TY - GEN A1 - Unger, Wolfgang A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter T1 - NEXAFS - spectroscopy on plasma-polymerized films prepared from organic molecules (ethylene, allyl alcohol, styrene) T2 - BESSY highlights - annual report 2003 KW - Plasma KW - Beschichtung KW - Organische Filme KW - Röntgenabsorptionsspektroskopie PY - 2004 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2003.pdf#page=297 SN - 0179-4159 SP - 297 EP - 299 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-3478 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Ünveren, Ercan A1 - Wirth, Thomas A1 - Unger, Wolfgang T1 - Poly-dimethyl-siloxane (PDMS) contamination of polystyrene (PS) oligomers samples: a comparison of time-of-flight static secondary ion mass spectrometry (TOF-SSIMS) and X-ray photoelectron spectroscopy (XPS) results JF - Applied surface science N2 - Pure and PDMS contaminated PS oligomers films were investigated both by time-of-flight static secondary ion mass spectrometry (TOF-SSIMS) and X-ray photoelectron spectroscopy (XPS). The secondary ion spectra from the PDMS contaminated PS oligomers were almost completely related to PDMS. XPS revealed a PDMS contamination characterized by a silicon surface concentration of 6 at.%. Obviously siloxane contaminants existing on the surface of a silicon wafer may diffuse towards the PS oligomers outermost surface resulting in a rather high PDMS surface concentration of about 85%. Due to the known differences in the information depth and sensitivity of SSIMS and XPS very different detection limits are to be considered. In elimination of siloxane contaminants by ultrasonication in hexane was found to be an effective way. Another common organic cleaning procedure, which is ultrasonication in trichloroethylene (TCE), subsequently in isopropanol and finally in acetone was found to be ineffective for cleaning of PDMS contaminated silicon wafers. KW - PDMS KW - TOF-SIMS KW - Polystyrene KW - Segregation PY - 2004 DO - https://doi.org/10.1016/j.apsusc.2003.12.008 SN - 0169-4332 SN - 1873-5584 VL - 227 SP - 318 EP - 324 PB - North-Holland CY - Amsterdam AN - OPUS4-3479 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - NEXAFS - spectroscopy on plasma-polymerised films prepared from organic molecules (Acrylic acid, allylamine, ethylene) T2 - BESSY highlights - annual report 2004 KW - NEXAFS KW - Plasmapolymere KW - Synchrotronstrahlung PY - 2005 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2004.pdf#page=315 SN - 0179-4159 SP - 315 EP - 317 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-7387 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Oran, Umut A1 - Unger, Wolfgang A1 - Schmidt, M. T1 - Measurement of the hydrophilic character of microscopic areas at microfluide components T2 - 2. Statuskolloquium des DFG SPP 1159 "Neue Strategien der Mess- und Prüftechnik für die Produktion von Mikrosystemen und Nanostrukturen" T2 - 2. Statuskolloquium des DFG SPP 1159 "Neue Strategien der Mess- und Prüftechnik für die Produktion von Mikrosystemen und Nanostrukturen" CY - Jena, Germany DA - 2006-05-29 PY - 2006 AN - OPUS4-12431 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Oran, Umut T1 - Surface chemical characterization of plasma chemically deposited polymer films by Time of Flight Secondary Ion Mass Spectrometry T2 - PhD Defense Presentation; Freie Universität Berlin; FB Biologie, Chemie, Pharmazie; Institut für Chemie T2 - PhD Defense Presentation; Freie Universität Berlin; FB Biologie, Chemie, Pharmazie; Institut für Chemie CY - Berlin, Germany DA - 2005-10-13 PY - 2005 AN - OPUS4-11277 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Unger, Wolfgang A1 - Friedrich, Jörg F. T1 - TOF-SIMS analysis of plasma chemically deposited co-polymer films T2 - 15th International Conference on Secondary Ion Mass Spectrometry (SIMS XV) T2 - 15th International Conference on Secondary Ion Mass Spectrometry (SIMS XV) CY - Manchester, England DA - 2005-09-12 PY - 2005 AN - OPUS4-11279 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface analysis of Plasma Deposited Polymer Films, 5 - ToF-SSIMS Characterization of Plasma Deposited Allyl Alcohol Films JF - Plasma processes and polymers N2 - The effect of the composite plasma parameter P/F, where P is the plasma power and F is the monomer flow rate, on the chemical character of pulsed plasma deposited allyl alcohol films was investigated by ToF-SSIMS. Information on the unsaturated character, the cross-linked and/or branched character of the plasma polymer films was derived in detail. The problem of the retention of OH groups in plasma deposited allyl alcohol films was elucidated in detail using SSIMS data. The lowest conversion rate from the monomer's hydroxyl groups to other oxygen functionalities in the plasma was concluded for the plasma polymer film produced at a P/F ratio of 0.05 W · sccm-1. It was found that the overall oxygen content of the films decreased vs. increasing P/F ratio. Because the freshly prepared films were investigated without air exposure, ageing on ambient air could be studied in detail. It was found that in the case of plasma deposited allyl alcohol films the ageing on air is probably based on two competing processes which are discussed in detail. Additionally, a review of literature data on the characterization of plasma deposited allyl alcohol films is given. KW - Ageing KW - Allyl alcohol KW - Plasma polymerization KW - ToF-SIMS PY - 2005 DO - https://doi.org/10.1002/ppap.200400075 SN - 1612-8850 SN - 1612-8869 VL - 2 IS - 7 SP - 563 EP - 571 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11933 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Aging of Plasma-Deposited Films Prepared from Organic Monomers JF - Plasma processes and polymers N2 - Plasma-deposited polymer films were prepared from organic molecules and investigated using near edge X-ray absorption fine structure (NEXAFS) and X-ray photoelectron spectroscopy (XPS) for aging effects after exposure to air. Results from the investigation of homopolymers are summarized. Primarily the effect of the deposition parameters duty cycle and power are dealt with. The effect of the deposition parameter pressure is briefly discussed. An example to show the effect of feed gas composition on the aging of plasma polymerized ethylene/allyl alcohol and styrene/allyl alcohol copolymer is also given. In general, change in content of unsaturated or aromatic species, change in concentration of monomer functionality, and change in the oxygen content was observed in the plasma polymerized films on aging. KW - Plasma copolymer KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization PY - 2007 SN - 1612-8850 SN - 1612-8869 VL - 4 IS - S1 SP - S784 EP - S789 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11934 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface Analysis of Plasma-Deposited Polymer Films, 4 - In situ Characterization of Plasma-Deposited Ethylene Films by XPS and NEXAFS JF - Plasma processes and polymers N2 - XPS and NEXAFS spectroscopy were used for the chemical characterization of pulsed plasma-deposited ethylene films before and after exposure to ambient air. The influence of external plasma parameters on the spectroscopic results was investigated. Information on the chemical character of the plasma-polymerized films, such as the regularity of the primary structure, the amount of long-living radicals, and branching or cross-linking or both was derived from this data. Irregularity and radical concentration for post-plasma reactions of the plasma-deposited films increased with the duty cycle or power. A decreased level of monomer fragmentation and, consequently, an increase in regularity is partially concluded from the experimental data when the monomer pressure is increased. The concentration of surface radicals available for post-plasma reactions also increased with monomer pressure. The correlation found between the degree of the post-plasma oxygen incorporation and the variation of the various external parameters agreed with earlier ToF-SSIMS findings. KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization KW - Polyethylene (PE) KW - Thin films PY - 2005 DO - https://doi.org/10.1002/ppap.200400070 SN - 1612-8850 SN - 1612-8869 VL - 2 IS - 4 SP - 310 EP - 318 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11940 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Retzko, Iris A1 - Schulze, Rolf-Dieter A1 - Lippitz, Andreas A1 - Wirth, Thomas A1 - Friedrich, Jörg F. A1 - Unger, Wolfgang T1 - Study of effects of plasma parameters by characterization of pulse plasma deposited organic films T2 - ECASIA `03 T2 - ECASIA `03 CY - Berlin, Germany DA - 2003-10-06 PY - 2003 AN - OPUS4-4673 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Unger, Wolfgang A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas T1 - Radio frequency (r.f.) plasma-deposited polymer films: influence of external plasma parameters as viewed by comprehensive in-situ surface chemical analysis by XAS, XPS and ToF-SIMS JF - Surface and interface analysis N2 - The formation of plasma-deposited materials made from organic molecules is a technologically attractive way to obtain films with unique properties, e.g. adhesion, wettability, conductivity or selected chemical functionalization. A detailed chemical characterization of these films is a great challenge for the analyst because of the co-existence of a large number of chemical species in plasma-deposited films. We investigated these types of organic films using photoelectron spectroscopy for chemical analysis (ESCA, XPS), near edge X-ray absorption fine structure (NEXAFS) spectroscopy at synchrotron radiation source BESSY II and time-of-flight secondary ion mass spectroscopy (ToF-SIMS). A dedicated plasma preparation chamber was designed and added to the main analysis chamber of the respective spectrometers. This approach offers the possibility of studying plasma-deposited films without exposure to air before analysis (often called in-situ analysis) and the influence of post-plasma reactions, i.e. the ageing process. The present investigations are aimed at finding correlations between basic chemical properties of the deposited films and the plasma deposition parameters, e.g. duty cycle in pulsed plasmas and the power of discharge. KW - Plasma deposition KW - NEXAFS KW - XPS KW - ToF-SIMS KW - Plasma parameter PY - 2006 DO - https://doi.org/10.1002/sia.2158 SN - 0142-2421 SN - 1096-9918 VL - 38 IS - 4 SP - 522 EP - 525 PB - Wiley CY - Chichester AN - OPUS4-12271 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - Surface analysis of Plasma Deposited Polymer Films, 7: "In situ" Characterization of Plasma Deposited Allylamine Films by ToF-SSIMS, XPS and NEXAFS Spectroscopy JF - Plasma processes and polymers N2 - Plasma deposited allylamine films were studied by in situ ToF-SSIMS, XPS and NEXAFS Spectroscopy before exposure to ambient air. The influence of external plasma parameters such as duty cycle, plasma power, and monomer flow rate on (i) unsaturation, (ii) branching and cross-linking, (iii) nitrogen surface concentration and (iv) retention of amino groups was investigated. Harder plasma conditions, which can be obtained when high duty cycles, high plasma power, and low monomer flow rates are employed, increase the unsaturated, branched and cross-linked character of the plasma deposited films, while the surface concentration of N as well as the retention of the monomer's amino group decrease. As proven by NEXAFS findings and cross-checked by ToF-SSIMS results, the allylamine monomer's primary amino groups are partially transformed into other nitrogen functionalities during its plasma polymerization. Amongst them imines and nitriles are the conversion products with the highest probabilities of formation. Another conversion channel is the formation of nitrogen species not participating in the film growth. This is the reason for an increased N loss in plasma deposited allylamine films as observed independently by XPS and ToF-SSIMS when the plasma parameters are changed from mild to hard. KW - Allylamine KW - NEXAFS KW - Plasma polymerization KW - ToF-SSIMS KW - XPS PY - 2006 DO - https://doi.org/10.1002/ppap.200500168 SN - 1612-8850 SN - 1612-8869 VL - 3 IS - 3 SP - 288 EP - 298 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-12272 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Static ToF-SIMS analysis of plasma chemically deposited ethylene/allyl alcohol co-polymer films JF - Applied surface science N2 - A plasma co-polymerization of ethylene as a “chain extending” monomer and allyl alcohol as a carrier monomer for hydroxyl groups was studied. The composition of the feed gas was systematically varied and the plasma co-polymers were analyzed in terms of their relative concentrations of OH functional groups by static Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS) immediately after their preparation without any air contact, i.e., under so called “in situ” conditions. The relative OH group concentration involved in the –CH2–OH groups was derived from the normalized yields of the CH3O+ secondary fragment ion. The density of functional groups in the plasma co-polymers was found to vary non-linearly with respect to the mole percentage of the monomers in the feed gas. Co-polymerization phenomena, i.e. chemical interactions and recombination reactions taking place between monomer molecules in the plasma and/or during the deposition process, become evident in ToF-SIMS spectra. KW - Plasma deposition KW - ToF-SIMS KW - Plasma co-polymerization KW - Ethylene KW - Allyl alcohol PY - 2006 DO - https://doi.org/10.1016/j.apsusc.2006.02.089 SN - 0169-4332 SN - 1873-5584 VL - 252 IS - 19 SP - 6588 EP - 6590 PB - North-Holland CY - Amsterdam AN - OPUS4-13724 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface Analysis of Plasma-Deposited Polymer Films, 2: Analysis of Post-Plasma Air Reacted Plasma Polymerized Styrene by X-Ray Photoelectron Spectroscopy and X-Ray Absorption Spectroscopy JF - Plasma processes and polymers N2 - Chemical properties of plasma-polymerized styrene films can be effectively controlled by the appropriate choice of external plasma parameters, such as duty cycle, power and monomer pressure. Chemical properties here are the regularity of the primary structure, the amount of long living radicals and branching or cross-linking or both in plasma polymerized styrene films, which can be indirectly monitored by X-ray photoelectron spectroscopy (XPS) and near edge X-ray absorption fine structure (NEXAFS) spectroscopy. Principally, XPS and NEXAFS spectra of plasma-polymerized styrene show all the spectroscopic fingerprints characteristic of atactic polystyrene indicating an inherent similarity of the respective primary chemical structures. There is an increase in irregularity and radical concentration for the plasma deposited films with increasing duty cycle or power. With an increase in monomer pressure, a decreased level of monomer fragmentation and, consequently, an increase in regularity must be concluded from the experimental data. The applied power regulates the fragmentation of the monomers as monitored by spectroscopic signals correlated to the aromatic rings. A trend in the extent of the post-plasma oxygen incorporation according to the variation of the various external plasma parameters was deduced, which agrees with earlier ToF-SIMS findings KW - Chemical characterization KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization KW - Polystyrene PY - 2004 DO - https://doi.org/10.1002/ppap.200400022 SN - 1612-8850 SN - 1612-8869 VL - 1 SP - 134 EP - 140 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-6935 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface Analysis of Plasma-Deposited Polymer Films, 3: In situ Characterization of Plasma-Deposited Ethylene Films by ToF-SSIMS JF - Plasma processes and polymers N2 - Pulsed-plasma-deposited ethylene films were studied by time-of-flight static secondary ion mass spectrometry (ToF-SSIMS) before and after exposure to ambient air. The influence of the external plasma parameters on the secondary ion mass spectra of plasma-deposited ethylene films was investigated. From these data, information on the chemical character of the plasma-deposited ethylene films was derived. The investigation of the effect of external plasma parameters on the chemical character of the plasma-deposited ethylene films revealed that there were some drastic changes in the secondary ion mass spectra of the films. It was found that fragmentation and re-arrangement of the monomer molecules in the plasma, which affects the chemical character of the deposited films, vary according to the external plasma parameters. When the plasma polymers are exposed to air, extensive oxygen incorporation occurs. The oxygen uptake is high at the beginning and then it levels of. Some indications for the formation and decay of peroxy radicals (COO) and, subsequently, hydroperoxides (COOH) are found. It was observed that the oxygen uptake of the plasma deposited ethylene films increase when the plasma conditions become harder. KW - Ageing KW - Plasma polymerization KW - Polyethylene (PE) KW - ToF-SIMS PY - 2004 DO - https://doi.org/10.1002/ppap.200400025 SN - 1612-8850 SN - 1612-8869 VL - 1 SP - 141 EP - 152 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-6936 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Oran, Umut A1 - Wirth, Thomas A1 - Unger, Wolfgang A1 - Unveren, E. T1 - A comparison study between Time-of-Flight Static Secondary lon Mass Spectrometry (TOF-SSIMS) and X-Ray Photoelectron Spectroscopy (XPS) in terms of Poly-dimethyl-siloxane (PDMS) contemination of Polystyrene (PS) samples T2 - 10th European Conference on Applications of Surface and Interface Analysis (ECASIA '03) T2 - 10th European Conference on Applications of Surface and Interface Analysis (ECASIA '03) CY - Berlin, Germany DA - 2003-09-05 PY - 2003 AN - OPUS4-5024 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter A1 - Unger, Wolfgang T1 - Characteriazation of Plasma-deposited Ethylene, Ally-alcohol and Ethylene-Ally-alcohol copolymer Films by Time-of-Flight Static Secondary lon Mass Spectrometry (TOF-SIMS) T2 - 10th European Conference on Applications of Surface and Interface Analysis (ECASIA '03) T2 - 10th European Conference on Applications of Surface and Interface Analysis (ECASIA '03) CY - Berlin, Germany DA - 2003-09-05 PY - 2003 AN - OPUS4-5025 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface analysis of plasma-deposited polymer films by Time of Flight Static Secondary Ion Mass Spectrometry (ToF-SSIMS) before and after exposure to ambient air JF - Surface and coatings technology N2 - Pulsed plasma deposited styrene and ethylene films were studied by Time of Flight Static Secondary Ion Mass Spectrometry (ToF-SSIMS) before and after exposure to ambient air. The influence of the external plasma parameters on the secondary ion mass spectra of plasma deposited films was investigated. Approaches for the interpretation of SSIMS spectra of organic materials were reviewed and applied to the evaluation of SSIMS data of plasma deposited films. From these data, information on the chemical character of the plasma deposited films was derived. When the plasma polymers are exposed to air oxygen incorporation occurs. The oxygen uptake is high at the beginning and then it levels of. A relation that “higher the regularity of the film lower is the oxygen uptake” was found. Harder plasma conditions, which could be obtained by applying higher plasma power or lower monomer flow rate, result in higher oxygen uptake and vice versa. KW - Plasma polymerization KW - Polyethylene (PE) KW - Polystyrene (PS) KW - SIMS KW - Ageing PY - 2005 DO - https://doi.org/10.1016/j.surfcoat.2005.02.032 SN - 0257-8972 VL - 200 IS - 1-4 SP - 463 EP - 467 PB - Elsevier Science CY - Lausanne AN - OPUS4-11044 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Study of influence of external plasma parameters on plasma polymerised films prepared from organic molecules (acrylic acid, allyl alcohol, allyl amine) using XPS and NEXAFS JF - Surface and coatings technology N2 - Plasma polymerised films of acrylic acid, allyl alcohol and allyl amine were prepared and studied by XPS (X-ray photoelectron spectroscopy) and XAS (X-ray absorption spectroscopy). The influence of external plasma parameters on certain chemical aspects of the films was investigated. The use of XPS and NEXAFS (near edge X-ray absorption fine structure) as complimentary tools in the surface characterisation of thin films has been highlighted. Certain chemical aspects of the plasma polymerised films such as presence of ROCdouble bond; length as m-dashO in the case of plasma polymerised acrylic acid films, presence of RCdouble bond; length as m-dashO and RC–OR bonds in case of plasma polymerised allyl alcohol films and presence of RCdouble bond; length as m-dashN and C?N in case of plasma polymerised allyl amine films were studied. The concentration of ROCdouble bond; length as m-dashO species was found to decrease with increase in r.f. duty cycle in the case of plasma polymerised acrylic acid films. In case of plasma polymerised allyl alcohol films there is a decrease in the concentration of RCdouble bond; length as m-dashO species and increase in the concentration of RC–OR species at higher pressures, while in the case of plasma polymerised allyl amine films the concentration of RCdouble bond; length as m-dashN and C?N increases at higher powers, with an increase in C?N more pronounced at higher powers. KW - Plasma polymerization KW - NEXAFS KW - XPS KW - Plasma parameter PY - 2005 DO - https://doi.org/10.1016/j.surfcoat.2005.01.083 SN - 0257-8972 VL - 200 IS - 1-4 SP - 494 EP - 497 PB - Elsevier Science CY - Lausanne AN - OPUS4-11045 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Baytekin, H. Tarik A1 - Oran, Umut A1 - Theisen, J. A1 - Schmidt, Martin A1 - Unger, Wolfgang ED - Weckenmann, A. T1 - Validierte Messverfahren für die nichtgeometrische Größe Hydrophilie - Anwendung in der Mikrofluidik T2 - Abschlussbericht DFG Schwerpunktprogramm 1159 - Neue Strategien der Mess- und Prüftechnik für die Produktion von Mikrosystemen und Nanostrukturen T2 - Abschlusskolloquium DFG Schwerpunktprogramm 1159 - Neue Strategien der Mess- und Prüftechnik für die Produktion von Mikrosystemen und Nanostrukturen CY - Erlangen, Deutschland DA - 2010-10-06 PY - 2011 SN - 978-3-8440-0358-1 SN - 0945-0769 SP - 163 EP - 172 PB - Shaker Verlag GmbH AN - OPUS4-24827 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -