TY - GEN A1 - Berger, Achim A1 - Ecker, Klaus A1 - Görner, Wolf A1 - Merchel, Silke A1 - Procop, Mathias A1 - Radtke, Martin A1 - Riesemeier, Heinrich T1 - X-ray fluorescence analysis at the BAMline T2 - BESSY highlights - annual report 2001 PY - 2002 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2001.pdf#page=253 SN - 0179-4159 SP - 253 EP - 254 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-1322 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Berger, Achim A1 - Görner, Wolf A1 - Merchel, Silke A1 - Procop, Mathias A1 - Radtke, Martin A1 - Riesemeier, Heinrich T1 - SY-XRF in certification of a reference material at the BAMline T2 - BESSY highlights - annual report 2002 PY - 2003 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2002.pdf#page=311 SN - 0179-4159 SP - 311 EP - 312 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-2492 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Gruska, B. A1 - Wandel, K. A1 - Procop, Mathias ED - Lengeler, B. T1 - The InGaAs/SiO2 interface investigated by angle resolved XPS and ellipsometry T2 - Formation of semiconductor interfaces T2 - 4th International Conference on the Formation of Semiconductor Interfaces (ICFSI) CY - Jülich, Germany DA - 1993-06-14 PY - 1993 SN - 981-021559-2 VL - 4 SP - 373 EP - 376 PB - World Scientific CY - Singapore AN - OPUS4-7088 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hasche, K. A1 - Herrmann, K. A1 - Thomsen-Schmidt, P. A1 - Krumrey, M. A1 - Ulm, G. A1 - Ade, G. A1 - Pohlenz, F. A1 - Stümpel, J. A1 - Busch, I. A1 - Schädlich, S. A1 - Frank, W. A1 - Hirsch, D. A1 - Schindler, A. A1 - Procop, Mathias A1 - Beck, Uwe T1 - Ein Beitrag zu kalibrierten Nanometerschichten für unterschiedliche Anwendungsbereiche T2 - 47. Internationales Wissenschaftliches Kolloquium N2 - Nanotechnologien werden gegenwärtig als leistungsfähige Oberflächentechniken in erheblichem Umfange industriell genutzt. Dabei spielen dünne Schichten und deren Kenndaten eine wesentliche Rolle, z.B. als Röntgenspiegel oder optische und magnetooptische Datenträger. Die Schichtdicke zählt hierbei zu den technologisch wichtigen Parametern. Abgeleitet von Anwenderinteressen, werden für die Röntgenreflektometrie (XRR bzw. GIXR), Elektronenstrahl-Mikroanalyse (EPMA) und Röntgenfluoreszenzanalyse (XRF) einerseits und die Ellipsometrie andererseits zugeschnittene Schichtdickenmaßverkörperungen (SDM) entwickelt, gefertigt und untersucht. Das Ziel ist die Bereitstellung praxistauglicher, kalibrierter SDM, im weiteren Schichtdickennormale (SDN) genannt. SDN sind Maßverkörperungen, für die der Schichtdickenwert mit einer definierten Messunsicherheit bekannt und auf ein metrologisch anerkanntes Längennormal zurückgeführt ist. Berichtet wird über die Herstellung und messtechnische Charakterisierung der beiden spezifischen Varianten von Maßverkörperungen. T2 - 47. Internationales Wissenschaftliches Kolloquium. Technische Universität Ilmenau ; Herbstkonferenz der Gesellschaft für Arbeitswissenschaft ; 6. Workshop Multimedia für Bildung und Wirtschaft CY - Ilmenau, Deutschland DA - 2002-09-23 PY - 2002 UR - http://publica.fraunhofer.de/documents/N-14872.html VL - 47 SP - 568 EP - 569 PB - Techn. Univ. CY - Ilmenau AN - OPUS4-2284 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Hasche, K. A1 - Ulm, G. A1 - Herrmann, K. A1 - Krumrey, M. A1 - Ade, G. A1 - Sümpel, J. A1 - Busch, I. A1 - Thomsen-Schmidt, P. A1 - Schädlich, S. A1 - Schindler, A. A1 - Frank, W. A1 - Procop, Mathias A1 - Beck, Uwe T1 - About the calibration of thickness standards on the nanometer scale T2 - Proceedings of the 3rd international EUSPEN conference T2 - 3rd International EUSPEN conference ; 3rd International conference. European Society for Precision Engineering and Nanotechnology ; 4th General meeting. European Society for Precision Engineering and Nanotechnology CY - Eindhoven, The Netherlands DA - 2002-05-26 PY - 2002 SN - 90-386-2883-8 SP - 1 EP - 5 CY - Eindhoven AN - OPUS4-2283 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Hodoroaba, Vasile-Dan A1 - Procop, Mathias T1 - Check of Energy-Dispersive X-ray Spectrometers (EDS) Performance with the BAM Test Material EDSTM001/2 and BAM Software EDS Spectrometer Test N2 - The test material EDS-TM001 together with an accompanying software package, “EDX spectrometer check”, have been made available in 2009 by BAM to be employed by EDS (energy-dispersive X-ray spectrometer) users to check the performance of an EDS attached to the SEM. Particularly for test laboratories operating under accreditation schemes like ISO/IEC 17025, a periodical control of the critical instrumental parameters in end-user laboratories is required. With EDS-TM001 or EDS-TM002 (second generation) test material, this periodical check is simplified to the acquisition of only one 10 kV spectrum. The software “EDX spectrometer check” is destined to evaluate automatically this spectrum and determine the performance of the EDS in terms of energy resolution and calibration, as well as possible alteration of low-energy Efficiency due to detector contamination. Energy resolution can be compared with the specified values according to the international ISO standard ISO 15632:2012. EDS-TM is a synthetic material consisting of a 6 μm thick layer of C, Al, Mn, Cu and Zr deposited on a steel (in case of EDS-TM001) or silicon (in case of EDS-TM002) substrate. The chemical composition of EDS-TM was chosen such as to give nearly equal intensities of the low energy lines in a 10 kV spectrum, thus, making it very sensitive against spectrometer efficiency changes. Meanwhile, about 150 laboratories use the EDS-TM001 or EDS-TM002 test material for the periodical check of their EDS. A detailed description of the test material and software together with examples of application was published recently. New results and gained experiences will be presented as well. When the FWHM of the X-ray lines in the EDS-TM spectrum are determined, the spectrum background must be subtracted accurately. The applied physical background subtraction procedure is robust and takes into account the transmission of the detector window. While the previous version considers only Moxtek AP windows, the new version includes selection of silicon Nitride window and the case of windowless detector. Moreover, the new version allows importing of spectra in Bruker spx-format and EMSA/MSA files from EDAX TEAM software. Windowless detectors have been also tested demonstrating long-term stability after repeated heating and cooling cycles. In this case, the appropriate Background subtraction is decisive for accurate detector characterization. Detailed results will be presented. T2 - EMAS 2019 - 16th European Workshop on MODERN DEVELOPMENTS AND APPLICATIONS IN MICROBEAM ANALYSIS CY - Trondheim, Norway DA - 19.05.2019 KW - EDS KW - Test material KW - Software KW - Spectrometer check KW - X-ray spectroscopy PY - 2019 AN - OPUS4-48103 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Hodoroaba, Vasile-Dan A1 - Terborg, R. A1 - Procop, Mathias T1 - Check of the performance of EDS systems attached to the SEM with the test material EDS-TM001/2 and evaluation software package EDS spectrometer test - Application, experiences and updates JF - Microscopy and Microanalysis N2 - The test material EDS-TM001 together with an accompanying software package, “EDX spectrometer check”, have been made available in 2009 by BAM to be employed by EDS (energy dispersive spectrometer) users to check the performance of an EDS attached to the SEM. Particularly for test laboratories operating under accreditation schemes like ISO/IEC 17025, a periodical control of the critical instrumental parameters in end-user laboratories is required. With EDS-TM001 or EDS-TM002 (second generation) test material, this periodical check is simplified to the acquisition of only one 10 kV spectrum. The software “EDX spectrometer check” is destined to evaluate automatically this spectrum and determine the performance of the EDS in terms of energy resolution and calibration as well as possible alteration of low-energy efficiency due to detector contamination. Energy resolution can be compared with the specified values according to the international ISO standard ISO 15632:2012. EDS-TM is a synthetic material consisting of a thick layer of C, Al, Mn, Cu and Zr in a well-defined composition, deposited on a steel (in case of EDS-TM001) or silicon (in case of EDS-TM002) substrate. Meanwhile, more than one hundred laboratories use the EDS-TM001 or EDS-TM002 test material for the periodical check of their EDS. A detailed description of the test material and software together with examples of application was published recently. New results and gained experiences will be presented as well. When the FWHM of lines appearing in the EDS-TM spectrum are determined, the spectrum background must be subtracted accurately. The applied physical background subtraction procedure is robust and takes into account the transmission of the detector window. While the previous version considers only Moxtek AP windows, the new version includes selection of silicon nitride window and the case of windowless detector. Moreover, the new version allows importing of spectra in Bruker spx format and EMSA/MSA files from EDAX TEAM software. KW - EDS KW - Performance check KW - SEM KW - Test material KW - X-ray spectrometer PY - 2018 UR - https://www.cambridge.org/core/journals/microscopy-and-microanalysis/article/check-of-the-performance-of-eds-systems-attached-to-the-sem-with-the-test-material-edstm0012-and-evaluation-software-package-eds-spectrometer-test-application-experiences-and-updates/3D01FDC765C3ECD734CB8DEC7081DAE2 DO - https://doi.org/10.1017/S1431927618004142 SN - 1431-9276 SN - 1435-8115 VL - 24 IS - S1 (August) SP - 730 EP - 731 PB - Cambridge University Press CY - New York, NY, U.S.A. AN - OPUS4-46006 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Koenders, L. A1 - Hasche, K. A1 - Ulm, G. A1 - Krumrey, M. A1 - Ade, G. A1 - Stümpel, J. A1 - Busch, I. A1 - Thomsen-Schmidt, P. A1 - Schädlich, S. A1 - Schindler, A. A1 - Frank, W. A1 - Beck, Uwe A1 - Procop, Mathias T1 - Über die metrologische Charakterisierung von Schichtdicken Standards im Nanometerbereich T2 - 12th Applied Surface Analysis Workshop T2 - 12th Applied Surface Analysis Workshop ; AOFA 12 CY - --- DA - 2002-09-15 PY - 2002 AN - OPUS4-2285 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Procop, Mathias T1 - Abschätzung der Dicke absorbierender Schichten eines EDX-Detektorsystems mit Hilfe von Bremsstrahlungsspektren JF - Beiträge zur elektronenmikroskopischen Direktabbildung und Analyse von Oberflächen T2 - 29. Kolloquium des Arbeitskreises für Elektronenmikroskopische Direktabbildung und Analyse von Oberflächen (EDO) CY - Münster, Deutschland DA - 1996-10-08 KW - Oberflächenanalyse KW - Schichtdickenmessung KW - EDX-Detektor KW - Bremsstrahlungspektrum KW - X-ray spectrometry KW - X-ray detector KW - Si(Li) detector PY - 1996 SN - 0340-3815 VL - 29 SP - 47 EP - 50 PB - Ehrenwerth CY - Münster, Westf. AN - OPUS4-641 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Procop, Mathias ED - Hunger, H.-J. T1 - AUGER-Elektronenspektroskopie T2 - Werkstoffanalytische Verfahren PY - 1995 SN - 3-342-00430-4 SP - 382 EP - 408 PB - Dt. Verl. für Grundstoffindustrie CY - Leipzig AN - OPUS4-605 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -