TY - JOUR A1 - Omar, Hassan A1 - Ahamadi, Shayan A1 - Hülagü, Deniz A1 - Hidde, Gundula A1 - Hertwig, Andreas A1 - Szymoniak, Paulina A1 - Schönhals, Andreas T1 - Investigations of the adsorbed layer of polysulfone: Influence of the thickness of the adsorbed layer on the glass transition of thin films N2 - This work studies the influence of the adsorbed layer on the glass transition of thin films of polysulfone. Therefore, the growth kinetics of the irreversibly adsorbed layer of polysulfone on silicon substrates was first investigated using the solvent leaching approach, and the thickness of the remaining layer was measured with atomic force microscopy. Annealing conditions before leaching were varied in temperature and time (0–336 h). The growth kinetics showed three distinct regions: a pre-growth step where it was assumed that phenyl rings align parallel to the substrate at the shortest annealing times, a linear growth region, and a crossover from linear to logarithmic growth observed at higher temperatures for the longest annealing times. No signs of desorption were observed, pointing to the formation of a strongly adsorbed layer. Second, the glass transition of thin polysulfone films was studied in dependence on the film thickness using spectroscopic ellipsometry. Three annealing conditions were compared: two with only a tightly bound layer formed in the linear growth regime and one with both tightly bound and loosely adsorbed layers formed in the logarithmic growth regime. The onset thickness and increase in the glass transition temperature increases with annealing time and temperature. These differences were attributed to the distinct conformations of the formed adsorbed layers. KW - Glass transition KW - Adsorbed Layer PY - 2024 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-607701 DO - https://doi.org/10.1063/5.0223415 SN - 0021-9606 VL - 161 IS - 5 SP - 1 EP - 12 PB - AIP Publishing AN - OPUS4-60770 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gawek, Marcel A1 - Szymoniak, Paulina A1 - Hülagü, Deniz A1 - Hertwig, Andreas A1 - Schönhals, Andreas T1 - Molecular Mobility of Thin Films and the Adsorbed Layer of Poly(2-vinylpyridine) N2 - The molecular dynamics of thin films and the adsorbed layer of poly(2-vinylpyridine) (P2VP) were investigated using broadband dielectric spectroscopy (BDS) and spectroscopic ellipsometry. Thin films of P2VP were prepared on silicon substrates and characterized to understand the influence of film thickness on the thermal glass transition temperature (Tg) and molecular mobility. The ellipsometric study revealed a decrease in Tg with decreasing film thickness, attributed to the enhanced mobility at the polymer/air interface. The adsorbed layer, prepared via the solvent leaching approach, exhibited a higher Tg compared to the bulk, indicating reduced molecular mobility due to strong polymer substrate interactions. The dielectric measurements were carried out in two different electrode configurations, crossed electrode capacitors (CEC) and nanostructured electrodes (NSE), where the latter allows for a free surface layer at the polymer/air interface. The relaxation rates of the α-relaxation measured in the CEC geometry collapse into one chart independent from the film thickness. For the thin films measured in the NSE arrangement the relaxation rates slow down with decreasing film thickness which was discussed as related to a stronger interaction of the P2VP segments with the native SiO2 at the surface of the silicon substrate compared to aluminum. It is worth to note that the effect of the enhanced mobility at the polymer/air interface is not observed in the dielectric measurements. BDS measurements in NSE geometry identified an additional relaxation process (α*-relaxation) in thin films, which was more pronounced in the adsorbed layer. This process is hypothesized to be related to molecular fluctuations within the adsorbed layer including the adsorption/desorption dynamics of segments or to a Slow Arrhenius Process (SAP) related to the equilibration dynamics deep in the glassy state. KW - Thin polymer films PY - 2025 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-637181 DO - https://doi.org/10.1039/d5sm00539f SN - 1744-6848 SP - 1 EP - 12 PB - Royal Society of Chemistry (RSC) AN - OPUS4-63718 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hülagü, Deniz A1 - Ermilova, Elena A1 - Weise, Matthias A1 - de Préville, Sophie A1 - Hoffmann, Johannes A1 - Morán‐Meza, José A1 - Piquemal, François A1 - Hertwig, Andreas T1 - Multimethod Electrical Characterization of Thin Indium Tin Oxide Films: Structuring and Calibration Sample Development for Scanning Probe Microscopy N2 - Indium tin oxide (ITO), a transparent conductive oxide, is widely used in optoelectronic applications due to its electrical conductivity, optical transparency, and chemical stability. This study employs spectroscopic ellipsometry (SE) to analyze ITO layers, enabling nondestructive determination of film thickness, dielectric functions, and bulk conductivity. Electrical properties derived from SE are compared with those obtained using the four‐point probe method (4PM) to improve metrological tools for nanotechnology applications and optimize deposition process monitoring for better control of film properties. This work also investigates the chemical stability of ITO layers under etching conditions and explores the development of new sheet resistance standards for scanning microwave microscopy (SMM). The results show that ITO resistivity, calculated from fitted SE data, increases with oxygen flow rate up to 5 cm3(STP) min−1. Good agreement is observed between sheet resistance values obtained by SE and 4PM up to 3 cm3(STP) min−1. Additionally, the sheet resistance values of a distinct set of microstructured ITO samples with different ITO layer thicknesses are determined by SMM, which are highly consistent with those obtained by the 4PM. KW - Ellipsometry KW - Indium tin oxide (ITO) KW - Scanning microwave microscopy (SMM) KW - Sheet resistance calibration standards KW - ITO wet etching PY - 2025 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-626242 DO - https://doi.org/10.1002/pssa.202400871 SN - 1862-6300 VL - 222 IS - 14 SP - 1 EP - 18 PB - Wiley CY - Hoboken, New Jersey, USA AN - OPUS4-62624 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Rastgou, Masoud A1 - Hülagü, Deniz A1 - Danilenko, Aleksandr A1 - Manoocheri, Farshid A1 - Hertwig, Andreas A1 - Ikonen, Erkki T1 - Comparison of thin-film thickness measurements using ellipsometry and reflectometry with uniform samples N2 - This study evaluates spectroscopic ellipsometry and reflectometry using high-quality SiO2 and Al2O3 thin-films on Si substrates, thereby facilitating a detailed assessment of consistency of measurement results and uncertainty analyses. The results with detailed uncertainty budgets indicate good agreement between the two methods across a broad layer thickness range from 10 nm to 2000 nm, with deviations remaining well within the measurement uncertainties. Ellipsometry results have lower uncertainty than reflectometry results especially with the thinner layers, whereas reflectometry uncertainties are lower with the thickest layers studied. This work underscores the importance of rigorous thickness characterization and reliable uncertainty evaluation as critical factors in advancing both modeling and measurement practices in thin-film metrology. KW - Ellipsometry KW - Reflectometry KW - Thin Film Metrology KW - Measurement Accuracy PY - 2026 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-655209 DO - https://doi.org/10.1088/1681-7575/ae3964 SN - 0026-1394 VL - 63 IS - 1 SP - 1 EP - 14 PB - IOP Publishing CY - Bristol, UK AN - OPUS4-65520 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gojani, Ardian A1 - Tobias, Charlie A1 - Hülagü, Deniz A1 - Rurack, Knut A1 - Hodoroaba, Vasile-Dan T1 - Toward determination of the surface roughness of particles from a SEM image N2 - In this communication, we address the issue of roughness measurement by investigating if the grayscale values from SEM images can be used for surface roughness determination of spherical particles. KW - MamaLoCA KW - Core-shell particles KW - Electron microscopy KW - Image processing KW - Particle characterisation KW - Roughness PY - 2021 DO - https://doi.org/10.1017/S1431927621011375 SN - 1431-9276 SN - 1435-8115 VL - 27 IS - Suplement S1 SP - 3302 EP - 3305 PB - Cambridge University Press CY - New York, NY AN - OPUS4-53283 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hülagü, Deniz A1 - Tobias, Charlie A1 - Dao, Radek A1 - Komarov, Pavel A1 - Rurack, Knut A1 - Hodoroaba, Vasile-Dan T1 - Towards 3D determination of the surface roughness of core–shell microparticles as a routine quality control procedure by scanning electron microscopy N2 - AbstractRecently, we have developed an algorithm to quantitatively evaluate the roughness of spherical microparticles using scanning electron microscopy (SEM) images. The algorithm calculates the root-mean-squared profile roughness (RMS-RQ) of a single particle by analyzing the particle’s boundary. The information extracted from a single SEM image yields however only two-dimensional (2D) profile roughness data from the horizontal plane of a particle. The present study offers a practical procedure and the necessary software tools to gain quasi three-dimensional (3D) information from 2D particle contours recorded at different particle inclinations by tilting the sample (stage). This new approach was tested on a set of polystyrene core-iron oxide shell-silica shell particles as few micrometer-sized beads with different (tailored) surface roughness, providing the proof of principle that validates the applicability of the proposed method. SEM images of these particles were analyzed by the latest version of the developed algorithm, which allows to determine the analysis of particles in terms of roughness both within a batch and across the batches as a routine quality control procedure. A separate set of particles has been analyzed by atomic force microscopy (AFM) as a powerful complementary surface analysis technique integrated into SEM, and the roughness results have been compared. KW - Core–shell particles KW - Image analysis KW - Roughness KW - Scanning electron microscopy KW - Atomic force microscopy KW - Tilting KW - Batch analysis PY - 2024 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-607590 DO - https://doi.org/10.1038/s41598-024-68797-7 SN - 2045-2322 VL - 14 IS - 1 SP - 1 EP - 13 PB - Springer Science and Business Media LLC AN - OPUS4-60759 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Riedel, Soraya A1 - Hülagü, Deniz A1 - Bennet, Francesca A1 - Carl, Peter A1 - Flemig, Sabine A1 - Schmid, Thomas A1 - Schenk, J. A. A1 - Hodoroaba, Vasile-Dan A1 - Schneider, Rudolf T1 - Electrochemical Immunomagnetic Ochratoxin A Sensing: Steps Forward in the Application of 3,3’,5,5’- Tetramethylbenzidine in Amperometric Assays N2 - Electrochemical methods offer great promise in meeting the demand for user-friendly on-site devices for Monitoring important parameters. The food industry often runs own lab procedures, for example, for mycotoxin analysis, but it is a major goal to simplify analysis, linking analytical methods with smart technologies. Enzyme-linked immunosorbent assays, with photometric detection of 3,3’,5,5’-tetramethylbenzidine (TMB),form a good basis for sensitive detection. To provide a straightforward approach for the miniaturization of the detectionstep, we have studied the pitfalls of the electrochemical TMB detection. By cyclic voltammetry it was found that the TMB electrochemistry is strongly dependent on the pH and the electrode material. A stable electrode response to TMB could be achieved at pH 1 on gold electrodes. We created a smartphonebased, electrochemical, immunomagnetic assay for the detection of ochratoxin A in real samples, providing a solid basis forsensing of further analytes. KW - Ochratoxin A KW - Amperometry KW - Cyclic voltammetry KW - Electrochemistry KW - Immunoassay PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-530421 DO - https://doi.org/10.1002/celc.202100446 N1 - Geburtsname von Riedel, Soraya: Höfs, S. - Birth name of Riedel, Soraya: Höfs, S. VL - 8 IS - 13 SP - 2597 EP - 2606 AN - OPUS4-53042 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hülagü, Deniz A1 - Tobias, Charlie A1 - Climent Terol, Estela A1 - Gojani, Ardian A1 - Rurack, Knut A1 - Hodoroaba, Vasile-Dan T1 - Generalized Analysis Approach of the Profile Roughness by Electron Microscopy with the Example of Hierarchically Grown Polystyrene–Iron Oxide–Silica Core–Shell–Shell Particles N2 - The roughness as a property of core–shell (CS) microparticles plays a key role in their functionality. Quantitative evaluation of the roughness of CS microparticles is, however, a challenging task with approaches using electron microscopy images being scarce and showing pronounced differences in terms of methodology and results. This work presents a generalized method for the reliable roughness determination of nonplanar specimens such as CS particles from electron microscopic images, the method being robust and reproducible with a high accuracy. It involves a self-written software package (Python) that analyzes the recorded images, extracts corresponding data, and calculates the roughness based on the deviation of the identified contour. Images of single particles are taken by a dual mode scanning electron microscopy (SEM) setup which permits imaging of the same field-of-view of the sample with high resolution and surface sensitive in SE InLens mode as well as in transmission mode (TSEM). Herein, a new type of polystyrene core–iron oxide shell–silica shell particles is developed to serve as a set of lower micrometer-sized study objects with different surface roughness; the analysis of their images by the semiautomatic workflow is demonstrating that the particles’ profile roughness can be quantitatively obtained. KW - Core–shell particles KW - Image analysis KW - Nanoparticles KW - Roughness KW - SEM KW - transmission mode PY - 2022 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-542576 DO - https://doi.org/10.1002/adem.202101344 SP - 1 EP - 9 PB - Wiley-VCH AN - OPUS4-54257 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hülagü, Deniz A1 - Tobias, Charlie A1 - Gojani, Ardian B. A1 - Rurack, Knut A1 - Hodoroaba, Vasile-Dan T1 - From 2D and Single Particle to 3D and Batch Analysis as a Routine Quality Check Procedure for the Morphological Characterization of Core-Shell Microparticles N2 - CS particles show unique properties by merging individual characteristics of the core and the shell materials. An alteration particularly in their surface roughness affects the final performance of the particles in the targeted application. Quantitative evaluation of the roughness of CS microparticles is, however, a challenging task employing microscopic techniques being scarce and showing large differences in terms of methodology and results. In our previous work, we have reported a systematic study with a reliable analysis tool, which evaluates profile roughness quantitatively, for individual core-shell microparticles using electron microscopy (EM) images of both types, Scanning Electron Microscopy (SEM) and transmission mode SEM (or TSEM). The SEM images contain two-dimensional (2D) information, therefore, provide profile roughness data only from the projection in the horizontal plane (in other words, from the “belly”) of a spherical particle. The present study offers a practical procedure to give access to more information by tilting the sample holder and hence allowing images of a single particle to be recorded at different orientations under the same view angle. From the analysis of these images, extended information on surface roughness of the particle can be extracted. Thus, instead of obtaining 2D information from a single SEM image, three-dimensional (3D) information is obtained from 2D projections recorded at different particle orientations. T2 - Microscopy and Microanalysis 2022 CY - Oregon, Portland, USA DA - 31.07.2022 KW - Core-shell particles KW - Image processing KW - Roughness KW - Scanning electron microscopy KW - Tilting PY - 2022 DO - https://doi.org/10.1017/S1431927622002094 SN - 1431-9276 VL - 28 IS - S1 SP - 332 EP - 334 PB - Cambridge University Press AN - OPUS4-55373 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hülagü, Deniz A1 - Tobias, Charlie A1 - Gojani, Ardian A1 - Rurack, Knut A1 - Hodoroaba, Vasile-Dan T1 - Analysis of the profile roughness of core-shell microparticles by electron microscopy N2 - A particle roughness analysis tool, based on electron microscopy images (SEM and TEM). The influence of various parameters on the calculated roughness was also investigated: the setting of the proper threshold, accelerating voltage, etc. The samples were gradually tilted to extend imaging information of more than only one projection. Furthermore, the measurement uncertainty of the profile roughness of particles associated to various orientations was estimated. KW - Core-shell particles KW - Electron microscopy KW - Image processing KW - MamaLoCa KW - Particle Characterization KW - Roughness PY - 2021 DO - https://doi.org/10.1017/S1431927621007285 VL - 27 IS - Suppl. 1 SP - 2002 EP - 2004 PB - Cambridge University Press AN - OPUS4-53123 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Frechilla, A. A1 - Martínez, E. A1 - del Moral, J. A1 - López-Santos, C. A1 - Frechilla, J. A1 - Nuñez-Gálvez, F. A1 - López-Flores, V. A1 - de la Fuente, G.F. A1 - Hülagü, Deniz A1 - Bonse, Jörn A1 - González-Elipe, A.R. A1 - Borrás, A. A1 - Angurel, L.A. T1 - Influence of near-edge Laser-Induced Periodic Surface Structures (LIPSS) on the electrical properties of fs-laser-machined ITO microcircuits N2 - Scalable, cost-effective methods for processing transparent electrodes at the microscale are pivotal to advancing in electrochemistry, optoelectronics, microfluidics, and energy harvesting. In these fields, the precise fabrication of micrometric circuits and patterns plays a critical role in determining device performance, material compatibility, and integration with added-value substrates. In this context, Laser Subtractive Manufacturing stands out as a suitable microfabrication technique for its adaptability to diverse materials and complex configurations, as well as its straightforward scalability, affordability, and eco-friendly nature. However, a challenge in micromachining metals and metal oxides is the inherent formation of Laser-Induced Periodic Surface Structures (LIPSS), which can significantly impair electrical conductivity, particularly when circuit dimensions fall within the micrometer range. Herein, we investigate the micromachining of electrical microcircuits using ultrashort pulse laser systems applied to transparent indium tin oxide (ITO) thin films. We analyze the formation of LIPSS at the edges of the micromachined regions associated with the Gaussian distribution of the energy within the laser spot, and the impact of these structures on the electrical properties of the circuits. Thus, we systematically evaluate the influence of LIPSS orientation and periodicity by fabricating various circuit patterns using femtosecond lasers at green (515 nm) and ultraviolet (UV) (343 nm) wavelengths. A correlation between electrical resistivity measurements and microstructure analysis, as determined by field emission scanning electron and transmission electron microscopy, reveals distinct effects of the formed nanostructures depending on the laser source and its polarization. For the green wavelength, the edge side regions where LIPSS are oriented perpendicular to the ITO track exhibit a resistance higher by a factor just above two compared to those where LIPSS are parallel. Additionally, UV laser processing results in a pronounced reduction of ITO thickness at the boundary between the LIPSS region and the substrate. The mechanisms for the formation of LIPSS with both wavelengths are also discussed. Furthermore, we have determined that in narrow conductive tracks with a width ranging from 6 to 8 µm, the impact of LIPSS is particularly significant because the LIPSS structured region occupies a dominant fraction of the total width. KW - ITO KW - Laser-induced periodic surface structures (LIPSS) KW - Laser subtractive manufacturing KW - fs-laser processing KW - Electrical properties PY - 2026 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-655921 DO - https://doi.org/10.1016/j.apsusc.2026.166415 SN - 0169-4332 VL - 731 SP - 1 EP - 13 PB - Elsevier B.V. AN - OPUS4-65592 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -