TY - CONF A1 - Omar, Hassan A1 - Hertwig, Andreas A1 - Szymoniak, Paulina A1 - Schönhals, Andreas T1 - Signature of the Adsorbed Layer on the glass transition of thin polymer Films: Broadband Dielectric spectroscopy and related techniques N2 - In well annealed thin polymer films with non-repulsive polymer/substrate interaction with a substrate an irreversibly adsorbed layer is expected to form. These adsorbed layers have shown a great potential for technological applications [1]. However, the growth kinetics and the molecular mobility of the adsorbed layer is still not fully understood. This concerns also the influence of the adsorbed layer on the thickness dependence of the glass transition temperature of thin films. This is partly due to the difficult accessibility of these layers in thin films. Here, the irreversibly adsorbed layers of semi-rigid mail chain polymers like polycarbonate or polysulfone are revealed by solvent-leaching experiments. First, the growth kinetics of these layers is investigated as a function of annealing time. The film thickness, topography and the quality of the adsorbed layer is controlled by Atomic Force Microscopy (AFM). Secondly, the molecular mobility of the adsorbed layer is investigated by Broadband Dielectric Spectroscopy (BDS). A developed nanostructured capacitor arrangement is employed to measure the layer with a free surface. In addition to the dielectric experiments, spectroscopic Ellipsometry measurements are carried out to estimate the glass transition of the thin films. The thickness dependence of the glass transition of the thin films is correlated with the adsorbed layer [2,3]. Acknowledgments D. Hülagü and G. Hidde thanked for the help with the ellipsometry measurements. T2 - 12. Conference on Broabband Dielectric Spectroscopy and its Application CY - Lisbon, Portugal DA - 01.09.2024 KW - Thin films PY - 2024 AN - OPUS4-60959 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hülagü, Deniz A1 - Hirahara, Kenta A1 - Fischer, Daniel A1 - Florian, Camilo A1 - Schusterbauer, Robert A1 - Ermilova, Elena A1 - Krüger, Jörg A1 - Unterreiner, Andreas-Neil A1 - Bonse, Jörn A1 - Hertwig, Andreas T1 - Using imaging ellipsometry to understand femtosecond laser materials processing of group IV materials N2 - Laser materials processing is an important tool for creating and shaping new materials. Laser machining, especially with ultrashort pulses offers the modification of surfaces, thin coatings, and bulk materials with an unprecedented precision and control. The most desired feature of pulsed laser processing in the femtosecond range is that the heat-affected zone in the irradiated material will be extremely small. To better understand the mechanisms involved during laser irradiation, it is important to analyse the outcome of light-matter interaction with spectroscopic methods. Ellipsometry, especially spectroscopic imaging ellipsometry (SIE), has become an important tool for this in recent times, as it gives access to local layer thicknesses, materials dielectric functions, and features like changes in surface roughness. This work includes an overview over our recent studies examining near-infrared fs-laser surface processing of different group IV materials. The superficial phase change of silicon from crystalline to amorphous has been investigated in the past as the result of laser processing strongly depends on the crystal orientation. Moreover, SIE is capable of determining the properties of buried a-Si interfaces with micrometer lateral and sub-nanoneter vertical precision. Additionally, the growth of native and laser-induced oxides can be revealed. T2 - ICSE10 - 10th International Conference on Spectroscopic Ellipsometry CY - Boulder, CO, USA DA - 08.06.2025 KW - Laser surface ablation KW - Amorphous Carbon KW - Silicon KW - Correlative Imaging Ellipsometry PY - 2025 AN - OPUS4-63633 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hertwig, Andreas T1 - Hochempfindliche Detektion von Gasen mittels SPR-Sensoren mit ellipsometrischen Messprinzip T2 - EFDS-Workshop "Analyse von Spurenverunreinigungen auf Oberflächen und in Gasen" CY - Dresden, Germany DA - 2013-12-02 PY - 2013 AN - OPUS4-30312 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hertwig, Andreas T1 - Accurate determination of film thickness and optical constants with ellipsometry T2 - Congrès International de Métrologie CY - Paris, France DA - 2013-10-07 PY - 2013 AN - OPUS4-30313 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hertwig, Andreas T1 - Vergleichbarkeit, Zuverlässigkeit und Genauigkeit der Bestimmung von Schichtdicken und optischen Konstanten mit Ellipsometrie an nicht-idealen Proben T2 - Seminar Messunsicherheit, PTB Berlin CY - Berlin, Germany DA - 2013-03-20 PY - 2013 AN - OPUS4-30314 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hertwig, Andreas T1 - Methoden zur optischen Analyse von dünnen Schichten mittels Ellipsometrie: Auswerteverfahren und Referenzmaterialien T2 - 7. VDI Fachtagung Messunsicherheit CY - Braunschweig, Deutschland DA - 2015-11-19 PY - 2015 AN - OPUS4-35111 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hertwig, Andreas T1 - IR ellipsometry - a new sampling technique in thin film analysis and nanotechnologies T2 - Sentech-Seminar on Thin Film Analysis CY - Dortmund, Germany DA - 2013-06-25 PY - 2013 AN - OPUS4-30594 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hertwig, Andreas T1 - Accuracy, traceability, and standardization in spectroscopic ellipsometry N2 - Ellipsometry has been an extremely successful and fast expanding method in the past decades along with other related techniques using polarisation sensitive measurements. Opening new fields of application for a successful measurement technique brings some requirements and issues that have to be solved. From a metrological point of view, ellipsometry has the problem that uncertainties are difficult to determine for model-based analysis techniques in general. In this presentation, we will explore how the usefulness of polarimetric methods like ellipsometry can be increased. Ellipsometry as a method could profit from several current developments which will be discussed in this presentation: • Standardisation initiatives on national and international level developing standards for best practice when using ellipsometry. A series of at least six standards is currently developed on national German and international level covering different levels of sample complexity. • Projects on traceability of ellipsometry and structured surface spectrometry as well as new dielectric function database initiatives. • Metadata handling and data ontology providing a better framework for exchange and collaborative use of research data. We will also explore the quantification of measurement uncertainty using examples from projects in which BAM is involved. Examples will be presented of multilayer and non-ideal materials as well as the determination of layer properties for technical applications such as thin layer catalysts and complex polymers. The definition of reference materials will be discussed. T2 - 11th Workshop Ellipsometry (WSE 11) CY - Steyr, Austria DA - 06.09.2021 KW - Ellipsometry KW - Uncertainty KW - Surface analytics KW - Data science PY - 2021 AN - OPUS4-53295 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hertwig, Andreas T1 - Characterisation of thin layers of Polydopamine used as functional coatings in X-Ray optics N2 - Polydopamine (PDA) is a biological / biomimetic polymer which has spiked considerable interest in recent years. Its monomer is an important neurotransmitter and it is one of the strongest glues produced by biological organisms. Polydopamine is a candidate for several applications, mainly in the field of biology and medicine, but also - recently - for layer coatings with optical, electrical, and mechanical function. In this work, we investigate PDA layers intended as reflectivity enhancers for mirror surfaces in X-ray astronomical observatories. It has previously been shown, that such X-ray telescopes can be improved by a coating of PDA in the thickness range of several nm. Accurate thickness determination is required to monitor and optimise the coating process. We use spectroscopic ellipsometry to determine first the dielectric function of the polydopamine layers using model coatings of sufficient thickness. This data is then used to accurately determine the layer thickness of much thinner PDA layers. This study resulted in data on the thickness and dielectric function of PDA layers that could lead to a better understanding of the correlation of layer thickness and layer properties depending on the process parameters. T2 - Deutsche Physikalische Gesellschaft - Frühjahrstagung CY - Berlin, Germany DA - 17.03.2024 KW - Ellipsometry KW - Polydopamine KW - Thin Polymer Layers KW - X-Ray Reflectometry KW - Biopolymers PY - 2024 AN - OPUS4-59760 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hertwig, Andreas A1 - Osterwald, Stephan A1 - Gerhold, Stefan T1 - Mess- und Prüfverfahren für Schichten und Schichtsysteme - Der DIN-Normausschuss 062-01-61 N2 - Die Funktionalität von modernen technischen Komponenten liegt meist in der Oberfläche und in Beschichtungen. Das Design und die Herstellungsqualität von Beschichtungen ist essenziell für die optischen, elektrischen, mechanischen und chemischen Eigenschaften von Bauteilen, sowie für den Korrosions- und Verschleißschutz. In diesem Gremium bearbeiten wir Normen für die Qualitätssicherung von dünnen Schichten verschiedener Art. Dabei betrachten wir Eigenschaften wie Schichtdicke, Zusammensetzung, Haltbarkeit, Korrosionsbeständigkeit und physikalische Parameter von dünnen Schichten mit sehr vielfältigen Techniken. Neben klassischen Verfahren aus der Galvanik und Schichtmesstechnik, werden dabei auch neuere spektroskopische Verfahren wie Ellipsometrie und THz-Reflektion bedeutend. Unser Gremium ist offen für neue Mitglieder aus der Oberflächen- und Beschichtungsgemeinschaft. T2 - ZVO Oberflächentage 2023 CY - Berlin, Germany DA - 13.09.2023 KW - Dünne Schichten KW - Galvanotechnik KW - Metallschichten KW - Messtechnik PY - 2023 AN - OPUS4-58432 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -