TY - JOUR A1 - Leach, R.K. A1 - Boyd, R. A1 - Burke, T. A1 - Danzebrink, H.-U. A1 - Dirscherl, K. A1 - Dziomba, T. A1 - Gee, M. A1 - Koenders, L. A1 - Morazzani, V. A1 - Pidduck, A. A1 - Roy, D. A1 - Unger, Wolfgang A1 - Yacoot, A. T1 - The European nanometrology landscape N2 - This review paper summarizes the European nanometrology landscape from a technical perspective. Dimensional and chemical nanometrology are discussed first as they underpin many of the developments in other areas of nanometrology. Applications for the measurement of thin film parameters are followed by two of the most widely relevant families of functional properties: measurement of mechanical and electrical properties at the nanoscale. Nanostructured materials and surfaces, which are seen as key materials areas having specific metrology challenges, are covered next. The final section describes biological nanometrology, which is perhaps the most interdisciplinary applications area, and presents unique challenges. Within each area, a review is provided of current status, the capabilities and limitations of current techniques and instruments, and future directions being driven by emerging industrial measurement requirements. Issues of traceability, standardization, national and international programmes, regulation and skills development will be discussed in a future paper. KW - Nanotechnology KW - Metrology KW - Chemistry KW - Surface analysis PY - 2011 DO - https://doi.org/10.1088/0957-4484/22/6/062001 SN - 0957-4484 SN - 1361-6528 VL - 22 IS - 6 SP - 062001-1 - 062001-15 PB - IOP Publishing Ltd. CY - Bristol AN - OPUS4-23259 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Bütefisch, S. A1 - Weimann, T. A1 - Busch, I. A1 - Danzebrink, H.-U. A1 - Gross, Thomas A1 - Unger, Wolfgang A1 - Wirth, Thomas T1 - New reference material for imaging XPS (X-ray photoelectron spectroscopy) instrument characterization N2 - Reference materials without variations in topography are essential for the characterization of imaging XPS (X-ray Photoelectron Spectroscopy) Instruments. Therefore a new fabrication process for this kind of zero-topography reference material was developed at PTB and resulted in first prototypes. The fabrication process and first measurement results will be presented in this paper. T2 - Sensor 2015 - 17th International conference on sensors and measurement technology CY - Nuremberg, Germany DA - 19.05.2015 KW - Imaging XPS KW - Reference material KW - Topography free KW - Micro technology PY - 2015 SN - 978-3-9813484-8-4 DO - https://doi.org/10.5162/sensor2015/P7.1 SP - Chapter P7, 821 EP - 825 AN - OPUS4-33837 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -