interfacial reaction. Finally, it is concluded that the given study should be of importance for advanced plasma processing of polyolefins. KW - NEXAFS KW - OTS Self-Assembled Layers PY - 1999 DO - https://doi.org/10.1021/la981174l SN - 0743-7463 SN - 1520-5827 VL - 15 IS - 4 SP - 1161 EP - 1166 PB - American Chemical Society CY - Washington, DC AN - OPUS4-808 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -