TY - JOUR A1 - Fahmy, A. A1 - Mix, Renate A1 - Schönhals, Andreas A1 - Friedrich, Jörg Florian T1 - Structure-property relationship of thin plasma deposited poly(allyl alcohol) films JF - Plasma chemistry and plasma processing N2 - Poly(allyl alcohol) films with a thickness of about 150 nm were deposited by pulse plasma polymerization onto different substrates (inorganic and organic). The structure/property relationships of these samples were studied in dependence on the duty cycle (DC) of the plasma by a broad combination of different techniques and probes. For the first time volume sensitive methods (FTIR and dielectric spectroscopy) are combined with surface analytics by employing XPS for that system. FTIR spectroscopy gives qualitatively the same dependence of the concentration of the OH groups on DC like XPS. The observed differences are discussed considering the different analytical depths of both the methods. The dielectric measurements show that the plasma deposited films are not thermally stable but undergo a post plasma chemical reaction during heating. The results obtained by dielectric spectroscopy are discussed in detail with the data from FTIR and XPS measurements. KW - Allyl alcohol KW - Dielectric properties KW - Plasma polymerization KW - Surface and bulk characterization KW - Thermal stability PY - 2011 DO - https://doi.org/10.1007/s11090-011-9297-0 SN - 0272-4324 VL - 31 IS - 3 SP - 477 EP - 498 PB - Plenum Publ. Corp. CY - New York, NY, USA AN - OPUS4-23671 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -