TY - GEN A1 - Unger, Wolfgang A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter T1 - NEXAFS - spectroscopy on plasma-polymerized films prepared from organic molecules (ethylene, allyl alcohol, styrene) T2 - BESSY highlights - annual report 2003 KW - Plasma KW - Beschichtung KW - Organische Filme KW - Röntgenabsorptionsspektroskopie PY - 2004 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2003.pdf#page=297 SN - 0179-4159 SP - 297 EP - 299 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-3478 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas T1 - Radio frequency (r.f.) plasma-deposited polymer films: influence of external plasma parameters as viewed by comprehensive in-situ surface chemical analysis by XAS, XPS and ToF-SIMS JF - Surface and interface analysis N2 - The formation of plasma-deposited materials made from organic molecules is a technologically attractive way to obtain films with unique properties, e.g. adhesion, wettability, conductivity or selected chemical functionalization. A detailed chemical characterization of these films is a great challenge for the analyst because of the co-existence of a large number of chemical species in plasma-deposited films. We investigated these types of organic films using photoelectron spectroscopy for chemical analysis (ESCA, XPS), near edge X-ray absorption fine structure (NEXAFS) spectroscopy at synchrotron radiation source BESSY II and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). A dedicated plasma preparation chamber was designed and added to the main analysis chamber of the respective spectrometers. This approach offers the possibility of studying plasma-deposited films without exposure to air before analysis (often called in-situ analysis) and the influence of post-plasma reactions, i.e. the ageing process. The present investigations are aimed at finding correlations between basic chemical properties of the deposited films and the plasma deposition parameters, e.g. duty cycle in pulsed plasmas and the power of discharge. KW - Plasma deposition KW - NEXAFS KW - XPS KW - ToF-SIMS KW - Plasma parameter PY - 2006 DO - https://doi.org/10.1002/sia.2158 SN - 0142-2421 SN - 1096-9918 VL - 38 IS - 4 SP - 522 EP - 525 PB - Wiley CY - Chichester AN - OPUS4-12271 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Lippitz, Andreas ED - Chandra, T. T1 - Ageing studies of plasma deposited organic films by surface chemical analysis (ESCA, ToF-SIMS, XAS) T2 - THERMEC 2006 T2 - 5th International Conference on Processing & Manufacturing of Advanced Materials CY - Vancouver, Canada DA - 2006-07-04 KW - Plasma polymerized organic films KW - Ageing phenomena KW - ESCA KW - TOF-SIMS KW - XAS PY - 2007 SN - 0-87849-428-6 SN - 0255-5476 N1 - Serientitel: Materials science forum – Series title: Materials science forum VL - 539-543 IS - 539/543 SP - 623 EP - 628 PB - Trans Tech Publ. CY - Stafa-Zürich AN - OPUS4-14446 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - NEXAFS - spectroscopy on plasma-polymerised films prepared from organic molecules (Acrylic acid, allylamine, ethylene) T2 - BESSY highlights - annual report 2004 KW - NEXAFS KW - Plasmapolymere KW - Synchrotronstrahlung PY - 2005 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2004.pdf#page=315 SN - 0179-4159 SP - 315 EP - 317 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-7387 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Surface Chemical Analysis of Plasma-Deposited Copolymer Films Prepared from Feed Gas Mixtures of Ethylene or Styrene with Allylamine JF - Plasma processes and polymers N2 - Plasma deposited ethylene/allylamine and styrene/allylamine copolymer films were prepared and analyzed using XPS, NEXAFS and ToF-SIMS. The relative partial flow rate of the each monomer was used as the variable deposition parameter, while the other deposition parameters were kept constant at optimized values for the retention of functional groups. The effect of the variation in the relative partial flow rates of co-monomers on various chemical aspects of the films like unsaturation, nitrogen retention and branching was investigated revealing several non-linear correlations. This observation is taken as an indication for chemical copolymerization processes during film deposition. An attempt is made to compare these non-linear correlations with approaches which have been developed for classic radical copolymerization processes. The aging behavior of these plasma copolymer films was also studied; the results indicated a stabilization against oxidation in comparison to the aging of allylamine plasma homopolymers. KW - Ethylene-allylamine copolymer KW - ESCA KW - NEXAFS KW - Plasma polymerization KW - Styrene-allylamine copolymer KW - Surface characterization KW - TOF-SIMS KW - XPS PY - 2008 DO - https://doi.org/10.1002/ppap.200700106 SN - 1612-8850 SN - 1612-8869 VL - 5 IS - 1 SP - 92 EP - 104 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-16466 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - NEXAFS - spectroscopy on freshly prepared and aged plasma-polymerised films T2 - BESSY highlights - annual report 2005 PY - 2006 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2005.pdf#page=322 SN - 0179-4159 SP - 320 EP - 322 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-12804 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface Analysis of Plasma-Deposited Polymer Films, 4 - In situ Characterization of Plasma-Deposited Ethylene Films by XPS and NEXAFS JF - Plasma processes and polymers N2 - XPS and NEXAFS spectroscopy were used for the chemical characterization of pulsed plasma-deposited ethylene films before and after exposure to ambient air. The influence of external plasma parameters on the spectroscopic results was investigated. Information on the chemical character of the plasma-polymerized films, such as the regularity of the primary structure, the amount of long-living radicals, and branching or cross-linking or both was derived from this data. Irregularity and radical concentration for post-plasma reactions of the plasma-deposited films increased with the duty cycle or power. A decreased level of monomer fragmentation and, consequently, an increase in regularity is partially concluded from the experimental data when the monomer pressure is increased. The concentration of surface radicals available for post-plasma reactions also increased with monomer pressure. The correlation found between the degree of the post-plasma oxygen incorporation and the variation of the various external parameters agreed with earlier ToF-SSIMS findings. KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization KW - Polyethylene (PE) KW - Thin films PY - 2005 DO - https://doi.org/10.1002/ppap.200400070 SN - 1612-8850 SN - 1612-8869 VL - 2 IS - 4 SP - 310 EP - 318 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11940 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface Analysis of Plasma-Deposited Polymer Films, 2: Analysis of Post-Plasma Air Reacted Plasma Polymerized Styrene by X-Ray Photoelectron Spectroscopy and X-Ray Absorption Spectroscopy JF - Plasma processes and polymers N2 - Chemical properties of plasma-polymerized styrene films can be effectively controlled by the appropriate choice of external plasma parameters, such as duty cycle, power and monomer pressure. Chemical properties here are the regularity of the primary structure, the amount of long living radicals and branching or cross-linking or both in plasma polymerized styrene films, which can be indirectly monitored by X-ray photoelectron spectroscopy (XPS) and near edge X-ray absorption fine structure (NEXAFS) spectroscopy. Principally, XPS and NEXAFS spectra of plasma-polymerized styrene show all the spectroscopic fingerprints characteristic of atactic polystyrene indicating an inherent similarity of the respective primary chemical structures. There is an increase in irregularity and radical concentration for the plasma deposited films with increasing duty cycle or power. With an increase in monomer pressure, a decreased level of monomer fragmentation and, consequently, an increase in regularity must be concluded from the experimental data. The applied power regulates the fragmentation of the monomers as monitored by spectroscopic signals correlated to the aromatic rings. A trend in the extent of the post-plasma oxygen incorporation according to the variation of the various external plasma parameters was deduced, which agrees with earlier ToF-SIMS findings KW - Chemical characterization KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization KW - Polystyrene PY - 2004 DO - https://doi.org/10.1002/ppap.200400022 SN - 1612-8850 SN - 1612-8869 VL - 1 SP - 134 EP - 140 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-6935 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Aging of Plasma-Deposited Films Prepared from Organic Monomers JF - Plasma processes and polymers N2 - Plasma-deposited polymer films were prepared from organic molecules and investigated using near edge X-ray absorption fine structure (NEXAFS) and X-ray photoelectron spectroscopy (XPS) for aging effects after exposure to air. Results from the investigation of homopolymers are summarized. Primarily the effect of the deposition parameters duty cycle and power are dealt with. The effect of the deposition parameter pressure is briefly discussed. An example to show the effect of feed gas composition on the aging of plasma polymerized ethylene/allyl alcohol and styrene/allyl alcohol copolymer is also given. In general, change in content of unsaturated or aromatic species, change in concentration of monomer functionality, and change in the oxygen content was observed in the plasma polymerized films on aging. KW - Plasma copolymer KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization PY - 2007 SN - 1612-8850 SN - 1612-8869 VL - 4 IS - S1 SP - S784 EP - S789 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11934 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Study of influence of external plasma parameters on plasma polymerised films prepared from organic molecules (acrylic acid, allyl alcohol, allyl amine) using XPS and NEXAFS JF - Surface and coatings technology N2 - Plasma polymerised films of acrylic acid, allyl alcohol and allyl amine were prepared and studied by XPS (X-ray photoelectron spectroscopy) and XAS (X-ray absorption spectroscopy). The influence of external plasma parameters on certain chemical aspects of the films was investigated. The use of XPS and NEXAFS (near edge X-ray absorption fine structure) as complimentary tools in the surface characterisation of thin films has been highlighted. Certain chemical aspects of the plasma polymerised films such as presence of ROCdouble bond; length as m-dashO in the case of plasma polymerised acrylic acid films, presence of RCdouble bond; length as m-dashO and RC–OR bonds in case of plasma polymerised allyl alcohol films and presence of RCdouble bond; length as m-dashN and C?N in case of plasma polymerised allyl amine films were studied. The concentration of ROCdouble bond; length as m-dashO species was found to decrease with increase in r.f. duty cycle in the case of plasma polymerised acrylic acid films. In case of plasma polymerised allyl alcohol films there is a decrease in the concentration of RCdouble bond; length as m-dashO species and increase in the concentration of RC–OR species at higher pressures, while in the case of plasma polymerised allyl amine films the concentration of RCdouble bond; length as m-dashN and C?N increases at higher powers, with an increase in C?N more pronounced at higher powers. KW - Plasma polymerization KW - NEXAFS KW - XPS KW - Plasma parameter PY - 2005 DO - https://doi.org/10.1016/j.surfcoat.2005.01.083 SN - 0257-8972 VL - 200 IS - 1-4 SP - 494 EP - 497 PB - Elsevier Science CY - Lausanne AN - OPUS4-11045 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -