TY - JOUR A1 - Waegner, M. A1 - Schröder, M. A1 - Suchaneck, G. A1 - Sturm, Heinz A1 - Weimann, Christiane A1 - Eng, L.M. A1 - Gerlach, G. T1 - Enhanced piezoelectric response in nano-patterned lead zirconate titanate thin films N2 - In this work, Pb(Zr,Ti)O3 thin films were used to fabricate well-ordered nanodot arrays by means of nanosphere lithography. This technique is based on a two-step etch process that enables excellent control of the fabrication of ordered nanodisc arrays of defined height, diameter, and pitch. Piezoresponse force microscopy was used to investigate both non-patterned and patterned films. The topography and both the out-of-plane and the in-plane polarization were deduced in this mode. Grains of nanodots with a low aspect ratio form domain structures comparable to domains in non-patterned two-dimensional films. In contrast, nanodots with a higher aspect ratio form particular structures like bi-sectioned domain assemblies, c-shaped domains or multi-domains surrounding a center domain. The patterning of the ferroelectric material was shown to affect the formation of ferroelectric domains. The initial polycrystalline films with random polarization orientation re-orient upon patterning and then show domain structures dependent on the nanodisc diameter and aspect ratio. PY - 2012 U6 - https://doi.org/10.1143/JJAP.51.11PG04 SN - 0021-4922 VL - 51 SP - 11PG04-1 - 11PG04-5 CY - Tokyo AN - OPUS4-27697 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Waegner, M. A1 - Schröder, M. A1 - Suchaneck, G. A1 - Sturm, Heinz A1 - Weimann, Christiane A1 - Eng, L.M. A1 - Gerlach, G. T1 - Domain formation in nano-patterned PZT thin films N2 - In this work, reactive magnetron-sputtered Pb(Zr,Ti)O3 thin films were used to fabricate well-ordered nanodot arrays by means of nanosphere lithography (NSL). NSL is based on a two-step etch process by means of, firstly adjusting the diameter of polystyrene spheres in the self-assembled polymeric nanosphere mask using reactive ion etching, and secondly transferring the mask to the substrate by ion milling with adjusted heights. Hence, structures with different aspect ratios can be fabricated. Piezoresponse force microscopy was used as the inspection tool on both non-patterned and patterned films. Both the topography and polarization out of plane and in plane was deduced in this mode. Grains of nanodots with low aspect ratio form domain structures comparable to domains in non-patterned films. In contrast to that, nanodots with a higher aspect ratio form particular structures. The in-plane amplitude images show mostly a bisectioned domain assembly, while the out-of-plane amplitude images show in some cases more complex structures like 'c'-shaped domains or multi-domains around a center domain. The patterning of the ferroelectric material was shown to affect the formation of ferroelectric domains. The initial polycrystalline, randomly-ordered films are re-oriented and show domain structures depending on nanodisc diameter and aspect ratio. This may enable tailoring of ferroelectric materials in their piezoelectric and pyroelectric properties by patterning. T2 - MRS Spring meeting 2012 CY - San Francisco, CA, USA DA - 2012-04-09 KW - Nanostructure KW - Piezoresponse KW - Ferroelectric KW - Piezo response force microscopy KW - Nanodots PY - 2012 U6 - https://doi.org/10.1557/opl.2012.1230 SN - 1946-4274 SN - 0272-9172 VL - 1454 SP - 1 EP - 6(?) PB - Mater. Res. Soc CY - Warrendale, Pa. AN - OPUS4-26521 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Sturm, Heinz A1 - Schröter, Maria-Astrid A1 - Weimann, Christiane T1 - Imaging method for vibrating scanning force microscopy cantilevers for the analysis of mode shapes and nonlinear harmonic motion N2 - A specially designed scanning force microscope (SFM, atomic force microscope – AFM) was incorporated into the chamber of a commercial scanning electron microscope (SEM) to investigate vibrating SFM cantilevers at their resonance. Inherently, the spatial resolution of electron microscopy is higher than that of optical methods. In this paper we present vibration modes (eigenmodes) of two different SFM cantilevers. Their nonlinear behavior is also explored in order to depict their 2nd harmonics (twice the fundamental frequency). Imaging of the local vibration is performed by measuring the frequency- and phase-selective responses of the SE signal at different X and Y positions of the scanned electron beam. KW - Electron microscopy KW - Scanning force microscopy KW - Motion detection KW - Cantilever KW - Eigenmode KW - Harmonic KW - Nonlinearity KW - Harmonix cantilever PY - 2012 U6 - https://doi.org/10.1016/j.mee.2012.07.088 SN - 0167-9317 SN - 1873-5568 VL - 98 SP - 492 EP - 496 PB - Elsevier Science CY - Amsterdam, Netherlands AN - OPUS4-26431 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Fritzsche, Sven A1 - Pauw, Brian Richard A1 - Weimann, Christiane A1 - Sturm, Heinz T1 - First of its kind: A test artifact for direct laser writing N2 - With Direct Laser Writing (DLW) maturing in all aspects as a manufacturing technology a toolset for quality assurance must be developed. In this work we want to introduce a first of its kind test artifact. Test artifacts are standardized 3D models with specific geometric feature to evaluate the performance of writing parameters. Test artifacts are already common in other 3D additive manufacturing technologies e.g. Selective Laser Melting. The test artifact introduced in this work was developed in particular to accommodate 1) the high geometrical resolution of DLW structures and 2) the limited possibilities to examine the resulting structure. Geometric accuracy, surface adhesion as well as confocal raman spectroscopy results were considered when evaluating the design of the test artifact. We will explain the individual features and design considerations of our DLW test artifact. The difference between two slicers, Cura and 3DPoli, and the implications on measured feature sizes and the general shape is quantified. The measured geometries are used to derive a general design guide for a specific combination of photoresist, laser power and scanning speed and to analyse the geometric accuracy of a structure produced using these guidelines. KW - Multi photon lithography KW - Test artifact KW - Two photon polymerization KW - Direct Laser Writing KW - Quality infrastructure PY - 2022 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:b43-560530 SP - 1 EP - 29 PB - MDPI CY - Basel AN - OPUS4-56053 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Fritzsche, S. A1 - Weimann, Christiane A1 - Pauw, Brian Richard A1 - Sturm, Heinz T1 - 2PP-TestArtifact N2 - This repository contains a test artifact (TA), also called test structure, designed for two-photon polymerization (also known as Direct Laser Writing (DLW) or Two/Multi-photon lithography (2PA/MPA)). Test artifacts can be used to compare structures, to check options used by the slicer, check the state of the 2PP machine itself or to get a construction guidelines for a certain combination of power, velocity and settings. The associated paper can be found here: https://dx.doi.org/10.1088/1361-6501/acc47a General ideas behind the test artifact: 1. optimized for 2PP-DLW 2. should be fast and easy to analyse with optical microscopy or 3. scanning electron microscopy without tilt. 3. short time to fabricate 4. include a reasonable amount of different features 5. bulk and small structures on the substrate KW - Reference structure KW - Calibration structure KW - Test structure KW - Laser writing KW - Two-photon polymerization KW - 3D printing KW - Additive manufacturing KW - Microprinting KW - Multi-photon light structuring PY - 2023 U6 - https://doi.org/10.6084/m9.figshare.22285204.v2 PB - Digital Science CY - Cambridge, MA, USA AN - OPUS4-57165 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Braun, Ulrike A1 - Lorenz, Edelgard A1 - Weimann, Christiane A1 - Sturm, Heinz A1 - Karimov, I. A1 - Ettl, J. A1 - Meier, R. A1 - Wohlgemuth, W. A. A1 - Berger, H. A1 - Wildgruber, M. T1 - Mechanic and surface properties of central-venous port catheters after removal: A comparison of polyurethane and Silicon rubber materials N2 - Central venous port devices made of two different polymeric materials, thermoplastic polyurethane (TPU)and silicone rubber (SiR), were compared due their material properties. Both naïve catheters as well as catheters after removal from patients were investigated. In lab experiments the influence of various chemo-therapeutic solutions on material properties was investigated, where as the samples after removal were compared according to the implanted time inpatient. The macroscopic,mechanical performance was assessed with dynamic, specially adapted tests for elasticity. The degradation status of the materials was determined with common tools of polymer characterisation, such as infrared spectroscopy, molecular weight measurements and various methods of thermal analysis. The surface morphology was an alysed using scanning electron microscopy. A correlation between material properties and clinical performance was proposed. The surface morphology and chemical composition of the polyurethane catheter materials can potentially result in increased susceptibility of the catheter to bloodstream infections and thrombotic complications. The higher mechanic failure,especially with increasing implantation time of the silicone catheters is related to the lower mechanical performance compared to the polyurethane material as well as loss of barium sulphate filler particles near the surface of the catheter. This results in preformed microscopic notches, which act as predetermined sites of fracture. KW - Thermoplastic polyurethane (TPU) KW - Silicone rubber (SiR) KW - Catheters KW - Central venous access port KW - Complication KW - Structure propertyrelationship KW - Mechanical testing PY - 2016 U6 - https://doi.org/10.1016/j.jmbbm.2016.08.002 SN - 1751-6161 SN - 1878-0180 VL - 64 SP - 281 EP - 291 PB - Elsevier Ltd. AN - OPUS4-37178 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Schmidt, Wolfram A1 - Weimann, Christiane A1 - Chaves Weba, Luciana ED - Schmidt, Wolfram ED - Priebe, Nsesheye Susan T1 - Influences of hydration effects on the flow phenomena of concrete with admixtures N2 - Chemical admixtures like superplasticisers or stabilising agents are of ever increasing importance for modern concrete technology. They liberate the workability of concrete from its dependency on water content, and thus, open the gate towards innovative and future oriented concrete technologies such as self-compacting concrete. Today, admixture addition has become common practice in concrete technology, but the understanding of their highly complex mode of operation is extremely difficult and demands for understanding of processes within the range between nanometres and centimetres. Due to its complex time-dependent, multi-phase and multi-scale behaviour, flowable concrete systems are highly complicated and cannot be described comprehensively by simple models. It is therefore extremely challenging to identify the relevant parameters that predominantly control flow phenomena on different size scales, since these may occur on any scale between the nano scale (e.g. superplasticizer adsorption) and macro scale (e.g. grading of the aggregates). The present study discusses fundamental mechanisms at the interface between particle or hydrate surfaces and the fluid phase at a very early stage of concrete formation, and links these effects to macroscopic flow phenomena. Methods are discussed that appear promising interdisciplinary tools for enhancement of the understanding of the relevant interactions that are responsible for the macroscopic flow of flowable concrete. T2 - 2nd International Conference on Advances in Cement and Concrete Technology in Africa CY - Dar es Salaam, Tanzania DA - 27.01.2016 KW - Cement hydration KW - Polymer adsorption KW - Rheology KW - Superplasticizer KW - Self-compacting concrete PY - 2016 SN - 978-3-9817502-3-2 N1 - Geburtsname von Priebe, Nsesheye Susan: Msinjili, N. S. - Birth name of Priebe, Nsesheye Susan: Msinjili, N. S. SP - 79 EP - 88 PB - Bundesanstalt für Materialforschung und -prüfung (BAM) CY - Berlin AN - OPUS4-36875 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Fritzsche, Sven A1 - Pauw, Brian Richard A1 - Weimann, Christiane A1 - Sturm, Heinz T1 - First of its kind: a test artifact for direct laser writing N2 - With femtosecond-laser direct writing (fs-LDW) maturing in all aspects as a manufacturing technology, a toolset for quality assurance must be developed. In this work we introduce a first of its kind test artifact. Test artifacts are standardized 3D models with specific geometric features to evaluate the performance of writing parameters. Test artifacts are already common in other 3D additive manufacturing technologies e.g. selective laser melting. The test artifact introduced in this work was developed in particular to accommodate the high geometrical resolution of fs-LDW structures and the limited possibilities to examine the resulting structure. Geometric accuracy, surface adhesion as well as confocal Raman spectroscopy results were considered when evaluating the design of the test artifact. We will explain the individual features and design considerations of our fs-LDW test artifact. The difference between two slicers, Cura and 3DPoli, and the implications on measured feature sizes and the general shape is quantified. The measured geometries are used to derive a general design guide for a specific combination of photoresists, laser power and scanning speed and to analyze the geometric accuracy of a structure produced using these guidelines. The shown test artifact is publicly available as STL file on GitHub (https://github.com/BAMresearch/2PP-TestArtifact) and in the supplement. KW - Laser direct writing KW - Multi photon lithography KW - Reference material KW - Raman spectroscopy KW - Confocal raman imaging KW - Slicers KW - Open data on zenodo PY - 2023 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:kobv:b43-580951 VL - 34 IS - 7 SP - 1 EP - 14 PB - IOP Science AN - OPUS4-58095 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Fritzsche, Sven A1 - Pauw, Brian Richard A1 - Weimann, Christiane A1 - Sturm, Heinz T1 - Test artifact for fs-LDW N2 - Data to generate the given graphs in the publication as well as raw images of the shown images. KW - stl code KW - Images KW - Graphs KW - Data PY - 2023 U6 - https://doi.org/10.5281/zenodo.7671945 PB - Zenodo CY - Geneva AN - OPUS4-58096 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -