TY - GEN A1 - Retzko, Iris A1 - Swaraj, Sufal A1 - Unger, Wolfgang A1 - Matsubayashi, N. A1 - Imamura, M. A1 - Tanaka, T. A1 - Shimada, H. T1 - Non-destructive chemical depth-profiling of plasma polymers by variable excitation energy XPS PY - 2003 UR - http://pfwww.kek.jp/acr2002pdf/part_b/pf02b197.pdf SN - 1344-6339 VL - 20 SP - 197 PB - KEK - High Energy Accelerator Research Organization CY - Tsukuba AN - OPUS4-2798 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Retzko, Iris A1 - Unger, Wolfgang A1 - Matsubayashi, N. A1 - Imamura, M. A1 - Tanaka, T. A1 - Shimada, H. T1 - Non-destructive XPS depth-profiling of ta:C-films by variable excitation energy PY - 2003 UR - http://pfwww.kek.jp/acr2002pdf/part_b/pf02b198.pdf SN - 1344-6339 VL - 20 SP - 198 PB - KEK - High Energy Accelerator Research Organization CY - Tsukuba AN - OPUS4-2799 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Retzko, Iris A1 - Mix, Renate A1 - Swaraj, Sufal A1 - Unger, Wolfgang A1 - Matsubayashi, N. A1 - Imamura, M. A1 - Tanaka, T. A1 - Shimada, H. T1 - Non-destructive chemical depth-profiling by variable excitation energy XPS: TFAA derivatized allyl alcohol - ethylene plasma polymer films KW - Oberflächenanalytik KW - Plasmapolymerisation PY - 2004 UR - http://pfwww.kek.jp/acr2003pdf/part_b/pf03b076.pdf SN - 1344-6339 VL - 21 SP - 76 PB - KEK - High Energy Accelerator Research Organization CY - Tsukuba AN - OPUS4-5849 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -