TY - JOUR A1 - Friedrich, Jörg Florian A1 - Hidde, Gundula A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Plasma bromination of graphene for covalent bonding of organic molecules N2 - Plasma-chemical bromination applied to graphitic materials, in particular to highly ordered pyrolytic graphite is reviewed. The resulting bromination efficiency of the plasma-chemical treatment was subject of systematic process optimization. The plasma of elemental bromine vapour produced bromine concentrations on graphene surfaces of more than 30 % Br/C using either inductively or capacitively coupled low-pressure radio-frequency plasmas. Plasma brominated graphite surfaces have been studied by Near Edge X-ray Absorption Fine Structure, X-ray Photoelectron Spectroscopy, Atomic Force Microscopy and Scanning Electron Microscopy. The introduction of bromine into graphene-like graphite layers and its binding situation were investigated. To study the physical effect of the plasma bromination process, Kr plasma was also used because of its chemical inertness but similar atomic mass. Covering the samples with a Faraday cage or with a LiF window should help to differentiate between physical, chemical and radiation effects of the plasma. Bromination was assigned to radical or electrophilic addition of bromine onto fully substituted aromatic double bonds (sp² C) with exothermal reaction enthalpy. Low bromination shows a strong decay of aromatic double bonds, higher bromination percentage let disappear all aromatic rings. The formed C–Br bonds were well suited for efficient grafting of organic molecules by post-plasma wet-chemical nucleophilic substitution. This grafting onto the graphene surface was demonstrated using aminosilane and different diamines. The bromination of double bonds changes the hybridization of carbon atoms from plane sp² to tetrahedral sp³ hybridization. Thus, the plane topography of graphene is destroyed and the conductivity is lost. KW - Graphene KW - Bromination KW - Grafting of diamines KW - Plasma KW - Organic graphting PY - 2014 DO - https://doi.org/10.1007/s11090-013-9509-x SN - 0272-4324 VL - 34 SP - 621 EP - 645 PB - Plenum Publ. Corp. CY - New York, NY, USA AN - OPUS4-30575 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Koprinarov, Ivaylo A1 - Ghode, Archana A1 - Geng, Sh. A1 - Kühn, Gerhard T1 - Plasma-based introduction of monosort functional groups of different type and density onto polymer surfaces. Part 1: Behaviour of polymers exposed to oxygen plasma N2 - Several approaches were investigated to produce monosort functionalized polymer surfaces with a high density and homogeneity of functional groups: (i) Plasma oxidation followed by wet-chemical reduction, (ii) formation of radicals and grafting on of functional group carrying molecules, (iii) plasma bromination followed by (iv) Williamson or Gabriel-like synthesis of spacer molecules, and (v) a pulsed plasma polymerization of functional groups bearing monomers or (vi) their copolymerisation with other comonomers. The formation of hydroxyl (OH), primary amino (NH2), and carboxyl (COOH) groups was studied in detail. The oxygen plasma treatment (i) in a low-pressure non-isothermal glow discharge results in the formation of a wide variety of O functional groups, polymer degradation and crosslinking. Low power densities and short exposure times (0.1 to 2 s) are required to functionalize a surface while preserving the original polymer structure. Carbonate, ester, and aromatic groups are rapidly degraded by an oxygen plasma treatment leading to scissions of polymer backbones and loss in molecular weight. Also the formation of macrocycles and C=C bonds was observed in a region of around 4 nm in depth. The investigated polymers could be classified by their degradation behaviour on exposure to the oxygen plasma.___TAGSTART___BR___TAGEND___ In order to maximize the process selectivity for OH groups, the variety of oxygen functionalities formed by the oxygen plasma was wet-chemically reduced by diborane, vitridetrade (Na complex), and LiAlH4. Typical yields were 9 to 14 OH groups per 100 carbon atoms.___TAGSTART___BR___TAGEND___ Plasma bromination (iii) (40 Br per 100 C atoms) of polymers, followed by grafting of spacer molecules (iv), has been proved to be a highly selective reaction.___TAGSTART___BR___TAGEND___ Another way to produce high densities of monosort functionalities was the pulsed plasma polymerization of functional group bearing monomers such as allylamine, allylalcohol or acrylic acid (v). The retention of chemical structure and functional groups during plasma polymerization was achieved by using low power densities and the pulsed plasma technique. The maximum yields were 30 OH, 18 NH2, and 24 COOH groups per 100 C atoms. To vary the density of functional groups a chemical copolymerization with ''chain-extending'' comonomers such as butadiene and ethylene was initiated in the pulsed plasma (vi). Additionally, the often-observed post-plasma oxidations of such layers initiated by reaction of trapped radicals with oxygen from the air were successfully suppressed by using NO gas as radical quencher. PY - 2003 DO - https://doi.org/10.1163/156855403765826865 VL - 10 IS - 2-3 SP - 139 EP - 171 PB - North-Holland CY - New York, NY AN - OPUS4-2705 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface Analysis of Plasma-Deposited Polymer Films, 2: Analysis of Post-Plasma Air Reacted Plasma Polymerized Styrene by X-Ray Photoelectron Spectroscopy and X-Ray Absorption Spectroscopy N2 - Chemical properties of plasma-polymerized styrene films can be effectively controlled by the appropriate choice of external plasma parameters, such as duty cycle, power and monomer pressure. Chemical properties here are the regularity of the primary structure, the amount of long living radicals and branching or cross-linking or both in plasma polymerized styrene films, which can be indirectly monitored by X-ray photoelectron spectroscopy (XPS) and near edge X-ray absorption fine structure (NEXAFS) spectroscopy. Principally, XPS and NEXAFS spectra of plasma-polymerized styrene show all the spectroscopic fingerprints characteristic of atactic polystyrene indicating an inherent similarity of the respective primary chemical structures. There is an increase in irregularity and radical concentration for the plasma deposited films with increasing duty cycle or power. With an increase in monomer pressure, a decreased level of monomer fragmentation and, consequently, an increase in regularity must be concluded from the experimental data. The applied power regulates the fragmentation of the monomers as monitored by spectroscopic signals correlated to the aromatic rings. A trend in the extent of the post-plasma oxygen incorporation according to the variation of the various external plasma parameters was deduced, which agrees with earlier ToF-SIMS findings KW - Chemical characterization KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization KW - Polystyrene PY - 2004 DO - https://doi.org/10.1002/ppap.200400022 SN - 1612-8850 SN - 1612-8869 VL - 1 SP - 134 EP - 140 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-6935 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Retzko, Iris A1 - Friedrich, Jörg Florian A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Chemical analysis of plasma-polymerized films: The application of X-ray photoelectron spectroscopy (XPS), X-ray absorption spectroscopy (NEXAFS) and fourier transform infrared spectroscopy (FTIR) N2 - Selected FTIR, XPS and NEXAFS spectroscopy results obtained with films deposited with different plasma polymerization processes and different monomers (styrene, acetylene, ethylene and butadiene) are presented. In detail FTIR spectra, XPS surveys, XPS valence bands and core level signals including shake-up features as well as carbon K-edge absorption spectra are qualitatively and, in some cases, semi-quantitatively considered. Information on the film formation, the chemistry of the films and the film stability against air exposure are derived from spectroscopic features. With styrene chemically rather well defined plasma polymer layers can be formed with rather high deposition rates applying a pulse plasma process. Using ethylene, acetylene or butadiene as a monomer in the plasma deposition process the deposition rates are smaller. Using these monomers plasma polymer films can be obtained with a primary chemical structure which is similar to each other but more or less different from those of the respective conventional polymers. The main difference between these samples is their individual concentration of unsaturated carbon species. Finally, a technologically relevant example, i.e. a plasma deposited polymer barrier layer deposited on the inner wall of a poly(ethylene) vessel is briefly considered. KW - Plasma polymer KW - Styrene KW - Ethylene KW - Acethylene KW - Butadiene KW - XPS KW - NEXAFS KW - FTIR KW - Chemical characterization KW - Deposition process KW - Stability PY - 2001 DO - https://doi.org/10.1016/S0368-2048(01)00330-9 SN - 0368-2048 SN - 1873-2526 VL - 121 IS - 2 SP - 111 EP - 129 PB - Elsevier CY - Amsterdam AN - OPUS4-6938 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Kühn, Gerhard A1 - Retzko, Iris A1 - Lippitz, Andreas A1 - Unger, Wolfgang A1 - Friedrich, Jörg Florian T1 - Homofunctionalized polymer surfaces formed by selective plasma processes N2 - Several possibilities exist to produce a modified polymer surface with a high density of only one sort of functional group such as: (i) the plasma grafting of unfragmented monomer molecules and their polymerization forms OH, NH2, COOH groups, etc. in concentrations of approximately 25 groups per 100 C atoms; (ii) selective plasma bromination provides 10–25 CBr groups; (iii) the plasma oxidation of polymer surfaces in an O2 plasma followed by the chemical reduction of all O-containing groups to OH groups by diborane, vitride™ (Na complex) or LiAlH4 yields 9–14 OH groups per 100 carbon atoms; and (iv) the grafting of spacers with different endgroups onto OH or CBr groups produces 7–10 spacer molecules/100 C. This work was focused on the formation of thin plasma deposited polymer layers with a maximum of (homo)functional groups and with a minimum of chemical irregularities using the pulsed plasma technique. The monomers were allylalcohol, allylamine, acrylonitrile and acrylic acid. The further intent was to study the interactions of functional groups (OH, COOH, NH2) and deposited metals (Cr, Al, Ti). It was expected that more basic (NH2), weakly basic or neutral (OH) or more acidic (COOH) groups would show different interactions and chemical reactions with metal atoms. KW - Pulsed plasma polymerization KW - Functional groups KW - Long-term stability KW - Polymer-metal composites PY - 2001 DO - https://doi.org/10.1016/S0257-8972(01)01056-8 SN - 0257-8972 VL - 142-144 SP - 494 EP - 500 PB - Elsevier Science CY - Lausanne AN - OPUS4-6971 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Friedrich, Jörg Florian A1 - Retzko, Iris A1 - Kühn, Gerhard A1 - Unger, Wolfgang A1 - Lippitz, Andreas T1 - Plasma polymers with chemically defined structures in contact with metals N2 - The retention of chemical structure and functional groups during plasma polymerization was investigated. Usually plasma polymer layers, prepared by a continuous wave radio-frequency plasma, are often chemically irregular in their structure and composition. To minimize these irregularities low wattages and the pulsed plasma technique were applied to avoid fragmentations. The first goal was to produce plasma polymers comprising double or triple bonds as precursors for electrically conducting polymers. Acetylene, ethylene, butadiene and polystyrene were used as monomers and deposited as thin polymer films by pulsed plasmas of low wattages. Styrene polymerization was strongly enhanced in the dark phase (plasma off) of a pulsed r.f. plasma caused by the reactivity of the vinyl-type double bond. This could be confirmed by a verification of a rather high chemical regularity of the film sample. The oxygen content of this film measured by X-ray photoelectron spectrometry (XPS) was in situ 0% and after 24 h exposure to air lower than 1%. Additionally, post-plasma oxidations of trapped radicals with air could be suppressed using NO gas as radical quencher. Such quenched plasma polymer layers were completely stable against oxidation for a number of weeks. During the low-wattage pulse plasma polymerization metal atoms were simultaneously or layer by layer evaporated into the growing layer and in situ measured by XPS. These metal atoms are acting as dopants. Here, Li, K, Mg and Cr were used at different concentrations providing electrical conductivity and magnetic properties for the film. KW - Pulsed plasma KW - Plasma polymerization KW - Doping with metal atoms KW - Encapsulation of nanoparticles PY - 2001 DO - https://doi.org/10.1016/S0257-8972(01)01051-9 SN - 0257-8972 VL - 142-144 SP - 460 EP - 467 PB - Elsevier Science CY - Lausanne AN - OPUS4-6972 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Retzko, Iris A1 - Friedrich, Jörg Florian A1 - Kühn, Gerhard A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Eine neue Generation von alterungsbeständigen Plasmapolymeren mit definierter chemischer Struktur T2 - 8. Neues Dresdner Vakuumtechnisches Kolloquium (NDVaK) CY - Dresden, Deutschland DA - 2000-10-19 PY - 2000 VL - 8 SP - 110 EP - 114 CY - Dresden AN - OPUS4-6974 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Koprinarov, Ivaylo A1 - Friedrich, Jörg Florian A1 - Wöll, Ch. T1 - K-Edge Soft X-ray Absorption (NEXAFS) Spectroscopy In Surface Chemical Analysis of Polymers T2 - International Discussion Meeting Advanced Methods of Polymer Characterization: New Developments and Applications in Industry CY - Mainz, Germany DA - 1999-03-15 PY - 1999 SP - P3.53 CY - Mainz AN - OPUS4-6925 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Koprinarov, Ivaylo A1 - Weiss, K. A1 - Wöll, Ch. ED - Mittal, K. T1 - The Application of Near Edge X-ray Absorption Fine Structures (NEXAFS) Spectroscopy and X-ray Photoelectron Spectroscopy (XPS) in Surface Analysis of Chromium-evaporated Polymers and Organic Films PY - 1998 SN - 90-6764-290-8 SP - 147 EP - 168 PB - VSP CY - Utrecht AN - OPUS4-6986 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Koprinarov, Ivaylo A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang A1 - Wöll, Ch. T1 - Oxygen plama induced degradation of the surface of poly(styrene), poly(bisphenol-A-carbonate) and poly(ethylene terephthalate) as observed by soft X-ray absorption spectroscopy (NEXAFS) KW - Oxygen DC plasma treatment KW - Plasma degradation KW - X-ray absorption spectroscopy (NEXAFS) PY - 1998 SN - 0032-3861 SN - 1873-2291 VL - 39 IS - 14 SP - 3001 EP - 3009 PB - Springer CY - Berlin AN - OPUS4-6990 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -