TY - JOUR A1 - Müller, Bernd R. A1 - Görner, Wolf A1 - Hentschel, Manfred P. A1 - Riesemeier, Heinrich A1 - Krumrey, M. A1 - Ulm, G. A1 - Diete, W. A1 - Klein, U. A1 - Frahm, R. T1 - BAMlin - the first hard X-ray beamline at BESSY II JF - Nuclear instruments and methods in physics research A N2 - The first hard X-ray beamline at BESSY II will be installed by BAM and PTB at a superconducting 7 T wavelength shifter. The main optical elements of the beamline are a Double-Multilayer-Monochromator and a Double-Crystal-Monochromator. The two devices can be used separately or in-line. Main applications of monochromatic radiation with photon energies up to 50 keV are X-ray fluorescence analysis, micro-computed tomography, X-ray topography, detector calibration and reflectometry. Calculable undispersed radiation up to 200 keV will be available for radiometric applications. KW - Double-Multilayer-Monochromator with meridional bender KW - Double-Crystal-Monochromator with sagittal bender KW - X-ray fluorescence analysis KW - Micro-computed tomography KW - X-ray topography KW - Detector calibration KW - Reflectometry PY - 2001 DO - https://doi.org/10.1016/S0168-9002(01)00466-1 SN - 0168-9002 SN - 0167-5087 VL - 467-468 IS - 1 SP - 703 EP - 706 PB - North-Holland CY - Amsterdam AN - OPUS4-1171 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Thomsen-Schmidt, P. A1 - Hasche, K. A1 - Ulm, G. A1 - Herrmann, K. A1 - Krumrey, M. A1 - Ade, G. A1 - Stümpel, J. A1 - Busch, I. A1 - Schädlich, S. A1 - Schindler, A. A1 - Frank, W. A1 - Hirsch, D. A1 - Procop, Mathias A1 - Beck, Uwe T1 - Realisation and metrological characterisation of thickness standards below 100 nm JF - Applied physics A N2 - High-accuracy film thickness measurements in the range below 100 nm can be made by various complex methods like spectral ellipsometry (SE), scanning force microscopy (SFM), grazing incidence X-ray reflectometry (GIXR), or X-ray fluorescence analysis (XRF). The measurement results achieved with these methods are based on different interactions between the film and the probe. A key question in nanotechnology is how to achieve consistent results on a level of uncertainty below one nanometre with different techniques. Two different types of thickness standards are realised. Metal film standards for X-ray techniques in the thickness range 10 to 50 nm are calibrated by GIXR with monochromatised synchrotron radiation of 8048 eV. The results obtained at four different facilities show excellent agreement. SiO2 on Si standards for SE and SFM in the thickness range 6 to 1000 nm are calibrated by GIXR with monochromatised synchrotron radiation of 1841 eV and with a metrological SFM. Consistent results within the combined uncertainties are obtained with the two methods. Surfaces and interfaces of both types of standards are additionally investigated by transmission electron microscopy (TEM). PY - 2004 DO - https://doi.org/10.1007/s00339-003-2273-7 SN - 0947-8396 VL - 78 IS - 5 SP - 645 EP - 649 PB - Springer CY - Berlin AN - OPUS4-17195 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hornemann, A. A1 - Eichert, D. A1 - Flemig, Sabine A1 - Ulm, G. A1 - Beckhoff, B. T1 - Qualifying label components for effective biosensing using advanced high-throughput SEIRA methodology JF - Physical chemistry, chemical physics N2 - The need for technological progress in bio-diagnostic assays of high complexity requires both fundamental research and constructing efforts on nano-scaled assay recognition elements that can provide unique selectivity and design-enhanced sensitivity features. Nanoparticle induced sensitivity enhancement and its application related to multiplexed capability Surface-Enhanced InfraRed Absorption (SEIRA) assay formats are well suitable for these purposes. The potential of diverse fluorophore–antibody conjugates, being chemisorbed onto low-cost gold nanoparticulate SEIRA substrates, has been explored with respect to their spectral discriminability. These novel biolabels deliver molecular SEIRA fingerprints that have been successfully analyzed by both uni- and multivariate analyzing tools, to discriminate their multiplexing capabilities. We show that this robust spectral encoding via SEIRA fingerprints opens up new opportunities for a fast, reliable and multiplexed high-end screening in biodiagnostics. KW - SEIRA methodology KW - bio-diagnostic KW - nanotechnology PY - 2015 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-351389 DO - https://doi.org/10.1039/C4CP05944A SN - 1463-9076 SN - 1463-9084 VL - 17 IS - 14 SP - 9471 EP - 9479 PB - The Royal Soc. of Chemistry CY - Cambridge AN - OPUS4-35138 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Vogel, Christian A1 - Hermann, P. A1 - Kästner, B. A1 - Adamczyk, Burkart A1 - Hoehl, A. A1 - Ulm, G. A1 - Adam, Christian T1 - Air and chlorine gas corrosion of different silicon carbides analyzed by nano-Fourier-transform infrared (nano-FTIR) spectroscopy JF - Corrosion Science N2 - The present study shows the potential of high-resolution imaging and nano-Fourier-transform infrared (nano-FTIR) spectroscopy for corrosion science. The protective oxidation layers of different chlorine-gas treated silicon carbides (SiCs) were characterized with these techniques. A nitrified SiC showed the highest resistant strength against chlorine corrosion at 1000 °C compared to the other SiCs. Nano-FTIR spectroscopy with a lateral resolution below 40 nm detected differences in the crystallinity of the bulk-SiC and in the transitional region to the protective layer. Furthermore, high-resolution imaging provides deep insight in the interfacial layer between bulk-SiC and the protective oxidation layer on sub-micrometer scale. KW - Nano-Fourier-transform infrared spectroscopy KW - Scattering-type scanning near-field optical microscopy (s-SNOM) KW - Synchrotron radiation KW - Corrosion KW - Silicon carbide KW - Chlorine PY - 2018 DO - https://doi.org/10.1016/j.corsci.2017.12.002 SN - 0010-938X VL - 131 SP - 324 EP - 329 PB - Elsevier AN - OPUS4-43648 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -