TY - CONF A1 - Ecker, Klaus T1 - Antimon implantiert in Silizium - Ein Schichtreferenzmaterial für die Oberflächenanalytik T2 - Seminar der Abteilung I, BAM CY - Berlin, Germany DA - 2002-03-25 PY - 2002 AN - OPUS4-2972 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Ecker, Klaus A1 - Dudzus, Thomas A1 - Merchel, Silke A1 - Kipphardt, Heinrich ED - Vízkelethy, G. T1 - Oxygen determination in BaF2 and CaF2 by Charged Particle Activation Analysis T2 - 16th International Conference on Ion Beam Analysis (IBA-16) CY - Albuquerque, NM, USA DA - 2003-06-29 PY - 2004 VL - 219-220 SP - P2 EP - 113 PB - Elsevier CY - Amsterdam AN - OPUS4-2627 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Riesemeier, Heinrich A1 - Ecker, Klaus A1 - Görner, Wolf A1 - Müller, Bernd R. A1 - Radtke, Martin A1 - Krumrey, M. T1 - Layout and first XRF Applications of the BAMline at BESSY II+ N2 - The first hard x-ray beamline at BESSY II has been installed by BAM and PTB at a superconducting 7 T wavelength shifter. The main optical elements of the beamline are a double-multilayer monochromator and a double-crystal monochromator. Depending on the application, the two devices are used separately or in-line. The main applications of the monochromatic radiation with photon energies up to 60 keV are x-ray fluorescence analysis, micro computed tomography, x-ray topography, detector calibration and reflectometry. Calculable undispersed radiation up to 200 keV is available for radiometric applications. KW - BAMline KW - XRF PY - 2005 DO - https://doi.org/10.1002/xrs.750 SN - 0049-8246 VL - 34 IS - 2 SP - 160 EP - 163 PB - Wiley CY - Chichester AN - OPUS4-11929 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Görner, Wolf A1 - Berger, Achim A1 - Ecker, Klaus A1 - Haase, Oskar A1 - Hedrich, Martina A1 - Segebade, Christian A1 - Weidemann, Gerd A1 - Dudek, Gabriele T1 - Broad band application of combined instrumental photon and neutron activation analysis PY - 2001 SN - 0236-5731 SN - 1588-2780 SN - 1417-2097 N1 - Geburtsname von Dudek, Gabriele: Wermann, G. - Birth name of Dudek, Gabriele: Wermann, G. VL - 248 IS - 1 SP - 45 EP - 52 PB - Elsevier Sequoia CY - Lausanne AN - OPUS4-11229 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Ecker, Klaus A1 - Wätjen, U. A1 - Berger, Achim A1 - Persson, L. A1 - Pritzkow, Wolfgang A1 - Radtke, Martin A1 - Riesemeier, Heinrich T1 - RBS, SY-XRF, INAA and ICP-IDMS of antimony implanted in silicon - A multi-method approach to characterize and certify a reference material N2 - A layer of Sb atoms, implanted with an energy of 400 keV and a nominal dose of 5×1016 atoms/cm2 into a high purity silicon wafer, was certified for its areal density (atoms/cm2) using Rutherford backscattering spectrometry (RBS), instrumental neutron activation analysis (INAA) and inductively coupled plasma isotope dilution mass spectrometry (ICP-IDMS) and for its isotope ratio using INAA and ICP-IDMS. Excellent agreement between the results of the different independent methods was found. In the present work, the measurements of the homogeneity of the areal density of Sb, previously determined with RBS in spots having 1 mm diameter, are improved with synchrotron X-ray fluorescence analysis: Higher precision in even smaller sample spots allows to estimate a reduced inhomogeneity of the whole batch of samples of the order of only 0.4%. Thus the uncertainty of the certified value can further be reduced. Down to fractions of a chip with 0.3×0.4 mm2 area, the areal density is now certified as (4.81±0.06)×1016 Sb atoms/cm2, where the expanded uncertainty 0.06 (coverage factor k=2) corresponds to only 1.2%. The relative merits of the different analytical methods are discussed. KW - Certified reference material KW - RBS KW - INAA KW - ICP-IDMS KW - XRF KW - SY-XRF PY - 2002 DO - https://doi.org/10.1016/S0168-583X(01)01038-2 SN - 0168-583X SN - 1872-9584 VL - 188 IS - 1-4 SP - 120 EP - 125 PB - Elsevier CY - Amsterdam AN - OPUS4-13870 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Maser, K. A1 - Mohr, U. A1 - Leihkauf, R. A1 - Ecker, Klaus A1 - Beck, Uwe A1 - Grambole, D. A1 - Grötzschel, R. A1 - Herrmann, F. A1 - Krauser, J. A1 - Weidinger, A. T1 - Hydrogen migration in wet-thermally grown silicon dioxide layers due to high dose 15N ion beam irradiation N2 - Three effects have been observed in wet-thermally grown structures under bombardement with energetic 15N ions: (1) Out-diffusion of H from the SiO2/Si system through the surface, (2) Accumulation of H at the SiO2/Si interface, (3) Changes in the optical fingerprint spectra of Ψ and Δ in dependence on λ (wavelength) obtained by ellipsometric measurements. PY - 1999 DO - https://doi.org/10.1016/S0167-9317(99)00356-1 SN - 0167-9317 SN - 1873-5568 VL - 48 IS - 1-4 SP - 139 EP - 142 PB - Elsevier CY - Amsterdam AN - OPUS4-25572 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Ecker, Klaus A1 - Dudzus, Thomas A1 - Merchel, Silke A1 - Kipphardt, Heinrich T1 - Oxygen determination in BaF2 and CaF2 by Charged Particle Activation Analysis T2 - 16th International Conference on Ion Beam Analysis CY - Albuquerque, NM, USA DA - 2003-06-29 PY - 2003 AN - OPUS4-4900 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Merchel, Silke A1 - Dudzus, Thomas A1 - Ecker, Klaus A1 - Hedrich, Martina A1 - Kipphardt, Heinrich A1 - Recknagel, Sebastian T1 - Viele (BAM-) Wege führen zu den leichten Elementen T2 - 12. Jahrescolloquium "Analyse von Feststoffen unterschiedlicher Materialien aus Industrie und Umwelt" CY - Berlin, Deutschland DA - 2002-11-19 PY - 2002 SP - 1(?) AN - OPUS4-2024 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Berger, Achim A1 - Ecker, Klaus A1 - Görner, Wolf A1 - Merchel, Silke A1 - Procop, Mathias A1 - Radtke, Martin A1 - Riesemeier, Heinrich T1 - X-ray fluorescence analysis at the BAMline PY - 2002 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2001.pdf#page=253 SN - 0179-4159 SP - 253 EP - 254 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-1322 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Berger, Achim A1 - Ecker, Klaus A1 - Görner, Wolf A1 - Radtke, Martin A1 - Reinholz, Uwe A1 - Riesemeier, Heinrich A1 - Segebade, Christian T1 - Strahlenverfahren in Kombination - ein Werkzeug für Analyse und Zertifizierung von Feststoffen T2 - 12. Jahrescolloquium "Analyse von Feststoffen unterschiedlicher Materialien aus Industrie und Umwelt" CY - Berlin, Deutschland DA - 2002-11-19 PY - 2002 SP - 1(?) AN - OPUS4-2025 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -