TY - JOUR A1 - Zydziak, N. A1 - Konrad, W. A1 - Feist, F. A1 - Afonin, S. A1 - Weidner, Steffen A1 - Barner-Kowollik, C. T1 - Coding and decoding libraries of sequence-defined functional copolymers synthesized via photoligation JF - Nature Communications N2 - Designing artificial macromolecules with absolute sequence order represents a considerable challenge. Here we report an advanced light-induced avenue to monodisperse sequencedefined functional linear macromolecules up to decamers via a unique photochemical approach. The versatility of the synthetic strategy—combining sequential and modular concepts—enables the synthesis of perfect macromolecules varying in chemical constitution and topology. Specific functions are placed at arbitrary positions along the chain via the successive addition of monomer units and blocks, leading to a library of functional homopolymers, alternating copolymers and block copolymers. The in-depth characterization of each sequence-defined chain confirms the precision nature of the macromolecules. Decoding of the functional information contained in the molecular structure is achieved via tandem mass spectrometry without recourse to their synthetic history, showing that the sequence information can be read.We submit that the presented photochemical strategy is a viable and advanced concept for coding individual monomer units along a macromolecular chain. KW - Photoligation KW - Copolymer sequence KW - MALDI-TOF MS/MS PY - 2016 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-391542 DO - https://doi.org/10.1038/ncomms13672 SN - 2041-1723 VL - 7 SP - Artikel Nr. 13672 AN - OPUS4-39154 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Steinkönig, J. A1 - Bloesser, F. R. A1 - Huber, B. A1 - Welle, A. A1 - Trouillet, V. A1 - Weidner, Steffen A1 - Barner, L. A1 - Roesky, P. W. A1 - Yuan, J. A1 - Goldmann, A. S. A1 - Barner-Kowollik, C. T1 - Controlled radical polymerization and in-depth mass-spectrometric characterization of poly(ionic liquid)s and their photopatterning on surfaces JF - Polymer Chemistry N2 - The preparation and characterization of poly(ionic liquid)s (PILs) bearing a polystyrene backbone via reversible addition fragmentation chain transfer (RAFT) polymerization and their photolithographic patterning on silicon wafers is reported. The controlled radical polymerization of the styrenic ionic liquid (IL) monomers ([BVBIM]X, X = Cl− or Tf2N−) by RAFT polymerization is investigated in detail. We provide a general synthetic tool to access this class of PILs with controlled molecular weight and relatively narrow molecular weight distribution (2000 g mol−1 ≤ Mn ≤ 10 000 g mol−1 with dispersities between 1.4 and 1.3 for p([BVBIM]Cl); 2100 g mol−1 ≤ MP ≤ 14 000 g mol−1 for p([BVBIM]Tf2N)). More importantly, we provide an in-depth characterization of the PILs and demonstrate a detailed mass spectrometric analysis via matrix-assisted laser desorption ionization (MALDI) as well as – for the first time for PILs – electrospray ionization mass spectrometry (ESI-MS). Importantly, p([BVBIM]Cl) and p([DMVBIM]Tf2N) were photochemically patterned on silicon wafers. Therefore, a RAFT agent carrying a photoactive group based on ortho-quinodimethane chemistry – more precisely photoenol chemistry – was photochemically linked for subsequent controlled radical polymerization of [BVBIM]Cl and [DMVBIM]Tf2N. The successful spatially-resolved photografting is evidenced by surface-sensitive characterization methods such as X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS). The presented method allows for the functionalization of diverse surfaces with poly(ionic liquid)s. KW - reversible addition fragmentation chain transfer (RAFT) polymerization KW - polyionic liquids KW - mass spectrometry KW - surface modification PY - 2016 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-355202 DO - https://doi.org/10.1039/C5PY01320H VL - 7 SP - 451 EP - 461 PB - Royal Society of Chemistry CY - Cambridge AN - OPUS4-35520 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -