TY - CONF A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Reiners, Georg A1 - Weise, Matthias A1 - Hartung, J. A1 - Reinhold, E. A1 - Strümpfel, J. T1 - Ion-assisted vs. Plasma-assisted PVD: Preparation of Optical Multi-layers in a Versatile Cluster System Implementing Electron Beam and Sputter Technology T2 - 47th Annual Technical Conference Proceedings KW - Thin Film Technology KW - Ion-assisted PVD KW - Plasma-assisted PVD KW - Optical Multi-layers KW - Cluster Deposition System PY - 2004 SN - 0737-5921 SP - 86 EP - 90 PB - Society of Vacuum Coaters AN - OPUS4-3536 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Beck, Uwe A1 - Hertwig, Andreas A1 - Reiners, Georg A1 - Weise, Matthias A1 - Hartung, J. A1 - Reinhold, E. A1 - Strümpfel, J. T1 - Ion Assisted vs. Plasma Assisted PVD: Preparation of Optical Multilayers in a Versatile Cluster System Implementing Electron Beam and Sputter Technology JF - Society of vacuum coaters N2 - Functionality of optical systems requires optical coatings of high quality which have to be adapted to the application in terms of the performance of optical parameters such as reflectivity (AR, low, defined, high), the substrate material of interest (polymers, ceramics, and glass), the environmental conditions (such as temperature or humidity), and the service conditions (such spectral range and power density). Moreover, in many cases, additional non-optical requirements have to be met, including mechanical features such as scratch resistance, hardness and modulus. Consequently, thickness and overall uniformity requirements are steadily increasing. In general, these demands can usually not be achieved by a single film or coating. Instead, films with specific design features (such as gradients), layer stacks and multilayers are a prerequisite for high quality layers and their reliability. For the development of such layer systems, a versatile cluster deposition system consisting of three clusters and a cluster-to-cluster handler has been designed. Besides a PECVD cluster for DLC coatings, two PVD clusters implement ion assisted electron beam evaporation and plasmabased sputter technology. In addition to metallic films, preparation of oxide and nitride optical coatings (SiO2, TiO2, Ta2O5, ITO, Al2O3, TiN, AlN) in various process modifications (nonreactive, partially reactive, full-reactive; rf-, dc-, mf- mode; PEM control) has been carried out. Within this paper, the effect of several process parameters on layer quality (optical constants, density, and uniformity) is discussed for selected applications examples (AR- and HR coatings, applications at elevated temperatures and applications of enhanced mechanical performance). It has been shown that specific features of ion and plasma assisted PVD processes, including ion-beam and plasma preand post-treatment of substrates and layer systems, may widen the application range and improve functionality features of given coating/substrate systems. T2 - 47th Annual Technical Conference Proceedings CY - Dallas, TX, United States of America DA - 2004-04-24 KW - Ion assisted PVD KW - Optical multilayers KW - Plasma assisted PVD KW - Cluster deposition system PY - 2004 UR - http://www.knovel.com/knovel2/Toc.jsp?BookID=1082 SN - 0737-5921 SN - 1539-2236 SP - 86 EP - 90 CY - Albuquerque, NM AN - OPUS4-4148 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -