TY - JOUR A1 - Vila-Comamala, J. A1 - Jefimovs, K. A1 - Raabe, J. A1 - Pilvi, T. A1 - Fink, R.H. A1 - Senoner, Mathias A1 - Maaßdorf, A. A1 - Ritala, M. A1 - David, C. T1 - Advanced thin film technology for ultrahigh resolution X-ray microscopy N2 - Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metalorganic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10 nm in width were resolved. KW - X-ray microscopy KW - X-ray diffractive optics KW - Electron-beam lithography KW - Atomic layer deposition KW - BAM-L200 KW - Laterale Auflösung KW - Referenzmaterial KW - Röntgenmikroskopie KW - Zonenplatte PY - 2009 U6 - https://doi.org/10.1016/j.ultramic.2009.07.005 SN - 0304-3991 VL - 109 IS - 11 SP - 1360 EP - 1364 PB - Elsevier CY - New York, NY AN - OPUS4-19976 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -