TY - JOUR A1 - Schmitt, R. A1 - Koerfer, F. A1 - Sadowny, O. A1 - Zimmermann, J. A1 - Krüger-Sehm, R. A1 - Xu, M. A1 - Dziomba, T. A1 - Koenders, L. A1 - Goch, G. A1 - Tausendfreund, A. A1 - Patzelt, S. A1 - Simon, S. A1 - Rockstroh, L. A1 - Bellon, Carsten A1 - Staude, Andreas A1 - Woias, P. A1 - Goldschmidtböing, F. A1 - Rabold, M. T1 - Virtuelle Messgeräte - Definition und Stand der Entwicklung N2 - Die Mikro- und Nanotechnologie gehört zu den Schlüsseltechnologien des 21. Jahrhunderts mit hohen Wachstumsprognosen, wie auch die im Auftrag des BMBF durchgeführte Studie “Nanotechnologie als wirtschaftlicher Wachstumsmarkt” von 2004 ausführlich darstellt. Aus diesem Trend resultiert ein steigender Bedarf an Messsystemen, die Nanostrukturen prozessnah bzw. im Fertigungsprozess charakterisieren können. Virtuelle Messgeräte liefern Erkenntnisse zur Entwicklung neuartiger Messsysteme, Analyse und Optimierung bestehender Verfahren sowie die Bestimmung der Messunsicherheit und modellbasierten Korrektur systematischer Fehler. Der virtuelle Messprozess umfasst neben dem Messmittel auch die Probe und die Wechselwirkungen zwischen beiden. In diesem Beitrag werden virtuelle Messgeräte vorgestellt sowie deren Anwendung diskutiert. N2 - Micro- and nanotechnology experienced a high economic growth in recent years. This yields in a growing demand for measuring instruments which are closely linked to the production process. Virtual measuring instruments provide knowledge for the development of new systems, the analysis and optimization of established devices as well as the determination of the uncertainty in measurement. The virtual measuring process consists of the measuring instrument, the sample, and the interaction between both. In this article examples of current developments of virtual instruments are presented and their way of utilization is discussed. KW - Virtuelle Messtechnik KW - Simulation KW - Messunsicherheit KW - Virtual metrology KW - Measurement uncertainty PY - 2008 U6 - https://doi.org/10.1524/teme.2008.0872 SN - 0340-837X SN - 0178-2312 SN - 0171-8096 VL - 75 IS - 5 SP - 298 EP - 310 PB - Oldenbourg CY - München AN - OPUS4-17569 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Kim, K.J. A1 - Kim, C.S. A1 - Ruh, S. W. A1 - Unger, Wolfgang A1 - Radnik, Jörg A1 - Mata-Salazar, J. A1 - Juarez-Garcia, J.M. A1 - Cortazar-Martinez, O. A1 - Herrera-Gomez, A. A1 - Hansen, P.E. A1 - Madesen, J.S. A1 - Senna, C.A. A1 - Archanjo, B.S. A1 - Damasceno, J.C. A1 - Achete, C.A. A1 - Wang, H. A1 - Wang, M. A1 - Windover, D. A1 - Steel, E. A1 - Kurokawa, A. A1 - Fujimoto, T. A1 - Azuma, Y. A1 - Terauchi, S. A1 - Zhang, L. A1 - Jordaan, W.A. A1 - Spencer, S.J. A1 - Shard, A.G. A1 - Koenders, L. A1 - Krumrey, M. A1 - Busch, I. A1 - Jeynes, C. T1 - Thickness measurement of nm HfO2 films N2 - A pilot study for the thickness measurement of HfO2 films was performed by the Surface Analysis Working Group (SAWG) of the Consultative Committee for Amount of Substance (CCQM). The aim of this pilot study was to ensure the equivalency in the measurement capability of national metrology institutes for the thickness measurement of HfO2 films. In this pilot study, the thicknesses of six HfO2 films with nominal thickness from 1 nm to 4 nm were measured by X-ray Photoelectron Spectroscopy (XPS), X-ray Reflectometry(XRR), X-ray Fluorescence Analysis (XRF), Transmission Electron Spectroscopy (TEM), Spectroscopic Ellipsometry (SE) and Rutherford Backscattering Spectrometry (RBS). The reference thicknesses were determined by mutual calibration of a zero-offset method (Medium Energy Ion Scattering Spectroscopy (MEIS) of KRISS) and a method traceable to the length unit (the average thicknesses of three XRR data except the thinnest film). These reference thicknesses are traceable to the length unit because they are based on the traceability of XRR. For the thickness measurement by XPS, the effective attenuation length of Hf 4f electrons was determined. In the cases of XRR and TEM, the offset values were determined from a linear fitting between the reference thicknesses and the individual data by XRR and TEM. The amount of substance of HfO2, expressed as thickness of HfO2 films (in both linear and areal density units), was found to be a good subject for a CCQM key comparison. To reach the main text of this paper, click on Final Report. The final report has been peer-reviewed and approved for publication by the CCQM. KW - Thickness measurements KW - nm films KW - X-ray Photoelectron Spectroscopy KW - Mutual calibration PY - 2021 U6 - https://doi.org/10.1088/0026-1394/58/1A/08016 SN - 0026-1394 VL - 58 IS - 1a SP - 08016 PB - IOP Publishing Lt. CY - Bristol AN - OPUS4-54175 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Senoner, Mathias A1 - Unger, Wolfgang A1 - Koenders, L. A1 - Wilkening, G. ED - Hasche, K. ED - Mirande, W. ED - Wilkening, G. T1 - Results of the inter-laboratory comparison "Determination of nanometric step heights with AFM" T2 - 5th Seminar on Quantitative Microscopy ; 1st Seminar on Nanoscale Calibration Standards and Methods ; NanoScale 2001 CY - Bergisch Gladbach, Germany DA - 2001-11-15 PY - 2002 SN - 3-89701-840-3 SN - 0179-0609 N1 - Serientitel: PTB-Bericht: PTB-F – Series title: PTB-Bericht: PTB-F VL - F-44 IS - 44 SP - 70 EP - 77 PB - Wirtschaftsverl. NW CY - Bremerhaven AN - OPUS4-1327 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Koenders, L. A1 - Hasche, K. A1 - Ulm, G. A1 - Krumrey, M. A1 - Ade, G. A1 - Stümpel, J. A1 - Busch, I. A1 - Thomsen-Schmidt, P. A1 - Schädlich, S. A1 - Schindler, A. A1 - Frank, W. A1 - Beck, Uwe A1 - Procop, Mathias T1 - Über die metrologische Charakterisierung von Schichtdicken Standards im Nanometerbereich T2 - 12th Applied Surface Analysis Workshop ; AOFA 12 CY - --- DA - 2002-09-15 PY - 2002 AN - OPUS4-2285 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Koenders, L. A1 - Dziomba, T. A1 - Thomsen-Schmidt, P. A1 - Senoner, Mathias T1 - Normale für die dimensionelle und analytische Nanometrologie KW - Nanometrologie KW - Nanoschichten KW - Nanotechnologie KW - Oberflächenanalytik KW - Zertifiziertes Referenzmaterial PY - 2004 SN - 0030-834X VL - 114 IS - 1 SP - 16 EP - 24 PB - Wirtschaftsverl. NW CY - Bremerhaven AN - OPUS4-3001 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias A1 - Unger, Wolfgang A1 - Koenders, L. A1 - Wilkening, G. T1 - Accuracy of step height determination by Atomic Force Microscopy - results of an inter-laboratory comparison T2 - 3rd International Conference European Society for Precision Engineering and Nanotechnology (euspen) CY - Eindhoven, The Netherlands DA - 2002-05-26 PY - 2002 SP - 773 EP - 776 AN - OPUS4-1415 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Göbel, E. O. A1 - Hasche, K. A1 - Ulm, G. A1 - Krumrey, M. A1 - Ade, G. A1 - Stümpel, J. A1 - Herrmann, K. A1 - Koenders, L. A1 - Thomsen-Schmidt, P. A1 - Pohlenz, F. A1 - Xu, M. A1 - Dai, G. A1 - Hoffmann, K.-P. A1 - Busch, I. A1 - Frank, W. A1 - Procop, M. A1 - Beck, Uwe T1 - Kalibrierte Schichtdicken-Maßverkörperungen für Nanometerschichten, Teilvorhaben - Kalibrierung von Schichtdicken-Maßverkörperungen im Nanometerbereich - Abschlussbericht des BMBF Verbundvorhabens 13N7704 - 13N77041 KW - Schichtdicke KW - Nanometerbereich PY - 2003 UR - http://edok01.tib.uni-hannover.de/edoks/e01fb02/373214030.pdf SP - 1 EP - 131 PB - Physikalisch-Technische Bundesanstalt CY - Dresden AN - OPUS4-25428 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Ritter, Martin A1 - Dziomba, T. A1 - Hemmleb, M. A1 - Koenders, L. A1 - Kranzmann, Axel T1 - A 3D-Calibration Method for the Quantitative SPM Measurement of Hardness Indenters KW - 3D Calibration KW - SPM KW - Hardness Indenter PY - 2007 SN - 0970-3950 VL - 22 IS - 3 SP - 167 EP - 175 PB - Metrology Society of India CY - New Delhi AN - OPUS4-16357 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Ritter, Martin A1 - Dziomba, T. A1 - Kranzmann, Axel A1 - Koenders, L. T1 - A landmark-based 3D calibration strategy for SPM N2 - We present a new method for the complete three-dimensional (3D) calibration of scanning probe microscopes (SPM) and other high-resolution microscopes, e.g., scanning electron microscopes (SEM) and confocal laser scanning microscopes (CLSM), by applying a 3D micrometre-sized reference structure with the shape of a cascade slope-step pyramid. The 3D reference structure was produced by focused ion beam induced metal deposition. In contrast to pitch featured calibration procedures that require separate lateral and vertical reference standards such as gratings and step height structures, the new method includes the use of landmarks, which are well established in calibration and measurement tasks on a larger scale. However, the landmarks applied to the new 3D reference structures are of sub-micrometre size, the so-called 'nanomarkers'. The nanomarker coordinates are used for a geometrical calibration of the scanning process of SPM as well as of other instrument types such as SEM and CLSM. For that purpose, a parameter estimation routine involving three scale factors and three coupling factors has been developed that allows lateral and vertical calibration in only one sampling step. With this new calibration strategy, we are able to detect deviations of SPM lateral scaling errors as well as coupling effects causing, e.g., a lateral coordinate shift depending on the measured height position of the probe. KW - Scanning probe microscopy KW - Focused ion beam KW - Calibration KW - 3D standards KW - Parameter estimation KW - Spatial coupling KW - Distortions KW - SPM KW - Landmarks KW - Nanomarker KW - Coupling KW - 3D calibration PY - 2007 U6 - https://doi.org/10.1088/0957-0233/18/2/S12 SN - 0957-0233 SN - 1361-6501 VL - 18 SP - 404 EP - 414 PB - IOP Publ. Ltd. CY - Bristol AN - OPUS4-16358 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Ritter, Martin A1 - Dziomba, T. A1 - Xu, M. A1 - Koenders, L. A1 - Kranzmann, Axel T1 - Eine neue 3D Kalibrierstrategie für Mikro- und Nanomessverfahren T2 - Tagung "Messtechnik für Mikro- und Nano-Engineering" CY - Erlangen, Deutschland DA - 29.11.2006 KW - 3D Kalibrierung KW - Rastermikroskopie KW - Nanomarker PY - 2006 SN - 3-18-091950-7 IS - 1950 SP - 15 EP - 24 AN - OPUS4-16359 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Koenders, L. A1 - Dai, G. A1 - Danzebrink, H. A1 - Dziomba, T. A1 - Hinze, P. A1 - Weimann, T. A1 - Kranzmann, Axel A1 - Ritter, Martin A1 - Senoner, Mathias T1 - Standards for SFM and nano-analytical techniques T2 - EuroNanoforum 2007 "Nanotechnology in Industrial Applications" CY - Düsseldorf, Germany DA - 2007-06-19 PY - 2007 AN - OPUS4-14551 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Koenders, L. A1 - Danzebrink, H. A1 - Dai, G. A1 - Dziomba, T. A1 - Min, X. A1 - Ritter, Martin A1 - Kranzmann, Axel A1 - Senoner, Mathias A1 - Yacoot, A. T1 - Dimensional metrology at nanometre scale - scanning force microscopes - standards - uncertainy T2 - 1st International Congress on Mechanical Metrology CY - Rio de Janeiro, Brazil DA - 2008-10-08 PY - 2008 AN - OPUS4-17874 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Leach, R.K. A1 - Boyd, R. A1 - Burke, T. A1 - Danzebrink, H.-U. A1 - Dirscherl, K. A1 - Dziomba, T. A1 - Gee, M. A1 - Koenders, L. A1 - Morazzani, V. A1 - Pidduck, A. A1 - Roy, D. A1 - Unger, Wolfgang A1 - Yacoot, A. T1 - The European nanometrology landscape N2 - This review paper summarizes the European nanometrology landscape from a technical perspective. Dimensional and chemical nanometrology are discussed first as they underpin many of the developments in other areas of nanometrology. Applications for the measurement of thin film parameters are followed by two of the most widely relevant families of functional properties: measurement of mechanical and electrical properties at the nanoscale. Nanostructured materials and surfaces, which are seen as key materials areas having specific metrology challenges, are covered next. The final section describes biological nanometrology, which is perhaps the most interdisciplinary applications area, and presents unique challenges. Within each area, a review is provided of current status, the capabilities and limitations of current techniques and instruments, and future directions being driven by emerging industrial measurement requirements. Issues of traceability, standardization, national and international programmes, regulation and skills development will be discussed in a future paper. KW - Nanotechnology KW - Metrology KW - Chemistry KW - Surface analysis PY - 2011 U6 - https://doi.org/10.1088/0957-4484/22/6/062001 SN - 0957-4484 SN - 1361-6528 VL - 22 IS - 6 SP - 062001-1 - 062001-15 PB - IOP Publishing Ltd. CY - Bristol AN - OPUS4-23259 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Koenders, L. A1 - Busch, I. A1 - Hinze, P. A1 - Senoner, Mathias T1 - Normale für die Nanometrologie und -analytik T2 - 16. Tagung Festkörperanalytik CY - Vienna, Austria DA - 2011-07-04 PY - 2011 AN - OPUS4-23964 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -