TY - JOUR A1 - Pellegrino, F. A1 - Isopescu, R. A1 - Pellutiè, L. A1 - Sordello, F. A1 - Rossi, A. M. A1 - Ortel, Erik A1 - Martra, G. A1 - Hodoroaba, Vasile-Dan A1 - Maurino, V. T1 - Machine learning approach for elucidating and predicting the role of synthesis parameters on the shape and size of TiO2 nanoparticles JF - Scientific Reports N2 - In the present work a series of design rules are developed in order to tune the morphology of TiO2 nanoparticles through hydrothermal process. Through a careful experimental design, the influence of relevant process parameters on the synthesis outcome are studied, reaching to the develop predictive models by using Machine Learning methods. The models, after the validation and training, are able to predict with high accuracy the synthesis outcome in terms of nanoparticle size, polydispersity and aspect ratio. Furthermore, they are implemented by reverse engineering approach to do the inverse process, i.e. obtain the optimal synthesis parameters given a specific product characteristic. For the first time, it is presented a synthesis method that allows continuous and precise control of NPs morphology with the possibility to tune the aspect ratio over a large range from 1.4 (perfect truncated bipyramids) to 6 (elongated nanoparticles) and the length from 20 to 140 nm. KW - Machine learning KW - Nanoparticles KW - Titanium dioxide KW - Size KW - Shape KW - Synthesis PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-515084 DO - https://doi.org/10.1038/s41598-020-75967-w VL - 10 IS - 1 SP - 18910 PB - Springer Nature AN - OPUS4-51508 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Stockmann, Jörg M. A1 - Radnik, Jörg A1 - Bütefisch, S. A1 - Busch, I. A1 - Weimann, T. A1 - Passiu, C. A1 - Rossi, A. A1 - Unger, Wolfgang T1 - A new test specimen for the determination of the field of view of small-area X-ray photoelectron spectrometers JF - Surface and Interface Analysis N2 - Small-area/spot photoelectron spectroscopy (SAXPS) is a powerful tool for the investigation of small surface features like microstructures of electronic devices, sensors or other functional surfaces, and so forth. For evaluating the quality of such microstructures, it is often crucial to know whether a small signal in a spectrum is an unwanted contamination of the field of view (FoV), defined by the instrument settings, or it originated from outside. To address this issue, the d80/20 parameter of a line scan across a chemical edge is often used. However, the typical d80/20 parameter does not give information on contributions from the long tails of the X-ray beam intensity distribution or the electron-optical system as defined by apertures. In the VAMAS TWA2 A22 project “Applying planar, patterned, multi-metallic samples to assess the impact of analysis area in surface-chemical analysis,” new test specimen was developed and tested. The here presented testing material consists of a silicon wafer substrate with an Au-film and embedded Cr circular and square spots with decreasing dimensions from 200 μm down to 5 μm. The spot sizes are traceable to the length unit due to size measurements with a metrological SEM. For the evaluation of the FoV, we determined the Au4f intensities measured with the center of the FoV aligned with the center of the spot and normalized to the Au4f intensity determined on the Au-film. With this test specimen, it was possible to characterize, as an example, the FoV of a Kratos AXIS Ultra DLD XPS instrument. T2 - ECASIA 2019 CY - Dresden, Germany DA - 15.09.2019 KW - Field of view KW - Reference material KW - Selected area XPS KW - Small-area XPS KW - Small-spot XPS PY - 2020 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-509902 DO - https://doi.org/10.1002/sia.6831 SN - 1096-9918 VL - 52 IS - 12 SP - 890 EP - 894 PB - John Wiley & Sons Ltd AN - OPUS4-50990 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Stockmann, Jörg M. A1 - Senoner, Mathias A1 - Weimann, T. A1 - Bütefisch, S. A1 - Passiu, C. A1 - Spencer, N. D. A1 - Rossi, A. T1 - Introduction to lateral resolution and analysis area measurements in XPS JF - Journal of Vacuum Science Technology A N2 - Imaging and small-spot (small area) XPS have become increasingly important components of surface chemical analysis during the last three decades, and its use is growing. Some ambiguity in the use of terminology, understanding of concepts, and lack of appropriate reference materials leads to confusing and not always reproducible data. In this paper, it is shown that by using existing knowledge, appropriate test specimens, and standardized approaches, problems of comparability and such reproducibility issues recently observed for XPS data reported in the scientific literature can be overcome. The standardized methods of ISO 18516:2019, (i) the straight-edge, (ii) the narrow-line, and (iii) the grating method, can be used to characterize and compare the lateral resolution achieved by imaging XPS instruments and are described by reporting examples. The respective measurements are made using new test specimens. When running an XPS instrument in the small-spot (small area) mode for a quantitative analysis of a feature of interest, the question arises as to what contribution to the intensity originates from outside the analysis area. A valid measurement approach to control the intensity from outside the nominal analysis area is also described. As always, the relevant resolution depends on the specific question that needs to be addressed. The strengths and limitations of methods defining resolution are indicated. KW - Imaging XPS KW - Lateral resolution KW - Analysis area measurements KW - Small-spot XPS PY - 2020 DO - https://doi.org/10.1116/6.0000398 VL - 38 IS - 5 SP - 053206 AN - OPUS4-51394 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -