TY - JOUR A1 - Wendt, U. A1 - Nolze, Gert T1 - FIB-Ätzen und Ionen-Channeling - Der Materialabtrag hängt von der kristallographischen Orientierung ab JF - GIT : Labor-Fachzeitschrift KW - FIB KW - Ionenätzen KW - Kristall PY - 2007 SN - 0016-3538 VL - 51 IS - 10 SP - 848 EP - 851 PB - GIT-Verlag CY - Darmstadt AN - OPUS4-16155 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Wendt, U. A1 - Nolze, Gert T1 - Correlation between Crystal Orientation, Channeling Contrast and Topography during FIB Milling of Cu Studied by FIB, EBSD, SEM, and AFM JF - Praktische Metallographie N2 - We have studied the anisotropic milling of Cu with respect to the milling rate and the milling topography, as well. The background is twofold: i) anisotropic milling has to be taken into account during the preparation of TEM specimens and in the manufacturing of micro parts from crystalline materials, and ii) the orientation depending milling behaviour can be used to generate topographies with specific properties with respect to, for example, adsorption, wear, and corrosion. KW - FIB KW - AFM KW - Crystal orientation KW - SEM PY - 2007 VL - 44 IS - 5 SP - 236 EP - 238 PB - Carl Hanser Verlag AN - OPUS4-38026 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Wendt, U. A1 - Nolze, Gert A1 - Heyse, H. T1 - Effect of crystal orientation on imaging contrast and sputter results during focused ion beam milling of Cu studied by FIB, EBSD, SEM, and AFM JF - Microscopy and Microanalysis N2 - During focused ion beam microscopy (FIB) of crystalline materials imaging contrast and milling result are effected by orientation of the crystals with respect to the incident ion beam. This is due to the possibility of ion channeling along preferred crystal directions which effects the depth at which interaction between ions and specimen atoms takes place. As a result of channeling emission of ion induced secondary electrons (iiSE) and secondary ions (SI) as well as the sputter rate decreases. Theoretical channeling orientations and critical angles can be calculated. These effects have been studied quantitatively for polycrystalline recrystallized Cu as a typical model case. KW - Electron backscatter diffraction KW - FIB KW - AFM KW - Crystal orientation PY - 2006 DO - https://doi.org/10.1017/S1431927606061812 SN - 1431-9276 SN - 1435-8115 VL - 12 IS - Suppl. 2 SP - 1302 EP - 1303 AN - OPUS4-38027 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -