TY - JOUR A1 - Girard-Lauriault, P.-L. A1 - Desjardins, P. A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Wertheimer, M. R. T1 - Chemical characterisation of nitrogen-rich plasma-polymer films deposited in dielectric barrier discharges at atmospheric pressure N2 - We have used an atmospheric pressure DBD apparatus to deposit novel families of N-rich plasma polymers (PP:N), using mixtures of three different hydrocarbon precursors in nitrogen at varying respective gas flow ratios. This research focuses on the overall chemical characterisation of those materials, with specific attention to (semi)-quantitative analysis of functional groups. Well-established and some lesser-known analytical techniques have been combined to provide the best possible chemical and structural characterisations of these three families of PP:N thin films, namely XPS, NEXAFS and FT-IR spectroscopy. KW - NEXAFS KW - XPS KW - DBD-plasma KW - Plasma polymerization PY - 2008 DO - https://doi.org/10.1002/ppap.200800054 SN - 1612-8850 SN - 1612-8869 VL - 5 IS - 7 SP - 631 EP - 644 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-17820 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -