TY - JOUR A1 - Krüger, Hannes A1 - Kemnitz, E. A1 - Hertwig, Andreas A1 - Beck, Uwe T1 - Transparent MgF2-films by sol-gel coating: Synthesis and optical properties JF - Thin solid films N2 - Dielectric, anti-reflective or high reflective systems consist of low and high refractive index layers. Common systems are oxides. The preparation of low refractive index MgF2-films of optical quality by means of an anhydrous low temperature sol–gel synthesis is presented. The MgF2-sol is prepared by spin-coating on silicon and glass substrates. Various film thicknesses between 20 nm and 435 nm have been deposited. It has been shown that the thickness increase is proportional to the number of coating steps. The deposited MgF2-films consist of 10 nm to 20 nm large nanoparticles and have smooth surfaces with an average roughness (Ra) of (1.7 ± 0.3) nm. The optical constants n and k of the films are in agreement with the literature data of bulk-MgF2. KW - Sol-gel KW - Nano-MgF2 KW - Spin coating KW - Optical properties KW - Nanoparticles PY - 2008 DO - https://doi.org/10.1016/j.tsf.2007.10.126 SN - 0040-6090 VL - 516 IS - 12 SP - 4175 EP - 4177 PB - Elsevier CY - Amsterdam AN - OPUS4-17375 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Krüger, Hannes A1 - Kemnitz, E. A1 - Hertwig, Andreas A1 - Beck, Uwe T1 - Moderate temperature sol-gel deposition of magnesium fluoride films for optical UV-applications: A study on homogeneity using spectroscopic ellipsometry JF - Physica status solidi A N2 - Thin films of MgF2 have been deposited on silicon wafers in optical quality with a novel sol-gel deposition process at temperatures as low as 100 °C. The properties of the fluoride layers are compared to bulk MgF2 with respect to the optical constants. By employing spectroscopic mapping ellipsometry, the uniformity of the thickness of fluoride layers is confirmed to be within acceptable limits for optical applications. The optical constants are close to the bulk data. High-quality low-index films of suitable and homogeneous thickness have already been produced on a laboratory scale. KW - 78.20.-e KW - 78.66.Li KW - 78.68.+m KW - 81.20.Fw PY - 2008 DO - https://doi.org/10.1002/pssa.200777856 SN - 1862-6300 SN - 0031-8965 VL - 205 IS - 4 SP - 821 EP - 824 PB - Wiley-VCH CY - Berlin AN - OPUS4-17330 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Krüger, Hannes A1 - Hertwig, Andreas A1 - Beck, Uwe A1 - Kemnitz, E. T1 - Low temperature sol-gel metal oxide and fluoride layer stacks for optical applications JF - Thin solid films N2 - MgF2 and TiO2 single layers and layer stacks were produced by a spin-coating sol-gel process. The final temperature treatment was carried out at 100 °C. The layers were deposited onto silicon and fused silica substrates and were analysed by means of atomic force microscopy, X-ray photoelectron spectroscopy, transmission electron microscopy, ellipsometry, and UV-vis transmission spectroscopy. MgF2 and TiO2 single layers have morphological and optical properties comparable with physical vapour deposited layers. By using spectroscopic mapping ellipsometry, a good inter- and intra-sample homogeneity was confirmed. Multiple deposition steps result in a linear increase of layer thickness. Various films were deposited with thicknesses between 25 nm and 350 nm. It was shown that the low temperature sol-gel process results in films of optical quality. Anti-reflective and high reflective layer stacks consisting of MgF2 and TiO2 were designed and can be produced now by a sol-gel process, whereas the MgF2 layers in the layer stacks contains also traces of MgF2-2xOx. KW - Magnesium fluoride KW - Titanium oxide KW - Sol-gel KW - Spin-coating KW - Optical properties KW - Optical layer stacks KW - MgF2 KW - TiO2 PY - 2010 DO - https://doi.org/10.1016/j.tsf.2010.06.025 SN - 0040-6090 VL - 518 IS - 21 SP - 6080 EP - 6086 PB - Elsevier CY - Amsterdam AN - OPUS4-21516 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -