TY - GEN A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Unger, Wolfgang A1 - Österle, Werner A1 - Kaiander, I. A1 - Sellin, R. L. A1 - Bimberg, D. ED - Wilkening, G. ED - Koenders, L. T1 - Testing the Lateral Resolution in the Nanometre Range with a New Type of Certified Reference Material T2 - NanoScale 2004 Seminar ; 6th Seminar on Quantitative Microscopy ; 2nd Seminar on Nanoscale Calibration Standards and Methods CY - Braunschweig, Germany DA - 2004-03-25 KW - Laterale Auflösung KW - Nanometrologie KW - Nanotechnologie KW - Oberflächenanalytik KW - Zertifiziertes Referenzmaterial PY - 2004 SN - 3-527-40502-X DO - https://doi.org/10.1002/3527606661.ch21 SP - 282 EP - 294 PB - Wiley-VCH CY - Weinheim AN - OPUS4-7541 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias T1 - A new nanoscaled strip-pattern for the determination of lateral resolution in surface analysis T2 - 11th European Conference on Applications of Surface and Interface Analysis ECASIA`05 CY - Vienna, Austria DA - 2005-09-25 PY - 2005 AN - OPUS4-10861 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Unger, Wolfgang T1 - Teststreifen für den Nanokosmos KW - Laterale Auflösung KW - Nanometrologie KW - Nanotechnologie KW - Oberflächenanalytik KW - Zertifiziertes Referenzmaterial PY - 2004 UR - http://www.laborpraxis.de/ SN - 0344-1733 SN - 1610-8256 VL - 27 IS - Juli/Aug SP - 30 EP - 32, Sonderh. Nanotechnologie PB - Vogel CY - Würzburg AN - OPUS4-3808 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias T1 - Qualitätssicherung in der Nanoanalytik T2 - Abschlussworkshop zum Projektverbund "Nanoskalige Kalibriermethoden- und Normale" CY - Braunschweig, Deutschland DA - 2002-11-19 PY - 2002 AN - OPUS4-2124 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Senoner, Mathias A1 - Unger, Wolfgang A1 - Reiners, Georg T1 - Quality assurance in nano-scale analysis N2 - Zusammenfassung Some methods of nano-scale analysis are on the threshold of being a standard method in industry and therefore quality assurance becomes important. But, at the present time, there are deficits in standardisation and validation of these methods. Therefore, we have organised method comparisons and interlaboratory comparisons to overcome these deficits. We report the results of an interlaboratory comparison in step-height determination by atomic force microscopy and the development of a reference material for laterally resolving methods of material analysis. PY - 2003 DO - https://doi.org/10.1007/s00339-002-1976-5 SN - 0947-8396 VL - 76 IS - 6 SP - 919 EP - 921 PB - Springer CY - Berlin AN - OPUS4-2289 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias ED - Jäckel, R. T1 - Ein neues zertifiziertes Referenzmaterial für die Analyse von Oberflächenstrukturen im Nanometerbereich KW - zertifiziertes Referenzmaterial KW - Nanotechnologie KW - Oberflächenanalytik KW - Halbleiter-Schichtstrukturen KW - SIMS PY - 2003 UR - http://www.nanotechnology.de/ger/s19/broschuere.pdf SP - 22 EP - 23 PB - Fraunhofer-Institut für Werkstoff- und Strahltechnik CY - Dresden AN - OPUS4-2886 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Koenders, L. A1 - Dziomba, T. A1 - Thomsen-Schmidt, P. A1 - Senoner, Mathias T1 - Normale für die dimensionelle und analytische Nanometrologie KW - Nanometrologie KW - Nanoschichten KW - Nanotechnologie KW - Oberflächenanalytik KW - Zertifiziertes Referenzmaterial PY - 2004 SN - 0030-834X VL - 114 IS - 1 SP - 16 EP - 24 PB - Wirtschaftsverl. NW CY - Bremerhaven AN - OPUS4-3001 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Paatsch, Wolfgang A1 - Beck, Uwe A1 - Senoner, Mathias T1 - Development of reference materials for surface technology in the micrometer and nanometer range T2 - AESF SUR/FIN 2004 ; Interfinish 2004 World Congress CY - Chicago, IL, USA DA - 2004-06-28 KW - Reference materials KW - Zerstörungsfreie Prüfung KW - Referenzmaterialien PY - 2004 SP - 369 EP - 385 PB - American Electroplaters and Surface Finishers Society (AESF) CY - Orlando AN - OPUS4-4130 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias T1 - BAM-L002 - A new type of certified reference material for length calibration and testing of lateral resolution in the nanometre range T2 - 10th European Conference on Applications of Surface and Interface Analysis (ECASIA '03) CY - Berlin, Germany DA - 2003-09-05 PY - 2003 AN - OPUS4-5032 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias T1 - Determination of modulation transfer function by imaging of square-wave gratings with different periods in the nanometre range T2 - NanoScale 2006 CY - Bern, Switzerland DA - 2006-04-24 PY - 2006 AN - OPUS4-12287 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias T1 - BAM-L200 - Ein neuartiges Referenzmaterial für die Bestimmung und Kontrolle der Bildauflösung im Nanometerbereich T2 - Analytica 2006 CY - Munich, Germany DA - 2006-04-25 PY - 2006 AN - OPUS4-12288 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias T1 - Project A8: New procedures for the determination of lateral resolution of instruments for surface analysis in the nanometre range T2 - VAMAS TWA 2 Meeting CY - Vienna, Austria DA - 2005-09-25 PY - 2005 AN - OPUS4-11218 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Senoner, Mathias A1 - Wirth, Thomas A1 - Unger, Wolfgang A1 - Escher, M. A1 - Weber, N. A1 - Funnenmann, D. A1 - Krömker, B. T1 - Testing of Lateral Resolution in the Nanometre Range Using the BAM-L002 - Certified Reference Material: Application to ToF-SIMS IV and NanoESCA Instruments T2 - International Symposium on Practical Surface Analysis CY - Jeju, Republic of Corea DA - 2004-10-04 KW - ESCA KW - Nanometrologie KW - Nanotechnologie KW - Oberflächenanalytik KW - SIMS KW - XPS KW - Zertifiziertes Referenzmaterial PY - 2005 SN - 1341-1756 SN - 1347-8400 VL - 12 IS - 2 SP - 78 EP - 82 CY - Tsukuba AN - OPUS4-11146 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Unger, Wolfgang A1 - Oran, Umut A1 - Senoner, Mathias A1 - Schmidt, M. T1 - Chemische Charakterisierung von mikro- und nanotechnologischen Bauteilen: Verfahrensentwicklung und Referenzmaterialien T2 - VDI/VDE-Tagung "Messtechnik für Mikro- und Nano-Engineering" CY - Erlangen, Germany DA - 2006-11-29 KW - Referenzmaterial KW - Mikrofluidik KW - Nanoanalytik PY - 2006 N1 - Serientitel: VDI-Berichte – Series title: VDI-Berichte IS - 1950 SP - 197 EP - 206 PB - VDI-Verl. CY - Düsseldorf AN - OPUS4-14110 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Senoner, Mathias A1 - Unger, Wolfgang T1 - Lateral resolution of secondary ion mass spectrometry - results of an inter-laboratory comparison N2 - Recently, BAM organised an inter-laboratory comparison focussed on lateral resolution and accuracy of sub-micron length measurements by secondary ion mass spectrometry (SIMS). Results were submitted by 16 laboratories from 10 countries. The task was to analyse a cross-sectioned semiconductor multilayer stack. The resulting strip pattern in the surface of the sample shows narrow strips, step transitions and gratings of different periods. Imaging analysis of this pattern enables the determination of relevant parameters related to the lateral resolution: (i) The width (FWHM) of the primary ion beam, (ii) the distance between 16% and 84% intensity points in a profile across the image of a step transition and (iii) the modulation of intensity in the images of gratings with different periods. The parameter's data reported by the participants vary in a wide range. A strong variation in the data of primary ion beam width was observed for results measured with the same type of instrument. The distance between two narrow strips was measured with high accuracy. Twelve of sixteen of the submitted values are within the limits of uncertainty of the reference value 964 ± 35 nm. This result shows that the calibration of the length scale of the SIMS instruments is already rather precise in most of the participating laboratories. KW - ESF KW - LSF KW - MTF KW - SIMS KW - Accuracy KW - Deconvolution KW - Edge method KW - Edge spread function KW - Inter-laboratory comparison KW - Ion microscopy KW - Lateral resolution KW - Length scale calibration KW - Line spread function KW - Modulation transfer function KW - Nanometrology KW - Nanotechnology KW - Primary ion beam width KW - Square-wave grating KW - Strip pattern PY - 2007 SN - 0142-2421 SN - 1096-9918 VL - 39 IS - 1 SP - 16 EP - 25 PB - Wiley CY - Chichester AN - OPUS4-14427 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias T1 - A new sub-lithographic strip pattern for the standardised determination of lateral resolution in the nanometer range T2 - European Standardisation Conference CY - Berlin, Germany DA - 2007-03-26 PY - 2007 AN - OPUS4-14574 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias T1 - New procedures for the determination of lateral resolution of instruments for surface analysis in the nanometre range (VAMAS Projekt A8) T2 - VAMAS TWA 2 "Surface Chemical Analysis" Meeting 2007 CY - Brussels, Belgium DA - 2007-09-09 PY - 2007 AN - OPUS4-15879 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias T1 - BAM-L200: A new type of reference material for the determination of lateral resolution and the calibration of length scale T2 - 18th International Conference on Secondary Ion Mass Spectrometry CY - Riva del Garda, Italy DA - 2011-09-18 PY - 2011 AN - OPUS4-24441 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Senoner, Mathias T1 - Comparison of methods for the determination of lateral resolution in imaging surface analysis T2 - 14th International Conference on Applications of Surface and Interface Analysis (ECASIA 11) CY - Cardiff, Wales DA - 2011-09-04 PY - 2011 AN - OPUS4-24443 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Herffurth, T. A1 - Schröder, S. A1 - Tan, Ö. A1 - Apel, S. A1 - Senoner, Mathias A1 - Sahre, Mario ED - Weckenmann, A. T1 - Rauheitsbewertung beschichteter Oberflächen T2 - Abschlusskolloquium DFG Schwerpunktprogramm 1159 - Neue Strategien der Mess- und Prüftechnik für die Produktion von Mikrosystemen und Nanostrukturen CY - Erlangen, Germany DA - 2010-10-06 KW - AFM-Spitzencharakterisierer KW - Nanotopographie KW - Rasterkraftmikroskopie KW - Rauheit KW - Weißlichtinterferometrie PY - 2011 SN - 978-3-8440-0358-1 SN - 0945-0769 SP - 219 EP - 231 PB - Shaker Verlag GmbH AN - OPUS4-24789 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Senoner, Mathias A1 - Sahre, Mario A1 - Rooch, Heidemarie A1 - Unger, Wolfgang ED - Weckenmann, A. T1 - Neuartige, räumlich strukturierte Testproben für die Bestimmung der Abbildungsqualität und die Kalibrierung der Längenskala in der Rastersondenmikroskopie T2 - Abschlusskolloquium DFG Schwerpunktprogramm 1159 - Neue Strategien der Mess- und Prüftechnik für die Produktion von Mikrosystemen und Nanostrukturen CY - Erlangen, Germany DA - 2010-10-06 KW - MOVPE KW - Rasterkraftmikroskopie KW - Referenzmaterial KW - Schichtstapel KW - Selektives Ätzen KW - Spitzencharakterisierer KW - TEM PY - 2011 SN - 978-3-8440-0358-1 SN - 0945-0769 SP - 116 EP - 129 PB - Shaker Verlag GmbH AN - OPUS4-24790 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Senoner, Mathias A1 - Unger, Wolfgang T1 - Summary of ISO/TC 201 technical report: ISO/TR 19319:2013 - Surface chemical analysis - Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods N2 - This Technical Report revises ISO/TR 19319:2003 - Surface chemical Analysis-Auger electron spectroscopy and X-ray photoelectron spectroscopy-Determination of lateral resolution, analysis area and sample area viewed by the analyser. The revised Technical Report gives a short introduction to basic models of image formation and introduces functions which characterize the performance of imaging instruments with respect to lateral resolution and sharpness. The determination of lateral resolution by imaging of square-wave gratings and the determination of sharpness by imaging of narrow stripes and straight edges are described in detail. Finally, physical factors affecting lateral resolution, analysis area and sample area viewed by the analyser are discussed. KW - CTF KW - ESF KW - Lateral resolution KW - LSF KW - MTF KW - Narrow stripe KW - Noise KW - PSF KW - Resolution criterion KW - Sharpness KW - Square-wave grating KW - Straight edge PY - 2013 DO - https://doi.org/10.1002/sia.5294 SN - 0142-2421 SN - 1096-9918 VL - 45 IS - 9 SP - 1313 EP - 1316 PB - Wiley CY - Chichester AN - OPUS4-29012 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -