TY - GEN A1 - Kautek, Wolfgang A1 - Pentzien, Simone A1 - Rudolph, Pascale A1 - Krüger, Jörg A1 - Maywald-Pitellos, C. A1 - Bansa, H. A1 - Grösswang, H. A1 - König, W. ED - Fotakis, C. T1 - Near-Ultraviolet Pulsed Laser Interaction with Contaminants and Pigments on Parchment: Spectroscopic Diagnostics for Laser Cleaning Safety T2 - 5th International Conference on Optics within Life Sciences CY - H¯erakleion, Greece DA - 1998-01-01 PY - 2000 SN - 3-540-66648-6 N1 - Serientitel: Optics within life sciences – Series title: Optics within life sciences IS - 5 SP - 100 EP - 107 PB - Springer CY - Berlin AN - OPUS4-6189 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Pentzien, Simone A1 - Conradi, Andrea A1 - Krüger, Jörg T1 - The influence of paper type and state of degradation on laser cleaning of artificially soiled paper N2 - Lasers can be a supplemental tool for restorers to overcome some of the limitations of traditional dry cleaning techniques for works of art on paper. The laser working range has to be optimized allowing for safe removal of contamination and limitation of damage to the substrate. This paper addresses the influence of paper type and state of degradation on laser working range. Three types of new paper (pure cellulose, bleached pulp paper, rag paper) were degraded and characterized with respect their degree of polymerization. Laser-induced damage thresholds of new and degraded paper were determined using SEM and viscometry. Additionally, artificially soiled model samples were made using two kinds of soiling, namely pulverized charcoal and soot-blackened standard test dust. Cleaning thresholds of soiled paper samples were evaluated. A working range for all combinations of paper and soiling between 0.05 J/cm2 and 0.5 J/cm2 was found for the application of 8-ns laser pulses at 532 nm wavelength. T2 - LACONA VIII - Lasers in the Conservation of Artworks VIII CY - Sibiu, Romania DA - 21.09.2009 KW - Nanosecond laser cleaning KW - Paper KW - Ageing KW - Degree of polymerization KW - Cleaning threshold KW - Damage threshold PY - 2011 SN - 978-0-415-58073-1 SP - 59 EP - 65 PB - Taylor & Francis CY - London, UK AN - OPUS4-23634 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Eberstein, M. A1 - Geier, M. A1 - Grießmann, H. A1 - Partsch, U. A1 - Voelkel, L. A1 - Böhme, R. A1 - Pentzien, Simone A1 - Koter, Robert A1 - Mann, Guido A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - Towards an industrial laser doping process for the selective emitter using phosphoric acid as dopant N2 - Different laser supported approaches have already been realized, proving the great potential of laserdoped selective emitters (LDSE). However, it is challenging to establish a low-cost process by using pulsed laser tools. So far a single-step process only leads to satisfying results utilizing cw-lasers. In this paper we have examined a two-step process to produce laser-doped selective emitters on multicrystalline textured standard silicon photovoltaic wafers (90-Ω/sq-Emitter, SiN-antireflection coating (ARC)). The precise ARC removal by near-infrared fs-laser pulses (30 fs, 800 nm), and the doping of uncoated silicon wafers by ns-laser pulses (8 ns, 532 nm) were systematically investigated. In the fs-experiment, optimum conditions for ARC removal were identified. In the nsexperiments under suitable conditions (melting regime), the phosphorous concentration underneath the wafer surface was significantly increased and the sheet resistance was reduced by nearly a factor of two. Moreover, electrical measurements on fired metallization fingers deposited on the laser processed wafers showed low contact resistances. Hence, wafer conditioning with combined fs-laser- and ns-laser-processes are expected to be a promising technology for producing selective emitters. T2 - 26th European photovoltaic solar energy conference and exhibition CY - Hamburg, Germany DA - 05.09.2011 KW - Laser processing KW - Doping KW - Selective emitter KW - Multicrystalline silicon PY - 2011 SN - 3-936338-27-2 DO - https://doi.org/10.4229/26thEUPVSEC2011-2BV.1.2 SP - 1220 EP - 1223 AN - OPUS4-24996 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Mäder, M. A1 - Holle, H. A1 - Schreiner, M. A1 - Pentzien, Simone A1 - Krüger, Jörg A1 - Kautek, Wolfgang ED - Johann Nimmrichter, ED - Kautek, Wolfgang ED - Manfred Schreiner, T1 - Traditional and laser cleaning methods of historic picture post cards T2 - LACONA VI CY - Vienna, Austria DA - 2005-09-21 KW - Laser KW - Cleaning KW - Picture Post Card PY - 2007 SN - 978-3-540-72129-1 SN - 0930-8989 N1 - Serientitel: Springer proceedings in physics – Series title: Springer proceedings in physics IS - 116 SP - 281 EP - 286 PB - Springer CY - Berlin AN - OPUS4-16378 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -