TY - GEN A1 - Rudolph, Pascale A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Mikrostrukturierung von Glas zur Erzeugung kristalliner Si-Schichten PY - 2000 IS - 12 SP - 7 EP - 36 PB - VDI-Verl. CY - Düsseldorf AN - OPUS4-985 LA - deu AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Krüger, Jörg A1 - Kautek, Wolfgang A1 - Lenzner, M. A1 - Sartania, S. A1 - Spielmann, C. A1 - Krausz, F. T1 - Laser micromachining of barium aluminium borosilicate glass with pulse durations between 20 fs and 3 ps N2 - Laser-micromachining of high-tech glass has been extended down to a pulse duration of 20 fs generated by a Ti sapphire laser system at a wavelength of 780 nm. A systematic electronmicroscopic study shows that, below 100 fs, an extreme precision and a substantial decrease of the ablation threshold fluence with respect to pulse laser processing with pulses in the picosecond and nanosecond range could be achieved. The technical relevance of this novel microtechnology is discussed. The morphology of the ablated areas is not determined by thermal processes, i.e. the heat affected zone. It is controlled by non-linear optical coupling effects. Multi-photon absorption becomes highly efficient below laser pulse durations of 100 fs so that light penetration is minimized and ablation cavities become smooth. At longer pulse durations, a higher light penetration due to a lower number of non-linearly absorbed photons allows mechanical relaxation processes in the glass material leading to roughening. KW - Laser micromachining KW - Subpicosecond laser ablation KW - Barium aluminium borosilicate glass PY - 1998 DO - https://doi.org/10.1016/S0169-4332(97)00763-0 SN - 0169-4332 SN - 1873-5584 IS - 127-129 SP - 892 EP - 898 PB - North-Holland CY - Amsterdam AN - OPUS4-887 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Krüger, Jörg A1 - Kautek, Wolfgang A1 - Niino, H. T1 - Biomaterial immobilization on polyurethane films by XeCl excimer laser processing N2 - Zusammenfassung The surface chemical modification of polyurethane (PU) films was performed by an UV laser-induced chemical reaction in a polysaccharide solution. This process may be applicable as hydrophilic packaging of implantable medical devices and in vivo sensors. When a PU film in contact with an aqueous alginic acid (AAC) solution was irradiated with a XeCl laser, the PU film turned hydrophilic. Contact angles of water on the film were reduced from 110° to 60°. Since light absorption of the AAC solution at 308 nm was negligibly small, reactive sites were generated solely on the PU surface. There, AAC could be immobilized by chemical bonds thus allowing for a nanometer-scaled grafting of this biomolecule. The mechanism was investigated by surface analyses with Fourier-transform infrared spectroscopy (FT-IR), dye staining, ultraviolet-visible (UV-VIS) spectroscopy, and scanning electron microscopy (SEM) techniques. A one-photon photochemical process could beidentified. PY - 2001 DO - https://doi.org/10.1007/s003390000617 SN - 0947-8396 VL - 72 IS - 1 SP - 53 EP - 57 PB - Springer CY - Berlin AN - OPUS4-926 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Bonse, Jörn A1 - Krüger, Jörg A1 - Kautek, Wolfgang A1 - Wrobel, J. M. T1 - Femtosecond pulse laser machining of InP wafers N2 - Ablation of indium phosphide wafers in air was performed with 130 fs laser pulses at a wavelength of 800 nm at a low repetition rate of 10 Hz. In order to evaluate the role of the incubation effects, the relationship between the number of laser pulses used for the ablation and the threshold fluence was studied. Particular attention was paid to the chemical composition, surface morphology and structural variations of the ablated area. T2 - 5th Laser Applications in Microelectronics and Optoelectronics Manufacturing Conference (LAMOM) CY - San José, CA, USA DA - 240.01.2000 KW - Femtosecond laser ablation KW - Indium phosphide KW - Auger electron spectroscopy PY - 2000 SN - 0-8194-3550-3 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 3933 SP - 280 EP - 287 PB - SPIE CY - Bellingham, Wash. AN - OPUS4-937 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Krüger, Jörg A1 - Bonse, Jörn A1 - Baudach, Steffen A1 - Kautek, Wolfgang A1 - Lenzner, M. A1 - Wrobel, J. M. T1 - Femtosecond-Pulse Laser Machining of Semiconducting Materials N2 - Summary form only given. Machining investigations of crystalline silicon have been performed with laser pulses at a wavelength of 780 nm in the range between 5 fs and 400 fs. Applying 100 pulses per spot, surface damage thresholds were determined by the measurement of the damage diameter. In this pulse duration regime, the threshold fluences were nearly constant. Single-pulse investigations with 5 fs pulses yielded a value of about 0.15 J cm-2 identical to the multi-pulse experiment. This is in contradiction to the behaviour of dielectrics where incubation effects alter the optical properties down to the 5 fs pulse regime. Employing laser pulses with a duration of 130 fs at a wavelength of 800 nm, single-pulse ablation thresholds of 0.23 J cm-2 and 0.16 J cm-2 were determined for Si and InP in air, respectively. The threshold fluence was calculated from the linear relation between the square of the diameters versus the logarithm of the laser fluences. T2 - CLEO/Europe 2000 ; Conference on Lasers and Electro-Optics Europe ; Conférence Européenne sur les Lasers et l'Electro-Optique ; CLEO/Europe-IQEC CY - Nice, France DA - 2000-09-10 PY - 2000 SN - 0-7803-6319-1 DO - https://doi.org/10.1109/CLEOE.2000.910410 PB - IEEE Service Center CY - Piscataway, NJ AN - OPUS4-958 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Kraft, S. A1 - Böttcher, Katrin A1 - Bonse, Jörn A1 - Schille, J. A1 - Löschner, U. A1 - Krüger, Jörg T1 - Unwanted X-ray emission in ultrashort pulse laser processing: From metallic to biological materials N2 - X-rays can be generated as an unwanted side effect during ultrashort pulse laser material processing of technical work pieces and even biological samples with laser intensities above 10^13 W/cm^2. First studies demonstrate the need to address this effect in industrial as well as in medical applications. This secondary hazard should be considered in work safety and risk assessment. T2 - Lasers in Manufacturing 2023 (LiM 2023) CY - Munich, Germany DA - 26.06.2023 KW - Ultrashort pulse laser processing KW - Laser-induced X-ray emission KW - Secondary hazard PY - 2023 SP - LiM 2023 - 1 EP - LiM 2023 - 6 PB - Wissenschaftliche Gesellschaft Lasertechnik und Photonik e.V. (WLT) AN - OPUS4-58358 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Pentzien, Simone A1 - Rabin, Ira A1 - Hahn, Oliver A1 - Krüger, Jörg A1 - Kleber, F. A1 - Hollaus, F. A1 - Diem, M. A1 - Sablatnig, R. T1 - Can modern technologies defeat nazi censorship? KW - Laser cleaning KW - Multispectral imaging KW - Image enhancement KW - Ancient manuscripts KW - Image restoration PY - 2010 SN - 1556-4673 VL - 2 IS - 3, Article 1 SP - 1 EP - 16 PB - Association for Computing Machinery CY - New York, NY, USA AN - OPUS4-25651 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - CONF A1 - Pentzien, Simone A1 - Rabin, Ira A1 - Hahn, Oliver A1 - Krüger, Jörg A1 - Kleber, F. A1 - Hollaus, F. A1 - Diem, M. A1 - Sablatnig, R. ED - Park, J.-I. ED - Kim, J. T1 - Can Modern Technologies Defeat Nazi Censorship? N2 - Censorship of parts of written text was and is a common practice in totalitarian regimes. It is used to destroy information not approved by the political power. Recovering the censored text is of interest for historical studies of the text. This paper raises the question, whether a censored postcard from 1942 can be made legible by applying multispectral imaging in combination with laser cleaning. In the fields of art conservation (e.g. color measurements), investigation (e.g. Analysis of underdrawings in paintings), and historical document analysis, multispectral imaging techniques have been applied successfully to give visibility to information hidden to the human eye. The basic principle of laser cleaning is to transfer laser pulse energy to a contamination layer by an absorption process that leads to heating and evaporation of the layer. Partial laser cleaning of postcards is possible; dirt on the surface can be removed and the obscured pictures and writings made visible again. We applied both techniques to the postcard. The text could not be restored since the original ink seems to have suffered severe chemical damage. T2 - ACCV 2012 Workshops, 11th Asian conference on computer vision CY - Daejeon, Korea DA - 05.11.2012 KW - Laser cleaning KW - Multispectral imaging KW - Image restoration KW - Image enhancement PY - 2013 SN - 978-3-642-37483-8 SN - 0302-9743 VL - II IS - LNCS 7729 SP - 13 EP - 24 PB - Springer CY - Berlin Heidelberg AN - OPUS4-28160 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Kautek, Wolfgang A1 - Pentzien, Simone A1 - Conradi, Andrea A1 - Krüger, Jörg A1 - Brzezinka, Klaus-Werner T1 - Pulsed-laser deposition and boron-blending of diamond-like carbon (DLC) thin films KW - Pulslaser KW - Bor KW - Dünnfilmtechnologie KW - Dünnfilm, diamantartig PY - 1996 SN - 0169-4332 SN - 1873-5584 VL - 106 SP - 158 EP - 165 PB - North-Holland CY - Amsterdam AN - OPUS4-630 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Krüger, Jörg A1 - Kautek, Wolfgang ED - Dubowski, J. T1 - Femtosecond-pulse laser processing of metallic and semiconducting thin films KW - Femtosekundenpulslaser KW - Pulslaser KW - Dünnschicht, metallisch KW - Dünnschicht, halbleitend KW - Ablation PY - 1995 SN - 0-8194-1750-5 SN - 1605-7422 N1 - Serientitel: SPIE proceedings series – Series title: SPIE proceedings series IS - 2403 SP - 436 EP - 447 PB - SPIE CY - Bellingham, Wash. AN - OPUS4-637 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Bonse, Jörn A1 - Rudolph, Pascale A1 - Krüger, Jörg A1 - Baudach, Steffen A1 - Kautek, Wolfgang T1 - Femtosecond pulse laser processing of TiN on silicon N2 - Ultrashort pulse laser microstructuring (pulse duration 130 fs, wavelength 800 nm, repetition rate 2 Hz) of titanium nitride (TiN) films on silicon substrates was performed in air using the direct focusing technique. The lateral and vertical precision of laser ablation was evaluated. The TiN ablation threshold changed with the number of pulses applied to the surface due to an incubation effect. An ablation depth per pulse below the penetration depth of light was observed. Columnar structures were formed in the silicon substrate after drilling through the TiN layer. KW - Femtosecond laser ablation KW - Titanium nitride KW - Silicon KW - Optical properties PY - 2000 DO - https://doi.org/10.1016/S0169-4332(99)00481-X SN - 0169-4332 SN - 1873-5584 VL - 154-155 SP - 659 EP - 663 PB - North-Holland CY - Amsterdam AN - OPUS4-802 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Baudach, Steffen A1 - Bonse, Jörn A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Ultrashort pulse laser ablation of polycarbonate and polymethylmethacrylate N2 - Ablation experiments with ultrashort laser pulses (pulse duration 150 fs, wavelength 800 nm) on polymers (PC, PMMA) relevant for biomedical technology have been performed in air. The lateral and vertical machining precision was evaluated by optical, atomic force and scanning electron microscopy. The ablation threshold reaches values in the range of 0.5–2.5 J/cm2 and depends significantly on the number of laser pulses applied to the same spot. The hole diameters are influenced by the laser fluence and the number of laser pulses. The relation between the ablation threshold and the number of laser pulses applied to the same spot is described in accordance with an incubation model. KW - Femtosecond laser ablation KW - Polymer KW - Polycarbonate KW - Polymethylmethacrylate PY - 2000 DO - https://doi.org/10.1016/S0169-4332(99)00474-2 SN - 0169-4332 SN - 1873-5584 VL - 154-155 SP - 555 EP - 560 PB - North-Holland CY - Amsterdam AN - OPUS4-803 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Krüger, Jörg A1 - Kautek, Wolfgang A1 - Lenzner, M. A1 - Krausz, F. T1 - Precision laser ablation of dielectrics in the 10-fs regime N2 - Zusammenfassung Laser pulses in the 10-fs domain provide a quality of micromachining of fused silica and borosilicate glass that is unobtainable with longer pulses in the range of several 100 femtoseconds up to picoseconds. The shortening of the pulses reduces the statistical behavior of the material removal and the ablation process thus attains a more deterministic and reproducible character. The improved reproducibility of ablation is accompanied by significantly smoother morphology. This offers the potential for lateral and vertical machining precision of the order of 100 nm and 10 nm, respectively. KW - Laser ablation PY - 1999 DO - https://doi.org/10.1007/s003390050906 SN - 0947-8396 VL - 68 IS - 3 SP - 369 EP - 371 PB - Springer CY - Berlin AN - OPUS4-825 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Krüger, Jörg A1 - Kautek, Wolfgang A1 - Krivenko, A.G. A1 - Benderskii, V.A. T1 - Gigantic Hydrogen-Ion Discharge Currents Initiated by a Subpicosecond Laser PY - 1998 SN - 0038-5387 SN - 1023-1935 VL - 34 IS - 10 SP - 1068 EP - 1075 PB - MAIK Nauka/Interperiodica Publ. CY - Moscow AN - OPUS4-826 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Krüger, Jörg A1 - Kautek, Wolfgang A1 - Lenzner, M. A1 - Krausz, F. T1 - Incubation of laser ablation in fused silica with 5-fs pulses N2 - Zusammenfassung The threshold fluences for laser-induced damage of fused silica with single 5-fs pulses from a Ti:sapphire laser system were determined by extrapolating the ablated volume to zero. These thresholds are about 4 times as high as the values previously obtained from multi-shot experiments. This result is interpreted in terms of an irreversible modification of the original material below the single-shot threshold (incubation). KW - Laser PY - 1999 DO - https://doi.org/10.1007/s003390051034 SN - 0947-8396 VL - 69 IS - 4 SP - 465 EP - 466 PB - Springer CY - Berlin AN - OPUS4-799 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Krüger, Jörg A1 - Kautek, Wolfgang A1 - Lenzner, M. A1 - Krausz, F. T1 - Photoablation with sub-10 fs laser pulses N2 - Ablation experiments in several glasses with single and multishot irradiation by laser pulses in the 10-fs pulse duration domain are presented; physical and technological implications are discussed. We demonstrate that these short pulses offer the potential for lateral and vertical machining precision of the order of 100 nm. KW - Ablation KW - Laser pulses KW - Femtosecond pulses PY - 2000 DO - https://doi.org/10.1016/S0169-4332(99)00432-8 SN - 0169-4332 SN - 1873-5584 VL - 154-155 SP - 11 EP - 16 PB - North-Holland CY - Amsterdam AN - OPUS4-800 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Rudolph, Pascale A1 - Bonse, Jörn A1 - Krüger, Jörg A1 - Kautek, Wolfgang T1 - Femtosecond- and nanosecond-pulse laser ablation of bariumalumoborosilicate glass N2 - Laser ablation with femtosecond pulses (130 fs, wavelength 800 nm, repetition rate 2 Hz) was compared with nanosecond-pulse ablation (10 ns, wavelength 266 nm, repetition rate 2.5 Hz) of bariumalumoborosilicate glass in air using the direct focusing technique. Different ablation thresholds and heat-affected zones were observed. The lateral and vertical machining precision was evaluated. Single nanosecond laser pulses in the far UV resulted in a bubble or a circular hole in the centre of the illuminated spot, depending on the applied fluence. The ablation behaviour in the case of near-IR femtosecond pulses contrasted to this. Bubble formation was not detected. It needed repeated pulses at the same spot to modify the surface until material removal could be observed (incubation). Cavity dimensions of less than the beam diameter were achieved in this case. T2 - 5th International Conference on Laser Ablation ; COLA '99 CY - Göttingen, Germany DA - 1998-07-19 KW - Laser ablation KW - Bariumalumoborosilicate glass PY - 1999 DO - https://doi.org/10.1007/s003390051524 SN - 0947-8396 VL - 69 IS - 7 SP - S763 EP - S766 PB - Springer CY - Berlin AN - OPUS4-801 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Voss, Heike A1 - Zahedi-Azad, Setareh A1 - Ernst, Owen C. A1 - Lucaßen, Jan A1 - Mann, Guido A1 - Bonse, Jörn A1 - Boeck, Torsten A1 - Martin, Jens A1 - Schmid, Martina A1 - Krüger, Jörg T1 - Chemical vapor deposition of indium precursors for solar microabsorbers using continuous laser radiation BT - A, Materials science & processing N2 - Localized deposition of indium on an amorphous glass surface covered with a thin molybdenum layer is demonstrated utilizing laser-assisted chemical vapor deposition. A continuous-wave laser causes a temperature rise on the molybdenum layer resulting in the selective aggregation of liquid and ultimately crystalline structures of indium. The formation sites of the indium are determined by the decomposition of gaseous trimethylindium. The deposited indium islands can serve as precursors and could be further processed into compound semiconductors like CuInSe2 for micro-concentrator solar cells. The experimental investigations were supported by theoretical simulations of the laser heating process to calculate the local temperature distribution on the surface of the molybdenum-covered glass substrate. KW - Laser-assisted Chemical Vapor Deposition KW - CW Laser KW - Indium Islands KW - Micro-concentrator Solar Cell PY - 2025 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-641069 DO - https://doi.org/10.1007/s00339-025-08895-z SN - 0947-8396 VL - 131 SP - 1 EP - 10 PB - Springer CY - Berlin ; Heidelberg [u.a.] AN - OPUS4-64106 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - GEN A1 - Böttcher, Katrin A1 - Kraft, Sebastian A1 - Weise, Matthias A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - Publisher correction: X-ray emission during ultrafast laser grooving N2 - This is a corrigendum to the original article "X-ray emission during ultrafast laser grooving" that was published in the journal "Applied Physics A", vol. 131 (2025), article 651 (doi 10.1007/s00339-025-08728-z). PY - 2025 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-648868 DO - https://doi.org/10.1007/s00339-025-08882-4 SN - 0947-8396 VL - 131 IS - 11 SP - 1 PB - Springer CY - Berlin AN - OPUS4-64886 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER - TY - JOUR A1 - Böttcher, Katrin A1 - Kraft, Sebastian A1 - Weise, Matthias A1 - Bonse, Jörn A1 - Krüger, Jörg T1 - X-ray emission during ultrafast laser grooving N2 - Ultrashort pulse lasers offer the possibility to process materials with minimal heat input and high precision. However, the X-ray emission at high laser peak intensities represents an undesirable side effect. A laser system (1030 nm wavelength, 40 W maximum average laser power, 925 fs pulse duration, 100 μJ maximum pulse energy, 400 kHz pulse repetition frequency) was used to analyze the X-ray skin dose rates for applied peak intensities between 9.2 × 10^12 W/cm^2 and 1.3 × 10^14 W/cm^2 for mild steel, stainless steel and tungsten during groove processing. The lowest laser peak intensity at which X-ray emission could be measured was 9.2 × 10^12 W/cm^2 for processing of stainless steel. The X-ray emission showed a characteristic evolution in dependence on the number of overscans at the same line positions. For low peak intensities, a measurable X-ray emission only begins after a few passes. The number of scans to reach the maximum dose rate increases with lower laser peak intensity. Analysis of the evolving surface topography by white light interference microscopy in connection with ray-tracing simulations led to the interpretation that the increase in X-ray emission is due to the local intensity redistribution by multiple reflection within the laser-generated grooves which is promoted by a particular choice of the linear laser polarization. KW - Ultrashort pulsed laser KW - Laser-induced X-rays KW - X-ray hazard KW - X-ray emission PY - 2025 UR - https://nbn-resolving.org/urn:nbn:de:kobv:b43-639483 DO - https://doi.org/10.1007/s00339-025-08728-z SN - 1432-0630 VL - 131 IS - 8 SP - 1 EP - 12 PB - Springer CY - Berlin AN - OPUS4-63948 LA - eng AD - Bundesanstalt fuer Materialforschung und -pruefung (BAM), Berlin, Germany ER -