TY - JOUR A1 - Unger, Wolfgang A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Bütefisch, S. A1 - Busch, I. T1 - Lateral resolution delivered by imaging surface-analytical instruments as SIMS, AES and XPS: Application of the BAM-L200 Certified Reference Material and related ISO Standards JF - Journal of Surface Analysis N2 - The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1 xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. KW - Standardization KW - AES KW - XPS KW - SIMS KW - Lateral resolution KW - Certified reference material PY - 2017 SN - 1341-1756 VL - 24 IS - 2 SP - 123 EP - 128 AN - OPUS4-43138 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Busch, I. A1 - Unger, Wolfgang A1 - Bütefisch, S. A1 - Lenck, O. A1 - Koenders, L. A1 - Weimann, T. A1 - Weinert, M. T1 - Analytical and topographical Reference Material for the Nanoscale N2 - Reliable standards are required to support research and development as well as end-user in application. Appropriate standards have to fulfill three requirements: small uncertainty, easy to use and low overall costs of application. For calibration of microscopes at nanoscale and/or element analysis special requirements for standards are given, which are challenging in manufacture. T2 - Workshop on Reference Nanomaterials CY - Berlin, Germany DA - 14.05.2018 KW - XPS KW - Imaging KW - Reference material KW - NoStep Standards PY - 2018 AN - OPUS4-45156 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -