TY - CONF A1 - Fischer, Daniel T1 - Doped Tin Oxide layers as sensitising layers in optical gas sensors: A study of optical properties using spectral ellipsometry T2 - European Material Research Society (E-MRS) - Spring Meeting 2014 CY - Lille, France DA - 2014-05-26 PY - 2014 AN - OPUS4-30109 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Fischer, Daniel T1 - Ellipsometric characterization of doped SnOx layers for novel SPR-based gas sensors T2 - DPG Frühjahrstagung CY - Regensburg, Germany DA - 2016-03-06 PY - 2016 AN - OPUS4-35274 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Fischer, Daniel T1 - Ellipsometric characterization of metal doped SnOx thin films for SPREE-based gas sensors T2 - EMRS Spring Meeting CY - Lille, France DA - 2016-05-02 PY - 2016 AN - OPUS4-35275 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Fischer, Daniel T1 - Ellipsometric characterization of doped SnOx layer for gas sensors based on SPREE (surface plasmon resonance enhanced ellipsometry). T2 - International conference on spectroscopic ellipsometry (ICSE 7) CY - Berlin, Germany DA - 2016-06-06 PY - 2016 AN - OPUS4-35276 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Kormunda, M. A1 - Fischer, Daniel A1 - Hertwig, Andreas A1 - Beck, Uwe A1 - Sebik, M. A1 - Pavlik, J. A1 - Esser, N. T1 - Deposition and characterization of single magnetron deposited Fe:SnOx coatings N2 - Coatings deposited by magnetron co-sputtering from a single RF magnetron with a ceramic SnO2 target with iron inset in argon plasma were studied. The mass spectra of the process identified Sn+ and SnO+ species as the dominant species sputtered from the target, but no SnO2+ species were detected. The dominant positive ions in argon plasma are Ar+ species. The only detected negative ions were O-. Sputtered neutral tin related species were not detected. Iron related species were also not detected because their concentration is below the detection limit. The concentration of iron dopant in the tin oxide coatings was controlled by the RF bias applied on the substrate holder while the discharge pressure also has some influence. The iron concentration was in the range from 0.9 at.% up to 19 at.% increasing with the substrate bias while the sheet resistivity decreases. The stoichiometry ratio of O/(Sn + Fe) in the coatings increased from 1.7 up to 2 in dependence on the substrate bias from floating bias (- 5 V) up to - 120 V of RF self-bias, respectively. The tin in the coatings was mainly bonded in Sn4 + state and iron was mainly in Fe2 + state when other tin bonding states were detected only in a small amounts. Iron bonding states in contrary to elemental compositions of the coatings were not influenced by the RF bias applied on the substrate. The coatings showed high transparency in the visible spectral range. However, an increased metallic behavior could be detected by using a higher RF bias for the deposition. The X-ray diffraction patterns and electron microscopy pictures made on the coatings confirmed the presence of an amorphous phase. KW - Metal oxides KW - Transparent conductive oxides (TCO) KW - Magnetron KW - Optical properties KW - Ellipsometry KW - XPS characterzation PY - 2015 DO - https://doi.org/10.1016/j.tsf.2015.11.009 SN - 0040-6090 VL - 595 IS - Part A SP - 200 EP - 208 PB - Elsevier B.V. CY - Amsterdam AN - OPUS4-35281 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Beck, Uwe A1 - Fischer, Daniel T1 - MISTRAL-Müller-Matrix-basierte Identifizierung von Inhomogenitäten und strukturellen Anomalien N2 - Mit abbildender Ellipsometrie (imaging ellipsometry: IE) können Nanometer-Beschichtungen/ Degradationen visualisiert und bezüglich Brechungsindex n, Extinktionskoeffizient k und Schichtdicke d charakterisiert werden. Materialseitig werden lokal Homogenität und Isotropie innerhalb eines/mehrerer Bildpunkte (field of analysis: FOA) und messtechnisch global die Ebenheit der Proben bezüglich aller Bildpunkte des Messfeldes vorausgesetzt. Für die Müller-Matrix-basierte abbildende Ellipsometrie (MM-IE), die den optischen Response anisotroper Materialien in jedem Bildpunkt über die bis zu 16 Müller-Matrix-Elemente erfasst, ist dies von besonderer Relevanz. Reale Substrate sind aber oft nicht eben, können lokal Noppen/Mulden (im FOA) aufweisen oder sind global konvex/ konkav im möglichen Messfeld (field of view: FOV) gekrümmt. Diese lokalen/globalen strukturellen Anomalien des Substrats werden schon für die IE messtechnisch/modellseitig oft nicht beherrscht und sind für die MM-IE in der Wirkung auf die MM-Elemente unbekannt. Diese Defizite sollen messtechnisch bzw. modellmäßig behoben und somit die Messung lokal/global gekrümmter Oberflächen ermöglicht werden (MM-CSIE, CS curved surface). KW - Abbildende Ellipsometrie (IE) KW - Müller-Matrix Ellipsometrie (MM-IE) KW - Gekrümmte Oberflächen KW - Schichtdicke KW - Optische Konstanten PY - 2020 SP - 1 EP - 7 AN - OPUS4-51574 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Florian, Camilo A1 - Fischer, Daniel A1 - Freiberg, K. A1 - Duwe, M. A1 - Sahre, Mario A1 - Schneider, S. A1 - Hertwig, Andreas A1 - Krüger, Jörg A1 - Rettenmayr, M. A1 - Beck, Uwe A1 - Undisz, A. A1 - Bonse, Jörn T1 - Single Femtosecond Laser-Pulse-Induced Superficial Amorphization and Re-Crystallization of Silicon N2 - Superficial amorphization and re-crystallization of silicon in <111> and <100> orientation after irradiation by femtosecond laser pulses (790 nm, 30 fs) are studied using optical imaging and transmission electron microscopy. Spectroscopic imaging ellipsometry (SIE) allows fast data acquisition at multiple wavelengths and provides experimental data for calculating nanometric amorphous layer thickness profiles with micrometric lateral resolution based on a thin-film layer model. For a radially Gaussian laser beam and at moderate peak fluences above the melting and below the ablation thresholds, laterally parabolic amorphous layer profiles with maximum thicknesses of several tens of nanometers were quantitatively attained. The accuracy of the calculations is verified experimentally by high-resolution transmission electron microscopy (HRTEM) and energy dispersive X-ray spectroscopy (STEM-EDX). Along with topographic information obtained by atomic force microscopy (AFM), a comprehensive picture of the superficial re-solidification of silicon after local melting by femtosecond laser pulses is drawn. KW - Femtosecond laser KW - Silicon KW - Amorphization KW - Crystallization KW - Spectroscopic imaging ellipsometry PY - 2021 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-523687 UR - https://www.mdpi.com/1996-1944/14/7/1651 DO - https://doi.org/10.3390/ma14071651 SN - 1996-1944 VL - 14 IS - 7 SP - 1651-1 EP - 1651-21 PB - MDPI AG CY - Basel, Switzerland AN - OPUS4-52368 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Beck, Uwe A1 - Baier, Jennifa A1 - Fischer, Daniel A1 - Griepentrog, Michael A1 - Hertwig, Andreas A1 - Hielscher-Hofinger, Stefan A1 - Stockmann, Jörg Manfred A1 - Weise, Matthias T1 - Mapping und Imaging modifizierter Oberflächen: Generische Kenngrößen, Fehlstellen, Reinigungszustand und Haftfestigkeit N2 - Der Vortrag widmet sich dem Mapping und Imaging modifizierter Oberflächen: generische Kenngrößen, Fehlstellen, Reinigungszustand und Haftfestigkeit. Es werden Untersuchungsmethoden zu ihrer Prüfung dargestellt. T2 - 37. ak-adp 2021 CY - Jena, Germany DA - 16.06.2021 KW - Qualitätssicherung KW - Mapping modifizierter Oberflächen KW - Imaging modifizierter Oberflächen KW - Generische Kenngrößen KW - Haftfestigkeit KW - Klebfestigkeit PY - 2021 SP - 1 EP - 10 AN - OPUS4-52893 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Ernst, O. C. A1 - Böttcher, K. A1 - Fischer, Daniel A1 - Uebel, D. A1 - Teubner, T. A1 - Boeck, T. T1 - Morphogenesis of liquid indium microdroplets on solid molybdenum surfaces during solidification at normal pressure and under vacuum conditions N2 - Electrical and optical applications based on micro- and nanoparticles have specific demands on their interfacial properties. These properties are strongly related to atmospheric conditions to which the particles were exposed during their formation. In this study, metallic In microparticles are synthesized by solidification of In droplets on an amorphous Mo substrate at normal pressure and under vacuum conditions. The influence of ambient pressure on the interface and surface shape is investigated. While solidification at atmospheric pressure leads to collapsed particles with undisturbed contact to the substrate, low pressures result in smooth spherical particles but with cavities inside. Numerical simulations with COMSOL Multiphysics reveal different temperature profiles and heat flux in particles during solidification for both cases. This indicates different starting conditions of the solidification, which leads to the described phenomenon eventually. The investigation of the varying process conditions on the particle shape in combination with the calculated and measured temperature curves over time gives valuable insights into new approaches to synthesize micro- and nanoparticles with defined interfacial properties. Both ambient pressure and cooling rate provide well-controllable and reliable parameters for the realization of different interfacial shapes. KW - Morphogenesis KW - Indium KW - Microdroplet KW - Molybdenum PY - 2022 DO - https://doi.org/10.1021/acs.langmuir.1c02744 SN - 0743-7463 SN - 1520-5827 VL - 38 IS - 2 SP - 762 EP - 768 PB - ACS Publ. CY - Washington, DC AN - OPUS4-54242 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Kormunda, M. A1 - Fischer, Daniel A1 - Hertwig, Andreas A1 - Beck, Uwe A1 - Sebik, M. A1 - Esser, N. T1 - Preparation of pulsed DC magnetron deposited Fe-doped SnO2 coatings N2 - Iron-doped SnO2 coatings were deposited in a 50 kHz DC-pulsed magnetron sputtering discharge. The pulses had a duration of 4 µs in selected gas mixtures from pure argon up to 60% of oxygen at a constant total pressure of 0.2 Pa. A single target of SnO2 with Fe inset was used. The mass spectrometry study detected the gas-related ions Ar+, O2+ and O+, where the last one becomes the dominant positive ion at higher oxygen contents. Atomic oxygen ions had a higher energy as it resulted from the collision-caused dissociation on the target surface. The tin-related species were detected as Sn+ and SnO+. SnO2+ species were not detected. The deposition rate decreased by using gas mixtures with oxygen as well as the corresponding amount of Sn-related species in the plasma. The increase of oxygen also increased significantly the sheet resistance of the films. The XPS study showed that the iron concentration decreased by using additional oxygen. But the O/Sn ratio in the coatings was constant, contrary to the increased FeO/Fe ratio in the films. An additional analysis of the coatings by spectroscopic ellipsometry has shown a dependence of the polarizability and the permittivity on the amount of oxygen used during the deposition. In contrast, the study has found no such dependence for the absorption of the layers. KW - Coatings KW - Magnetron sputtering KW - Optical properties KW - Sheet resistivity KW - SnO2 PY - 2016 UR - http://onlinelibrary.wiley.com/doi/10.1002/pssa.201532882/full DO - https://doi.org/10.1002/pssa.201532882 SN - 0031-8965 SN - 1862-6300 VL - 213 IS - 9 SP - 2303 EP - 2309 PB - WILEY-VCH Verlag GmbH & Co. KGaA CY - Weinheim AN - OPUS4-38106 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Fischer, Daniel A1 - Hertwig, Andreas A1 - Beck, Uwe A1 - Negendank, Detlef A1 - Lohse, Volkmar A1 - Kormunda, M. A1 - Esser, N. T1 - Dependence of the optical constants and the performance in the SPREE gas measurement on the thickness of doped tin oxide over coatings N2 - In this study, thickness related changes of the optical properties of doped tin oxide were studied. Two different sets of samples were prepared. The first set was doped with iron or nickel on silicon substrate with thicknesses of 29–56 nm, the second was iron doped on gold/glass substrate with 1.6–6.3 nm. The optical constants were determined by using spectral ellipsometry (SE) followed by modelling of the dielectric function with an oscillator model using Gaussian peaks. The analysis of the optical constants shows a dependence of the refraction and the absorption on the thickness of the doped tin oxide coating. In addition to the tin oxide absorption in the UV, one additional absorption peak was found in the near-IR/red which is related to plasmonic effects due to the doping. This peak shifts from the near-IR to the red part of the visible spectrum and becomes stronger by reducing the thickness, probably due to the formation of metal nanoparticles in this layer. These results were found for two different sets of samples by using the same optical model. Afterwards the second sample set was tested in the Surface Plasmon Resonance Enhanced Ellipsometric (SPREE) gas measurement with CO gas. It was found that the thickness has significant influence on the sensitivity and thus the adsorption of the CO gas. By increasing the thickness from 1.6 nm to 5.1 nm, the sensing ability is enhanced due to a higher coverage of the surface with the over coating. This is explained by the high affinity of CO molecules to the incorporated Fe-nanoparticles in the tin oxide coating. By increasing the thickness further to 6.3 nm, the sensing ability drops because the layer disturbs the SPR sensing effect too much. T2 - 7th International Conference on Spectroscopic Ellipsometry (ICSE-7) DA - 06.06.2016 KW - Surface plasmon resonance KW - Spectroscopic ellipsometry KW - Doped tin oxide KW - Gas sensing KW - Plasmonic absorption PY - 2017 DO - https://doi.org/10.1016/j.apsusc.2016.11.188 SN - 0169-4332 VL - 421, Teil B SP - 480 EP - 486 PB - Elsevier B.V. AN - OPUS4-42692 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -