TY - JOUR A1 - Reinholz, Uwe A1 - Bremser, Wolfram A1 - Brzezinka, Klaus-Werner A1 - Strub, Erik A1 - Weise, Hans-Peter A1 - Merchel, Silke T1 - A thin-layer reference material for hydrogen analysis N2 - In many areas of material sciences, hydrogen analysis is of particular importance. For example, hydrogen is most abundant as impurity in thin film materials – depending on the deposition process – and has great influence on the chemical, physical and electrical properties of many materials. Existing bulk reference materials (RMs) are not suited for surface sensitive analytical methods like elastic recoil detection analysis (ERDA) or nuclear reaction analysis (NRA). To overcome this serious lack of (certified) thin-layer reference materials for the determination of hydrogen in the near-surface region (1–2 µm depth), we produced stable, homogeneous amorphous silicon layers on Si-wafers (aSi:H–Si) by means of chemical vapour deposition (CVD), while about 10% of hydrogen was incorporated in the Si-layer. Homogeneity and stability were proved by NRA whereas traceability of reference values has been assured by an international interlaboratory comparison. KW - Hydrogen KW - Nuclear reaction analysis KW - Depth profiling KW - Reference material KW - Ion beam analysis PY - 2008 DO - https://doi.org/10.1016/j.nimb.2008.03.015 SN - 0168-583X SN - 1872-9584 VL - 266 IS - 10 SP - 2418 EP - 2423 PB - Elsevier CY - Amsterdam AN - OPUS4-17553 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Reiche, I. A1 - Britzke, Ralf A1 - Bukalis, Gregor A1 - Reinholz, Uwe A1 - Weise, Hans-Peter A1 - Gadebusch, R.D. T1 - An external PIXE study: Mughal painting pigments KW - PIXE KW - Mughal painting KW - Pigments KW - Archaeometry PY - 2005 SN - 0049-8246 VL - 34 SP - 42 EP - 45 PB - Wiley CY - Chichester AN - OPUS4-6846 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Reiche, I. A1 - Castaing, J. A1 - Calligaro, T. A1 - Salomon, J. A1 - Aucouturier, M. A1 - Reinholz, Uwe A1 - Weise, Hans-Peter T1 - Analyses of hydrogen in quartz and in sapphire using depth profiling by ERDA at atmospheric pressure: Comparison with resonant NRA and SIMS N2 - Hydrogen is present in anhydrous materials as a result of their synthesis and of their environment during conservation. IBA provides techniques to measure H concentration depth profiles allowing to identify various aspects of the materials including the history of objects such as gemstones used in cultural heritage. A newly established ERDA set-up, using an external microbeam of alpha particles, has been developed to study hydrated near-surface layers in quartz and sapphire by non-destructive H depth profiling in different atmospheres. The samples were also analysed using resonant NRA and SIMS. KW - Hydrogen KW - Gemstones KW - ERDA KW - External beam KW - Depth profiling PY - 2006 DO - https://doi.org/10.1016/j.nimb.2006.03.066 SN - 0168-583X SN - 1872-9584 VL - 249 IS - 1-2 SP - 608 EP - 611 PB - Elsevier CY - Amsterdam AN - OPUS4-12844 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -