TY - GEN A1 - Unger, Wolfgang A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter T1 - NEXAFS - spectroscopy on plasma-polymerized films prepared from organic molecules (ethylene, allyl alcohol, styrene) T2 - BESSY highlights - annual report 2003 KW - Plasma KW - Beschichtung KW - Organische Filme KW - Röntgenabsorptionsspektroskopie PY - 2004 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2003.pdf#page=297 SN - 0179-4159 SP - 297 EP - 299 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-3478 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Ünveren, Ercan A1 - Wirth, Thomas A1 - Unger, Wolfgang T1 - Poly-dimethyl-siloxane (PDMS) contamination of polystyrene (PS) oligomers samples: a comparison of time-of-flight static secondary ion mass spectrometry (TOF-SSIMS) and X-ray photoelectron spectroscopy (XPS) results JF - Applied surface science N2 - Pure and PDMS contaminated PS oligomers films were investigated both by time-of-flight static secondary ion mass spectrometry (TOF-SSIMS) and X-ray photoelectron spectroscopy (XPS). The secondary ion spectra from the PDMS contaminated PS oligomers were almost completely related to PDMS. XPS revealed a PDMS contamination characterized by a silicon surface concentration of 6 at.%. Obviously siloxane contaminants existing on the surface of a silicon wafer may diffuse towards the PS oligomers outermost surface resulting in a rather high PDMS surface concentration of about 85%. Due to the known differences in the information depth and sensitivity of SSIMS and XPS very different detection limits are to be considered. In elimination of siloxane contaminants by ultrasonication in hexane was found to be an effective way. Another common organic cleaning procedure, which is ultrasonication in trichloroethylene (TCE), subsequently in isopropanol and finally in acetone was found to be ineffective for cleaning of PDMS contaminated silicon wafers. KW - PDMS KW - TOF-SIMS KW - Polystyrene KW - Segregation PY - 2004 DO - https://doi.org/10.1016/j.apsusc.2003.12.008 SN - 0169-4332 SN - 1873-5584 VL - 227 SP - 318 EP - 324 PB - North-Holland CY - Amsterdam AN - OPUS4-3479 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Unger, Wolfgang T1 - NEXAFS - spectroscopy on plasma-polymerised films prepared from organic molecules (Acrylic acid, allylamine, ethylene) T2 - BESSY highlights - annual report 2004 KW - NEXAFS KW - Plasmapolymere KW - Synchrotronstrahlung PY - 2005 UR - http://www.helmholtz-berlin.de/media/media/oea/web/pr_webseite/druckschriften/berichte/bessy/annualreport2004.pdf#page=315 SN - 0179-4159 SP - 315 EP - 317 PB - Berliner Elektronenspeicherring-Gesellschaft für Synchrotronstrahlung CY - Berlin AN - OPUS4-7387 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Oran, Umut A1 - Unger, Wolfgang A1 - Schmidt, M. T1 - Measurement of the hydrophilic character of microscopic areas at microfluide components T2 - 2. Statuskolloquium des DFG SPP 1159 "Neue Strategien der Mess- und Prüftechnik für die Produktion von Mikrosystemen und Nanostrukturen" T2 - 2. Statuskolloquium des DFG SPP 1159 "Neue Strategien der Mess- und Prüftechnik für die Produktion von Mikrosystemen und Nanostrukturen" CY - Jena, Germany DA - 2006-05-29 PY - 2006 AN - OPUS4-12431 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Oran, Umut T1 - Surface chemical characterization of plasma chemically deposited polymer films by Time of Flight Secondary Ion Mass Spectrometry T2 - PhD Defense Presentation; Freie Universität Berlin; FB Biologie, Chemie, Pharmazie; Institut für Chemie T2 - PhD Defense Presentation; Freie Universität Berlin; FB Biologie, Chemie, Pharmazie; Institut für Chemie CY - Berlin, Germany DA - 2005-10-13 PY - 2005 AN - OPUS4-11277 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Unger, Wolfgang A1 - Friedrich, Jörg F. T1 - TOF-SIMS analysis of plasma chemically deposited co-polymer films T2 - 15th International Conference on Secondary Ion Mass Spectrometry (SIMS XV) T2 - 15th International Conference on Secondary Ion Mass Spectrometry (SIMS XV) CY - Manchester, England DA - 2005-09-12 PY - 2005 AN - OPUS4-11279 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface analysis of Plasma Deposited Polymer Films, 5 - ToF-SSIMS Characterization of Plasma Deposited Allyl Alcohol Films JF - Plasma processes and polymers N2 - The effect of the composite plasma parameter P/F, where P is the plasma power and F is the monomer flow rate, on the chemical character of pulsed plasma deposited allyl alcohol films was investigated by ToF-SSIMS. Information on the unsaturated character, the cross-linked and/or branched character of the plasma polymer films was derived in detail. The problem of the retention of OH groups in plasma deposited allyl alcohol films was elucidated in detail using SSIMS data. The lowest conversion rate from the monomer's hydroxyl groups to other oxygen functionalities in the plasma was concluded for the plasma polymer film produced at a P/F ratio of 0.05 W · sccm-1. It was found that the overall oxygen content of the films decreased vs. increasing P/F ratio. Because the freshly prepared films were investigated without air exposure, ageing on ambient air could be studied in detail. It was found that in the case of plasma deposited allyl alcohol films the ageing on air is probably based on two competing processes which are discussed in detail. Additionally, a review of literature data on the characterization of plasma deposited allyl alcohol films is given. KW - Ageing KW - Allyl alcohol KW - Plasma polymerization KW - ToF-SIMS PY - 2005 DO - https://doi.org/10.1002/ppap.200400075 SN - 1612-8850 SN - 1612-8869 VL - 2 IS - 7 SP - 563 EP - 571 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11933 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Aging of Plasma-Deposited Films Prepared from Organic Monomers JF - Plasma processes and polymers N2 - Plasma-deposited polymer films were prepared from organic molecules and investigated using near edge X-ray absorption fine structure (NEXAFS) and X-ray photoelectron spectroscopy (XPS) for aging effects after exposure to air. Results from the investigation of homopolymers are summarized. Primarily the effect of the deposition parameters duty cycle and power are dealt with. The effect of the deposition parameter pressure is briefly discussed. An example to show the effect of feed gas composition on the aging of plasma polymerized ethylene/allyl alcohol and styrene/allyl alcohol copolymer is also given. In general, change in content of unsaturated or aromatic species, change in concentration of monomer functionality, and change in the oxygen content was observed in the plasma polymerized films on aging. KW - Plasma copolymer KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization PY - 2007 SN - 1612-8850 SN - 1612-8869 VL - 4 IS - S1 SP - S784 EP - S789 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11934 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Swaraj, Sufal A1 - Oran, Umut A1 - Lippitz, Andreas A1 - Schulze, Rolf-Dieter A1 - Friedrich, Jörg Florian A1 - Unger, Wolfgang T1 - Surface Analysis of Plasma-Deposited Polymer Films, 4 - In situ Characterization of Plasma-Deposited Ethylene Films by XPS and NEXAFS JF - Plasma processes and polymers N2 - XPS and NEXAFS spectroscopy were used for the chemical characterization of pulsed plasma-deposited ethylene films before and after exposure to ambient air. The influence of external plasma parameters on the spectroscopic results was investigated. Information on the chemical character of the plasma-polymerized films, such as the regularity of the primary structure, the amount of long-living radicals, and branching or cross-linking or both was derived from this data. Irregularity and radical concentration for post-plasma reactions of the plasma-deposited films increased with the duty cycle or power. A decreased level of monomer fragmentation and, consequently, an increase in regularity is partially concluded from the experimental data when the monomer pressure is increased. The concentration of surface radicals available for post-plasma reactions also increased with monomer pressure. The correlation found between the degree of the post-plasma oxygen incorporation and the variation of the various external parameters agreed with earlier ToF-SSIMS findings. KW - ESCA/XPS KW - NEXAFS KW - Plasma polymerization KW - Polyethylene (PE) KW - Thin films PY - 2005 DO - https://doi.org/10.1002/ppap.200400070 SN - 1612-8850 SN - 1612-8869 VL - 2 IS - 4 SP - 310 EP - 318 PB - Wiley-VCH Verl. CY - Weinheim AN - OPUS4-11940 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Oran, Umut A1 - Swaraj, Sufal A1 - Retzko, Iris A1 - Schulze, Rolf-Dieter A1 - Lippitz, Andreas A1 - Wirth, Thomas A1 - Friedrich, Jörg F. A1 - Unger, Wolfgang T1 - Study of effects of plasma parameters by characterization of pulse plasma deposited organic films T2 - ECASIA `03 T2 - ECASIA `03 CY - Berlin, Germany DA - 2003-10-06 PY - 2003 AN - OPUS4-4673 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -