TY - JOUR A1 - Gross, Thomas A1 - Treu, Dieter A1 - Unger, Wolfgang T1 - Standard operating procedure (SOP) for the quantitative determination of organic silicon compounds at the surface of elastomeric sealants N2 - Elastomeric sealants may contain organic silicon compounds. The use of these sealants for housings for electronic components is harmful for the reliability of electric contacts inside. In order to prevent electronic components from malfunction, quality control of elastomeric sealants is required. An analytical procedure developed to fulfil this requirement was developed. It is based on electron spectroscopy for chemical analysis (ESCA). Information on the silicon compounds existing at the surface of elastomeric sealants is provided by this method. Silicon in organic and inorganic compounds can be differentiated with the help of Si 2p photoelectron spectra. Quantitative results can be obtained too. The uncertainty budget of the quantitative procedure is estimated. T2 - 11th Conference on Applied Surface Analysis (AOFA) CY - Leipzig, Germany DA - 2000-09-24 KW - ESCA KW - Silicone KW - Standard operation procedure PY - 2001 SN - 0169-4332 SN - 1873-5584 VL - 179 IS - 1-4 SP - 109 EP - 112 PB - North-Holland CY - Amsterdam AN - OPUS4-977 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Retzko, Iris A1 - Unger, Wolfgang A1 - Schulz, H. A1 - Scheibe, H.-J. A1 - Treu, Dieter A1 - Matsubayashi, N. T1 - Analysis of carbon materials by XPS T2 - Materials Week 2002 ; European Congress on Advanced Materials, their Processes and Applications ; 6th International Conference on Joining Ceramics, Glass and Metal CY - Munich, Germany DA - 2002-09-30 PY - 2002 SN - 3-88355-314-X PB - Werkstoff-Informationsges. AN - OPUS4-1734 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Graf, Nora A1 - Yegen, E. A1 - Lippitz, Andreas A1 - Treu, Dieter A1 - Wirth, Thomas A1 - Unger, Wolfgang T1 - Optimization of cleaning and aminosilanization protocols for Si wafers to be used as platforms for biochip microarrays by surface analysis (XPS, ToF-SIMS and NEXAFS spectroscopy) N2 - It is known that aminosilanized Si wafers may be used as microarray platforms. Results of an XPS study of a cleaning applied to Si wafers prior to aminosilanization are presented and discussed. Furthermore, the results of an aminosilanization protocol optimized in terms of nitrogen chemistry are described. After optimization of the protocol a free amine content of 94% was reached. The surface chemistry was investigated in this study by using XPS, time of flight (ToF)-SIMS and near-edge X-ray absorption fine structure (NEXAFS) spectroscopy. Reference to aminosilanization protocols reported in the literature has been made. KW - Aminosilanization KW - Si wafers KW - Microarray KW - XPS KW - ToF-SIMS KW - NEXAFS PY - 2008 U6 - https://doi.org/10.1002/sia.2621 SN - 0142-2421 SN - 1096-9918 VL - 40 IS - 3-4 SP - 180 EP - 183 PB - Wiley CY - Chichester AN - OPUS4-17192 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Yegen, E. A1 - Lippitz, Andreas A1 - Treu, Dieter A1 - Unger, Wolfgang T1 - Derivatization of amino groups by pentafluorobenzaldehyde (PFB) as observed by XPS and NEXAFS spectroscopy on spin coated 4,4'-methylenebis(2,6-diethylaniline) films N2 - A toluene solution of 4,4´-methylenebis(2,6-diethylaniline) was spin coated on Si wafers. The samples were derivatized with pentafluorobenzaldehyde (PFB) in order to determine the primary amino groups on the surface. XPS C 1s and N 1s and C and N K-edge NEXAFS of underivatized and derivatized films were carefully analyzed. The result was that after 10 min of exposure the gas-surface reaction was already completed. A reasonable derivatization reaction yield in the order of 90% is derived from the experiments. This number correlates well to a reaction yield obtained by a wet chemical approach. KW - Amino groups KW - Derivatization KW - PFB KW - XPS KW - NEXAFS PY - 2008 U6 - https://doi.org/10.1002/sia.2685 SN - 0142-2421 SN - 1096-9918 VL - 40 IS - 3-4 SP - 176 EP - 179 PB - Wiley CY - Chichester AN - OPUS4-17193 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Baytekin, H.T. A1 - Wirth, Thomas A1 - Gross, Thomas A1 - Treu, Dieter A1 - Sahre, Mario A1 - Theisen, J. A1 - Schmidt, M. A1 - Unger, Wolfgang T1 - Determination of wettability of surface-modified hot-embossed polycarbonate wafers used in microfluidic device fabrication via XPS and ToF-SIMS N2 - The wettability of the surfaces inside the microchannels of a microfluidic device is an important property considering a liquid flows through them. Contact angle measurements usually applied to test the wettability of surfaces cannot be used for an analysis of microchannel walls within microfluidic devices. A workaround is the use of surface analytical methods, which are able to reach points of interest in microchannels and may provide information on the surface chemistry established there. In calibrating these methods by using flat polymer wafers, where the contact angle can be measured as usual, data measured in real microchannels can be evaluated in terms of wetting properties. Reference wafers of bisphenol-A polycarbonate, a polymeric material that is often used in fluidic microdevice fabrication, were treated under different oxygen plasma conditions. The modified surfaces were characterized by using XPS, time of flight (ToF)-SIMS and atomic force microscope (AFM). Surface chemistry and surface topography have been correlated with contact angle measurements. In addition, effects of ageing or rinsing after plasma treatment have also been investigated. KW - Oxygen plasma KW - Polycarbonate KW - XPS KW - ToF-SIMS KW - Principal component analysis PY - 2008 U6 - https://doi.org/10.1002/sia.2724 SN - 0142-2421 SN - 1096-9918 VL - 40 IS - 3-4 SP - 358 EP - 363 PB - Wiley CY - Chichester AN - OPUS4-17340 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Retzko, Iris A1 - Treu, Dieter A1 - Matsubayashi, N. A1 - Imamura, M. A1 - Tanaka, T. A1 - Schulz, H. A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Analysis of carbon materials and plasma polymers by X-ray photoelectron spectroscopy and X-ray absorption spectroscopy (XPS, XAS) T2 - AIST-BAM Symposium on Materials Surface Technology in Twin Institute Programme CY - Tsukuba, Japan DA - 2003-02-18 PY - 2003 SP - 59 EP - 65 AN - OPUS4-6928 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hantsche, Harald A1 - Schmidt, Dieter A1 - Kempf, Gerhard A1 - Treu, Dieter ED - Vetters, H. T1 - Fortschritte bei der Automatisierung der energiedispersiven Röntgenmikroanalyse T2 - 10. Sitzung d. Arbeitskreises Rastermikroskopie in der Materialprüfung, DVM-Tag CY - Dortmund, Germany DA - 13.10.1981 PY - 1982 SP - 21 EP - 28 CY - Berlin AN - OPUS4-36328 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Gross, Thomas A1 - Treu, Dieter A1 - Ünveren, E. A1 - Kemnitz, G. A1 - Unger, Wolfgang T1 - Characterization of Cr(III) compounds of O, OH, F and Cl by XPS N2 - Cr2O3, CrCl3, α-CrF3, CrF3·3H20 and Cr(OH)3 were investigated by x-ray photoelectron (XPS) and x-ray excited Auger electron spectroscopy (XAES) using a latest generation XPS spectrometer. Non-conductive powders are analyzed with ultimate energy resolution. Multiplet splitting features and/or satellite emission were observed in the Cr 2p and Cr 3s spectra. Cr(III) compounds are of interest in many applications as for example in corrosion and catalysis. Chromia and chromium-III-fluoride activated by reaction with fluoroalkanes are very promising industrial catalysts. It is the aim of this selection of spectral reference data to enable deeper insight in the formation of catalytically active fluorinated chromia phases by using XPS analysis. KW - Chromium(III) compound KW - Cr2O3 KW - CrCl3 KW - Cr(OH)3 KW - CrF3 KW - CrF3.3H2O KW - XPS KW - XAES KW - Multiplet splitting KW - Satellite KW - Powder chromium(III) compounds PY - 2008 U6 - https://doi.org/10.1116/11.20080801 SN - 1055-5269 SN - 1520-8575 VL - 15 SP - 77 EP - 123 PB - AIP CY - Woodbury, NY AN - OPUS4-23387 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Griebenow, Werner A1 - Werthmann, Barbara A1 - Treu, Dieter A1 - Hörn, K. A1 - Krause, S. T1 - Zur Identifizierung von Tinten auf alten Handschriften PY - 1983 SN - 0025-1445 SN - 0342-3719 VL - 89 IS - 3 SP - 208 EP - 212 PB - Callwey CY - München AN - OPUS4-38963 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Dietrich, Paul A1 - Treu, Dieter A1 - Kalbe, Henryk A1 - Krumrey, M. A1 - Gross, Thomas A1 - Marti, K. A1 - Unger, Wolfgang T1 - Experimental determination of the effective attenuation length of palladium 3d 5/2 photoelectrons in a magnetron sputtered Pd nanolayer N2 - An electron effective attenuation length (EAL) of 1.68nm for Al Kα excited Pd 3d 5/2 photoelectrons with a kinetic energy of 1.152 keV has been determined experimentally using a sputtered Pd film deposited on an ultra flat fused quartz substrate. The film thickness was reduced by Ar ion sputtering several times in order to obtain different Pd film thicknesses which are used to determine experimental EAL values. These results are compared to data generated by using a Simulation of Electron Spectra for Surface Analysis (SESSA) simulation using an inelastic mean free path (IMFP) calculated with the Tanuma–Powell–Penn (TPP)-2M formula and with ‘elastic scattering on and off’. Contributions to the uncertainty budget related to the experimental approach are discussed in detail. Proposals on how to further improve the approach are suggested. KW - Pd 3d KW - Electron effective attenuation length KW - XPS PY - 2017 UR - http://onlinelibrary.wiley.com/doi/10.1002/sia.6141/abstract?campaign=woletoc U6 - https://doi.org/10.1002/sia.6141 SN - 0142-2421 SN - 1096-9918 VL - 49 IS - 5 SP - 464 EP - 468 PB - John Wiley & Sons, Ltd AN - OPUS4-39682 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -