TY - CONF A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Koprinarov, Ivaylo A1 - Friedrich, Jörg Florian A1 - Wöll, Ch. T1 - K-Edge Soft X-ray Absorption (NEXAFS) Spectroscopy In Surface Chemical Analysis of Polymers T2 - International Discussion Meeting Advanced Methods of Polymer Characterization: New Developments and Applications in Industry CY - Mainz, Germany DA - 1999-03-15 PY - 1999 SP - P3.53 CY - Mainz AN - OPUS4-6925 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Retzko, Iris A1 - Treu, Dieter A1 - Matsubayashi, N. A1 - Imamura, M. A1 - Tanaka, T. A1 - Schulz, H. A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Analysis of carbon materials and plasma polymers by X-ray photoelectron spectroscopy and X-ray absorption spectroscopy (XPS, XAS) T2 - AIST-BAM Symposium on Materials Surface Technology in Twin Institute Programme CY - Tsukuba, Japan DA - 2003-02-18 PY - 2003 SP - 59 EP - 65 AN - OPUS4-6928 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Güttler, B. A1 - Schiel, D. A1 - Danzebrink, H. A1 - Unger, Wolfgang A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Müller, J.-P. T1 - Physical and Chemical Characterization of Thermal and Native Siliconoxide layers on Silicon T2 - Symposium "Reference Materials for Technologies in the New Millenium" CY - Berlin, BAM, Germany DA - 2000-05-22 PY - 2000 SP - 1(?) EP - 7(?) AN - OPUS4-6924 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Koprinarov, Ivaylo A1 - Weiss, K. A1 - Wöll, Ch. ED - Mittal, K. T1 - The Application of Near Edge X-ray Absorption Fine Structures (NEXAFS) Spectroscopy and X-ray Photoelectron Spectroscopy (XPS) in Surface Analysis of Chromium-evaporated Polymers and Organic Films PY - 1998 SN - 90-6764-290-8 SP - 147 EP - 168 PB - VSP CY - Utrecht AN - OPUS4-6986 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Koprinarov, Ivaylo A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang A1 - Wöll, Ch. T1 - Oxygen plama induced degradation of the surface of poly(styrene), poly(bisphenol-A-carbonate) and poly(ethylene terephthalate) as observed by soft X-ray absorption spectroscopy (NEXAFS) KW - Oxygen DC plasma treatment KW - Plasma degradation KW - X-ray absorption spectroscopy (NEXAFS) PY - 1998 SN - 0032-3861 SN - 1873-2291 VL - 39 IS - 14 SP - 3001 EP - 3009 PB - Springer CY - Berlin AN - OPUS4-6990 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Friedrich, Jörg Florian A1 - Koprinarov, Ivaylo A1 - Giebler, Rainer A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Reactions and Intermediates at the Metal-Polymer Interface - Detected by XPS and NEXAFS Spectroscopy T2 - 4th European Conference on Adhesion (EURADH '98) ; 1st World Congress on Adhesion and Related Phenomena (WCARP) CY - Garmisch-Partenkirchen, Germany DA - 1998-09-06 PY - 1998 SN - 0021-8464 VL - 75 IS - 1 SP - 1.60 EP - 1.62 PB - Gordon & Breach CY - New York, NY AN - OPUS4-6991 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Koprinarov, Ivaylo A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang A1 - Wöll, Ch. T1 - Surface analysis of DC oxygen plasma treated or chromium evaporated poly(ethylene terephthalate) foils by soft X-ray absorption spectroscopy (NEXAFS) KW - Biaxially streched poly(ehtylene terephthalate) KW - Oxygen DC plasma treatment KW - Metallization with chromium PY - 1997 SN - 0032-3861 SN - 1873-2291 VL - 38 IS - 8 SP - 2005 EP - 2010 PB - Springer CY - Berlin AN - OPUS4-6998 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Friedrich, Jörg Florian A1 - Wigant, L. A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Wittrich, H. T1 - Corona, spark and combined UV and ozone modification of polymer films WeBP23 N2 - Different types of plasma, irradiative and chemical activation were compared in terms of surface functionalization. Corona and spark jet plasmas are characterized by low gas temperatures and high rates in surface modification. UV irradiation in the presence of ozone does not involve any particle bombardment and acts only by enhanced photooxidative processes. Although ion implantation can be avoided, this method is not free of radiative damage in both the surface-near region and the bulk of polymers. Furthermore, its functionalization rate is low. In relation to low-pressure O2 plasma modification, all treatments mentioned here have a low efficiency in adhesion promotion due to oxidative degradation of macromolecules and formation of molecular debris known as the ''weak boundary layer''. PY - 1998 DO - https://doi.org/10.1016/S0257-8972(97)00318-6 SN - 0257-8972 VL - 98 IS - 1 SP - 879 EP - 885 PB - Elsevier Science CY - Lausanne AN - OPUS4-7000 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Friedrich, Jörg Florian A1 - Wigant, L. A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Erdmann, J. A1 - Gorsler, H.-V. T1 - Oberflächenvorbehandlung von Polypropylen in elektrischen Entladungen PY - 1995 SN - 0590-8450 VL - 1 SP - 123 EP - 127 PB - Verl. Coating Thomas CY - St. Gallen AN - OPUS4-7005 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Friedrich, Jörg Florian A1 - Wigant, L. A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Wittrich, H. A1 - Prescher, D. ED - Mittal, K. L. T1 - Barrier properties of plasma-modified polypropylene and polyethyleneterephthalate T2 - International Symposium on Polymer Surface Modification: Relevance to Adhesion CY - Las Vegas, NV, USA DA - 1993-11-03 KW - Plasma fluorination of polymers KW - Deposition of fluorine-containing plasma polymers KW - Barrier formation against solvent permeation KW - Permeation mechanism of solvent mixtures PY - 1996 SN - 90-6764-201-0 VL - 1 SP - 121 EP - 136 PB - VSP CY - Utrecht AN - OPUS4-7006 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Gross, Thomas A1 - Rohrer, P. A1 - Saur, W. A1 - Erdmann, J. A1 - Gorsler, H.-V. ED - Mittal, K. L. T1 - The improvement in adhesion of polyurethane-polypropylene composites by short-time exposure of polypropylene to low and atmospheric pressure plasmas KW - Polyurethane-polypropylene adhesion KW - Low pressure plasma pretreatment KW - Atmospheric pressure plasma treatment KW - Short-time exposure KW - Relevance of functional groups to adhesion KW - Molecular orientation at polymer surfaces PY - 1996 SN - 90-6764-201-0 SP - 49 EP - 72 PB - VSP CY - Utrecht AN - OPUS4-7007 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian T1 - Plasmabehandelte Polymere charakterisieren PY - 1995 SN - 0025-5300 VL - 37 IS - 6 SP - 233 EP - 237 PB - Carl Hanser Verlag CY - München AN - OPUS4-7009 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Gross, Thomas A1 - Rohrer, P. A1 - Saur, W. A1 - Erdmann, J. A1 - Gorsler, H.-V. T1 - The improvement in adhesion of polyurethane-polypropylene composites by short-time exposure of polypropylene to low and atmospheric pressure plasmas KW - Polyurethane-polypropylene adhesion KW - Low pressure plasma pretreatment KW - Atmospheric pressure plasma treatment KW - Short-time exposure KW - Relevance of functional groups to adhesion KW - Molecular orientation at polymer surfaces PY - 1995 SN - 0169-4243 SN - 1568-5616 VL - 9 IS - 5 SP - 575 EP - 598 PB - VNU Science Press CY - Utrecht AN - OPUS4-7010 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Friedrich, Jörg Florian A1 - Wigant, L. A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Geng, Sh. A1 - Erdmann, J. A1 - Gorsler, H.-V. T1 - Neue Erkenntnisse zur Plasmamodifizierung von Polymeroberflächen PY - 1995 SN - 0949-8214 VL - 1 SP - 36 EP - 42 PB - Technische Fachhochschule CY - Wildau AN - OPUS4-7011 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang A1 - Lippitz, Andreas T1 - Plasma Modification of Polymer Surfaces PY - 1995 SN - 1022-1360 SN - 0258-0322 SN - 1521-3900 VL - 100 SP - 111 EP - 115 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-7012 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Friedrich, Jörg Florian A1 - Wigant, L. A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Wittrich, H. A1 - Prescher, D. A1 - Erdmann, J. A1 - Gorsler, H.-V. A1 - Nick, L. T1 - Barrier properties of plasma-modified polypropylene and polyethyleneterephthalate KW - Plasma fluorination of polymers KW - Deposition of fluorine-containing plasma polymers KW - Barrier formation against solvent permeation KW - Permeation mechanism of solvent mixtures PY - 1995 SN - 0169-4243 SN - 1568-5616 VL - 9 IS - 9 SP - 1165 EP - 1180 PB - VNU Science Press CY - Utrecht AN - OPUS4-7013 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Koprinarov, Ivaylo A1 - Friedrich, Jörg Florian A1 - Lippitz, Andreas A1 - Unger, Wolfgang ED - Olefjord, I. ED - Nyborg, L. ED - Briggs, D. T1 - X-ray Absorption Spectroscopy (NEXAFS) of PET Surfaces T2 - 7th European Conference on Applications of Surface and Interface Analysis CY - Göteborg, Sweden DA - 1997-06-16 PY - 1997 SN - 0-471-97827-2 SP - 755 EP - 759 PB - Wiley CY - Chichester AN - OPUS4-7288 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Moritz, W. A1 - Krause, S. A1 - Roth, U. A1 - Klimm, D. A1 - Lippitz, Andreas T1 - Re-activation of an all solid state oxygen sensor N2 - The silicon based semiconductor structure Si/SiO2/Si3N4/LaF3/Pt can be used as a potentiometric oxygen sensor working at room temperature. A thermal re-activation can be applied to overcome the earlier disadvantage of an increase in response time with continuous use. Using the Pt gate electrode as a resistive heater, very short electrical high-power pulses can be applied. A heating time as short as 300 ns was sufficient for the re-activation of the sensor. This way, only the sensitive thin layer system LaF3/Pt was heated, and the whole sensor was at room temperature immediately after heating. Impedance spectroscopy, X-ray photoelectron spectroscopy (XPS) and quadruple mass spectrometric (QMS)–thermogravimetry (TG) were used to investigate the mechanism of deterioration in dynamic sensor behaviour and re-activation. The formation of hydrated carbonate and the desorption of CO2 and H2O have been shown to be the causes. KW - Chemical sensor KW - Thermal treatment KW - Activation KW - LaF3 KW - Pt PY - 2001 DO - https://doi.org/10.1016/S0003-2670(01)00993-X SN - 0003-2670 SN - 1873-4324 SN - 0378-4304 VL - 437 SP - 183 EP - 190 PB - Elsevier CY - Amsterdam AN - OPUS4-6836 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Gross, Thomas A1 - Lippitz, Andreas T1 - Prüfartenakkreditierung am Beispiel der ESCA N2 - Die Akkreditierung für Prüfverfahren in der Oberflächenanalytik wird gemeinhin als sehr schwierig angesehen. Durch das unlängst eingeführte flexible Konzept der Akkreditierung, auch Prüfartenakkreditierung genannt, eröffnen sich nunmehr neue Möglichkeiten. Aus dem Bereich des Normenwesens in der Oberflächenanalytik erhalten die Prüflaboratorien zusätzliche Unterstützung. Die Validierung von ESCA-Prüfverfahren und ein wohldokumentiertes Prüfmittelmanagement sind weitere Bausteine auf dem Weg zur erfolgreichen Akkreditierung. Oberflächenanalyseverfahren sind akkreditierfähig. PY - 1999 SN - 0344-1733 SN - 1610-8256 SP - 90 EP - 93 PB - Vogel CY - Würzburg AN - OPUS4-6842 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - NEXAFS - spectroscopy on plasma-polymerised films prepared from organic molecules (Acrylic acid, allylamine, ethylene) KW - NEXAFS KW - Plasmapolymere KW - Synchrotronstrahlung PY - 2005 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2004.pdf#page=315 SN - 0179-4159 SP - 315 EP - 317 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-7387 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Ünveren, Ercan A1 - Kemnitz, E. A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Surface Characterization of Chromia for Chlorine/Fluorine Exchange Reactions N2 - The dismutation of CCl2F2 was used to probe the effect of halogenation of chromia by Cl/F exchange reactions to find out the difference between the halogenated inactive and active catalysts. The heterogeneous reactions were performed in a continuous flow Ni reactor and also under simulated reaction conditions in a reactor where after the reaction X-ray photoelectron spectroscopy (XPS) and X-ray excited Auger electron spectroscopy (XAES) analyses are possible without air exposure of the catalyst, i.e., under so-called "in situ" conditions. The Cr(III) 2p XP spectra, which revealed multiplet splitting features and satellite emission, were used for chemical analysis by using a simple evaluation procedure which neglects this inherent complexity. Chemical analysis was also applied by using chemical state plots for Cr 3s in order to cross-check Cr 2p related results. Both ex and in situ XPS show that as soon as Cr2O3 is exposed to CCl2F2 at 390°C fluorination as well as chlorination takes place at the catalyst surface. When the XPS surface composition reaches approximately 4 at. % fluorination and 6 at. % chlorination, maximum catalytic activity was obtained. Application of longer reaction times did not change significantly the obtained surface composition of the activated chromia. The fluorination and chlorination of chromia was further investigated by various HF and HCl treatments. The activated chromia samples and the Cr2O3, Cr(OH)3, CrF2OH, CrF3·H2O, α-CrF3, β-CrF3, and CrCl3 reference samples with well-known chemical structures were also characterized by X-ray absorption near edge structure (XANES), time-of-flight secondary ion mass spectroscopy (TOF-SIMS), pyridine-FTIR, wet chemical (F and Cl) analysis, X-ray powder diffraction (XRD), and surface area (BET) analysis. The results suggest that the formation of chromium oxide chloride fluoride species, e.g., chromium oxide halides, at the surface is sufficient to provide catalytic activity. The presence of any CrF3 and/or CrCl3 phases on the activated chromia samples was not found. PY - 2005 DO - https://doi.org/10.1021/jp045902r SN - 1520-6106 SN - 1520-5207 SN - 1089-5647 VL - 109 IS - 5 SP - 1903 EP - 1913 PB - Soc. CY - Washington, DC AN - OPUS4-10531 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Lippitz, Andreas A1 - Hübert, Thomas T1 - XPS investigations of chromium nitride thin films N2 - Cr–N film coatings were prepared by magnetron sputter deposition at different nitrogen partial pressures. The film characterisation by XRD and DTG gives average bulk compositions of Cr2N and CrN for the coatings. Highly sensitive XPS investigations were performed and the chemical and phase compositions of a film surface range of about 10 nm thickness was estimated quantitatively from the deconvoluted peak intensities. It is demonstrated that the composition of the surface of chromium nitride thin films differs from the core and is more complex in constitution. Not only chromium nitrides (Cr2N and CrN) but also chromium oxynitrides and chromium oxides (CrOx and CrOxHy) were detected. Metallic chromium was also found in films prepared at higher nitrogen flow. The concentration of the estimated phases shows dependence on film preparation and additional heat treatment. KW - XPS KW - ESCA KW - Physical vapour deposition (PVD) KW - CrN thin films PY - 2005 DO - https://doi.org/10.1016/j.surfcoat.2005.02.091 SN - 0257-8972 VL - 200 IS - 1-4 SP - 250 EP - 253 PB - Elsevier Science CY - Lausanne AN - OPUS4-10865 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter T1 - NEXAFS - spectroscopy on plasma-polymerized films prepared from organic molecules (ethylene, allyl alcohol, styrene) KW - Plasma KW - Beschichtung KW - Organische Filme KW - Röntgenabsorptionsspektroskopie PY - 2004 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2003.pdf#page=297 SN - 0179-4159 SP - 297 EP - 299 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-3478 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Aging of Plasma-Deposited Films Prepared from Organic Monomers N2 - Plasma-deposited polymer films were prepared from organic molecules and investigated using near edge X-ray absorption fine structure (NEXAFS) and X-ray photoelectron spectroscopy (XPS) for aging effects after exposure to air. Results from the investigation of homopolymers are summarized. Primarily the effect of the deposition parameters duty cycle and power are dealt with. The effect of the deposition parameter pressure is briefly discussed. An example to show the effect of feed gas composition on the aging of plasma polymerized ethylene/allyl alcohol and styrene/allyl alcohol copolymer is also given. In general, change in content of unsaturated or aromatic species, change in concentration of monomer functionality, and change in the oxygen content was observed in the plasma polymerized films on aging. KW - Plasma copolymer KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization PY - 2007 SN - 1612-8850 SN - 1612-8869 VL - 4 IS - S1 SP - S784 EP - S789 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11934 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface Analysis of Plasma-Deposited Polymer Films, 4 - In situ Characterization of Plasma-Deposited Ethylene Films by XPS and NEXAFS N2 - XPS and NEXAFS spectroscopy were used for the chemical characterization of pulsed plasma-deposited ethylene films before and after exposure to ambient air. The influence of external plasma parameters on the spectroscopic results was investigated. Information on the chemical character of the plasma-polymerized films, such as the regularity of the primary structure, the amount of long-living radicals, and branching or cross-linking or both was derived from this data. Irregularity and radical concentration for post-plasma reactions of the plasma-deposited films increased with the duty cycle or power. A decreased level of monomer fragmentation and, consequently, an increase in regularity is partially concluded from the experimental data when the monomer pressure is increased. The concentration of surface radicals available for post-plasma reactions also increased with monomer pressure. The correlation found between the degree of the post-plasma oxygen incorporation and the variation of the various external parameters agreed with earlier ToF-SSIMS findings. KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization KW - Polyethylene (PE) KW - Thin films PY - 2005 DO - https://doi.org/10.1002/ppap.200400070 SN - 1612-8850 SN - 1612-8869 VL - 2 IS - 4 SP - 310 EP - 318 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11940 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas T1 - Radio frequency (r.f.) plasma-deposited polymer films: influence of external plasma parameters as viewed by comprehensive in-situ surface chemical analysis by XAS, XPS and ToF-SIMS N2 - The formation of plasma-deposited materials made from organic molecules is a technologically attractive way to obtain films with unique properties, e.g. adhesion, wettability, conductivity or selected chemical functionalization. A detailed chemical characterization of these films is a great challenge for the analyst because of the co-existence of a large number of chemical species in plasma-deposited films. We investigated these types of organic films using photoelectron spectroscopy for chemical analysis (ESCA, XPS), near edge X-ray absorption fine structure (NEXAFS) spectroscopy at synchrotron radiation source BESSY II and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). A dedicated plasma preparation chamber was designed and added to the main analysis chamber of the respective spectrometers. This approach offers the possibility of studying plasma-deposited films without exposure to air before analysis (often called in-situ analysis) and the influence of post-plasma reactions, i.e. the ageing process. The present investigations are aimed at finding correlations between basic chemical properties of the deposited films and the plasma deposition parameters, e.g. duty cycle in pulsed plasmas and the power of discharge. KW - Plasma deposition KW - NEXAFS KW - XPS KW - ToF-SIMS KW - Plasma parameter PY - 2006 DO - https://doi.org/10.1002/sia.2158 SN - 0142-2421 SN - 1096-9918 VL - 38 IS - 4 SP - 522 EP - 525 PB - Wiley CY - Chichester AN - OPUS4-12271 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Surface analysis of Plasma Deposited Polymer Films, 7: "In situ" Characterization of Plasma Deposited Allylamine Films by ToF-SSIMS, XPS and NEXAFS Spectroscopy N2 - Plasma deposited allylamine films were studied by in situ ToF-SSIMS, XPS and NEXAFS Spectroscopy before exposure to ambient air. The influence of external plasma parameters such as duty cycle, plasma power, and monomer flow rate on (i) unsaturation, (ii) branching and cross-linking, (iii) nitrogen surface concentration and (iv) retention of amino groups was investigated. Harder plasma conditions, which can be obtained when high duty cycles, high plasma power, and low monomer flow rates are employed, increase the unsaturated, branched and cross-linked character of the plasma deposited films, while the surface concentration of N as well as the retention of the monomer's amino group decrease. As proven by NEXAFS findings and cross-checked by ToF-SSIMS results, the allylamine monomer's primary amino groups are partially transformed into other nitrogen functionalities during its plasma polymerization. Amongst them imines and nitriles are the conversion products with the highest probabilities of formation. Another conversion channel is the formation of nitrogen species not participating in the film growth. This is the reason for an increased N loss in plasma deposited allylamine films as observed independently by XPS and ToF-SSIMS when the plasma parameters are changed from mild to hard. KW - Allylamine KW - NEXAFS KW - Plasma polymerization KW - ToF-SSIMS KW - XPS PY - 2006 DO - https://doi.org/10.1002/ppap.200500168 SN - 1612-8850 SN - 1612-8869 VL - 3 IS - 3 SP - 288 EP - 298 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-12272 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - NEXAFS - spectroscopy on freshly prepared and aged plasma-polymerised films PY - 2006 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2005.pdf#page=322 SN - 0179-4159 SP - 320 EP - 322 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-12804 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Study of influence of external plasma parameters on plasma polymerised films prepared from organic molecules (acrylic acid, allyl alcohol, allyl amine) using XPS and NEXAFS N2 - Plasma polymerised films of acrylic acid, allyl alcohol and allyl amine were prepared and studied by XPS (X-ray photoelectron spectroscopy) and XAS (X-ray absorption spectroscopy). The influence of external plasma parameters on certain chemical aspects of the films was investigated. The use of XPS and NEXAFS (near edge X-ray absorption fine structure) as complimentary tools in the surface characterisation of thin films has been highlighted. Certain chemical aspects of the plasma polymerised films such as presence of ROCdouble bond; length as m-dashO in the case of plasma polymerised acrylic acid films, presence of RCdouble bond; length as m-dashO and RC–OR bonds in case of plasma polymerised allyl alcohol films and presence of RCdouble bond; length as m-dashN and C?N in case of plasma polymerised allyl amine films were studied. The concentration of ROCdouble bond; length as m-dashO species was found to decrease with increase in r.f. duty cycle in the case of plasma polymerised acrylic acid films. In case of plasma polymerised allyl alcohol films there is a decrease in the concentration of RCdouble bond; length as m-dashO species and increase in the concentration of RC–OR species at higher pressures, while in the case of plasma polymerised allyl amine films the concentration of RCdouble bond; length as m-dashN and C?N increases at higher powers, with an increase in C?N more pronounced at higher powers. KW - Plasma polymerization KW - NEXAFS KW - XPS KW - Plasma parameter PY - 2005 DO - https://doi.org/10.1016/j.surfcoat.2005.01.083 SN - 0257-8972 VL - 200 IS - 1-4 SP - 494 EP - 497 PB - Elsevier Science CY - Lausanne AN - OPUS4-11045 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Lippitz, Andreas ED - Chandra, T. T1 - Ageing studies of plasma deposited organic films by surface chemical analysis (ESCA, ToF-SIMS, XAS) T2 - 5th International Conference on Processing & Manufacturing of Advanced Materials CY - Vancouver, Canada DA - 2006-07-04 KW - Plasma polymerized organic films KW - Ageing phenomena KW - ESCA KW - TOF-SIMS KW - XAS PY - 2007 SN - 0-87849-428-6 SN - 0255-5476 N1 - Serientitel: Materials science forum – Series title: Materials science forum VL - 539-543 IS - 539/543 SP - 623 EP - 628 PB - Trans Tech Publ. CY - Stafa-Zürich AN - OPUS4-14446 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Friedrich, Jörg Florian A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Surface Chemical Analysis of Plasma-Deposited Copolymer Films Prepared from Feed Gas Mixtures of Ethylene or Styrene with Allyl Alcohol N2 - Plasma deposited styrene/allyl alcohol and ethylene/allyl alcohol copolymer films were prepared and characterized using XPS, NEXAFS and ToF-SIMS. The relative partial flow rates of the co-monomers are used as deposition process parameters to vary and all other process parameters were constrained to conditions optimized for retention of functional groups. By doing this it is possible to control certain chemical properties of the copolymer films such as unsaturation, oxygen and hydroxyl group relative surface contents. The aging behavior of the plasma copolymer films on air was studied, too. Non-linear variations of relative oxygen contents, contents of C—OR species and contents of carbonyl species are obtained vs. variation of feed gas composition for both monomer combinations. The chemical character of the plasma copolymer films varies between the limits given by the respective plasma homopolymers. The observed non-linear correlations are discussed in terms of approaches developed for classic radical copolymerization. The aging behavior of the different plasma copolymers films depends on the feed gas composition. Principally these aging phenomena known from plasma polymer aging studies of that respective monomer which dominates the character of the plasma copolymer are observed. KW - Plasma polymers KW - Plasma copolymers KW - XPS KW - NEXAFS KW - Allyl alcohol KW - ESCA/XPS KW - Plasma polymerization KW - ToF-SIMS PY - 2007 SN - 1612-8850 SN - 1612-8869 VL - 4 IS - 4 SP - 376 EP - 389 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-14846 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Surface Chemical Analysis of Plasma-Deposited Copolymer Films Prepared from Feed Gas Mixtures of Ethylene or Styrene with Allylamine N2 - Plasma deposited ethylene/allylamine and styrene/allylamine copolymer films were prepared and analyzed using XPS, NEXAFS and ToF-SIMS. The relative partial flow rate of the each monomer was used as the variable deposition parameter, while the other deposition parameters were kept constant at optimized values for the retention of functional groups. The effect of the variation in the relative partial flow rates of co-monomers on various chemical aspects of the films like unsaturation, nitrogen retention and branching was investigated revealing several non-linear correlations. This observation is taken as an indication for chemical copolymerization processes during film deposition. An attempt is made to compare these non-linear correlations with approaches which have been developed for classic radical copolymerization processes. The aging behavior of these plasma copolymer films was also studied; the results indicated a stabilization against oxidation in comparison to the aging of allylamine plasma homopolymers. KW - Ethylene-allylamine copolymer KW - ESCA KW - NEXAFS KW - Plasma polymerization KW - Styrene-allylamine copolymer KW - Surface characterization KW - TOF-SIMS KW - XPS PY - 2008 DO - https://doi.org/10.1002/ppap.200700106 SN - 1612-8850 SN - 1612-8869 VL - 5 IS - 1 SP - 92 EP - 104 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-16466 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dietrich, Paul A1 - Horlacher, T. A1 - Girard-Lauriault, Pierre-Luc A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Min, Hyegeun A1 - Wirth, Thomas A1 - Castelli, R. A1 - Seeberger, P. A1 - Unger, Wolfgang T1 - Multimethod chemical characterization of carbohydrate-functionalized surfaces N2 - A combined XPS, NEXAFS, and ToF-SIMS chemical surface characterization of carbohydrate-functionalized gold and glass surfaces is presented. Spot shape and chemical composition across a spot surface are provided by surface-sensitive methods as ToF-SIMS and XPS, used in their imaging modes. Moreover, the feasibility of this multimethod approach to control relevant production steps of a carbohydrate microarray prototype is demonstrated. KW - Carbohydrates KW - Microarrays KW - Self-assembled monolayers KW - XPS KW - NEXAFS KW - ToF-SIMS PY - 2011 DO - https://doi.org/10.1080/07328303.2011.615181 SN - 0732-8303 VL - 30 IS - 4-6 SP - 361 EP - 372 PB - Taylor & Francis CY - London [u.a.] AN - OPUS4-24874 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Girard-Lauriault, Pierre-Luc A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Chemical and elemental depth profiling of very thin organic layers by constant kinetic energy XPS: a new synchrotron XPS analysis strategy N2 - We present a new synchrotron X-ray photoelectron spectroscopy strategy for surface chemical analysis of materials. Our approach is based on the acquisition of photoelectron spectra at constant kinetic energies with the help of a tunable synchrotron X-radiation source. This ensures both constant and tunable information depth for all elements in a very thin organic layer. Many of the problems known to XPS depth profiling using laboratory equipment are thereby avoided. Using our methodology, the 95% information depth, z95%, can be tuned down to about 0.7 nm in organic materials. The upper limit in our study at the HE-SGM monochromator dipole magnet beamline at the synchrotron radiation source BESSY II is about 4.3 nm. Elemental quantification is achieved through relative sensitivity factors (RSF) specific to the measurement conditions, determined either with the help of calculated photoionization cross sections and inelastic mean free paths or experimentally. The potential of the technique is demonstrated for the in-depth analysis of plasma deposited nitrogen-rich organic thin films used in biomedical applications. PY - 2012 DO - https://doi.org/10.1021/ac300585q SN - 0003-2700 SN - 1520-6882 VL - 84 IS - 14 SP - 5984 EP - 5991 PB - American Chemical Society CY - Washington, DC AN - OPUS4-26299 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Plasma bromination of HOPG surfaces: a NEXAFS and synchrotron XPS study N2 - Br bonding on plasma brominated graphite surfaces has been studied by using Near Edge X-ray Absorption Fine Structure (NEXAFS) and X-ray Photoelectron Spectroscopy (XPS). Br2 and bromoform were used as plasma gases in an r.f. cw low pressure plasma process. Kr plasma had been used to study separately the physical and chemical plasma etching effects. At early steps of plasma bromination which lead to only small XPS Br surface concentration values a quick decay of aromaticity has been observed. At low Br surface concentration radical or even electrophilic addition of bromine onto sp2 carbon atoms is discussed as the dominating reaction pathway. At higher Br surface concentrations the inherent formation of sp3 defects in the graphene network by chemical etching processes promotes nucleophilic substitution of bromine at sp3 carbons as a competing reaction pathway. Both reaction pathways lead to C–Br species characterized by the same Br 3d XPS binding energy. However more than one Br 3d component in XP spectra has been found at lower Br2 plasma induced Br surface concentrations and complexation of bromine at HOPG is assumed as a third way of interaction with Br2 plasma. KW - HOPG KW - Graphite KW - Plasma bromination KW - Low pressure plasma KW - NEXAFS KW - XPS PY - 2013 DO - https://doi.org/10.1016/j.susc.2013.01.020 SN - 0039-6028 VL - 611 SP - L1 EP - L7 PB - Elsevier CY - Amsterdam AN - OPUS4-27928 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Darlatt, Erik A1 - Nefedov, A. A1 - Traulsen, C.H.-H. A1 - Poppenberg, J. A1 - Richter, S. A1 - Dietrich, Paul A1 - Lippitz, Andreas A1 - Illgen, René A1 - Kühn, Julius A1 - Schalley, C.A. A1 - Wöll, Ch. A1 - Unger, Wolfgang T1 - Interperetation of experimental N K NEXAFS of azide, 1,2,3-triazole and terpyridyl groups by DFT spectrum simulations N2 - Experimental N K-edge NEXAFS data of surface immobilized azide, 1,2,3-triazole and terpyridyl groups are interpreted with the help of DFT spectrum simulations. Assignments of π* resonances in experimental N K-edge NEXAFS spectra to nitrogen atoms within these functional groups have been made. The azide was immobilized on gold as the head group of a thiol SAM, 1,2,3-triazole was formed on this SAM by click reaction and terpyridyl groups were introduced as substituents of the acetylene used for the click reaction. For azide-terminated molecules, DFT spectrum simulations are found to be useful to find measurement conditions delivering experimental N K-edge NEXAFS data with negligible X-ray damage. The 1,2,3-triazole group is found to be rather stable under X-ray irradiation. KW - N K-edge NEXAFS KW - XANES KW - Surface click chemistry KW - Density functional theory KW - Azide KW - 1,2,3-Triazole PY - 2012 DO - https://doi.org/10.1016/j.elspec.2012.09.008 SN - 0368-2048 SN - 1873-2526 VL - 185 IS - 12 SP - 621 EP - 624 PB - Elsevier CY - Amsterdam AN - OPUS4-27774 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Charakterisierung von Siliziumoxidschichten auf Silizium mit ESCA - Ein Beitrag zur Präszisionsbestimmung der Avogadro-Konstanten T2 - EMASS 2000 CY - Berlin, Deutschland DA - 2000-11-10 PY - 2000 AN - OPUS4-1020 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Güttler, B. T1 - Uncertainty in measurement of overlayer thickness of thermally oxidized silicon using x-ray photoelectron spectroscopy N2 - Overlayers of SiO2 (nominally 4, 6 and 8 nm thick) on silicon, prepared by thermal oxidation, were investigated using x-ray photoelectron spectroscopy (XPS). The thickness of these overlayers was obtained from a measurement of the photoelectron intensities originating from the substrate and the oxide overlayer by applying an appropriate quantitative model. The uncertainty budget of that thickness measurement method is given. The relative combined standard uncertainty of the method was found to be 15%. The effective attenuation lengths or the corresponding electron inelastic mean free paths are of considerable importance for both the estimated values of overlayer thickness and combined standard uncertainties. The XPS results were compared with ellipsometry data. KW - XPS KW - ESCA KW - Uncertainty KW - Overlayer KW - SiO2 PY - 2000 DO - https://doi.org/10.1002/1096-9918(200012)29:12<891::AID-SIA943>3.0.CO;2-A SN - 0142-2421 SN - 1096-9918 IS - 29 SP - 891 EP - 894 PB - Wiley CY - Chichester AN - OPUS4-1075 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Lippitz, Andreas A1 - Unger, Wolfgang A1 - Boese, O. A1 - Kemnitz, E. T1 - y-Al2O3 by Au 4f7/2-referenced XPS and XAES N2 - Powder x-ray diffraction (XRD) defined -Al2O3 has been investigated by x-ray photoelectron spectroscopy (XPS) and x-ray excited Auger electron spectroscopy (XAES). The Au 4f7/2 orbital is used for static charge referencing. This feature originates from well-defined and chemically inert 20 nm highly dispersed gold particles deposited on the sample surface. The particles, with a narrow particle size distribution, were obtained from a highly purified colloidal solution (sodium concentration below 1 mg/l). This procedure allows a determination of gold-referenced XPS and XAES data sets. ©2001 American Vacuum Society. KW - Au 4f referenced XPS data KW - Aluminium KW - Oxide PY - 2001 UR - http://scitation.aip.org/vsearch/servlet/VerityServlet?KEY=SSSPEN&ONLINE=YES&smode=strresults&sort=chron&maxdisp=25&threshold=0&possible1zone=article&possible4=lippitz&possible4zone=author&bool4=and&fromyear=2001&OUTLOG=NO&viewabs=SSSPEN&key=DISPLAY&docID DO - https://doi.org/10.1116/11.20020305 SN - 1055-5269 SN - 1520-8575 VL - 8 IS - 1-4 SP - 214 EP - 219 PB - AIP CY - Woodbury, NY AN - OPUS4-1910 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang A1 - Böse, Olaf A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Gelius, U. ED - Boehlig, H. T1 - Results of a VAMAS TWA 2 inter-laboratory test experimen - Evaluation of static charge stabilization and determination methods in XPS on non-conducting samples T2 - 11th Conference on Applied Surface Analysis (AOFA) CY - Leipzig, Germany DA - 2000-09-24 PY - 2000 SN - 0169-4332 VL - 179 IS - 1 PB - Elsevier CY - Amsterdam AN - OPUS4-978 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Friedrich, Jörg Florian A1 - Retzko, Iris A1 - Kühn, Gerhard A1 - Unger, Wolfgang A1 - Lippitz, Andreas ED - Mittal, K. T1 - Metal doped plasma polymer films T2 - 7th Symposium on Metallized Plastics CY - Newark, NJ, USA DA - 1999-12-02 KW - Plasma polymer KW - r.f. pulsed plasma KW - Conducting films KW - Metal-polymer interface PY - 2001 SN - 90-6764-340-8 VL - 7 SP - 117 EP - 142 PB - VSP CY - Utrecht AN - OPUS4-929 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Nietzold, Carolin A1 - Dietrich, Paul A1 - Holzweber, M. A1 - Lippitz, Andreas A1 - Kamalakumar, A. A1 - Blanchard, V. A1 - Ivanov-Pankov, S. A1 - Weigel, W. A1 - Panne, Ulrich A1 - Unger, Wolfgang T1 - Surface chemical characterization of model glycan surfaces and shelf life studies of glycan microarrays using XPS, NEXAFS spectroscopy, ToF-SIMS and fluorescence scanning N2 - Biomedical applications, including functional biomaterials, carbohydrate-arrays, and glycan-based biosensors. The chemistry of glycan immobilization plays an essential role in the bioavailability and function of surface bound carbohydrate moieties. For biomedical applications the stability over time (shelf life) of glycan arrays is a crucial factor. Herein we report on approaches for surface and interface characterization relevant to the needs of production of glycan microarrays which were tested using model carbohydrate surfaces. For detailed characterization of glycan model surfaces we used a combination of X-ray photoelectron spectroscopy (XPS), near edge X-ray absorption fine structure spectroscopy (NEXAFS) and ToF SIMS which are complementary techniques of surface chemical analysis. Links to fluorescence spectroscopy often used for characterization in the microarray community were established as well. In detail, amine-reactive silicon oxide and glass surfaces were used for anchoring oligosaccharides with an amino linker. The amount of surface bound carbohydrates was estimated by X-ray photoelectron spectroscopy (XPS). Glycan immobilization was investigated using lectins, which are glycan-binding molecules. A shelf life study of model glycan microarrays on epoxy-coated glass surfaces was done over a period of 160 days under different storage conditions utilizing fluorescence, ToF-SIMS and XPS analysis. It was shown that glycan activity of the models used can be maintained at least for half a year of storage at 4 °C. KW - Glycan microarray KW - XPS KW - NEXAFS KW - ToF-SIMS KW - Fluorescence PY - 2018 UR - https://www.sciencedirect.com/science/article/pii/S0169433218320300?via%3Dihub DO - https://doi.org/10.1016/j.apsusc.2018.07.133 SN - 0169-4332 SN - 1873-5584 VL - 459 SP - 860 EP - 873 PB - Elsevier B.V. AN - OPUS4-46212 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Friedrich, Jörg Florian A1 - Geng, Sh. A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Erdmann, J. A1 - Gorsler, H.-V. T1 - Plasma functionalization and reorientation of macromolecules at polymer surfaces KW - Plasma KW - Polymer KW - Monolayer KW - Einschichtsystem KW - NEXAFS KW - Spektroskopie KW - Oberflächenanalyse PY - 1995 SN - 0257-8972 VL - 74-75 SP - 664 EP - 669 PB - Elsevier Science CY - Lausanne AN - OPUS4-627 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Friedrich, Jörg Florian A1 - Wigan, L. A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Erdmann, J. A1 - Gorsler, H.-V. T1 - Barrier properties of plasma and chemically fluorinated polypropylene and polyethyleneterephthalate N2 - The functionalization, perfluorination or an coating of polypropylene (PP) and polyethyleneterephthalate (PET) surfaces in different plasma atmospheres and in an F[2] + N[2] gas mixture were investigated. The aim of this work was to form a barrier layer against solvent and fuel permeation. Typical test solvents were n-pentane, toluene, tetrachloroethylene and mixtures of n-pentane and methanol. The permeation was gravimetrically measured. The permeation of the solvent mixtures was analyzed by mass spectrometry and Fourier transform IR spectroscopy. The permeation of the solvent mixtures through the plasma-modified polymer samples was associated with increased absorption of polar solvent components in the polymer film. The thickness of the plasma-fluorinated PP surface layer was 10-100 nm and that of chemically fluorinated PP about 5000 nm. Nearly the same barrier efficiency was measured for both plasma- and chemically fluorinated samples. T2 - International Conference on Plasma Surface Engineering No. 4 CY - Garmisch-Partenkirchen, Germany DA - 1994-09-19 KW - Plasma KW - Fluor KW - Plasmapolymer KW - Sperrschicht KW - Permeation PY - 1995 UR - http://cat.inist.fr/?aModele=afficheN&cpsidt=3158319 SN - 0257-8972 VL - 74-75 IS - 1-3 SP - 910 EP - 918 PB - Elsevier Science CY - Lausanne AN - OPUS4-628 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Lippitz, Andreas A1 - Koprinarov, Ivaylo A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang A1 - Weiss, K. A1 - Wöll, Ch. T1 - Surface analysis of metaillized poly(bisphenol A cabonate) films by x-ray absorption spectroscopy (NEXAFS) KW - NEXAFS KW - Röntgenadsorptionsspektroskopie KW - Oberflächenanalyse KW - Film, metallisiert KW - Polymeroberfläche PY - 1996 SN - 0032-3861 SN - 1873-2291 VL - 37 IS - 14 SP - 3157 EP - 3160 PB - Springer CY - Berlin AN - OPUS4-649 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang A1 - Schertel, A. A1 - Wöll, Ch. T1 - Surface analysis of partially crystalline and amorphous poly(ethylene terephthalate) samples by x-ray absorption spectroscopy (NEXAFS) KW - NEXAFS KW - Röntgenadsorptionsspektroskopie KW - Oberflächenanalyse KW - Polymeroberfläche PY - 1996 SN - 0032-3861 SN - 1873-2291 VL - 37 IS - 14 SP - 3151 EP - 3155 PB - Springer CY - Berlin AN - OPUS4-650 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Grohmann, I. A1 - Kemnitz, E. A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Curve Fitting of Cr2p Photoelectron Spectra of Cr2O3 and CrF3 KW - Photoelektronenspektroskopie KW - Kurvenglättung KW - Chrom PY - 1995 SN - 0142-2421 SN - 1096-9918 VL - 23 SP - 887 EP - 891 PB - Wiley CY - Chichester AN - OPUS4-678 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Lippitz, Andreas A1 - Koprinarov, Ivaylo A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang A1 - Schertel, A. A1 - Wöll, Ch. T1 - NEXAFS analysis of a plasma treated, partially crystalline poly(ehtylene terephtalate) surface KW - NEXAFS KW - Röntgenstrukturanalyse KW - Oberflächen behandeln KW - Plasma PY - 1996 SN - 0179-4159 SP - 279 EP - 281 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-681 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Forkel, K. A1 - Kosslick, H. A1 - Lippitz, Andreas A1 - Rolle, S. ED - Dufour, L.-C. T1 - Investigation of thermal properties of Fe75Cr5P8C10Si2 metal-metalloid glassy T2 - XIIIth International Symposium ; 13th International Symposium on the Reactivity of Solids CY - Hamburg, Germany DA - 1996-09-08 KW - Glasoberfläche KW - Beanspruchung, thermisch PY - 1996 PB - North-Holland CY - Amsterdam AN - OPUS4-686 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Gross, Thomas A1 - Friedrich, Jörg Florian A1 - Wöll, Ch. A1 - Nick, L. T1 - The Use of Octadecyltrichlorosilane Self-Assembled Layers as a Model for the Assessment of Plasma Treatment and Metallization Effects on Polyolefins N2 - Self-assembled octadecyltrichlorosilane (CH3(CH2)17SiCl3, OTS) films were deposited on an oxidized silicon wafer. They were carefully exposed to a low-pressure oxygen direct current (dc) plasma and/or Cr vapor. Subsequently, they were characterized by X-ray photoelectron spectroscopy, near-edge X-ray absorption fine structure spectroscopy, and atomic force microscopy. Detailed information on the oxygen functionalization and the molecular conformation of the OTS films was obtained. The main result was that functionalization conditions can be found where the order of the film remains almost unaffected. Similarly, Cr evaporation of pure OTS films revealed only slight effects on the order in the film. Cr evaporation of an ordered but functionalized OTS film immediately changes its state toward a fully isotropic one. In the course of interaction, oxygen sites at the surface of the functionalized OTS film are reduced whereas Cr becomes oxidized. A redox reaction scheme is proposed for this interfacial reaction. Finally, it is concluded that the given study should be of importance for advanced plasma processing of polyolefins. KW - NEXAFS KW - OTS Self-Assembled Layers PY - 1999 DO - https://doi.org/10.1021/la981174l SN - 0743-7463 SN - 1520-5827 VL - 15 IS - 4 SP - 1161 EP - 1166 PB - American Chemical Society CY - Washington, DC AN - OPUS4-808 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Friedrich, Jörg Florian A1 - Koprinarov, Ivaylo A1 - Giebler, Rainer A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Reactions and Intermediates at the Metal-Polymer Interface as Observed by XPS and NEXAFS Spectroscopy KW - XPS KW - NEXAFS KW - Interfacial polymer-metal redox reactions KW - Chromium-polymer intermediates KW - Near edge X-ray absorption fine structure spectroscopy KW - Adhesion KW - Polymer-metal bonds KW - Polymer-aluminium bonds KW - Polymer-copper bonds PY - 1999 SN - 0021-8464 SN - 1545-5823 VL - 71 SP - 297 EP - 321 PB - Gordon & Breach CY - New York, NY AN - OPUS4-798 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Lippitz, Andreas A1 - Unger, Wolfgang A1 - Gross, Thomas A1 - Güttler, J. T1 - Neues vom Urkilogramm KW - Oberflächenanalytik PY - 1999 SN - 0341-5163 SN - 1521-3854 VL - 47 IS - 7 SP - 784 EP - 786 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-791 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -