TY - JOUR A1 - Hoffmann, V. A1 - Dorka, R. A1 - Wilken, L. A1 - Hodoroaba, Vasile-Dan A1 - Wetzig, K. T1 - Present possibilities of thin-layer analysis by GDOES JF - Surface and interface analysis N2 - The analysis of thin layers of thickness 100 nm has become a new field of application for glow discharge optical emission spectroscopy (GDOES). In this paper an overview is given of the experiences and possibilities gained by the authors in later years at their research, development and application of GDOES. During GDOES analysis of a multilayer system the depth resolution was determined using the inverse maximal slope method. Under optimized discharge conditions a depth resolution of 25 nm at 100 nm depth was achieved. The gas flow in a Grimm-type source for glow discharge mass spectrometry (GDMS) was simulated and a correlation between calculated pressure and crater shape was found. Cleanness of the sample and source turned out to be essential for a fast stabilization time and reduction of the influence of light elements and molecules. Thereby, a 10 nm layer at the top surface of a sample could be quantified. Apart from the influence of density, the reflectivity of the sample surface is discussed. It is shown that a high sample reflectivity can cause up to 100% more light to be measured by the spectrometer. KW - GDOES KW - GDMS KW - Thin-layer analysis PY - 2003 DO - https://doi.org/10.1002/sia.1575 SN - 0142-2421 SN - 1096-9918 VL - 35 IS - 7 SP - 575 EP - 582 PB - Wiley CY - Chichester AN - OPUS4-2624 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -