TY - GEN A1 - Grytsenko, K. P. A1 - Capobianchi, A. A1 - Convertino, A. A1 - Friedrich, Jörg Florian A1 - Schulze, Rolf-Dieter A1 - Ksensov, V. A1 - Schrader, S. ED - Iwamori, S. T1 - Polymer-metal nanocomposite thin film prepared by co-evaporation in a vacuum PY - 2005 SN - 81-7736276-3 SP - 85 EP - 109 PB - Research Signpost CY - Trivandrum, Kerala AN - OPUS4-11225 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Grytsenko, K. P. A1 - Friedrich, Jörg F. A1 - Hidde, Gundula A1 - Schulze, Rolf-Dieter A1 - Doroshenko, T. A1 - Kolomzarov, Y. A1 - Navozenko, O. A1 - Sopinskii, M. A1 - Lytvyn, O. T1 - Structure and properties of PTFE films deposited in vacuum from pretreated substances T2 - Frühjahrstagung der Europäischen Gesellschaft für Materialforschung (EMRS) CY - Strasbourg, France DA - 2008-05-26 PY - 2008 AN - OPUS4-17526 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Grytsenko, K. P. A1 - Kolomzarov, Y. A1 - Lytvyn, O. A1 - Strelchuk, V. A1 - Ksianzou, V. A1 - Schrader, S. A1 - Beyer, H. A1 - Servet, B. A1 - Enouz-Vedrenne, S. A1 - Garry, G. A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian T1 - Metal-filled polytetrafluoroethylene nanostructered thin film N2 - Thin metal-filled polyterafluoroethylene films with various metal concentration were produced by co-deposition in vacuum. Metal nanocluster size increased with metal concentration. Films were heated up to 300 degrees C, their optical spectra were recorded during heating. The changes in plasmon band shape and wavelength of the nanocluster ensemble during heating are not linearly related with metal concentration and heating temperature. This is caused by different thermal behavior of the complex processes, which are taking place in each of the two materials present in the film. The metal cluster size and optical properties of the whole ensemble can be purposefully formed by varying metal nature, its concentration and annealing temperature of the film. Nano- and micro-domains with properties different from original film were generated by focused excimer laser or electron beam. Gold-filled PTFE nano-structured films were used as substrate for surface enhanced Raman scattering measurements of ultrathin film of Rhodamine 6G dye. KW - Gold nanoparticles KW - Arrays KW - SERS PY - 2010 UR - http://openurl.ingenta.com/content?genre=article&issn=1936-6612&volume=3&issue=3&spage=308&epage=312 DO - https://doi.org/10.1166/asl.2010.1127 SN - 1936-6612 SN - 1936-7317 VL - 3 IS - 3 SP - 308 EP - 312 PB - American Scientific Publ. CY - Stevenson Ranch, Calif. AN - OPUS4-23957 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dimitriev, O.P. A1 - Grytsenko, K.P. A1 - Lytvyn, P.M. A1 - Doroshenko, T.P. A1 - Briks, J.L. A1 - Tolmachev, A.I. A1 - Slominskii, Y.L. A1 - Kudinova, M.A. A1 - Schrader, S. A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian T1 - Substrate-induced self-assembly of donor-acceptor type compounds with terminal thiocarbonyl groups N2 - Two types of conjugated thiocarbonyl-terminated compounds have been synthesized and their ability to be adsorbed on surfaces of the different nature, namely, glass, polytetrafluoroethylene (PTFE), and gold has been studied. Different morphology of the films prepared by thermal vacuum evaporation and drop-casting from solutions has been observed depending on the surface used. It has been found that gold surface has a unique property to influence self-assembly of both monolayer and larger aggregates or crystals of the compounds, in contrast to glass and PTFE substrates. It was found that thiocarbonyl group is able to be chemisorbed to the gold surface. However, it was concluded that in spite of the fact that the thiocarbonyl groups are important for the chemical interaction with the gold surface, physical adsorption on the substrate surface, compound–compound and compound–solvent (when using solution) interactions are of great significance to drive self-assembly of the final film. KW - Thiocarbonyl group KW - Donor–acceptor compound KW - Gold surface KW - Aggregation KW - Film morphology PY - 2013 DO - https://doi.org/10.1016/j.tsf.2013.05.084 SN - 0040-6090 VL - 539 SP - 127 EP - 133 PB - Elsevier B.V. CY - Amsterdam AN - OPUS4-30571 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Grytsenko, K.P. A1 - Lytvyn, P. A1 - Friedrich, Jörg Florian A1 - Schulze, Rolf-Dieter A1 - Schrader, S. T1 - Influence of plasma discharge on the structure of polytetrafluoroethylene film and step coverage on polymer substrate N2 - Polytetrafluoroethylene (PTFE) films have been deposited onto polycarbonate (PC) substrates from the products of PTFE evaporation, activated by a cloud of accelerated electrons. A 40.68 MHz glow discharge was used during the deposition process. The polymer films have been characterised by XPS, FTIR and AFM. The use of the low power plasma during film growth led to the formation of PTFE films with modified structure. Films are amorphous and contain more cross-links, but in general, the structure of their macromolecules is still linear. An increase of RF-power leads to the formation of films with large amount of double bonds and enhanced internal stresses. Deposition of PTFE on PC without plasma treatment led to the formation of PTFE clusters up to 50 nm in diameter. The RMS roughness of the films, deposited without plasma, was about 4 nm, while the films deposited with plasma treatment had a roughness of 1.5 nm. The use of plasma has an additional effect if a PTFE coating is deposited on the PC substrate with submicrometer-sized steps. Without plasma the steps retain a rectangular shape. Deposited with the RF-discharge the PTFE layers resemble plasma-polymerised films. Under certain conditions the deposited films can fill trenches in the substrate like a wetting liquid, while under other conditions they avoid trenches and grow in between them. KW - Polytetrafluoroethylene KW - PTFE KW - Vacuum deposition KW - Plasma KW - Discharge KW - Film PY - 2007 DO - https://doi.org/10.1016/j.msec.2006.09.029 SN - 0928-4931 SN - 1873-0191 VL - 27 IS - 5-8 SP - 1227 EP - 1231 PB - Elsevier CY - Amsterdam AN - OPUS4-14014 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -