TY - JOUR A1 - Yegen, E. A1 - Zimmermann, Uwe A1 - Unger, Wolfgang A1 - Braun, T. T1 - C-F bond cleavage during derivatization reactions of amino groups with TFBA and PFB at plasma-processed organic surfaces? N2 - Chemical derivatization XPS is used for the quantitative determination of amines at conventional organic surfaces, and it is also applied to plasma-processed aminated surfaces. When using TFBA and PFB as derivatization reagents for tagging primary amino groups, unexpected fluorine species were observed in the second case. The existence of reaction pathways other than those expected for amine derivatization with PFB or TFBA has to be assumed. This phenomenon is tentatively interpreted as the result of C—F bond cleavage during derivatization reactions of TFBA and PFB at plasma-polymerized allylamine and other plasma-processed aminated surfaces. As a consequence, quantification procedures based on derivatization by PFB or TFBA will underestimate amine surface concentrations. KW - Aminated surfaces KW - Chemical derivatization KW - ESCA KW - Plasma polymers KW - XPS PY - 2009 DO - https://doi.org/10.1002/ppap.200800100 SN - 1612-8850 SN - 1612-8869 VL - 6 IS - 1 SP - 11 EP - 16 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-18686 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Baytekin, H.T. A1 - Baytekin, B. A1 - Schulz, a. A1 - Springer, A. A1 - Gross, Thomas A1 - Unger, Wolfgang A1 - Artamonova, M. A1 - Schlecht, S. A1 - Lentz, D. A1 - Schalley, C.A. T1 - Metallo-supramolecular nanospheres via hierarchical self-assembly N2 - A novel coordination oligo/polymer is synthesized by metal-directed self-assembly from equimolar amounts of the (dppp)M(OTf)2 precursor complexes (dppp = bis-(diphenylphosphino)-propane, OTf = triflate; M = PdII or M = PtII) and banana-shaped bidentate dipyridyl ligands. The assemblies were characterized by ESI mass spectrometry and NMR spectroscopy. The analysis of the cloudy suspension prepared by dissolving the coordination polymer in aqueous methanol solutions indicates nanosized spherical objects to form. Evidence for vesicle formation from these metallo-supramolecular oligomers comes from (cryogenic) transmission electron microscopy (TEM, cryo-TEM). Atomic force microscopy revealed stable nanospheres on hydrophilic mica and monolayer formation on hydrophobic highly oriented pyrolitic graphite (HOPG) substrates. On mica, also torus-shaped object were observed, which are rationalized by vesicles that opened during the drying procedure and released the internal solvent. Elemental analysis of the nanoassemblies by X-ray photoelectron spectroscopy (XPS) indicates uncoordinated and coordinated pyridines in the coordination polymers that form the nanospheres. Various control experiments using different metal centers and modified ligands support the conclusions. KW - Self-assembly KW - Metallo-supramolecular chemistry KW - Coordination polymers KW - Vesicles KW - Electron microscopy KW - Nano-materials PY - 2009 DO - https://doi.org/10.1021/cm900642p SN - 0897-4756 SN - 1520-5002 VL - 21 IS - 13 SP - 2980 EP - 2992 PB - American Chemical Society CY - Washington, DC AN - OPUS4-19638 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Metrologie und Standardisierung in der Oberflächenanalytik mit XPS T2 - 1. Nutzertreffen deutscher Anwender von KRATOS ESCA-Spektrometern CY - Berlin, Germany DA - 2009-06-15 PY - 2009 AN - OPUS4-19539 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Graf, Nora A1 - Yegen, E. A1 - Gross, Thomas A1 - Lippitz, Andreas A1 - Weigel, W. A1 - Krakert, S. A1 - Terfort, A. A1 - Unger, Wolfgang T1 - XPS and NEXAFS studies of aliphatic and aromatic amine species on functionalized surfaces N2 - The chemical constitution of functionalized supports is an important parameter that determines their performance in a broad range of applications, e.g. for immobilization of biomolecules. Supports with amino functionalized surfaces are also often used for DNA microarray experiments. However, spectral data which have been reported for surfaces with amino functionalities suffer from some inconsistencies. In this article a detailed XPS (X-ray photoelectron spectroscopy) and NEXAFS (Near edge X-ray absorption fine structure) database for amino functionalized surfaces is presented. Amino-terminated surfaces prepared from aliphatic and aromatic aminosilanes or aminothiols and a field sample are considered. Effects of aging in air and damage by radiation are addressed as well. KW - Near edge X-ray absorption fine structure (NEXAFS) KW - Self-assembled monolayers KW - Amino-functionalized surfaces KW - X-ray photoelectron spectroscopy (XPS) PY - 2009 DO - https://doi.org/10.1016/j.susc.2009.07.029 SN - 0039-6028 VL - 603 IS - 18 SP - 2849 EP - 2860 PB - Elsevier CY - Amsterdam AN - OPUS4-19832 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - RPRT A1 - Senoner, Mathias A1 - Unger, Wolfgang A1 - Powell, C. T1 - Surface chemical analysis - General procedures - Determination of lateral resolution KW - AES KW - Contrast transfer function KW - Imaging KW - ISO TC 201 KW - Lateral resolution KW - Performance of imaging instruments KW - Quality management systems KW - Simulation KW - SIMS KW - XPS PY - 2009 SP - 1 EP - 65 AN - OPUS4-19158 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Winzer, Nicholas A1 - Xu, Ping A1 - Bender, S. A1 - Gross, Thomas A1 - Unger, Wolfgang A1 - Cross, Carl Edward T1 - Stress corrosion cracking of gas-tungsten arc welds in continuous-cast AZ31 Mg alloy sheet N2 - AZ31 Mg alloy sheet was welded using a gas-tungsten arc (GTA) process over inserts containing 2.3-9.3 wt.% Al. The welded specimens were susceptible to SCC in distilled water, with susceptibility increasing with decreasing weld metal Al (or β particle) concentration. Primary stress corrosion cracks initiated at the weld metal-HAZ interface by stress-assisted localised dissolution and propagated through the weld and base metals by transgranular and intergranular H-assisted fracture (TG-HAF and IG-HAF) respectively. The IG fracture mode may be intrinsic to the texture imparted upon the base metal by rolling. The increase in SCC susceptibility with decreasing weld metal Al concentration is contrary to the purported roles of β particles in promoting localised corrosion and as crack nucleation sites, but corresponds with increases in weld - base metal galvanic current density and weld metal localised corrosion susceptibility. KW - C. Stress corrosion KW - C. Hydrogen embrittlement KW - A. Magnesium KW - C. Welding PY - 2009 DO - https://doi.org/10.1016/j.corsci.2009.05.037 SN - 0010-938X VL - 51 IS - 9 SP - 1950 EP - 1963 PB - Elsevier CY - Orlando, Fla. AN - OPUS4-20049 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Unger, Wolfgang T1 - Metrological Challenges in Surface Micro/Nano Analysis (SMNA) T2 - 13th European Conference on Apllications of Surface and Interface Analysis, ECASIA 09 CY - Antalya, Turkey DA - 2009-10-18 PY - 2009 AN - OPUS4-20201 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Graf, Nora A1 - Gross, Thomas A1 - Wirth, Thomas A1 - Weigel, W. A1 - Unger, Wolfgang T1 - Application of XPS and ToF-SIMS for surface chemical analysis of DNA microarrays and their substrates N2 - The chemical composition of the functional surfaces of substrates used for microarrays is one of the important parameters that determine the quality of a microarray experiment. In addition to the commonly used contact angle measurements to determine the wettability of functionalized supports, X-ray photoelectron spectroscopy (XPS) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) are more specific methods to elucidate details about the chemical surface constitution. XPS yields information about the atomic composition of the surface, whereas from ToF-SIMS, information on the molecular species on the surface can be concluded. Applied on printed DNA microarrays, both techniques provide impressive chemical images down to the micrometer scale and can be utilized for label-free spot detection and characterization. Detailed information about the chemical constitution of single spots of microarrays can be obtained by high-resolution XPS imaging. KW - Microarrays KW - Surface analysis KW - XPS KW - ToF-SIMS KW - Chemical imaging PY - 2009 DO - https://doi.org/10.1007/s00216-009-2599-x SN - 1618-2642 SN - 1618-2650 VL - 393 IS - 8 SP - 1907 EP - 1912 PB - Springer CY - Berlin AN - OPUS4-19245 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Seah, M.P. A1 - Unger, Wolfgang A1 - Wang, H. A1 - Jordaan, W. A1 - Gross, Thomas A1 - Dura, J.A. A1 - Moon, D.W. A1 - Totarong, P. A1 - Krumrey, M. A1 - Hauert, R. A1 - Zhiqiang, M. T1 - Ultra-thin SiO2 on Si IX: absolute measurements of the amount of silicon oxide as a thickness of SiO2 on Si N2 - Results from a study conducted between National Metrology Institutes (NMIs) for the measurements of the absolute thicknesses of ultra-thin layers of SiO2 on Si are reported. These results are from a key comparison and associated pilot study under the auspices of the Consultative Committee for Amount of Substance. ´Amount of substance´ may be expressed in many ways, and here the measurand is the thickness of the silicon oxide layers with nominal thicknesses in the range 1.5-8 nm on Si substrates, expressed as the thickness of SiO2. Separate samples were provided to each institute in containers that limited the carbonaceous contamination to approximately < 0.3 nm. The SiO2 samples were of ultra-thin on (100) and (111) orientated wafers of Si. The measurements from the laboratories which participated in the study were conducted using ellipsometry, neutron reflectivity, X-ray photoelectron spectroscopy or X-ray reflectivity, guided by the protocol developed in an earlier pilot study. A very minor correction was made in the different samples that each laboratory received. Where appropriate, method offset values attributed to the effects of contaminations, from the earlier pilot study, were subtracted. Values for the key comparison reference values (agreed best values from a Consultative Committee study) and their associated uncertainties for these samples are then made from the weighted means and the expanded weighted standard deviations of the means of these data. These results show a dramatic improvement on previous comparisons, leading to 95% uncertainties in the range 0.09-0.27 nm, equivalent to 0.4-1.0 monolayers over the 1.5-8.0 nm nominal thickness range studied. If the sample-to-sample uncertainty is reduced from its maximum estimate to the most likely value, these uncertainties reduce to 0.05-0.25 nm or ~1.4% relative standard uncertainties. The best results achieve ~1% relative standard uncertainty. It is concluded that XPS has now been made fully traceable to the SI, for ultra-thin thermal SiO2 on Si layers, by calibration using wavelength methods in an approach that may be extended to other material systems. KW - Attenuation length KW - Calibration KW - Silicon dioxide KW - Thickness KW - Ultra-thin oxide PY - 2009 DO - https://doi.org/10.1002/sia.3045 SN - 0142-2421 SN - 1096-9918 VL - 41 IS - 5 SP - 430 EP - 439 PB - Wiley CY - Chichester AN - OPUS4-19246 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gross, Thomas A1 - Kühn, Gerhard A1 - Unger, Wolfgang T1 - Photoelectron spectroscopy on organic surfaces: X-ray degradation of oxygen-plasma-treated and chemically reduced poly(propylene) surfaces in comparison to conventional polymers N2 - The X-ray-induced sample damage during mono XPS analysis of an oxygen-plasma-oxidized and subsequently wet-chemically reduced poly(propylene) film was investigated as a showcase for plasma-modified or plasma-deposited samples. By doing this, the degradation index approach as introduced by Beamson and Briggs in the Scienta ESCA300 high-resolution XPS database of organic polymers has been adopted. As to be expected, the sample degrades by loosing oxygen as revealed by observation of decreasing O/C and COR/Csum ratios. However, the X-ray degradation indices are definitely higher than those of conventional reference polymers. Moreover, the COR/Csum degradation index is significantly higher in comparison with one obtained for the O/C ratio. In that context, there is no difference between the plasma sample and a conventional poly(vinyl alcohol) polymer. It is concluded that for reliable quantitative surface chemical analysis, the quality of spectra in terms of acquisition times must be optimized aimed to a minimization of X-ray degradation. Finally, it is proposed to describe the photon flux of an X-ray gun in an XPS experiment, which defines the degradation rate at the end, by using the sample current simply measured with a carefully grounded sputter-cleaned reference silver sample. KW - Photoelectron spectroscopy KW - ESCA/XPS KW - Surfaces KW - Surface modification KW - Poly(propylene) (PP) KW - Plasma treatment KW - X-ray KW - Degradation PY - 2009 DO - https://doi.org/10.1002/sia.3024 SN - 0142-2421 SN - 1096-9918 VL - 41 IS - 5 SP - 445 EP - 448 PB - Wiley CY - Chichester AN - OPUS4-19252 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -