TY - JOUR A1 - Reinholz, Uwe A1 - Bremser, Wolfram A1 - Brzezinka, Klaus-Werner A1 - Strub, Erik A1 - Weise, Hans-Peter A1 - Merchel, Silke T1 - A thin-layer reference material for hydrogen analysis JF - Nuclear instruments and methods in physics research B N2 - In many areas of material sciences, hydrogen analysis is of particular importance. For example, hydrogen is most abundant as impurity in thin film materials – depending on the deposition process – and has great influence on the chemical, physical and electrical properties of many materials. Existing bulk reference materials (RMs) are not suited for surface sensitive analytical methods like elastic recoil detection analysis (ERDA) or nuclear reaction analysis (NRA). To overcome this serious lack of (certified) thin-layer reference materials for the determination of hydrogen in the near-surface region (1–2 µm depth), we produced stable, homogeneous amorphous silicon layers on Si-wafers (aSi:H–Si) by means of chemical vapour deposition (CVD), while about 10% of hydrogen was incorporated in the Si-layer. Homogeneity and stability were proved by NRA whereas traceability of reference values has been assured by an international interlaboratory comparison. KW - Hydrogen KW - Nuclear reaction analysis KW - Depth profiling KW - Reference material KW - Ion beam analysis PY - 2008 DO - https://doi.org/10.1016/j.nimb.2008.03.015 SN - 0168-583X SN - 1872-9584 VL - 266 IS - 10 SP - 2418 EP - 2423 PB - Elsevier CY - Amsterdam AN - OPUS4-17553 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -