TY - JOUR A1 - Kautek, Wolfgang A1 - Rudolph, Pascale A1 - Krüger, Jörg A1 - Rosenfeld, A. A1 - Lorenz, M. A1 - Ashkenasi, D. T1 - Morphological and mechanical investigations of bariumalumoborosilicate glass surfaces processed with 700-fs laser pulses N2 - We present surface micro-modifications of bariumalumoborosilicate glasses with a high transformation temperature near 700 °C. Laser processing of the glass substrate was realized by using ultra-short laser pulses at 800 nm. The morphological conversion of the laser-treated surfaces was characterized by scanning force microscopy and nano-indentation. A hardness increase by at least a factor of six on the laser ablation crater edge relative to illuminated non- ablated areas shows that the material in the crater walls underwent drastic morphological and mechanical changes. In this heat- and shock-affected zone, the material became more elastic as a result of increased stress. T2 - 5th International Conference on Laser Ablation ; COLA '99 CY - Göttingen, Germany DA - 1999-07-19 KW - Bariumalumoborosilicate glass surfaces PY - 1999 DO - https://doi.org/10.1007/s003390051523 SN - 0947-8396 VL - 69 IS - 7 SP - S759 EP - S761 PB - Springer CY - Berlin AN - OPUS4-775 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Rudolph, Pascale A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Mikrostrukturierung von Glas zur Erzeugung kristalliner Si-Schichten PY - 2000 IS - 12 SP - 7 EP - 36 PB - VDI-Verl. CY - Düsseldorf AN - OPUS4-985 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Bonse, Jörn A1 - Rudolph, Pascale A1 - Krüger, Jörg A1 - Baudach, Steffen A1 - Kautek, Wolfgang T1 - Femtosecond pulse laser processing of TiN on silicon N2 - Ultrashort pulse laser microstructuring (pulse duration 130 fs, wavelength 800 nm, repetition rate 2 Hz) of titanium nitride (TiN) films on silicon substrates was performed in air using the direct focusing technique. The lateral and vertical precision of laser ablation was evaluated. The TiN ablation threshold changed with the number of pulses applied to the surface due to an incubation effect. An ablation depth per pulse below the penetration depth of light was observed. Columnar structures were formed in the silicon substrate after drilling through the TiN layer. KW - Femtosecond laser ablation KW - Titanium nitride KW - Silicon KW - Optical properties PY - 2000 DO - https://doi.org/10.1016/S0169-4332(99)00481-X SN - 0169-4332 SN - 1873-5584 VL - 154-155 SP - 659 EP - 663 PB - North-Holland CY - Amsterdam AN - OPUS4-802 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Rudolph, Pascale A1 - Bonse, Jörn A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Femtosecond- and nanosecond-pulse laser ablation of bariumalumoborosilicate glass N2 - Laser ablation with femtosecond pulses (130 fs, wavelength 800 nm, repetition rate 2 Hz) was compared with nanosecond-pulse ablation (10 ns, wavelength 266 nm, repetition rate 2.5 Hz) of bariumalumoborosilicate glass in air using the direct focusing technique. Different ablation thresholds and heat-affected zones were observed. The lateral and vertical machining precision was evaluated. Single nanosecond laser pulses in the far UV resulted in a bubble or a circular hole in the centre of the illuminated spot, depending on the applied fluence. The ablation behaviour in the case of near-IR femtosecond pulses contrasted to this. Bubble formation was not detected. It needed repeated pulses at the same spot to modify the surface until material removal could be observed (incubation). Cavity dimensions of less than the beam diameter were achieved in this case. T2 - 5th International Conference on Laser Ablation ; COLA '99 CY - Göttingen, Germany DA - 1998-07-19 KW - Laser ablation KW - Bariumalumoborosilicate glass PY - 1999 DO - https://doi.org/10.1007/s003390051524 SN - 0947-8396 VL - 69 IS - 7 SP - S763 EP - S766 PB - Springer CY - Berlin AN - OPUS4-801 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -