TY - JOUR A1 - Friedrich, Jörg Florian A1 - Mix, Renate A1 - Kühn, Gerhard A1 - Retzko, Iris A1 - Schönhals, Andreas A1 - Unger, Wolfgang T1 - Plasma-based introduction of monosort functional groups of different type and density onto polymer surfaces. Part 2: Pulsed plasma polymerization N2 - This new functionalization method consists of the deposition of very thin plasma polymer layers (20 to 100 nm) of functional group bearing monomers in pulsed plasma. With allylalcohol, a maximum of 30 OH groups per 100 C atoms was measured with a selectivity of about 90% and a significant stability at long-time exposure to air. Allylamine was used to produce primary amino groups, with a maximum of 18 NH2 groups per 100 C atoms. Side reactions were observed during the storage in air, such as oxidation of the amino groups. Carboxylic groups could be produced using acrylic acid with a maximum concentration of 24 COOH groups per 100 C atoms. The most prominent side reaction was the decarbonylation/ decarboxylation of the acid group during plasma deposition.___TAGSTART___BR___TAGEND___ The variation of the density of functional groups using the pulsed-plasma polymerization of functional-group-bearing monomers was possible by the chemically-initiated radical copolymerization with either a chain-extending monomer, such as ethylene, or a cross linker, such as butadiene, in plasma. The density of functional groups could be adjusted continuously (0 to 30 OH, 0 to 18 NH2 and 0 to 24 COOH groups per 100 C atoms).___TAGSTART___BR___TAGEND___ The successful application of these densely functionalized polymer surfaces for producing biocompatible surfaces and for use in metal–polymer composites is proposed. KW - Pulsed plasma polymerization KW - Plasma-initiated copolymerization KW - Charcterization of homo- and copolymers PY - 2003 DO - https://doi.org/10.1163/156855403765826874 VL - 10 IS - 2-3 SP - 173 EP - 223 PB - North-Holland CY - New York, NY AN - OPUS4-2706 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Friedrich, Jörg Florian A1 - Meyer-Plath, Asmus A1 - Retzko, Iris A1 - Kühn, Gerhard A1 - Mix, Renate ED - d'Agostino, R. T1 - Comparison of different plasmachemical processes for the formation of monotype functionalized polymer surfaces T2 - 16th International Symposium on Plasma Chemistry (ISPC-16) CY - Taormina, Italy DA - 2003-06-22 PY - 2003 IS - CD-ROM PB - Dep. of Chemistry, Univ. CY - Bari AN - OPUS4-2709 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Retzko, Iris T1 - Analytik neuer Kohlenstoffmaterialien - DLS Filme T2 - Abschlusskolloquium zum Ma Tech-Projekt 03N8627C, IWS Dresden CY - Dresden, Germany DA - 2003-02-12 PY - 2003 AN - OPUS4-4372 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Retzko, Iris T1 - Analysis of carbon materials and plasma polymers by x-ray photoelectron spectroscopy and x-ray absorption spectroscopy (XPS, XAS) T2 - AIST-BAM Symposium on Material Surface Technology in TWIN Institute Programme; AIST Tsukuba Research Centre CY - Tsukuba, Japan DA - 2003-02-18 PY - 2003 AN - OPUS4-4373 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Retzko, Iris T1 - Charakterization of carbon materials and plasma polymers by XPS and NAXAFS spectroscopy T2 - Kolloquium Materials Research Labs, Sony Corporation CY - Yokohama, Japan DA - 2003-02-20 PY - 2003 AN - OPUS4-4374 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Retzko, Iris A1 - Unger, Wolfgang A1 - Gesatzke, Wolfgang A1 - Scholl, A. A1 - Kilcoyne, A. D. A1 - Koprinarov, I. A1 - Ade, H. A1 - Hitchcock, A. P. A1 - Schulz, H. A1 - Scheibe, H.-J. ED - Tamura, L. S. T1 - Spectromicroscopy with inhomogeneous ta - C samples PY - 2003 UR - http://repositories.cdlib.org/lbnl/LBNL-52519/ SP - 1 EP - 3(?) AN - OPUS4-4694 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Retzko, Iris A1 - Unger, Wolfgang T1 - Analysis of carbon materials by X-ray photoelectron spectroscopy and X-ray absorption spectroscopy N2 - Since hard coating such as ta:C films are of growing interest for protecting surfaces of industrial machines and high capacity tools against wear and friction or for biomedical applications, more information about the structure-to-property relation is required. Therefore, core level X-ray photoelectron sprectroscopy and X-ray absorption spectroscopy and spectromicroscopy are used to derive chemical information about selected carbon species. PY - 2003 DO - https://doi.org/10.1002/adem.200320138 SN - 1438-1656 VL - 5 IS - 7 SP - 519 EP - 522 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-6937 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Matsubayashi, N. A1 - Imamura, M. A1 - Tanaka, T. A1 - Shimada, H. A1 - Retzko, Iris A1 - Unger, Wolfgang T1 - Surface Analysis by XPS and XAS Using a High-Rsolution and High-Flux Soft X-ray from Synchrotron T2 - AIST-BAM Symposium on Materials Surface Technology in Twin Institute Programme CY - Tsukuba, Japan DA - 2003-02-18 KW - XPS KW - XAS KW - DLC KW - Synchrotron Radiation PY - 2003 SP - 67 EP - 69 AN - OPUS4-6927 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Retzko, Iris A1 - Treu, Dieter A1 - Matsubayashi, N. A1 - Imamura, M. A1 - Tanaka, T. A1 - Schulz, H. A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Analysis of carbon materials and plasma polymers by X-ray photoelectron spectroscopy and X-ray absorption spectroscopy (XPS, XAS) T2 - AIST-BAM Symposium on Materials Surface Technology in Twin Institute Programme CY - Tsukuba, Japan DA - 2003-02-18 PY - 2003 SP - 59 EP - 65 AN - OPUS4-6928 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Retzko, Iris A1 - Swaraj, Sufal A1 - Unger, Wolfgang A1 - Matsubayashi, N. A1 - Imamura, M. A1 - Tanaka, T. A1 - Shimada, H. T1 - Non-destructive chemical depth-profiling of plasma polymers by variable excitation energy XPS PY - 2003 UR - http://pfwww.kek.jp/acr2002pdf/part_b/pf02b197.pdf SN - 1344-6339 VL - 20 SP - 197 PB - KEK - High Energy Accelerator Research Organization CY - Tsukuba AN - OPUS4-2798 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -