TY - CONF A1 - Vila-Comamala, J. A1 - Diaz, A. A1 - Guizar-Sicairos, M. A1 - Gorelick, S. A1 - Guzenko, V.A. A1 - Karvinen, P. A1 - Kewish, C.M. A1 - Färm, E. A1 - Ritala, M. A1 - Mantion, Alexandre A1 - Bunk, O. A1 - Menzel, A. A1 - David, C. ED - Morawe, C. ED - Khounsary, A.M. ED - Goto, S. T1 - Characterization of a 20-nm hard X-ray focus by ptychographic coherent diffractive imaging N2 - Recent advances in the fabrication of diffractive X-ray optics have boosted hard X-ray microscopy into spatial resolutions of 30 nm and below. Here, we demonstrate the fabrication of zone-doubled Fresnel zone plates for multi-keV photon energies (4-12 keV) with outermost zone widths down to 20 nm. However, the characterization of such elements is not straightforward using conventional methods such as knife edge scans on well-characterized test objects. To overcome this limitation, we have used ptychographic coherent diffractive imaging to characterize a 20 nm-wide X-ray focus produced by a zone-doubled Fresnel zone plate at a photon energy of 6.2 keV. An ordinary scanning transmission X-ray microscope was modified to acquire the ptychographic data from a strongly scattering test object. The ptychographic algorithms allowed for the reconstruction of the image of the test object as well as for the reconstruction of the focused hard X-ray beam waist, with high spatial resolution and dynamic range. This method yields a full description of the focusing performance of the Fresnel zone plate and we demonstrate the usefulness ptychographic coherent diffractive imaging for metrology and alignment of nanofocusing diffractive X-ray lenses. T2 - SPIE Optics and photonics CY - San Diego, USA DA - 20.08.2011 KW - X-ray imaging KW - Diffractive X-ray optics KW - Electron beam lithography KW - Ptychographic coherent diffractive imaging PY - 2011 U6 - https://doi.org/10.1117/12.893235 SN - 0277-786X N1 - Serientitel: Proceedings of SPIE – Series title: Proceedings of SPIE VL - 8139 SP - 81390E-1 EP - 81390E-7 AN - OPUS4-24613 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Vila-Comamala, J. A1 - Jefimovs, K. A1 - Raabe, J. A1 - Pilvi, T. A1 - Fink, R.H. A1 - Senoner, Mathias A1 - Maaßdorf, A. A1 - Ritala, M. A1 - David, C. T1 - Advanced thin film technology for ultrahigh resolution X-ray microscopy N2 - Further progress in the spatial resolution of X-ray microscopes is currently impaired by fundamental limitations in the production of X-ray diffractive lenses. Here, we demonstrate how advanced thin film technologies can be applied to boost the fabrication and characterization of ultrahigh resolution X-ray optics. Specifically, Fresnel zone plates were fabricated by combining electron-beam lithography with atomic layer deposition and focused ion beam induced deposition. They were tested in a scanning transmission X-ray microscope at 1.2 keV photon energy using line pair structures of a sample prepared by metalorganic vapor phase epitaxy. For the first time in X-ray microscopy, features below 10 nm in width were resolved. KW - X-ray microscopy KW - X-ray diffractive optics KW - Electron-beam lithography KW - Atomic layer deposition KW - BAM-L200 KW - Laterale Auflösung KW - Referenzmaterial KW - Röntgenmikroskopie KW - Zonenplatte PY - 2009 U6 - https://doi.org/10.1016/j.ultramic.2009.07.005 SN - 0304-3991 VL - 109 IS - 11 SP - 1360 EP - 1364 PB - Elsevier CY - New York, NY AN - OPUS4-19976 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -